Patents by Inventor Junichi Ishikawa

Junichi Ishikawa has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20010050766
    Abstract: A raindrop detecting apparatus has a temperature sensor, an EEPROM, a processor and a raindrop sensor. A temperature characteristic data is defined by a first temperature data of the temperature sensor and a first output data of the raindrop sensor produced at a first temperature condition, and stored in the EEPROM. The processor updates a raindrop detection threshold by using the stored characteristic data, a second temperature data and a second output data produced at a second temperature, when an engine is started under no-raindrop condition. The processor compares an output data of the raindrop sensor with the raindrop detection threshold to detect a raindrop, while converting at least one of the characteristic data and the output data in correspondence with a temperature data produced at a raindrop detection time.
    Type: Application
    Filed: May 21, 2001
    Publication date: December 13, 2001
    Inventors: Shinji Wakabayashi, Junichi Ishikawa, Akira Kurahashi, Osamu Terakura
  • Patent number: 6251743
    Abstract: Microstructures, including a plurality of spaced structural members which are bendable under an external force, undergo a treating method using a first treating liquid, to prevent permanent deformation, by removing the microstructure from the first treating liquid to an environment having a pressure less than atmospheric pressure; or moving the microstructure from the first treating liquid to a second treating liquid having a smaller surface tension than the first treating liquid, and then removing the microstructure from the second liquid; or drying the microstructure removed from the first treating liquid by exposing same to a liquid vapor having a smaller surface tension than the first treating liquid; or removing the microstructure from the first treating liquid to the atmosphere, and drying the microstructure using an energy beam of high intensity or an ultrasonic wave.
    Type: Grant
    Filed: May 5, 1998
    Date of Patent: June 26, 2001
    Assignees: Fujitsu Limited, Fujitsu VLSI Limited
    Inventors: Motoo Nakano, Hiroshi Nomura, Masaya Katayama, Toshimi Ikeda, Fumihiko Inoue, Junichi Ishikawa, Masahiro Kuwamura
  • Patent number: 5888633
    Abstract: A micro-structure including at least a first bendable member having first and second ends and being supported at the first end only, and either being spaced from a rigid component, or being spaced from a second bendable member also supported only at a first end thereof. The first member has a length L from the first end to the second end specified by one of the following equations: (a) for the first member adjacent to the rigid component: L<(2Edt.sup.3 /3P).sup.1/4, wherein E is a Young's modulus of a material of the first member; d is a distance of the space between the first member and the rigid component; t is a thickness of the first member; and P is an external pressure applied to the first member; or b) for the first member adjacent to the second member: L<(2Ed't.sup.3 /3P).sup.1/4, wherein E, t and P are as defined above; and d' is a distance of the space between the first and second members.
    Type: Grant
    Filed: March 12, 1997
    Date of Patent: March 30, 1999
    Assignee: Fujitsu Limited & Fujitsu VLSI Limited
    Inventors: Motoo Nakano, Hiroshi Nomura, Masaya Katayama, Toshimi Ikeda, Fumihiko Inoue, Junichi Ishikawa, Masahiro Kuwamura
  • Patent number: 5652167
    Abstract: Micro-structures comprising at least a structural member, which is liable to be bent under an external force and formed so as to leave a space between the member and another member liable to be bent and/or other rigid component, are successfully treated using a treating liquid, without suffering permanent deformation resulting from the use of the treating liquid, by removing the micro-structures from the liquid to an environment having a pressure less than the atmospheric pressure; or displacing the micro-structures from the treating liquid to another treating liquid having a smaller surface tension than that of the former liquid, and then removing the micro-structures from the latter liquid; or drying the micro-structures removed from the treating liquid by exposing the same to vapor of a liquid having a smaller surface tension than that of the treating liquid; or removing the micro-structures from the treating liquid to the atmosphere, and drying them using an energy beam of high intensity or an ultrasonic
    Type: Grant
    Filed: June 29, 1993
    Date of Patent: July 29, 1997
    Assignees: Fujitsu Ltd., Fujitsu VLSI Ltd.
    Inventors: Motoo Nakano, Hiroshi Nomura, Masaya Katayama, Toshimi Ikeda, Fumihiko Inoue, Junichi Ishikawa, Masahiro Kuwamura
  • Patent number: 5583987
    Abstract: A symmetric multiprocessor system connecting a plurality of CPUs by a common bus initializes itself while defective CPUs are set aside to use only the remaining CPUs when the power is turned on, thereby maintaining the predetermined CPU numbers and giving a minimum influence with the existing software thereof. The multiprocessor system includes an identifier setting register to designate in a predetermined order the CPU numbers only to normal CPUs, and a reset controller to cut off the defective CPUs from the common bus. The multiprocessor system can automatically start re-setting up where the defective CPUs are detected during the processing of setting-up based on the time-out detection, can release an abnormal state of the hardware, and can control the setting-up processing in use of any CPU based on the level of a reset status input port and contents of a reset information register.
    Type: Grant
    Filed: December 21, 1994
    Date of Patent: December 10, 1996
    Assignees: Mitsubishi Denki Kabushiki Kaisha, Apricot Computers Limited
    Inventors: Satoshi Kobayashi, Toshikazu Yokoi, Kunio Takahari, Yoichi Nakamura, Junichi Ishikawa, Nigel Bruce, David Wright, Colin Hough
  • Patent number: 4983556
    Abstract: High strength alumina porcelains for use in insulators are disclosed herein, in which the maximum particle diameter of quartz grians remaining in the porcelains is not more than 40 .mu.m. A process for producing such high strength alumina porcelains for use in insulators comprises the steps of mixing the alumina of a controlled grain size which is decomposed in a single crystalline state and in which the 50% average particle diameter is in a range from 4 to 14 .mu.m, raw materials ground finely which are selected from the group consisting essentially of feldspar, silica sand, and china stone, and clay together, forming the thus obtained mixture, and drying and firing the formed body.
    Type: Grant
    Filed: February 24, 1988
    Date of Patent: January 8, 1991
    Assignee: NGK Insulators, Ltd.
    Inventors: Shoji Seike, Noriyasu Oguri, Hiroshi Harada, Junichi Ishikawa