Patents by Inventor Jung-sung Hwang

Jung-sung Hwang has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 11367558
    Abstract: A magnetic composition includes first, second, and third magnetic metal particles. The first magnetic metal particles have an average particle size of 10 ?m to 28 ?m; the second magnetic metal particles have an average particle size of 1 ?m to 4.5 ?m; and the third magnetic metal particles include insulating layers disposed on surfaces thereof and have a particle size of 300 nm or less. Therefore, eddy current loss of an inductor having a body formed of the magnetic composition may be improved, and high efficiency and inductance of the inductor may be secured.
    Type: Grant
    Filed: October 30, 2019
    Date of Patent: June 21, 2022
    Assignee: SAMSUNG ELECTRO-MECHANICS CO., LTD.
    Inventors: Se Hyung Lee, Je Ik Moon, Jung Wook Seo, Jun Sung Lee, Woo Jin Lee, Kang Ryong Choi, Il Jin Park, Gwang Hwan Hwang
  • Publication number: 20220189693
    Abstract: A multilayer capacitor includes a body having a plurality of dielectric layers and first and second internal electrodes alternately disposed with the dielectric layers interposed therebetween, and further including an active region in which the first and second internal electrodes overlap each other, and upper and lower covers disposed above and below the active region, respectively; and first and second external electrodes disposed on the body to be connected to the first and second internal electrodes, respectively, wherein the upper and lower covers include barium titanate (BT, BaTiO3) and Yttria-stabilized zirconia (YSZ).
    Type: Application
    Filed: November 16, 2021
    Publication date: June 16, 2022
    Applicant: SAMSUNG ELECTRO-MECHANICS CO., LTD.
    Inventors: Yo Han SEO, Min Hoe KIM, Jong Hyun CHO, Min Sung SONG, Byung Kil YUN, Jung Wun HWANG
  • Patent number: 8469650
    Abstract: A wafer transfer system, and method of controlling pressure in the system, includes a loadport for receiving a wafer container, a housing operably connected to the loadport, a wafer transfer mechanism for transferring a wafer between the wafer container and the housing, a wafer container sensor for detecting a presence of the wafer container on the loadport, a variable speed fan disposed in a first portion of the housing, a variable exhaust unit disposed in a second portion of the housing facing the first portion, the variable exhaust unit being capable of varying an exhaust rate of air from the housing, and a controller for variably operating the variable speed fan and the variable exhaust unit in response to a signal from the wafer container sensor.
    Type: Grant
    Filed: October 17, 2008
    Date of Patent: June 25, 2013
    Assignee: Samsung Electronics Co., Ltd.
    Inventors: Soo-woong Lee, Hyung-seok Choi, Jung-sung Hwang, Sung-hwan Choi
  • Patent number: 7988122
    Abstract: A vibration control pedestal and an installation method thereof are disclosed, including a method for reducing particles and vibrations while moving equipment, including semiconductor equipment, from one vibration control pedestal to another. The vibration control pedestal includes an equipment support body having at least two equipment support cells. A cell connection unit passes through side surfaces of the equipment support cells and connects the equipment support cells to each other. A bottom structure installed under the equipment support body braces the equipment support body.
    Type: Grant
    Filed: November 8, 2007
    Date of Patent: August 2, 2011
    Assignee: Samsung Electronics Co., Ltd.
    Inventors: Seok-Youn Kim, Jung-Sung Hwang, Ho-Young Lee, Do-Hyun Kwun, Jung-Shik Heo
  • Publication number: 20090053034
    Abstract: A wafer transfer system, and method of controlling pressure in the system, includes a loadport for receiving a wafer container, a housing operably connected to the loadport, a wafer transfer mechanism for transferring a wafer between the wafer container and the housing, a wafer container sensor for detecting a presence of the wafer container on the loadport, a variable speed fan disposed in a first portion of the housing, a variable exhaust unit disposed in a second portion of the housing facing the first portion, the variable exhaust unit being capable of varying an exhaust rate of air from the housing, and a controller for variably operating the variable speed fan and the variable exhaust unit in response to a signal from the wafer container sensor.
    Type: Application
    Filed: October 17, 2008
    Publication date: February 26, 2009
    Applicant: SAMSUNG ELECTRONICS CO., LTD.
    Inventors: Soo-woong Lee, Hyung-seok Choi, Jung-sung Hwang, Sung-hwan Choi
  • Patent number: 7438514
    Abstract: A wafer transfer system, and method of controlling pressure in the system, includes a loadport for receiving a wafer container, a housing operably connected to the loadport, a wafer transfer mechanism for transferring a wafer between the wafer container and the housing, a wafer container sensor for detecting a presence of the wafer container on the loadport, a variable speed fan disposed in a first portion of the housing, a variable exhaust unit disposed in a second portion of the housing facing the first portion, the variable exhaust unit being capable of varying an exhaust rate of air from the housing, and a controller for variably operating the variable speed fan and the variable exhaust unit in response to a signal from the wafer container sensor.
    Type: Grant
    Filed: October 14, 2004
    Date of Patent: October 21, 2008
    Assignee: Samsung Electronics Co., Ltd.
    Inventors: Soo-woong Lee, Hyung-seok Choi, Jung-sung Hwang, Sung-hwan Choi
  • Publication number: 20080174057
    Abstract: A vibration control pedestal and an installation method thereof are disclosed, including a method for reducing particles and vibrations while moving equipment, including semiconductor equipment, from one vibration control pedestal to another. The vibration control pedestal includes an equipment support body having at least two equipment support cells. A cell connection unit passes through side surfaces of the equipment support cells and connects the equipment support cells to each other. A bottom structure installed under the equipment support body braces the equipment support body.
    Type: Application
    Filed: November 8, 2007
    Publication date: July 24, 2008
    Applicant: SAMSUNG ELECTRONICS CO., LTD.
    Inventors: Seok-Youn KIM, Jung-Sung HWANG, Ho-Young LEE, Do-Hyun KWUN, Jung-Shik HEO
  • Publication number: 20080160905
    Abstract: Provided is an exhaust unit capable of preventing large pressure fluctuations within a process chamber due to atmospheric pressure changes. The exhaust unit includes a main exhaust duct and a supplemental exhaust duct that acts as a partial bypass. A flap is located at a downstream opening between the main exhaust duct and supplemental exhaust duct and controls the amount of bypassed gas flowing from the supplemental exhaust duct to the main exhaust duct. First and second plates of the flap are pivotally coupled to the main exhaust duct adjacent the downstream opening, the first plate colliding with gas flowing through the main exhaust duct and the second plate partially blocking bypassed gas flowing back into the main exhaust duct from the supplemental exhaust duct. When gas is exhausted through the main exhaust line and the supplemental exhaust duct, the flap passively controls the amount by which the supplemental exhaust duct is opened through fluctuations in atmospheric pressure.
    Type: Application
    Filed: December 31, 2007
    Publication date: July 3, 2008
    Inventors: Moon-Jeong Kim, Kang-Ho Ahn, Suck-Hoon Kang, Jae-Young Lee, Jai-Heung Choi, Jung-Sung Hwang
  • Patent number: 7326284
    Abstract: An air-conditioning system of a substrate processing apparatus includes an air inlet line for providing air to a clean room. A contamination control apparatus for removing contaminants in the air is connected to the air inlet line. A controller controls temperature and humidity of the air without the contaminants. An air outlet line provides the air having the controlled temperature and humidity to a substrate processing chamber that is disposed in the clean room. The contamination control apparatus includes a spray unit having at least one nozzle that sprays water. At least one eliminator that traps the water for capturing contaminants in the air and drops the trapped water into a tank. A water circulation unit provides the water that includes an additive for controlling pH of the water to the spray unit.
    Type: Grant
    Filed: July 1, 2004
    Date of Patent: February 5, 2008
    Assignee: Samsung Electronics Co., Ltd.
    Inventors: Tae-Jin Hwang, Jae-Hyun Yang, Jung-Sung Hwang, Hyun-Joon Kim, Yo-Han Ahn
  • Patent number: 7161660
    Abstract: A management system and method of a reticle in an exposing process are disclosed. A calculator calculates an accumulated dosage of an illuminating light irradiated onto a reticle used in a photolithography process. The calculator is connected to an exposing apparatus to expose photoresist on a semiconductor substrate. A comparator compares the calculated accumulated dosage with a preset reference dosage. When the calculated accumulated dosage is greater than or equal to the reference dosage, a controller suspends the photolithography process. Minimizing haze contamination on the reticle, thus preventing process failures.
    Type: Grant
    Filed: December 22, 2004
    Date of Patent: January 9, 2007
    Assignee: Samsung Electronics Co., Ltd.
    Inventors: Yo-Han Ahn, Seok-Ryeul Lee, Jung-Sung Hwang, Tae-Jin Hwang, Byung-Moo Lee
  • Patent number: 7156892
    Abstract: A filter protection apparatus includes a frame of a closed curve defining an inner space isolated from surroundings, the frame having a shape of a filter securing part for securing an air filter, an attaching part for attaching the frame to a filter securing part, and a protection part, which is coupled on the inner surface of the frame to occupy the inner space with a plurality of minute holes through which air passes, for protecting the filter from damage. In operation, the protection part is able to prevent damage to the filter that may be caused by work instruments during maintenance work.
    Type: Grant
    Filed: October 15, 2003
    Date of Patent: January 2, 2007
    Assignee: Samsung Electronics Co., Ltd.
    Inventors: Dae-Won Kim, Jung-Sung Hwang, Tae-Hyup Kim
  • Patent number: 7047793
    Abstract: A surface acoustic wave gas sensor for detecting predetermined substances includes a piezoelectric substrate, an input transducer and an output transducer which is formed on the piezoelectric substrate, and a sensitive film which is formed between the input transducer and the output transducer and detects at least one of acetone, benzene, dichloroethane, ethanol, and toluene. The sensitive film includes mercaptoundecanoic acid and CMP composed of cellulose nitrate, dibutyl phthalate, compound of benzene and ethanol, ethyl acetate. The surface acoustic wave gas sensor can quickly detect even small amounts of these substances.
    Type: Grant
    Filed: December 3, 2003
    Date of Patent: May 23, 2006
    Assignee: Samsung Electronics Co., Ltd.
    Inventors: Kun-Hyung Lee, Jung-Sung Hwang, Seung-Yeon Cho
  • Patent number: 6996453
    Abstract: A substrate processing apparatus for processing substrates prevents the substrates from contaminating as they are transferred. The apparatus includes a container, like a FOUP, for containing substrates, at least one processing chamber where the substrates are processed, a substrate transferring module including a substrate transfer chamber and at least one load port for supporting a container, and a contamination controlling system for the substrate transfer chamber. The contamination controlling system includes a purge gas supply inlet connected to the substrate transfer chamber, and a gas circulating tube for recycling the purging gas to circulate through the chamber. The substrate transfer chamber is purged using the purging gas to remove moisture and contaminating materials from the substrate transfer chamber. The formation of particles on the substrate otherwise caused by a reaction between the moisture and contaminating materials while the substrate is standing by in the container can be prevented.
    Type: Grant
    Filed: October 15, 2003
    Date of Patent: February 7, 2006
    Assignee: Samsung Electronics Co., Ltd.
    Inventors: Yo-Han Ahn, Ki-Doo Kim, Soo-Woong Lee, Jung-Sung Hwang, Hyeog-Ki Kim
  • Publication number: 20060021934
    Abstract: The invention discloses a method and system for fabricating a filter structure. The method for fabricating the filter structure comprises preparing a filtering net having mesh patterns, injecting an adhesive on the filtering net, and adhering refining materials to the filtering net coated with the adhesive. Here, the adhesive is injected to have a smaller size than an interval of the mesh patterns. The system for fabricating the filter structure comprises a filtering net, a filtering net transfer device for transferring the filtering net, and an adhesive injection device for injecting an adhesive solution on the filtering net.
    Type: Application
    Filed: March 22, 2005
    Publication date: February 2, 2006
    Inventors: Chang-Min Cho, Jung-Sung Hwang, Dong-Seok Ham, Ha-Na Kim
  • Publication number: 20060018736
    Abstract: A wafer transfer system, and method of controlling pressure in the system, includes a loadport for receiving a wafer container, a housing operably connected to the loadport, a wafer transfer mechanism for transferring a wafer between the wafer container and the housing, a wafer container sensor for detecting a presence of the wafer container on the loadport, a variable speed fan disposed in a first portion of the housing, a variable exhaust unit disposed in a second portion of the housing facing the first portion, the variable exhaust unit being capable of varying an exhaust rate of air from the housing, and a controller for variably operating the variable speed fan and the variable exhaust unit in response to a signal from the wafer container sensor.
    Type: Application
    Filed: October 14, 2004
    Publication date: January 26, 2006
    Inventors: Soo-woong Lee, Hyung-seok Choi, Jung-sung Hwang, Sung-hwan Choi
  • Publication number: 20060003684
    Abstract: Grating forming the floor of a clean room minimizes turbulence and enhances the rate at which air is discharged therethrough. The grate includes a base plate having a plurality of through-holes. Each of the through-holes includes a receiving portion through which the air is received and an exhausting portion through which the air is exhausted. The cross-sectional area of the receiving decreases toward the exhausting portion, and the cross-sectional area of the exhausting portion decreases toward the receiving portion.
    Type: Application
    Filed: June 3, 2005
    Publication date: January 5, 2006
    Inventors: Jung-Sung Hwang, Chang-Min Cho, Jae-Hyun Yang, Sang-Mun Chon, Jae-Bong Kim
  • Publication number: 20060002833
    Abstract: An apparatus and method for exhaust control. The apparatus may include a vessel to accommodate a gas flow of a gas, a sensor mounted on the vessel to sense a direction of the gas flow in the vessel, a conduit coupled to the vessel to exhaust the gas from the vessel, and a control unit that adjusts a flow rate of the gas through the conduit based on the direction of the gas flow in vessel sensed by the sensor. The method may include providing a gas flow of a gas in a vessel, sensing a direction of the gas flow in the vessel, exhausting the gas from the vessel at an exhaust flow rate, and adjusting the exhaust flow rate based on the sensed direction of the gas flow in the vessel.
    Type: Application
    Filed: June 13, 2005
    Publication date: January 5, 2006
    Inventors: Hyung-Seok Choi, Jung-Sung Hwang, Kyoung-Ho Park, Kil-Sun Ko, Yong-Woon Oh
  • Publication number: 20050134823
    Abstract: A management system and method of a reticle in an exposing process are disclosed. A calculator calculates an accumulated dosage of an illuminating light irradiated onto a reticle used in a photolithography process. The calculator is connected to an exposing apparatus to expose photoresist on a semiconductor substrate. A comparator compares the calculated accumulated dosage with a preset reference dosage. When the calculated accumulated dosage is greater than or equal to the reference dosage, a controller suspends the photolithography process. Minimizing haze contamination on the reticle, thus preventing process failures.
    Type: Application
    Filed: December 22, 2004
    Publication date: June 23, 2005
    Inventors: Yo-Han Ahn, Seok-Ryeul Lee, Jung-Sung Hwang, Tae-Jin Hwang, Byung-Moo Lee
  • Publication number: 20050115213
    Abstract: A fresh air duct is configured to direct fresh air filtered by an air conditioning system towards a clean room downstream from the fresh air duct, the fresh air having a first level of particle density. A separate particle filter in the fresh air duct, located downstream from the air conditioning system and upstream from the clean room, is configured to further filter the fresh air to provide filtered fresh air having a second level of particle density therein that is less than the first level. Related methods are also disclosed.
    Type: Application
    Filed: January 10, 2005
    Publication date: June 2, 2005
    Inventors: Chang-Su Lim, Suk-Hee Im, Jung-Sung Hwang
  • Patent number: 6849100
    Abstract: A fresh air duct is configured to direct fresh air filtered by an air conditioning system towards a clean room downstream from the fresh air duct, the fresh air having a first level of particle density. A separate particle filter in the fresh air duct, located downstream from the air conditioning system and upstream from the clean room, is configured to further filter the fresh air to provide filtered fresh air having a second level of particle density therein that is less than the first level. Related methods are also disclosed.
    Type: Grant
    Filed: October 16, 2002
    Date of Patent: February 1, 2005
    Assignee: Samsung Electronics Co., Ltd.
    Inventors: Chang-Su Lim, Suk-Hee Im, Jung-Sung Hwang