Abstract: A fresh air duct is configured to direct fresh air filtered by an air conditioning system towards a clean room downstream from the fresh air duct, the fresh air having a first level of particle density. A separate particle filter in the fresh air duct, located downstream from the air conditioning system and upstream from the clean room, is configured to further filter the fresh air to provide filtered fresh air having a second level of particle density therein that is less than the first level. Related methods are also disclosed.

Abstract: A fresh air duct is configured to direct fresh air filtered by an air conditioning system towards a clean room downstream from the fresh air duct, the fresh air having a first level of particle density. A separate particle filter in the fresh air duct, located downstream from the air conditioning system and upstream from the clean room, is configured to further filter the fresh air to provide filtered fresh air having a second level of particle density therein that is less than the first level. Related methods are also disclosed.

Abstract: An air-conditioning system of a substrate processing apparatus includes an air inlet line for providing air to a clean room. A contamination control apparatus for removing contaminants in the air is connected to the air inlet line. A controller controls temperature and humidity of the air without the contaminants. An air outlet line provides the air having the controlled temperature and humidity to a substrate processing chamber that is disposed in the clean room. The contamination control apparatus includes a spray unit having at least one nozzle that sprays water. At least one eliminator that traps the water for capturing contaminants in the air and drops the trapped water into a tank. A water circulation unit provides the water that includes an additive for controlling pH of the water to the spray unit.

Abstract: An apparatus for processing a substrate includes a load port for supporting a container for receiving a plurality of substrates, a substrate processing module for processing the substrate transferred from the container, a substrate transfer module, including a substrate transfer chamber connecting the load port with the substrate processing module and a substrate transfer robot disposed in the substrate transfer chamber for transferring the substrate, a fan filter unit connected to the substrate transfer chamber for supplying air, a differential pressure gauge connected to the substrate transfer chamber for measuring a differential pressure between internal and external pressures of the substrate transfer chamber, and a pressure adjustment means for exhausting air supplied into the substrate transfer chamber and for adjusting a flow rate of air being exhausted from the substrate transfer chamber according to the differential pressure so that the internal pressure is maintained higher than the external pressur

Abstract: A surface acoustic wave gas sensor for detecting predetermined substances includes a piezoelectric substrate, an input transducer and an output transducer which is formed on the piezoelectric substrate, and a sensitive film which is formed between the input transducer and the output transducer and detects at least one of acetone, benzene, dichloroethane, ethanol, and toluene. The sensitive film includes mercaptoundecanoic acid and CMP composed of cellulose nitrate, dibutyl phthalate, compound of benzene and ethanol, ethyl acetate. The surface acoustic wave gas sensor can quickly detect even small amounts of these substances.

Abstract: A substrate processing apparatus for processing substrates prevents the substrates from contaminating as they are transferred. The apparatus includes a container, like a FOUP, for containing substrates, at least one processing chamber where the substrates are processed, a substrate transferring module including a substrate transfer chamber and at least one load port for supporting a container, and a contamination controlling system for the substrate transfer chamber. The contamination controlling system includes a purge gas supply inlet connected to the substrate transfer chamber, and a gas circulating tube for recycling the purging gas to circulate through the chamber. The substrate transfer chamber is purged using the purging gas to remove moisture and contaminating materials from the substrate transfer chamber. The formation of particles on the substrate otherwise caused by a reaction between the moisture and contaminating materials while the substrate is standing by in the container can be prevented.

Abstract: A filter protection apparatus includes a frame of a closed curve defining an inner space isolated from surroundings, the frame having a shape of a filter securing part for securing an air filter, an attaching part for attaching the frame to a filter securing part, and a protection part, which is coupled on the inner surface of the frame to occupy the inner space with a plurality of minute holes through which air passes, for protecting the filter from damage. In operation, the protection part is able to prevent damage to the filter that may be caused by work instruments during maintenance work.

Abstract: A fresh air duct is configured to direct fresh air filtered by an air conditioning system towards a clean room downstream from the fresh air duct, the fresh air having a first level of particle density. A separate particle filter in the fresh air duct, located downstream from the air conditioning system and upstream from the clean room, is configured to further filter the fresh air to provide filtered fresh air having a second level of particle density therein that is less than the first level. Related methods are also disclosed.

Abstract: A filter medium, a filter into which the filter medium is installed, and an apparatus for supplying air and chemicals equipped with the filter. The filter medium has a sheet including a first pleated portion, which is folded in a first wave shape such that a first amplitude and a first wave length are formed in the first pleated portion. The filter medium also includes a second pleated portion, which is folded in a second wave shape such that a second amplitude, less than the first amplitude, and a second wave length, shorter than the first wave length, are formed in the second pleated portion. At least one second pleated portion is formed in the first pleated portion.

Abstract: A gas purifying system includes a water spraying system, and a collecting apparatus installed downstream of the water spraying system. The collecting apparatus has a surface composed of an electron emitting material, and the electron emitting material is capable of emitting electrons when subjected to visible light, ultraviolet light or electrical energy. The system can also include an ultraviolet lamp, with an ultraviolet photoelectron emitting material surrounding the ultraviolet lamp. The ultraviolet lamp and the ultraviolet photoelectron emitting material are positioned between the water spraying system and the collecting apparatus.

Abstract: A gas purifying system including a water spraying system, and a collecting apparatus installed downstream of the water spraying system. The collecting apparatus has a surface composed of an electron emitting material, and the electron emitting material is capable of emitting electrons when subjected to visible light, ultraviolet light or electrical energy. The system can also include an ultraviolet lamp, with an ultraviolet photoelectron emitting material surrounding the ultraviolet lamp. The ultraviolet lamp and the ultraviolet photoelectron emitting material are positioned between the water spraying system and the collecting apparatus.

Abstract: An analysis system and method for a cleanroom environment is disclosed wherein on-line testing of water-soluble contaminants is performed by condensing water vapor from an air sample taken from the clean room. The condenser is connected to a analyzing unit that is used to measure and analyze the water-soluble contaminants in the condensed water received from the condensing unit.

Abstract: Methods of analyzing water-soluble contaminants comprise providing reference air streams having gaseous water present therein; condensing the reference air streams such that the gaseous water liquefies; pressurizing the liquefied water; and supplying the liquefied water to analyzers. Systems for analyzing water-soluble contaminants comprise air inlets that absorb reference air containing gaseous water therein; valves that control the flow of the reference air in fluid communication with the air inlets; condensers that condense the gaseous water in the reference air in fluid communication with the valves; pressurization pumps that pressurize the water condensed from the reference air in fluid communication with the condensers; and discharge pumps that discharge an excessive amount of water contained in the reference air.

Abstract: A monitoring device and a driving control system for a fan filter unit in a semiconductor clean room for monitoring the operating state of the fan filter unit. The monitoring device includes a switching section in each fan filter unit which alternately applies electrical power to one of a plurality of terminals. The switching section is responsive to a force from an air stream introduced therein via rotation of a fan in the fan filter unit. A display section in each fan filter unit is connected to the plurality of terminals which provide different signals, indicative of an on or off state of the fan, according to which of the plurality of terminals is electrically connected to the electrical power.

Abstract: A fan drive checking system, for an air conditioning system in a clean room having a fan filter unit (FFU), includes a flow sensor for sensing air flow inside a housing of a FFU. The sensor provides a sensor signal indicative of normal and adverse flow conditions in the housing. A control portion in data communication with the sensor outputs a control signal responsive to the sensing signal. An alarm in data communication with the control portion provides a warning when the control signal indicates the adverse flow condition.

Abstract: Compositions for making ultrapure water in microelectronic device fabrication processes comprise hydrogen peroxide, peracetic acid, and water. Methods of sterilizing ultrapure water delivery systems for use in microelectronic device fabrication processes comprise contacting ultrapure water delivery systems with water having temperatures ranging from about 26.degree. C. to about 40.degree. C.; and sterilizing the ultrapure water delivery systems with compositions comprising hydrogen peroxide, peracetic acid, and water. The ultrapure water delivery systems comprise water tanks, heat exchangers in fluid communication with the water tanks, ultraviolet sterilizers in fluid communication with the heat exchangers, OR-polishers in fluid communication with the ultraviolet sterilizers, MB-polishers in fluid communication with the OR-polishers, and ultrafilters in fluid communication with the OR-polishers. The compositions employed in the sterilizing step do not contact the OR-polishers and the MB-polishers.

Abstract: An air conditioning system for a semiconductor clean room includes a chemical filter between an air conditioner including a humidifier and a ULPA filter of the clean room, for ionizing chemical impurities using moisture supplied from the humidifier and then adsorbing the ionized chemical impurities by using the chemical filter. The chemical filter is installed downstream of the humidifier, which applies phosphoric acid for the prevention of scale-formation. This downstream location allows the chemical filter to prevent the phosphoric acid from being included in the fresh air as a new chemical impurity, which makes regulation of temperature and humidity of the air possible without having to use a special and expensive pure steam system.

Abstract: An apparatus for quantitatively depositing molecular impurities on a semiconductor wafer, includes a reaction chamber, a gas generator for generating a source gas serving as the molecular impurities, a humidifier for generating moisture vapour of a constant temperature, a mixer for mixing the source gas and the moisture vapour to generate a mixed gas, a gas injector for injecting the mixed gas into the reaction chamber, an exhausting part for initiating a vacuum condition in the reaction chamber before deposition of the molecular impurities and for exhausting a remaining gases after deposition of the molecular impurities, and a cleaning air supply portion for supplying a cleaning air into the reaction chamber before deposition of the molecular impurities. After fabricating a semiconductor device using the wafer processed as above, a defective source of mechanism of contamination can be traced by analysing the semiconductor device.