Abstract: A hard mask-forming composition which forms a hard mask used in lithography, including: a resin containing an aromatic ring and a polar group; and a compound containing at least one of an oxazine ring fused to an aromatic ring, and a fluorene ring.

Abstract: The present invention detects the copy number of a specific nucleic acid per single cell in a cell population. This method comprises, in a reaction compartment containing a DNA sample, which is derived from nucleic acids in a single cell, and a PCR system, amplifying a target contained in the DNA sample by PCR. Then, PCR amplicons for each reaction compartment are quantified during the exponential amplification phase.

Abstract: A hard mask-forming composition which forms a hard mask used in lithography, including: a resin containing an aromatic ring and a polar group; and a compound containing at least one of an oxazine ring fused to an aromatic ring, and a fluorene ring.

Abstract: A hard mask-forming composition which forms a hard mask used in lithography, including: a resin containing an aromatic ring and a polar group; and a compound containing at least one of an oxazine ring fused to an aromatic ring, and a fluorene ring.

Abstract: A hard-mask forming composition including a resin containing a structural unit represented by General Formula (u1-1) or a structural unit represented by General Formula (u1-2) and a compound represented by General Formula (c-1), in which R11 and R12 are aromatic hydrocarbon groups which may have a substituent, Y is an organic group, R01 is a hydrocarbon group, R02 is an alkyl group, n1 is an integer of 0 to 3, n2 is an integer of 1 to 4, n3 is an integer of 1 to 3, n4 is an integer of 3 or more, and the number of —CH2OR02 is 6 or more

Abstract: A hard-mask forming composition including a resin (P1) containing a structural unit (u11) represented by General Formula (u11-1), and a resin (P2) containing an aromatic ring and a polar group, provided that the resin (P1) is excluded from the resin (P2), wherein R11 represents an aromatic hydrocarbon group which may have a substituent, Rp11 is an aldehyde group, a group represented by Formula (u-r-1), a group represented by Formula (u-r-2), or a group represented by Formula (u-r-3)

Abstract: A resist composition which generates an acid when exposed and whose solubility in a developer is changed by an action of an acid, the resist composition including: a base material component (A) whose solubility in a developer is changed by an action of an acid, in which the base material component (A) comprises a polymer compound (A1) having a constitutional unit (a01) represented by Formula (a0-1), a constitutional unit (a02) represented by Formula (a0-2), and a constitutional unit (a03) which is represented by Formula (a0-3) and has a structure different from the constitutional unit (a02).

Abstract: A resist composition including a resin component (A1) which exhibits changed solubility in a developing solution under action of acid, the resin component (A1) including a structural unit (a0) represented by general formula (a0-1) shown below (wherein Ya01 and Ya02 each independently represents a single bond or an alkylene group of 1 to 3 carbon atoms, provided that the total number of carbon atoms of Ya01 and Ya02 is 3 or less; Ra01 and Ra02 each independently represents a hydrogen atom or an alkyl group of 1 to 4 carbon atoms, provided that the total number of carbon atoms of Ra01 and Ra02 is 2 to 6; A? represents an alkylene group of 1 to 5 carbon atoms).

Abstract: A resist composition which generates an acid when exposed and whose solubility in a developer is changed by an action of an acid, the resist composition including: a base material component (A) whose solubility in a developer is changed by an action of an acid, in which the base material component (A) comprises a polymer compound (A1) having a constitutional unit (a01) represented by Formula (a0-1) and a constitutional unit (a1) which comprises an acid-decomposable group whose polarity is increased due to an action of an acid, and the constitutional unit (a1) comprises a constitutional unit containing an acid-dissociable group represented by Formula (a1-r-1) and a constitutional unit containing an acid-dissociable group represented by Formula (a1-r-2).

Abstract: A hard mask-forming composition which forms a hard mask used in lithography, including: a resin containing an aromatic ring and a polar group; and a compound containing at least one of an oxazine ring fused to an aromatic ring, and a fluorene ring.

Abstract: A resist composition which generates acid upon exposure and exhibits changed solubility in a developing solution under action of acid includes a base component which exhibits changed solubility in a developing solution under action of acid, and a compound represented by general formula (D0-1) below, in which Ya01 represents an arylene group, an alkylene group, an alkenylene group or a divalent alicyclic group, provided that the divalent alicyclic group may contain a hetero atom in the alicyclic structure; R01 represents a linear or branched alkyl group. n01 represents 0 or 1.

Abstract: A resist composition including a base component which exhibits changed solubility in a developing solution under action of acid, and an amine compound represented by general formula (d0), and a carboxylic acid compound represented by general formula (e0), or a salt thereof, wherein Rd01, Rd02 and Rd03 each independently represents an aliphatic hydrocarbon group; Re01 represents an aliphatic hydrocarbon group having a fluorine atom; Ye01 represents a divalent linking group or a single bond.

Abstract: A method of recovering a defect portion of a resist pattern formed on a substrate including applying a shrinking agent composition so as to cover the resist pattern having the defect portion; forming a developing solution-insoluble region on the surface of the resist pattern; and developing the covered resist pattern, the shrinking agent composition including a polymeric compound (X) which is a homopolymer or a random copolymer.

Abstract: A resist composition which generates an acid when exposed and whose solubility in a developer is changed by an action of an acid, the resist composition including: a base material component (A) whose solubility in a developer is changed by an action of an acid, in which the base material component (A) comprises a polymer compound (A1) having a constitutional unit (a01) represented by Formula (a0-1), a constitutional unit (a02) represented by Formula (a0-2), and a constitutional unit (a03) which is represented by Formula (a0-3) and has a structure different from the constitutional unit (a02).

Abstract: A resist composition which generates an acid when exposed and whose solubility in a developer is changed by an action of an acid, the resist composition including: a base material component (A) whose solubility in a developer is changed by an action of an acid, in which the base material component (A) comprises a polymer compound (A1) having a constitutional unit (a01) represented by Formula (a0-1) and a constitutional unit (a1) which comprises an acid-decomposable group whose polarity is increased due to an action of an acid, and the constitutional unit (a1) comprises a constitutional unit containing an acid-dissociable group represented by Formula (a1-r-1) and a constitutional unit containing an acid-dissociable group represented by Formula (a1-r-2).

Abstract: A communication node comprises a flow table that stores a flow entry defining how a packet is processed; a control part that updates the flow table according to an instruction from a predetermined control apparatus; a packet processing part that processes a received packet by referring to the flow table; and a control apparatus proxy part that creates a flow entry for realizing new communication in cooperation with control apparatus proxy parts of other communication nodes in place of the predetermined control apparatus when the new communication occurs in a state in which the instruction from the control apparatus cannot be received. The communication node sets the flow entry for realizing the new communication in the flow table and processes packets belonging to the new communication until an instruction from the predetermined control apparatus can be received.

Abstract: A method of forming a resist pattern including forming a first resist pattern on a substrate; applying a cross-linking composition so as to cover the first resist pattern; heating the covered first resist pattern and crosslinking an isocyanate group in the cross-linking composition with the first resist pattern; and developing the covered first resist pattern, wherein the cross-linking composition includes a blocked isocyanate compound having a protected isocyanate group.

Abstract: A method of forming a resist pattern, including: step A in which a first resist pattern is formed on a substrate, step B in which a basic composition is applied to cover the first resist pattern, step C in which a base contained in the basic composition and the first resist pattern are neutralized to form a developing solution insoluble region on a surface of the first resist pattern, and step D in which the covered first resist pattern is developed, the basic composition containing a basic component, and the basic component containing a polymeric compound having a structural unit (x0) represented by general formula (x0-1) (R is H, C1˜5 alkyl group, C1˜5 halogenated alkyl group; Vx01 is divalent hydrocarbon group having ether bond or amide bond or divalent aromatic hydrocarbon group; Yx01 is single bond or divalent linking group; Rx1 is substituent having nitrogen atom).

Abstract: A method of forming a resist pattern including forming a first resist pattern on a substrate; applying a cross-linking composition so as to cover the first resist pattern; heating the covered first resist pattern and crosslinking an isocyanate group in the cross-linking composition with the first resist pattern; and developing the covered first resist pattern, wherein the cross-linking composition includes a blocked isocyanate compound having a protected isocyanate group.

Abstract: A method of producing a copolymer, including copolymerizing a monomer (am0) containing a partial structure represented by formula (am0-1) shown below, a monomer (am1) containing an acid decomposable group which exhibits increased polarity by the action of acid and a monomer (am5) containing an —SO2— containing cyclic group in the presence of a nitrogen-containing compound (X) having a conjugated acid with an acid dissociation constant of less than 10 (in the formula, *0 to *4 each represents a valence bond).