Abstract: A sorbent media protective device includes an enclosure having a gas inlet, gas outlet and a thin-film multilayer indicator. The thin-film multilayer indicator is proximate sorbent media that can sorb a vapor of interest flowing from the gas inlet towards the gas outlet. The indicator includes a porous detection layer whose optical thickness changes in the presence of the vapor, located between a semireflective layer and a reflective layer permeable to the vapor. With equilibration at the applied vapor concentration between at least a portion of the media and the vapor, the vapor can pass through the reflective layer into the detection layer and change the detection layer optical thickness sufficiently to cause a visibly discernible change in the indicator appearance if viewed through the semireflective layer.

Abstract: An optical microresonator device is described including an optical waveguide and an optical microresonator positioned so as to optically couple to the waveguide. The waveguide includes a core and a metal cladding layer on at least part of one boundary of the core.

Abstract: A method of making a microresonator device includes the steps of providing at least a first substrate and providing a waveguide integrated on the substrate. The waveguide includes a core and a metal cladding layer on at least part of one boundary of the core. Another step is positioning a microresonator so that it is in an optically coupling relationship with the waveguide.

Abstract: A method of selectively and electrolessly depositing a metal onto a substrate having a metallic patterned-nanostructure surface is disclosed. The method includes providing a tool having a patterned-nanostructure surface, the patterned-nanostructure surface having surface regions having a nanostructured surface, replicating the tool patterned-nanostructure surface onto a substrate to form a substrate patterned-nanostructure surface, disposing a metal layer on the substrate patterned-nanostructure surface to form a metallic patterned-nanostructure surface region, forming a self-assembled monolayer on the metallic patterned-nanostructure surface region, exposing the self-assembled monolayer to an electroless plating solution comprising a deposit metal, and depositing electrolessly the deposit metal selectively on the surface regions having a metallic nanostructured surface. Articles formed from this method are also disclosed.

Abstract: An optical waveguide assembly has integral alignment features. The waveguide assembly is formed by fabricating a waveguide on a substrate prior to forming the alignment features, removing a portion of the waveguide to reveal the substrate, and forming the alignment feature in the substrate.

Abstract: A method for manufacturing an optical waveguide device in accordance with the present invention includes the steps of depositing a lower cladding layer; coating a photoresist layer directly on the lower cladding layer; patterning the photoresist layer to create channels; depositing a core layer, wherein a first portion of the core layer is deposited inside the channels and a second portion overlays the patterned photoresist layer; removing the patterned photoresist layer and the second portions of the core layer overlaying the patterned photoresist layer; and depositing an upper cladding layer.

Abstract: Disclosed is an optical waveguide having an optical confinement layer.

Abstract: Disclosed is an optical waveguide having an optical confinement layer.

Abstract: Disclosed is an optical waveguide having an optical confinement layer.

Abstract: Disclosed is an optical waveguide having an optical confinement layer.

Abstract: A method for manufacturing an optical waveguide device in accordance with the present invention includes the steps of depositing a lower cladding layer; coating a photoresist layer directly on the lower cladding layer; patterning the photoresist layer to create channels; depositing a core layer, wherein a first portion of the core layer is deposited inside the channels and a second portion overlays the patterned photoresist layer; removing the patterned photoresist layer and the second portions of the core layer overlaying the patterned photoresist layer; and depositing an upper cladding layer.