Abstract: An apparatus for drying a substrate is provided. In one embodiment, the apparatus includes a drying room in which a support member for supporting a plurality of wafers is disposed. The apparatus further includes a drying gas-supply element for supplying a drying gas to the substrates supported by the support member. The drying gas-supply element includes nozzles located within the drying room and arranged in a plurality of groups, and supply pipes for supplying a drying gas to the nozzles. Nozzles belonging to a first group are formed such that the density of the openings in a spray port is higher in a front region than in other regions, and nozzles belonging to a second group are formed such that density of openings in a spray port is higher in a rear region than in other regions. Different supply pipes can be connected to nozzles belonging to different groups, and a flow control valve can be installed in each of the supply pipes.

Abstract: A display device includes a driving unit and a processing unit. If the driving unit operates abnormally during a power-on period, the processing unit generates a control signal according to a driving signal outputted by the driving unit. In response to the control signal, the driving unit is reset and then re-outputs the driving signal. A method for recovering from abnormal power-on therefor includes generating two signals, wherein one signal is adapted for re-activating a light source and the other is adapted for resetting the driving unit so that the driving unit may re-output the driving signal.

Abstract: The present invention relates to an antagonist against vanilloid receptor and the pharmaceutical compositions containing the same. As diseases associated with the activity of vanilloid receptor, pain, acute pain, chronic pain, neuropathic pain, post-operative pain, migraine, arthralgia, neuropathies, nerve injury, diabetic neuropathy, neurodegeneration, neurotic skin disorder, stroke, urinary bladder hypersensitiveness, irritable bowel syndrome, a respiratory disorder such as asthma or chronic obstructive pulmonary disease, irritation of skin, eye or mucous membrane, fevescence, stomach-duodenal ulcer, inflammatory bowel disease and inflammatory diseases can be enumerated. The present invention provides a pharmaceutical composition for prevention or treatment of these diseases.

Abstract: A wafer guide includes a horizontal support panel and at least three vertical panels attached on one surface of the support panel. Each of the vertical panels has a vertical body panel and a plurality of protrusions upwardly extended from a top surface of the vertical body panel. Gap regions between the protrusions act as slots for holding wafers. Sidewalls of the slots have a convex shaped profile when viewed from a top view, and bottom surfaces of the slots also have a convex shaped profile when viewed from a cross sectional view that crosses the vertical panels.

Abstract: In an embodiment, a cleaning apparatus and method can prevent adsorption of nano-size particles by wafers. The apparatus includes a cleaning chamber for filling with a cleaning solution for cleaning an object and a drying chamber disposed over the cleaning chamber for drying the object by supplying drying fluid from an upper part. It also includes a transferring unit for transferring the object by moving it between the cleaning and drying chambers. Further, it includes a moveable exhaust plate disposed between the drying chamber and the cleaning chamber for dividing the two chambers and for exhausting the drying fluid supplied to the drying chamber. The drying fluid flows in a uniform laminar flow in the drying chamber.

Abstract: An apparatus and method for cleaning a wafer are provided. According to various embodiments, deionized water can be activated by forming an electric field in a supply member through which the deionized water is supplied. The activated deionized water preferably contains radicals with excellent reactivity, in addition to ions. The activated deionized water is then preferably supplied to the cleaning chamber shortly after being activated, to thereby remove contaminants from the wafer. The activated deionized water can be used instead of or in addition to a chemical solution to clean the wafer. When used instead of a chemical solution, a rinsing process for removing the chemical solution from the wafer can be avoided and the costs and time associated with the cleaning process can be reduced.

Abstract: A cleaning apparatus is provided comprising a process chamber defining a work space, a supporter apparatus for rotating a wafer, the supporter apparatus being located in the work space and the wafer being mounted on the supporter apparatus such that a processing surface of the wafer is upwardly facing, an organic solvent supplying nozzle for supplying an organic solvent into the work space to the processing surface of the wafer mounted on the supporter apparatus, and a dry gas supplying nozzle for supplying an organic solvent vapor into the work space and forming an organic solvent atmosphere therein. Thus, water remaining on the wafer may be readily removed.

Abstract: Disclosed relates to a method for preparing unsaturated fatty acids and, more particularly, to a method for preparing unsaturated fatty acids in a high purity of at least 99% by isolating and purifying unsaturated fatty acids via a secondary nucleation mechanism using fatty acid-urea inclusion compounds.

Abstract: Disclosed relates to a method for improving a conversion rate of oil soluble unsaturated lipids into water-soluble lipids and, more particularly, to a method for improving a conversion rate of oil soluble unsaturated lipids into water-soluble lipids that forms an unsaturated lipid-chloride derivative having an increased reaction activity by using a pyridine-thionyl chloride as a catalyst, not directly causing a reaction between the unsaturated lipids and amino acids, or that applies an emulsifier to cause a reaction between the unsaturated lipids and amino acids so as to minimize the size of lipid particles to a nano-size of less than 50 nm, thus improving the reaction conversion rate to more than 99%.

Abstract: A wafer guide includes a horizontal support panel and at least three vertical panels attached on one surface of the support panel. Each of the vertical panels has a vertical body panel and a plurality of protrusions upwardly extended from a top surface of the vertical body panel. Gap regions between the protrusions act as slots for holding wafers. Sidewalls of the slots have a convex shaped profile when viewed from a top view, and bottom surfaces of the slots also have a convex shaped profile when viewed from a cross sectional view that crosses the vertical panels.

Abstract: A plurality of fuel cell stacks (8, 8a, 9, 9a) have their cathode ends (11, 12) contiguous with either a common current collector (15a-15d) or respective current collectors (15a, 15b) which may be separated by electrical isolation (27a, 27b). The cathode-to-cathode relationship protects the cathode of each of the stacks from cold ambient environments, thereby permitting improved cold starts and mitigation of performance loss as a result of cold starts as well as freeze/thaw cycles. Heaters (30, 30a-30d) may be provided in current collectors, or in or between electrical isolation. Four stacks may share one current collector, or each may have its own current collector.

Abstract: A wafer guide used in cleaning and/or drying processes of semiconductor wafers is provided. The wafer guide includes a horizontal support panel and at least three vertical panels attached on one surface of the support panel. Each of the vertical panels has a vertical body panel and a plurality of protrusions upwardly extended from a top surface of the vertical body panel. Gap regions between the protrusions act as slots for holding wafers. Sidewalls of the slots have a convex shaped profile when viewed from a top view, and bottom surfaces of the slots also have a convex shaped profile when viewed from a cross sectional view that crosses the vertical panels. Accordingly, contact areas between the wafers and the wafer guide are reduced to improve a drying efficiency of the wafers.

Abstract: The present invention disclosed herein is an apparatus for drying a substrate. In accordance with the present invention, the apparatus includes a measuring unit to detect a density of IPA vapor at predetermined regions in a process chamber or a pipe. The measuring unit has a radiating unit, a detection unit, and a window unit. The radiating unit transmits infrared-ray in a wavenumber region where light is absorbed by the IPA vapor.

Abstract: A wafer guide includes a horizontal support panel and at least three vertical panels attached on one surface of the support panel. Each of the vertical panels has a vertical body panel and a plurality of protrusions upwardly extended from a top surface of the vertical body panel. Gap regions between the protrusions act as slots for holding wafers. Sidewalls of the slots have a convex shaped profile when viewed from a top view, and bottom surfaces of the slots also have a convex shaped profile when viewed from a cross sectional view that crosses the vertical panels.

Abstract: A method of communicating semiconductor manufacturing information. The method includes providing, by a first service provider, a lot of semiconductor components to a second service provider for processing. The method also includes receiving from the second service provider, by the first service provider, first information associated with the processing. The method further includes outputting to a customer, by the first service provider, second information determined in response to the first information.

Abstract: A quality assurance system and method for use between a service provider having a sequence of process stages and a quality assurance stage, and a control center. The service provider performs a plurality of processes on goods at the process stages, transfers engineering data corresponding to the processes to the control center via Internet, and holds the goods at the quality assurance. The control center compares the engineering data with a standard specification, and transfers a confirmation message to the service provider if the engineering data conforms to the standard specification. The service provider may ship the goods to customers after the confirmation message is received.

Abstract: A fuel cell includes a membrane electrode assembly (46) having a first reactant flow field (80) secured adjacent a first or second surface (48, 50) of the assembly (46) for directing flow of a first reactant adjacent the first or second surface of the assembly (46). The first reactant flow field (80) defines a plurality of two-pass circuits (82, 84, 86, 88), and each two-pass circuit (82) is in fluid communication with both a first reactant inlet (90) for directing the first reactant into the fuel cell (12), and with a first reactant outlet (92) for directing the first reactant out of the fuel cell (12). The plurality of two-pass circuits (82) facilitate water movement (112) toward the reactant inlet (90) to aid in passive maintenance of fuel cell (12) water balance.

Abstract: An apparatus includes a chamber for containing a fluid, a guide seated in the chamber, and a transfer robot for loading and/or unloading a plurality of wafers to and/or from the guide. The wafers are located on the guide. The guide has a supporting member for supporting a wafer and a stopper member for preventing the wafer from being inclined over a predetermined range. The stopper member is in contact with a wafer edge disposed at a higher position than a wafer edge supported by the supporting member. A wafer guide has a stopper member to prevent adjacent wafers from being inclined and coming in contact with each other. Therefore, it is possible to suppress a poor drying such as water spots (or watermarks) produced when wafers are adhered to each other in a drying process.

Abstract: A method for searching television channel is provided. An initial frequency and a frequency search interval are set. Thereafter, using the initial frequency as the starting point, television signals are scanned to find any television channel within a designated frequency bandwidth. The channel ID is resolved from the channel frequency based on a specific broadcasting system on each detecting of the channel signals. The channel frequency and frequency ID of any television channel thus found are also stored. In this invention, the television channel is searched by frequency instead of a channel table as in a conventional method.

Abstract: A method an apparatus for drying a wafer, and an apparatus for cleaning and drying a wafer are provided. In the apparatus for cleaning and drying a wafer, the wafer is dipped into a cleaning solution in a cleaning tank. The wafer is then dried using a drying gas in a drying chamber disposed over the cleaning tank. A shutter separates the cleaning tank from the drying tank. A wafer boat moves the wafer vertically between the cleaning tank and the drying tank. Nozzles for providing the cleaning solution onto the wafer are disposed at both inner sides of the drying tank. The nozzles are connected to a drying gas supply unit to alternately and periodically provide the drying gas onto the wafer.