Patents by Inventor Jun Ogawa

Jun Ogawa has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20240160216
    Abstract: A vehicle control system includes: a vehicle including an operation device; a first communication device; and a second communication device. In a case in which the first communication device is positioned in a first area containing a position of the vehicle, the vehicle operates in an operation waiting state in which the operation device is allowed to receive an operation. In a case in which the second communication device is positioned in a second area contained in the first area and smaller than the first area, the vehicle operates in the operation waiting state. In a case in which the first communication device is positioned in the first area and the second communication device is positioned in the second area, the second communication device generates a notification indicating that the vehicle is in the operation waiting state.
    Type: Application
    Filed: January 23, 2024
    Publication date: May 16, 2024
    Applicant: PANASONIC INTELLECTUAL PROPERTY MANAGEMENT CO., LTD.
    Inventors: Jun FUJIYAMA, Naoya KOIKE, Jun OGAWA, Shinya OTA
  • Publication number: 20240146580
    Abstract: An estimation system generates, from a value of a time series of an estimation object in a past period, a plurality of patterns of a transition of a value of the estimation object. Based on the plurality of generated patterns and a value of a time series of a factor in the past period, the estimation system specifies a dependency relationship between a transition pattern and a value of the factor and a transition pattern at a past (or future) time point and identifies a model in accordance with the specified dependency relationship. By inputting a value of a time series of the factor in a future period to the estimation model, the estimation system specifies a time series of a value in the future period of the estimation object using at least one transition pattern.
    Type: Application
    Filed: March 8, 2022
    Publication date: May 2, 2024
    Inventors: Masato UTSUMI, Tohru WATANABE, Kazuki NAMBA, Ikuo SHIGEMORI, Hiroshi IIMURA, Hiroaki OGAWA, Daisuke HAMABA, Jun YAMAZAKI
  • Patent number: 11970768
    Abstract: There is provided a method of forming a silicon nitride film on a substrate having first and second films formed thereon, wherein the first film and the second film have different incubation times. The method includes: supplying a processing gas composed of a silicon halide having Si—Si bonds to the substrate; supplying a non-plasmarized second nitriding gas to the substrate; forming a thin silicon nitride layer covering the first film and the second film by repeating the supplying the processing gas and the supplying the second nitriding gas in a sequential order; supplying a plasmarized modifying gas to the substrate and modifying the thin silicon nitride layer; and forming the silicon nitride film on the modified thin silicon nitride layer by supplying the raw material gas and the first nitriding gas to the substrate.
    Type: Grant
    Filed: August 14, 2020
    Date of Patent: April 30, 2024
    Assignee: TOKYO ELECTRON LIMITED
    Inventors: Hideomi Hane, Shimon Otsuki, Takeshi Oyama, Ren Mukouyama, Jun Ogawa, Noriaki Fukiage
  • Patent number: 11968855
    Abstract: An embodiment of the present invention provides an optical film (10) including a light-transmitting base material (11), a hard coat layer (12), and an inorganic layer (13) in this order, wherein the hard coat layer (12) is in contact with the inorganic layer (13), the hard coat layer (12) contains a binder resin (12A) and inorganic particles (12B), the hard coat layer (12) has a film thickness of 1 ?m or more, and the hard coat layer (12) has an indentation hardness of 200 MPa or more.
    Type: Grant
    Filed: May 18, 2022
    Date of Patent: April 23, 2024
    Assignee: DAI NIPPON PRINTING CO., LTD.
    Inventors: Hiroki Matsushita, Yoshimasa Ogawa, Yousuke Kousaka, Jun Sato, Keisuke Ebisu
  • Publication number: 20240101066
    Abstract: When a vehicle and a smartphone are in a second communication state, the vehicle can operate, and then if the vehicle and the smartphone are not in the second communication state for a predetermined time or longer, and if a main switch of the vehicle detects a predetermined operation, an emergency advertising is transmitted from the vehicle. Thereby, the smartphone can be used as a key that can receive the emergency information from the vehicle. By enabling the smartphone to be used as a key for the vehicle, it is possible to popularize a smartphone that can be used as a key for the vehicle.
    Type: Application
    Filed: December 7, 2023
    Publication date: March 28, 2024
    Inventors: Jun FUJIYAMA, Jun OGAWA, Toshichika HOYA
  • Publication number: 20240096595
    Abstract: In a mask pattern forming method, a resist film is formed over a thin film, the resist film is processed into resist patterns having a predetermined pitch by photolithography, slimming of the resist patterns is performed, and an oxide film is formed on the thin film and the resist patterns after an end of the slimming step in a film deposition apparatus by supplying a source gas and an oxygen radical or an oxygen-containing gas. In the mask pattern forming method, the slimming and the oxide film forming are continuously performed in the film deposition apparatus.
    Type: Application
    Filed: November 30, 2023
    Publication date: March 21, 2024
    Inventors: Kazuhide HASEBE, Shigeru NAKAJIMA, Jun OGAWA, Hiroki MURAKAMI
  • Patent number: 11937447
    Abstract: An embodiment of the present invention provides an optical film (10) including a light-transmitting base material (11), a hard coat layer (12), and an inorganic layer (13) in this order, wherein the hard coat layer (12) is in contact with the inorganic layer (13), the hard coat layer (12) contains a binder resin (12A) and inorganic particles (12B), the hard coat layer (12) has a film thickness of 1 ?m or more, and the hard coat layer (12) has an indentation hardness of 200 MPa or more.
    Type: Grant
    Filed: May 18, 2022
    Date of Patent: March 19, 2024
    Assignee: DAI NIPPON PRINTING CO., LTD.
    Inventors: Hiroki Matsushita, Yoshimasa Ogawa, Yousuke Kousaka, Jun Sato, Keisuke Ebisu
  • Patent number: 11921518
    Abstract: A vehicle control system includes: a vehicle including an operation device; a first communication device; and a second communication device. In a case in which the first communication device is positioned in a first area containing a position of the vehicle, the vehicle operates in an operation waiting state in which the operation device is allowed to receive an operation. In a case in which the second communication device is positioned in a second area contained in the first area and smaller than the first area, the vehicle operates in the operation waiting state. In a case in which the first communication device is positioned in the first area and the second communication device is positioned in the second area, the second communication device generates a notification indicating that the vehicle is in the operation waiting state.
    Type: Grant
    Filed: June 22, 2021
    Date of Patent: March 5, 2024
    Assignee: PANASONIC INTELLECTUAL PROPERTY MANAGEMENT CO., LTD.
    Inventors: Jun Fujiyama, Naoya Koike, Jun Ogawa, Shinya Ota
  • Patent number: 11881379
    Abstract: In a mask pattern forming method, a resist film is formed over a thin film, the resist film is processed into resist patterns having a predetermined pitch by photolithography, slimming of the resist patterns is performed, and an oxide film is formed on the thin film and the resist patterns after an end of the slimming step in a film deposition apparatus by supplying a source gas and an oxygen radical or an oxygen-containing gas. In the mask pattern forming method, the slimming and the oxide film forming are continuously performed in the film deposition apparatus.
    Type: Grant
    Filed: June 23, 2022
    Date of Patent: January 23, 2024
    Assignee: Tokyo Electron Limited
    Inventors: Kazuhide Hasebe, Shigeru Nakajima, Jun Ogawa, Hiroki Murakami
  • Patent number: 11868967
    Abstract: A schedule creation assisting device 100 includes: a storage unit that stores information on a total working time length in a specified period of each of workers who work in cooperation in a specified operation, a number of the workers necessary at each timing during the period, and a constraint condition regarding allocation of the workers to the operation; and a computation unit 104 that computes an Ising model in which, regarding an objective function including, as terms, the total working time length in the period, the number of necessary workers, and a constraint condition function that is minimized when the constraint condition is satisfied, whether each of the workers is to attend at work is set as a spin, and a sensitivity between variables of the constraint condition function is set as an intensity of interaction between the spins, and that outputs a schedule in which whether each of the workers is to attend at work at the each timing during the specified period is specified based on the result.
    Type: Grant
    Filed: March 18, 2020
    Date of Patent: January 9, 2024
    Assignee: HITACHI, LTD.
    Inventors: Kohei Terasaki, Jun Ogawa, Keisuke Yamamoto
  • Publication number: 20230395371
    Abstract: A substrate processing method includes housing, in a processing container, a substrate having an insulating film on a surface of the substrate; exposing the insulating film to plasma generated from a gas including deuterium gas in a state where the substrate housed in the processing container is maintained at a first temperature, to introduce deuterium into the insulating film; and heat-treating the insulating film without exposing the insulating film to the plasma in a state where the substrate housed in the processing container is controlled to be at a second temperature that is different from the first temperature, to adjust concentration of the deuterium introduced into the insulating film.
    Type: Application
    Filed: May 10, 2023
    Publication date: December 7, 2023
    Inventors: Kazumasa IGARASHI, Jun OGAWA, Yuki TANAKA
  • Publication number: 20230395368
    Abstract: A substrate processing method includes preparing a substrate having a target film including silicon, carbon, and nitrogen on a surface of the substrate; supplying hydrogen gas and oxygen gas to the target film to oxidize a surface layer of the target film and form an oxide film; and etching the oxide film.
    Type: Application
    Filed: May 12, 2023
    Publication date: December 7, 2023
    Inventors: Kazumasa IGARASHI, Yamato TONEGAWA, Jun OGAWA, Yuki TANAKA
  • Patent number: 11837465
    Abstract: A deposition method for embedding a SiN film in a recessed pattern formed on a surface of a substrate includes: (a) activating and supplying a first process gas containing NH3 to the surface of the substrate and causing NHx groups to adsorb on the surface of the substrate, where x is 1 or 2; (b) supplying a silicon-containing gas to the surface of the substrate on which the NHx groups are adsorbed and causing the silicon-containing gas to adsorb on the NHx groups; and (c) activating and supplying a second process gas containing N2 to the surface of the substrate on which the NHx groups are adsorbed and partly replacing the NHx groups with N groups, wherein (a) and (b) are repeated, and (c) is performed every time (a) and (b) are repeated a predetermined number of times.
    Type: Grant
    Filed: September 8, 2021
    Date of Patent: December 5, 2023
    Assignee: Tokyo Electron Limited
    Inventors: Jun Ogawa, Takayuki Karakawa
  • Patent number: 11801895
    Abstract: A control device includes a processor and a storage device storing a program for controlling an operation of the processor. The processor determines whether a vehicle is in a straight-ahead traveling state, based on a vehicle speed detected by a vehicle speed sensor, a steering wheel torque applied to a steering wheel, and a steering wheel angle as a rotation angle of an input shaft. The processor stores the steering wheel angle in the memory when determining that the vehicle is in the straight-ahead traveling state. The processor stores the steering wheel angle in the memory multiple times when determining that the vehicle is in the straight-ahead traveling state. The processor calculates a corrected steering angle amount from a weighted average of the steering wheel angles stored in the memory.
    Type: Grant
    Filed: July 6, 2021
    Date of Patent: October 31, 2023
    Assignee: NIDEC CORPORATION
    Inventors: Sohei Miyake, Jun Ogawa, Satoru Onishi, Masaya Ishikawa
  • Publication number: 20230323414
    Abstract: An object of the present disclosure is at least to provide an enzyme that dehydroxylates a hydroxyl group at a 9-position of urolithins having a hydroxyl group at the 9-position, and the object is solved by an enzyme having properties (1) and (2) below: (1) The enzyme dehydroxylates a hydroxyl group at a 9-position of urolithins; and (2) the enzyme is activated by reduced nicotinamide adenine dinucleotide (NADH) and/or reduced nicotinamide adenine dinucleotide phosphate (NADPH).
    Type: Application
    Filed: August 26, 2021
    Publication date: October 12, 2023
    Applicant: DAICEL CORPORATION
    Inventors: Shunsuke ISHIWA, Hiroaki YAMAMOTO, Jun OGAWA, Shigenobu KISHINO
  • Publication number: 20230262437
    Abstract: A vehicle wireless communication system includes: a vehicle including an output circuit; and first and second communication devices configured to wirelessly communicate with the vehicle. In a case in which the first communication device is positioned in a first area including one point located inside the vehicle, the use of the vehicle is permitted. In a case in which the first communication device is positioned in a second area including the one point and the second communication device is not positioned in a third area including the one point, the output circuit outputs a notification that there is a possibility of failure to carry the second communication device. In a case in which the first communication device is positioned in the second area and the second communication device is positioned in the third area, the output circuit of the vehicle does not output the notification.
    Type: Application
    Filed: April 26, 2023
    Publication date: August 17, 2023
    Inventors: Jun FUJIYAMA, Naoya KOIKE, Jun OGAWA, Shinya OTA
  • Patent number: 11671810
    Abstract: A vehicle wireless communication system includes: a vehicle including an output circuit; and first and second communication devices configured to wirelessly communicate with the vehicle. In a case in which the first communication device is positioned in a first area including one point located inside the vehicle, the use of the vehicle is permitted. In a case in which the first communication device is positioned in a second area including the one point and the second communication device is not positioned in a third area including the one point, the output circuit outputs a notification that there is a possibility of failure to carry the second communication device. In a case in which the first communication device is positioned in the second area and the second communication device is positioned in the third area, the output circuit of the vehicle does not output the notification.
    Type: Grant
    Filed: September 3, 2021
    Date of Patent: June 6, 2023
    Assignee: PANASONIC INTELLECTUAL PROPERTY MANAGEMENT CO., LTD.
    Inventors: Jun Fujiyama, Naoya Koike, Jun Ogawa, Shinya Ota
  • Patent number: 11613811
    Abstract: A film forming apparatus sequentially supplies a raw material gas of a compound containing chlorine and an element other than the chlorine, and a first reaction to form a fil. The film forming apparatus includes a rotary table, a raw material gas ejection port configured to eject the raw material gas to a first region, a reaction gas supply part configured to supply, to a second region, a first reaction gas and a second reaction gas that reacts with chlorine to generate a third reaction product, in order to prevent a second reaction product from being generated due to a reaction of the chlorine remaining in the vacuum container with air when performing the opening-to-air. The film forming apparatus further includes an atmosphere separation part, a first exhaust port and a second exhaust port, and a controller.
    Type: Grant
    Filed: September 21, 2020
    Date of Patent: March 28, 2023
    Assignee: TOKYO ELECTRON LIMITED
    Inventors: Jun Ogawa, Hiroyuki Wada
  • Publication number: 20230042760
    Abstract: A prostaglandin production method according to the present invention comprises reacting an unsaturated fatty acid with cyclooxygenase in the presence of a reducing agent. According to the present invention, it is possible to produce prostaglandins at a high yield.
    Type: Application
    Filed: December 25, 2020
    Publication date: February 9, 2023
    Applicant: KYOWA PHARMA CHEMICAL CO., LTD.
    Inventors: Eitora YAMAMURA, Jun OGAWA, Akinori ANDO
  • Patent number: 11515153
    Abstract: A method of forming a silicon nitride film on a substrate having a recess pattern formed in a surface thereof, includes: forming the silicon nitride film in conformity to the surface of the substrate by supplying each of a raw material gas containing silicon and a nitriding gas for nitriding the raw material gas into a processing container in which the substrate is accommodated; shrinking the silicon nitride film such that a thickness thereof is reduced from a bottom side toward an upper side of the recess pattern by supplying a plasmarized shaping gas for shaping the silicon nitride film to the substrate in a state where the supply of the raw material gas containing silicon into the processing container is stopped; and burying the silicon nitride film in the recess pattern by alternately and repeatedly performing the forming the silicon nitride film and the shrinking the silicon nitride film.
    Type: Grant
    Filed: August 28, 2020
    Date of Patent: November 29, 2022
    Assignee: TOKYO ELECTRON LIMITED
    Inventor: Jun Ogawa