Patents by Inventor Jung-Ho Jo

Jung-Ho Jo has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20160040042
    Abstract: There are provided a composition for forming an adhesive layer of a dicing film including: a silicon compound oil including at least one reactive functional group; an adhesive binder; and a photoinitiator, wherein a weight ratio of the silicon compound oil including at least one reactive functional group to the adhesive binder is 0.01% to 4.5%, a dicing film including an adhesive layer including the composition, a dicing die bonding film including the dicing film, and a method for dicing a semiconductor wafer using the dicing die bonding film.
    Type: Application
    Filed: December 12, 2014
    Publication date: February 11, 2016
    Applicant: LG CHEM, LTD.
    Inventors: Young Kook KIM, Se Ra KIM, Hee Jung KIM, Jung Ho JO, Kwang Joo LEE, Jung Hak KIM, Seung Hee NAM
  • Publication number: 20160040043
    Abstract: There are provided a composition for forming an adhesive layer of a dicing film, including: a polymer additive including at least one polymer selected from the group consisting of a polymer containing a (meth)acrylate-based functional group and a non-polar functional group, a (meth)acrylate-based polymer containing at least one fluorine, and a silicon-modified (meth)acrylate-based polymer containing a reactive functional group; an adhesive binder; and a photoinitiator, wherein a weight ratio of the polymer additive to the adhesive binder is 0.01% to 4.5%, a dicing film including an adhesive layer including the composition, a dicing die bonding film including the dicing film, and a method for dicing a semiconductor wafer using the dicing die bonding film.
    Type: Application
    Filed: December 12, 2014
    Publication date: February 11, 2016
    Applicant: LG CHEM, LTD.
    Inventors: Young Kook KIM, Hee Jung KIM, Se Ra KIM, Jung Ho JO, Jung Hak KIM, Seung Hee NAM, Kwang Joo LEE
  • Patent number: 9012595
    Abstract: The present invention provides polyimide applied to the buffer coating of semiconductors and a photosensitive resin composition including the same. The polyimide is a polyimide polymer represented by Chemical Formula 1 below. Further, the present invention provides a photosensitive resin composition, including 1) BDA-series soluble polyimide having an i-ray permeability of 70% or more; 2) a polyamic acid having elongation of 40% or more; 3) a novolak resin, and 4) diazonaphthoquinone-series photosensitive substance and having a high resolution, high sensitivity, an excellent film characteristic, and mechanical physical properties which are the requirements of semiconductor buffer coating.
    Type: Grant
    Filed: November 5, 2010
    Date of Patent: April 21, 2015
    Assignee: LG Chem, Ltd.
    Inventors: Sang Woo Kim, Chanhyo Park, Kyungjun Kim, Hyeran Seong, Sejin Shin, Hye Won Jeong, Jung Ho Jo
  • Publication number: 20150008425
    Abstract: Provided are a substrate for an organic electronic device (OED), an OED, and lighting. The substrate capable of forming an OED may have excellent performances including light extraction efficiency and prevent penetration of moisture or a gas from an external environment, and thus an OED having excellent performance and durability may be provided.
    Type: Application
    Filed: September 26, 2014
    Publication date: January 8, 2015
    Inventors: Min Choon PARK, Jung Ho JO, Sang Woo KIM, Mi Ra IM
  • Publication number: 20140316074
    Abstract: The present invention relates to a polyamic acid polymer composite and a method for producing the same, and more specifically, a polyamic acid polymer composite, which can be applied to display substrate production due to its high transparency and low thermal expansion of glass-level, and a method for producing same. The polyamic acid polymer composite comprises 50 to 99 wt % of a polyamic acid polymer having a repeating unit of Chemical Formula 1; and 1 to 50 wt % of a silica-based particle: wherein, R1 to R3, m and n have the same meanings as defined in the specification.
    Type: Application
    Filed: July 3, 2013
    Publication date: October 23, 2014
    Applicant: LG CHEM, LTD.
    Inventors: HangAh Park, BoRa Shin, Cheolmin Yun, Kyungjun Kim, JinHo Lee, Jung Ho Jo
  • Patent number: 8470914
    Abstract: The present invention relates to polyimide or precursor thereof represented by Chemical Formula 1 or 2 and a photosensitive resin composition including the same. The polyimide or precursor thereof are fabricated using diamine comprising polyalkyleneoxide. The photosensitive resin composition of the present invention has excellent light transmissivity, an excellent resolution, and excellent photo sensitivity and image forming performance. Further, the photosensitive resin composition has high adhesiveness with substrates, such as a silicon film, a silicon oxide film, and a metal film. In particular, an excellent film without failure, such as crack, can be formed.
    Type: Grant
    Filed: August 23, 2010
    Date of Patent: June 25, 2013
    Assignee: LG Chem, Ltd.
    Inventors: Jung Ho Jo, Kyung Jun Kim, Hye Ran Seong, Hye Won Jeong, Chan Hyo Park, Yu Na Kim, Sang Woo Kim, Se Jin Shin, Kyoung Ho Ahn
  • Patent number: 8123977
    Abstract: Disclosed is a copolymer for liquid crystal alignment having a photoreactive group, a mesogen group, a thermosetting group, and a crosslinking group, a liquid crystal aligning layer including the copolymer for liquid crystal alignment, and a liquid crystal display including the liquid crystal aligning layer. Since the liquid crystal aligning layer has excellent thermal stability and no residual image, the liquid crystal aligning layer is usefully applied to the liquid crystal display.
    Type: Grant
    Filed: November 6, 2006
    Date of Patent: February 28, 2012
    Assignee: LG Chem, Ltd.
    Inventors: Dong Hyun Oh, Kyung Jun Kim, Jung Ho Jo, Hye Ran Seong, Sang Kook Kim, Byung Hyun Lee
  • Publication number: 20110223538
    Abstract: Polyimide or a precursor thereof represented by Chemical Formula 1 or 2 and a photosensitive organic insulator composition having the same are disclosed. The polyimide or the precursor thereof is prepared from diamine including polyalkyleneoxide. The use of the photosensitive organic insulator composition can allow for low temperature curing and shorten a curing time, form a low taper angle, and implement a high sensitivity and high residual film. Also, since the photosensitive organic insulator composition, as a positive photosensitive composition, has excellent solubility with respect to an alkali solution of an exposed portion, the generation of impurity can be minimized.
    Type: Application
    Filed: March 11, 2011
    Publication date: September 15, 2011
    Applicant: LG CHEM. LTD.
    Inventors: Sang Woo KIM, Kyoung Ho AHN, Kyung Jun KIM, Se Jin SHIN, Hye Won JEONG, Chan Hyo PARK, Jung Ho JO, Yu Na KIM
  • Patent number: 7959989
    Abstract: The present invention relates to a novel cyclic olefin compound, a polymer including the cyclic olefin compound, a liquid crystal alignment film including the polymer, and a liquid crystal display device including the liquid crystal alignment film. Since the polymer includes the cyclic olefin compound as a main chain, the thermal stability is excellent and the photoreactive speed is high. Accordingly, the production time can be reduced, the production cost can be reduced, and the anchoring force of the liquid crystal can be increased because the alignment property is stabilized due to the curing.
    Type: Grant
    Filed: March 6, 2008
    Date of Patent: June 14, 2011
    Assignee: LG Chem, Ltd.
    Inventors: Heon Kim, Sung-Ho Chun, Hee-Jin Lee, Dmitry Kravchuk, Kyung-Jun Kim, Sang-Kook Kim, Sung-Joon Oh, Hye-Ran Seong, Byung-Hyun Lee, Hye-Won Jeong, Jung-Ho Jo, Yun-Jeong Lee, Dong-Hyun Oh
  • Publication number: 20110111341
    Abstract: The present invention provides polyimide applied to the buffer coating of semiconductors and a photosensitive resin composition including the same. The polyimide is a polyimide polymer represented by Chemical Formula 1 below. Further, the present invention provides a photosensitive resin composition, including 1) BDA-series soluble polyimide having an i-ray permeability of 70% or more; 2) a polyamic acid having elongation of 40% or more; 3) a novolak resin, and 4) diazonaphthoquinone-series photosensitive substance and having a high resolution, high sensitivity, an excellent film characteristic, and mechanical physical properties which are the requirements of semiconductor buffer coating.
    Type: Application
    Filed: November 5, 2010
    Publication date: May 12, 2011
    Applicant: LG CHEM, LTD.
    Inventors: Sang Woo KIM, Chanhyo PARK, Kyungjun KIM, Hyeran SEONG, Sejin SHIN, Hye Won JEONG, Jung Ho JO
  • Publication number: 20110046277
    Abstract: The present invention relates to polyimide or precursor thereof represented by Chemical Formula 1 or 2 and a photosensitive resin composition including the same. The polyimide or precursor thereof are fabricated using diamine comprising polyalkyleneoxide. The photosensitive resin composition of the present invention has excellent light transmissivity, an excellent resolution, and excellent photo sensitivity and image forming performance. Further, the photosensitive resin composition has high adhesiveness with substrates, such as a silicon film, a silicon oxide film, and a metal film. In particular, an excellent film without failure, such as crack, can be formed.
    Type: Application
    Filed: August 23, 2010
    Publication date: February 24, 2011
    Applicant: LG CHEM. LTD.
    Inventors: Jung Ho JO, Kyung Jun KIM, Hye Ran SEONG, Hye Won JEONG, Chan Hyo PARK, Yu Na KIM, Sang Woo KIM, Se Jin SHIN, Kyoung Ho AHN
  • Publication number: 20100076166
    Abstract: The present invention relates to a novel cyclic olefin compound, a polymer including the cyclic olefin compound, a liquid crystal alignment film including the polymer, and a liquid crystal display device including the liquid crystal alignment film. Since the polymer includes the cyclic olefin compound as a main chain, the thermal stability is excellent and the photoreactive speed is high. Accordingly, the production time can be reduced, the production cost can be reduced, and the anchoring force of the liquid crystal can be increased because the alignment property is stabilized due to the curing.
    Type: Application
    Filed: March 6, 2008
    Publication date: March 25, 2010
    Inventors: Heon Kim, Sung-Ho Chun, Hee-Jin Lee, Dmitry Kravchuk, Kyung-Jun Kim, Sang-Kook Kim, Sung-Joon Oh, Hye-Ran Seong, Byung-Hyun Lee, Hye-won Jeong, Jung-Ho Jo, Yun-Jeong Lee, Dong-Hyun Oh
  • Publication number: 20100060834
    Abstract: The present invention relates to a novel polyimide copolymer, a method of preparing the polyimide copolymer, a liquid crystal aligning layer including the polyimide copolymer, a method of producing the liquid crystal aligning layer, and a liquid crystal display including the liquid crystal aligning layer. The liquid crystal aligning layer that includes the polyimide copolymer according to the present invention is advantageous in that when ultraviolet rays are radiated on movable chains of the polyamic acid copolymer to perform alignment before a polyimide copolymer is imidized and heat treatment is then performed to conduct imidization, thermal stability is excellent, residual images are not formed, and alignment of liquid crystals is excellent.
    Type: Application
    Filed: January 7, 2008
    Publication date: March 11, 2010
    Inventors: Xing-Zhong Fang, Kyung-Jun Kim, Byung-Hyun Lee, Jung-Ho Jo, Dong-Hyun Oh, Wan-Hee Goh, Sang-Kook Kim, Hye-Ran Seong, Hye-Won Jeong, Yun-Jeong Lee
  • Patent number: 7655284
    Abstract: Disclosed is a multi-functional monomer including a heat-curable functional group as well as a typical photoreactive group. In the multi-functional monomer, the photoreactive group is not chained to a main chain of a polymer. Thus, since it is possible to perform desirable alignment treatment even though polarized UV is radiated for a short time, the production time and the production cost are reduced and alignment regulating force of liquid crystals is increased, thereby increasing a dichroic ratio.
    Type: Grant
    Filed: September 22, 2006
    Date of Patent: February 2, 2010
    Assignee: LG Chem, Ltd.
    Inventors: Kyung Jun Kim, Keon Woo Lee, Byung Hyun Lee, Min Young Lim, Hye Won Jeong, Jung Ho Jo, Heon Kim, Sung Joon Oh, Sung Ho Chun
  • Patent number: 7625611
    Abstract: The present invention to a composition for liquid crystal aligning comprising an oligoimide or oligoamic acid, which comprises a thermocurable or photocurable functional group on at least one end of the oligoimide or oligoamic acid backbone, a liquid crystal aligning layer prepared from the same, and a liquid crystal display comprising the same. The composition for liquid crystal aligning according to the present can minimize the generation of the decomposed by-products, which had been generated upon the use of polyimides, by using an oligoimide or oligoamic acid on at least one end of the backbone, instead of the conventional polyimides and has an excellent effect of improvement in alignment property, thermal stability, and image sticking.
    Type: Grant
    Filed: January 4, 2007
    Date of Patent: December 1, 2009
    Assignee: LG Chem. Ltd.
    Inventors: Kyung-Jun Kim, Yun-Jeong Lee, Sang-Kook Kim, Hye-Ran Seong, Dong-Hyun Oh, Jung-Ho Jo
  • Publication number: 20070154656
    Abstract: The present invention to a composition for liquid crystal aligning comprising an oligoimide or oligoamic acid, which comprises a thermocurable or photocurable functional group on at least one end of the oligoimide or oligoamic acid backbone, a liquid crystal aligning layer prepared from the same, and a liquid crystal display comprising the same. The composition for liquid crystal aligning according to the present can minimize the generation of the decomposed by-products, which had been generated upon the use of polyimides, by using an oligoimide or oligoamic acid on at least one end of the backbone, instead of the conventional polyimides and has an excellent effect of improvement in alignment property, thermal stability, and image sticking.
    Type: Application
    Filed: January 4, 2007
    Publication date: July 5, 2007
    Inventors: Kyung-Jun Kim, Yun-Jeong Lee, Sang-Kook Kim, Hye-Ran Seong, Dong-Hyun Oh, Jung-Ho Jo