Patents by Inventor Jun Kanayasu

Jun Kanayasu has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Substrate cleaning apparatus
    Publication number: 20050183749
    Abstract: A substrate cleaning apparatus comprises an outer shell constructed such that the outer shell is selectively openable or hermetically closable to form a sealed space, an inner shell enclosed within the outer shell and having a holding member for holding a substrate, and a dispenser unit for feeding at least one of gas and liquid into the inner shell. Within the sealed space formed by the outer shell, a highly gas-tight space is formed by the inner shell to permit cleaning of the substrate within the highly gas-tight space. Also disclosed are a dispenser, a substrate holding mechanism and a substrate cleaning chamber, which are suitable for use with the substrate cleaning apparatus, and substrate cleaning processes making use of these dispenser, substrate holding mechanism and substrate cleaning chamber, respectively.
    Type: Application
    Filed: March 2, 2005
    Publication date: August 25, 2005
    Applicant: m-FSI LTD.
    Inventors: Kousaku Matsuno, Masao Iga, Takeji Ueda, Jun Kanayasu, Satoshi Shikami
  • Substrate cleaning apparatus
    Publication number: 20050183750
    Abstract: A substrate cleaning apparatus comprises an outer shell constructed such that the outer shell is selectively openable or hermetically closable to form a sealed space, an inner shell enclosed within the outer shell and having a holding member for holding a substrate, and a dispenser unit for feeding at least one of gas and liquid into the inner shell. Within the sealed space formed by the outer shell, a highly gas-tight space is formed by the inner shell to permit cleaning of the substrate within the highly gas-tight space. Also disclosed are a dispenser, a substrate holding mechanism and a substrate cleaning chamber, which are suitable for use with the substrate cleaning apparatus, and substrate cleaning processes making use of these dispenser, substrate holding mechanism and substrate cleaning chamber, respectively.
    Type: Application
    Filed: March 2, 2005
    Publication date: August 25, 2005
    Applicant: m-FSI LTD.
    Inventors: Kousaku Matsuno, Masao Iga, Takeji Ueda, Jun Kanayasu, Satoshi Shikami
  • Substrate cleaning apparatus
    Publication number: 20050150530
    Abstract: A substrate cleaning apparatus comprises an outer shell constructed such that the outer shell is selectively openable or hermetically closable to form a sealed space, an inner shell enclosed within the outer shell and having a holding member for holding a substrate, and a dispenser unit for feeding at least one of gas and liquid into the inner shell. Within the sealed space formed by the outer shell, a highly gas-tight space is formed by the inner shell to permit cleaning of the substrate within the highly gas-tight space. Also disclosed are a dispenser, a substrate holding mechanism and a substrate cleaning chamber, which are suitable for use with the substrate cleaning apparatus, and substrate cleaning processes making use of these dispenser, substrate holding mechanism and substrate cleaning chamber, respectively.
    Type: Application
    Filed: March 2, 2005
    Publication date: July 14, 2005
    Applicant: m-FSI LTD.
    Inventors: Kousaku Matsuno, Masao Iga, Takeji Ueda, Jun Kanayasu, Satoshi Shikami
  • Substrate cleaning apparatus
    Patent number: 6874516
    Abstract: A substrate cleaning apparatus comprises an outer shell constructed such that the outer shell is selectively openable or hermetically closable to form a sealed space, an inner shell enclosed within the outer shell and having a holding member for holding a substrate, and a dispenser unit for feeding at least one of gas and liquid into the inner shell. Within the sealed space formed by the outer shell, a highly gas-tight space is formed by the inner shell to permit cleaning of the substrate within the highly gas-tight space. Also disclosed are a dispenser, a substrate holding mechanism and a substrate cleaning chamber, which are suitable for use with the substrate cleaning apparatus, and substrate cleaning processes making use of these dispenser, substrate holding mechanism and substrate cleaning chamber, respectively.
    Type: Grant
    Filed: May 30, 2002
    Date of Patent: April 5, 2005
    Assignee: m•FSI Ltd.
    Inventors: Kousaku Matsuno, Masao Iga, Takeji Ueda, Jun Kanayasu, Satoshi Shikami
  • Substrate Cleaning apparatus
    Publication number: 20030005948
    Abstract: A substrate cleaning apparatus comprises an outer shell constructed such that the outer shell is selectively openable or hermetically closable to form a sealed space, an inner shell enclosed within the outer shell and having a holding member for holding a substrate, and a dispenser unit for feeding at least one of gas and liquid into the inner shell. Within the sealed space formed by the outer shell, a highly gas-tight space is formed by the inner shell to permit cleaning of the substrate within the highly gas-tight space. Also disclosed are a dispenser, a substrate holding mechanism and a substrate cleaning chamber, which are suitable for use with the substrate cleaning apparatus, and substrate cleaning processes making use of these dispenser, substrate holding mechanism and substrate cleaning chamber, respectively.
    Type: Application
    Filed: May 30, 2002
    Publication date: January 9, 2003
    Applicant: m-FSI LTD.
    Inventors: Kousaku Matsuno, Masao Iga, Takeji Ueda, Jun Kanayasu, Satoshi Shikami