Patents by Inventor Jun Ki PARK

Jun Ki PARK has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20230272178
    Abstract: The composite film according to an embodiment adopts an acrylate-based binder and an acrylamide-based monomer in a single functional layer for antistatic, antifouling, and chemical resistant functions to exhibit flexible characteristics without deteriorating the adhesive strength to a substrate; thus, it can be applied as a cover window of a flexible display device.
    Type: Application
    Filed: December 5, 2022
    Publication date: August 31, 2023
    Inventors: Hyung-Woo CHO, Jun-Ki PARK, Seok-Jong WOO, Seung-Yong PYUN
  • Publication number: 20230272175
    Abstract: In the composite film according to the embodiment, an elastic layer in which its modulus change characteristics with respect to temperature have been adjusted to a certain range is coated onto the opposite side to a hard coating layer; thus, it is possible to enhance the surface hardness and elastic recovery characteristics of the hard coating layer. Thus, it can be advantageously applied as a cover window of a flexible display device.
    Type: Application
    Filed: December 5, 2022
    Publication date: August 31, 2023
    Inventors: Jun-Ki PARK, Seok-Jong WOO, Hyung-Woo CHO, Seung-Yong PYUN
  • Publication number: 20230271404
    Abstract: A multilayer sheet including: a transparent film with a total light transmittance of 85% or more in accordance with ISO 13468; a coating layer disposed on a first surface of the transparent film; and an adhesive layer disposed on a second surface, opposite to the first surface, of the transparent film, wherein a thickness of the adhesive layer after being cured is two times or less of a thickness of the coating layer, is disclosed.
    Type: Application
    Filed: October 31, 2022
    Publication date: August 31, 2023
    Applicant: SK microworks solutions Co., Ltd.
    Inventors: Seok-Jong WOO, Jun-Ki PARK, Hyung-Woo CHO, Seung-Yong PYUN
  • Publication number: 20220130970
    Abstract: A semiconductor device capable of improving a device performance and a reliability is provided. The semiconductor device comprising a gate structure including a gate electrode on a substrate, a source/drain pattern on a side face of the gate electrode, on the substrate and, a source/drain contact connected to the source/drain pattern, on the source/drain pattern, a gate contact connected to the gate electrode, on the gate electrode, and a wiring structure connected to the source/drain contact and the gate contact, on the source/drain contact and the gate contact, wherein the wiring structure includes a first via plug, a second via plug, and a wiring line connected to the first via plug and the second via plug, the first via plug has a single conductive film structure, and the second via plug includes a lower via filling film, and an upper via filling film on the lower via filling film.
    Type: Application
    Filed: July 6, 2021
    Publication date: April 28, 2022
    Inventors: Ji Won KANG, Tae-Yeol KIM, Jeong Ik KIM, Rak Hwan KIM, Jun Ki PARK, Chung Hwan SHIN
  • Publication number: 20220041859
    Abstract: The present disclosure relates to a polyester-based resin composition and a molded article manufactured using the same. More particularly, the present disclosure relates to a polyester-based resin composition including 93 to 99.5% by weight of a polybutylene terephthalate resin; 0.1 to 3% by weight of a polar group-containing lubricant; and 0.1 to 2% by weight of an antioxidant and a molded article manufactured using the polyester-based resin composition.
    Type: Application
    Filed: October 16, 2020
    Publication date: February 10, 2022
    Inventors: Gun KO, Soo Min LEE, Yi Seul JUN, Myeung Il KIM, Jun Ki PARK, Jin Sol PARK, Hee Jae HWANG
  • Patent number: 10557198
    Abstract: A substrate processing apparatus is provided. The substrate processing apparatus includes a substrate chuck, a shower head structure over the substrate chuck, and a gas distribution apparatus connected to the shower head structure. The gas distribution apparatus includes a dispersion container including a first dispersion space and a gas inlet section on the dispersion container. The gas inlet section includes a first inlet pipe including a first inlet path fluidly connected to the first dispersion space and a second inlet pipe including a second inlet path fluidly connected to the first dispersion space. The second inlet pipe surrounds at least a portion of a sidewall of the first inlet pipe.
    Type: Grant
    Filed: November 14, 2018
    Date of Patent: February 11, 2020
    Assignee: Samsung Electronics Co., Ltd.
    Inventors: Heon Bok Lee, Dae Yong Kim, Dong Woo Kim, Jun Ki Park, Sang Yub Ie, Sang Jin Hyun
  • Publication number: 20190292664
    Abstract: A substrate processing apparatus is provided. The substrate processing apparatus includes a substrate chuck, a shower head structure over the substrate chuck, and a gas distribution apparatus connected to the shower head structure. The gas distribution apparatus includes a dispersion container including a first dispersion space and a gas inlet section on the dispersion container. The gas inlet section includes a first inlet pipe including a first inlet path fluidly connected to the first dispersion space and a second inlet pipe including a second inlet path fluidly connected to the first dispersion space. The second inlet pipe surrounds at least a portion of a sidewall of the first inlet pipe.
    Type: Application
    Filed: November 14, 2018
    Publication date: September 26, 2019
    Inventors: Heon Bok Lee, Dae Yong Kim, Dong Woo Kim, Jun Ki Park, Sang Yub Ie, Sang Jin Hyun
  • Patent number: 10134856
    Abstract: A semiconductor device includes an active fin partially protruding from an isolation pattern on a substrate, a gate structure on the active fin, a source/drain layer on a portion of the active fin adjacent to the gate structure, a source/drain layer on a portion of the active fin adjacent to the gate structure, a metal silicide pattern on the source/drain layer, and a plug on the metal silicide pattern. The plug includes a second metal pattern, a metal nitride pattern contacting an upper surface of the metal silicide pattern and covering a bottom and a sidewall of the second metal pattern, and a first metal pattern on the metal silicide pattern, the first metal pattern covering an outer sidewall of the metal nitride pattern. A nitrogen concentration of the first metal pattern gradually decreases according to a distance from the outer sidewall of the metal nitride pattern.
    Type: Grant
    Filed: September 1, 2016
    Date of Patent: November 20, 2018
    Assignee: SAMSUNG ELECTRONICS CO., LTD.
    Inventors: Da-Il Eom, Jeong-Ik Kim, Ja-Hum Ku, Chul-Sung Kim, Jun-Ki Park, Sang-Jin Hyun
  • Patent number: 9813070
    Abstract: The present invention relates to a method for generating a reference signal to drive a display apparatus. A method according to the present invention may comprise generating a reference signal having a training pattern being repeated with a periodicity of two clock terms (CTs); and transmitting the reference signal to a phase locked loop (PLL). Each CT has a single embedded clock bit (CB) and a plurality of data bits, and the reference signal has a rising edge at a start point of a first CB corresponding to a first unit interval (UI) of a first CT, and a rising edge at an end point of a second CB corresponding to a first UI of a second CT. According to exemplary embodiments of the present disclosure, energy consumption and EMI effects can be remarkably reduced, and a complexity of PLL can be reduced.
    Type: Grant
    Filed: February 16, 2016
    Date of Patent: November 7, 2017
    Assignee: POSTECH ACADEMY—INDUSTRY FOUNDATION
    Inventors: Jae Joon Kim, Doo Bock Lee, Jun Ki Park, Eun Woo Song
  • Publication number: 20170077248
    Abstract: A semiconductor device includes an active fin partially protruding from an isolation pattern on a substrate, a gate structure on the active fin, a source/drain layer on a portion of the active fin adjacent to the gate structure, a source/drain layer on a portion of the active fin adjacent to the gate structure, a metal silicide pattern on the source/drain layer, and a plug on the metal silicide pattern. The plug includes a second metal pattern, a metal nitride pattern contacting an upper surface of the metal silicide pattern and covering a bottom and a sidewall of the second metal pattern, and a first metal pattern on the metal silicide pattern, the first metal pattern covering an outer sidewall of the metal nitride pattern. A nitrogen concentration of the first metal pattern gradually decreases according to a distance from the outer sidewall of the metal nitride pattern.
    Type: Application
    Filed: September 1, 2016
    Publication date: March 16, 2017
    Inventors: Da-Il EOM, Jeong-Ik KIM, Ja-Hum KU, Chul-Sung KIM, Jun-Ki PARK, Sang-Jin HYUN
  • Publication number: 20160241251
    Abstract: The present invention relates to a method for generating a reference signal to drive a display apparatus. A method according to the present invention may comprise generating a reference signal having a training pattern being repeated with a periodicity of two clock terms (CTs); and transmitting the reference signal to a phase locked loop (PLL). Each CT has a single embedded clock bit (CB) and a plurality of data bits, and the reference signal has a rising edge at a start point of a first CB corresponding to a first unit interval (UI) of a first CT, and a rising edge at an end point of a second CB corresponding to a first UI of a second CT. According to exemplary embodiments of the present disclosure, energy consumption and EMI effects can be remarkably reduced, and a complexity of PLL can be reduced.
    Type: Application
    Filed: February 16, 2016
    Publication date: August 18, 2016
    Inventors: Jae Joon KIM, Doo Bock LEE, Jun Ki PARK, Eun Woo SONG