Abstract: Provided is an aerosol-generating article including a wrapper which is discolored as the aerosol-generating material is heated, the aerosol-generating article including: a tobacco rod; a front-end plug arranged on a side of the tobacco rod; a filter rod arranged on the other side of the tobacco rod; and the wrapper surrounding the tobacco rod, the front-end plug, and the filter rod, wherein the wrapper includes a thermochromic material which is heated and discolored by an aerosol-generating device when the aerosol-generating article is inserted into the aerosol-generating device.

Abstract: A seat for a vehicle, includes a second row center seat and a second row side seat provided on a partition wall positioned rearward of a driver seat, the second row center seat may move leftward or rightward, and an interval between the seats may be increased in a state in which the second row center seat is moved in a right direction away from the second row side seat, which makes it possible to maximally prevent body contact between a passenger in the second row center seat and a passenger in the second row side seat.

Abstract: The present disclosure relates to a vehicle rear seat including: a center seat; and side seats located on the left and right of the center seat, wherein, the center seat is capable of protruding by moving the center seat forward with respect to the side seats, and in the state in which the center seat protrudes forward, it is possible to increase an inter-passenger distance so that physical contact between the passenger of the center seat and the passenger of each of the side seats can be prevented as much as possible.

Abstract: A wafer transfer system, and method of controlling pressure in the system, includes a loadport for receiving a wafer container, a housing operably connected to the loadport, a wafer transfer mechanism for transferring a wafer between the wafer container and the housing, a wafer container sensor for detecting a presence of the wafer container on the loadport, a variable speed fan disposed in a first portion of the housing, a variable exhaust unit disposed in a second portion of the housing facing the first portion, the variable exhaust unit being capable of varying an exhaust rate of air from the housing, and a controller for variably operating the variable speed fan and the variable exhaust unit in response to a signal from the wafer container sensor.

Abstract: A vibration control pedestal and an installation method thereof are disclosed, including a method for reducing particles and vibrations while moving equipment, including semiconductor equipment, from one vibration control pedestal to another. The vibration control pedestal includes an equipment support body having at least two equipment support cells. A cell connection unit passes through side surfaces of the equipment support cells and connects the equipment support cells to each other. A bottom structure installed under the equipment support body braces the equipment support body.

Abstract: A wafer transfer system, and method of controlling pressure in the system, includes a loadport for receiving a wafer container, a housing operably connected to the loadport, a wafer transfer mechanism for transferring a wafer between the wafer container and the housing, a wafer container sensor for detecting a presence of the wafer container on the loadport, a variable speed fan disposed in a first portion of the housing, a variable exhaust unit disposed in a second portion of the housing facing the first portion, the variable exhaust unit being capable of varying an exhaust rate of air from the housing, and a controller for variably operating the variable speed fan and the variable exhaust unit in response to a signal from the wafer container sensor.

Abstract: A wafer transfer system, and method of controlling pressure in the system, includes a loadport for receiving a wafer container, a housing operably connected to the loadport, a wafer transfer mechanism for transferring a wafer between the wafer container and the housing, a wafer container sensor for detecting a presence of the wafer container on the loadport, a variable speed fan disposed in a first portion of the housing, a variable exhaust unit disposed in a second portion of the housing facing the first portion, the variable exhaust unit being capable of varying an exhaust rate of air from the housing, and a controller for variably operating the variable speed fan and the variable exhaust unit in response to a signal from the wafer container sensor.

Abstract: A vibration control pedestal and an installation method thereof are disclosed, including a method for reducing particles and vibrations while moving equipment, including semiconductor equipment, from one vibration control pedestal to another. The vibration control pedestal includes an equipment support body having at least two equipment support cells. A cell connection unit passes through side surfaces of the equipment support cells and connects the equipment support cells to each other. A bottom structure installed under the equipment support body braces the equipment support body.

Abstract: Provided is an exhaust unit capable of preventing large pressure fluctuations within a process chamber due to atmospheric pressure changes. The exhaust unit includes a main exhaust duct and a supplemental exhaust duct that acts as a partial bypass. A flap is located at a downstream opening between the main exhaust duct and supplemental exhaust duct and controls the amount of bypassed gas flowing from the supplemental exhaust duct to the main exhaust duct. First and second plates of the flap are pivotally coupled to the main exhaust duct adjacent the downstream opening, the first plate colliding with gas flowing through the main exhaust duct and the second plate partially blocking bypassed gas flowing back into the main exhaust duct from the supplemental exhaust duct. When gas is exhausted through the main exhaust line and the supplemental exhaust duct, the flap passively controls the amount by which the supplemental exhaust duct is opened through fluctuations in atmospheric pressure.

Abstract: An air-conditioning system of a substrate processing apparatus includes an air inlet line for providing air to a clean room. A contamination control apparatus for removing contaminants in the air is connected to the air inlet line. A controller controls temperature and humidity of the air without the contaminants. An air outlet line provides the air having the controlled temperature and humidity to a substrate processing chamber that is disposed in the clean room. The contamination control apparatus includes a spray unit having at least one nozzle that sprays water. At least one eliminator that traps the water for capturing contaminants in the air and drops the trapped water into a tank. A water circulation unit provides the water that includes an additive for controlling pH of the water to the spray unit.

Abstract: A management system and method of a reticle in an exposing process are disclosed. A calculator calculates an accumulated dosage of an illuminating light irradiated onto a reticle used in a photolithography process. The calculator is connected to an exposing apparatus to expose photoresist on a semiconductor substrate. A comparator compares the calculated accumulated dosage with a preset reference dosage. When the calculated accumulated dosage is greater than or equal to the reference dosage, a controller suspends the photolithography process. Minimizing haze contamination on the reticle, thus preventing process failures.

Abstract: A filter protection apparatus includes a frame of a closed curve defining an inner space isolated from surroundings, the frame having a shape of a filter securing part for securing an air filter, an attaching part for attaching the frame to a filter securing part, and a protection part, which is coupled on the inner surface of the frame to occupy the inner space with a plurality of minute holes through which air passes, for protecting the filter from damage. In operation, the protection part is able to prevent damage to the filter that may be caused by work instruments during maintenance work.

Abstract: A surface acoustic wave gas sensor for detecting predetermined substances includes a piezoelectric substrate, an input transducer and an output transducer which is formed on the piezoelectric substrate, and a sensitive film which is formed between the input transducer and the output transducer and detects at least one of acetone, benzene, dichloroethane, ethanol, and toluene. The sensitive film includes mercaptoundecanoic acid and CMP composed of cellulose nitrate, dibutyl phthalate, compound of benzene and ethanol, ethyl acetate. The surface acoustic wave gas sensor can quickly detect even small amounts of these substances.

Abstract: A substrate processing apparatus for processing substrates prevents the substrates from contaminating as they are transferred. The apparatus includes a container, like a FOUP, for containing substrates, at least one processing chamber where the substrates are processed, a substrate transferring module including a substrate transfer chamber and at least one load port for supporting a container, and a contamination controlling system for the substrate transfer chamber. The contamination controlling system includes a purge gas supply inlet connected to the substrate transfer chamber, and a gas circulating tube for recycling the purging gas to circulate through the chamber. The substrate transfer chamber is purged using the purging gas to remove moisture and contaminating materials from the substrate transfer chamber. The formation of particles on the substrate otherwise caused by a reaction between the moisture and contaminating materials while the substrate is standing by in the container can be prevented.

Abstract: The invention discloses a method and system for fabricating a filter structure. The method for fabricating the filter structure comprises preparing a filtering net having mesh patterns, injecting an adhesive on the filtering net, and adhering refining materials to the filtering net coated with the adhesive. Here, the adhesive is injected to have a smaller size than an interval of the mesh patterns. The system for fabricating the filter structure comprises a filtering net, a filtering net transfer device for transferring the filtering net, and an adhesive injection device for injecting an adhesive solution on the filtering net.

Abstract: A wafer transfer system, and method of controlling pressure in the system, includes a loadport for receiving a wafer container, a housing operably connected to the loadport, a wafer transfer mechanism for transferring a wafer between the wafer container and the housing, a wafer container sensor for detecting a presence of the wafer container on the loadport, a variable speed fan disposed in a first portion of the housing, a variable exhaust unit disposed in a second portion of the housing facing the first portion, the variable exhaust unit being capable of varying an exhaust rate of air from the housing, and a controller for variably operating the variable speed fan and the variable exhaust unit in response to a signal from the wafer container sensor.

Abstract: An apparatus and method for exhaust control. The apparatus may include a vessel to accommodate a gas flow of a gas, a sensor mounted on the vessel to sense a direction of the gas flow in the vessel, a conduit coupled to the vessel to exhaust the gas from the vessel, and a control unit that adjusts a flow rate of the gas through the conduit based on the direction of the gas flow in vessel sensed by the sensor. The method may include providing a gas flow of a gas in a vessel, sensing a direction of the gas flow in the vessel, exhausting the gas from the vessel at an exhaust flow rate, and adjusting the exhaust flow rate based on the sensed direction of the gas flow in the vessel.

Abstract: Grating forming the floor of a clean room minimizes turbulence and enhances the rate at which air is discharged therethrough. The grate includes a base plate having a plurality of through-holes. Each of the through-holes includes a receiving portion through which the air is received and an exhausting portion through which the air is exhausted. The cross-sectional area of the receiving decreases toward the exhausting portion, and the cross-sectional area of the exhausting portion decreases toward the receiving portion.

Abstract: A management system and method of a reticle in an exposing process are disclosed. A calculator calculates an accumulated dosage of an illuminating light irradiated onto a reticle used in a photolithography process. The calculator is connected to an exposing apparatus to expose photoresist on a semiconductor substrate. A comparator compares the calculated accumulated dosage with a preset reference dosage. When the calculated accumulated dosage is greater than or equal to the reference dosage, a controller suspends the photolithography process. Minimizing haze contamination on the reticle, thus preventing process failures.

Abstract: A fresh air duct is configured to direct fresh air filtered by an air conditioning system towards a clean room downstream from the fresh air duct, the fresh air having a first level of particle density. A separate particle filter in the fresh air duct, located downstream from the air conditioning system and upstream from the clean room, is configured to further filter the fresh air to provide filtered fresh air having a second level of particle density therein that is less than the first level. Related methods are also disclosed.