Patents by Inventor Junichi Tsuchiya
Junichi Tsuchiya has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Publication number: 20160274464Abstract: A method of recovering a defect portion of a resist pattern formed on a substrate including applying a shrinking agent composition so as to cover the resist pattern having the defect portion; forming a developing solution-insoluble region on the surface of the resist pattern; and developing the covered resist pattern, the shrinking agent composition including a polymeric compound (X) which is a homopolymer or a random copolymer.Type: ApplicationFiled: March 15, 2016Publication date: September 22, 2016Inventors: Junichi TSUCHIYA, Rikita TSUNODA, Daichi TAKAKI, Miki SHINOMIYA, Masafumi FUJISAKI
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Publication number: 20160266495Abstract: A method of forming a resist pattern, including: step A in which a first resist pattern is formed on a substrate, step B in which a basic composition is applied to cover the first resist pattern, step C in which a base contained in the basic composition and the first resist pattern are neutralized to form a developing solution insoluble region on a surface of the first resist pattern, and step D in which the covered first resist pattern is developed, the basic composition containing a basic component, and the basic component containing a polymeric compound having a structural unit (x0) represented by general formula (x0-1) (R is H, C1˜5 alkyl group, C1˜5 halogenated alkyl group; Vx01 is divalent hydrocarbon group having ether bond or amide bond or divalent aromatic hydrocarbon group; Yx01 is single bond or divalent linking group; Rx1 is substituent having nitrogen atom).Type: ApplicationFiled: October 15, 2015Publication date: September 15, 2016Inventors: Tomoyuki HIRANO, Junichi TSUCHIYA, Rikita TSUNODA, Tomonari SUNAMICHI, Takayoshi MORI
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Patent number: 9411227Abstract: A polymeric compound having a structural unit represented by general formula (a0-1), and a resist composition containing the same (in which R represents a hydrogen atom, an alkyl group of 1 to 5 carbon atoms or a halogenated alkyl group of 1 to 5 carbon atoms; Va01 and Va02 each independently represents a hydrocarbon group of 2 to 10 carbon atoms; Va01-La0— represents Va01-C(?O)O— or Va01-OC(?O)—; Ra0 represents an acid dissociable, branched hydrocarbon group of 8 or more carbon atoms, an acid dissociable, monocyclic hydrocarbon group of 4 or more carbon atoms, or an acid dissociable, polycyclic hydrocarbon group, provided that methyl adamantyl group is excluded.Type: GrantFiled: January 15, 2015Date of Patent: August 9, 2016Assignee: TOKYO OHKA KOGYO CO., LTD.Inventors: Takashi Nagamine, Junichi Tsuchiya, Masatoshi Arai, Yoshitaka Komuro
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Patent number: 9405190Abstract: A resist pattern formation method with enhanced resolution and process margin in forming a resist pattern. The method includes using a resist composition containing a high-molecular weight compound having a constituent unit represented by the general formula (a0-1) and conducting patterning by negative type development with a developing solution containing an organic solvent to forma resist pattern in which R represents a hydrogen atom, an alkyl group having 1 to 5 carbon atoms, or a halogenated alkyl group having 1 to 5 carbon atoms; Va0 represents a divalent hydrocarbon group; na0 is an integer of 0 to 2; R1 represents a chain or cyclic aliphatic hydrocarbon group; R2 represents a group for forming a monocyclic group together with the carbon atom to which R1 is bonded; and R3 represents an optionally substituted cyclic group.Type: GrantFiled: October 21, 2014Date of Patent: August 2, 2016Assignee: TOKYO OHKA KOGYO CO., LTD.Inventors: Takayoshi Mori, Junichi Tsuchiya, Yusuke Suzuki
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Patent number: 9274424Abstract: A resist composition which generates an acid upon exposure and exhibits changed solubility in a developing solution by the action of the acid contains a high-molecular weight compound (A1) having a constituent unit (a0) represented by a general formula (a0-1) and a constituent unit (a1-1) including a monocyclic group-containing acid decomposable group whose polarity increases by the action of an acid. In the formula (a0-1), R represents a hydrogen atom, an alkyl group having 1 to 5 carbon atoms, or a halogenated alkyl group having 1 to 5 carbon atoms; Ya01 represents a single bond or a divalent linking group; X01 represents a sulfur atom or an oxygen atom; and Ra01 represents an optionally substituted cyclic group, chain alkyl group, or chain alkenyl group.Type: GrantFiled: March 19, 2014Date of Patent: March 1, 2016Assignee: TOKYO OHKA KOGYO CO., LTD.Inventors: Tsuyoshi Nakamura, Kazuishi Tanno, Naoto Motoike, Junichi Tsuchiya, Yoichi Hori
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Patent number: 9244347Abstract: A resist composition comprising a compound (m0) (wherein Rb1 represents an electron withdrawing group; Rb2 and Rb3 each independently represents an aryl group, an alkyl group or an alkenyl group, provided that Rb2 and Rb3 may be mutually bonded to form a ring with the sulfur atom; and X0? represents a monovalent counteranion).Type: GrantFiled: May 30, 2014Date of Patent: January 26, 2016Assignee: TOKYO OHKA KOGYO CO., LTD.Inventors: Yoshitaka Komuro, Takaaki Kaiho, Toshiaki Hato, Akiya Kawaue, Junichi Tsuchiya, Yoshiyuki Utsumi
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Patent number: 9244357Abstract: A method for forming a negative type resist pattern having a high residual film rate of exposed areas of a resist film by heating an exposed resist film and subjecting it to patterning by negative type development with a developing solution containing an organic solvent, in which a resist composition containing a high-molecular weight compound having a constituent unit represented by a particular general formula.Type: GrantFiled: January 14, 2014Date of Patent: January 26, 2016Assignee: TOKYO OHKA KOGYO CO., LTD.Inventors: Yuta Iwasawa, Kotaro Endo, Junichi Tsuchiya
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Patent number: 9140983Abstract: A resist composition including a high-molecular weight compound having a constituent unit represented by general formula (a0-1), a constituent unit (a1) containing a group containing a monocyclic group or a chain group among acid decomposable groups whose polarity increases by action of acid, a constituent unit (a1?) containing a group containing a polycyclic group among acid decomposable groups whose polarity increases by the action of an acid, and a constituent unit (a2) containing a lactone-containing monocyclic group, with a proportion of the constituent unit (a1) being equal to a proportion of the constituent unit (a1?) or more; and a method for forming a resist pattern using the resist composition.Type: GrantFiled: May 29, 2014Date of Patent: September 22, 2015Assignee: TOKYO OHKA KOGYO CO., LTD.Inventors: Junichi Tsuchiya, Yuta Iwasawa
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Publication number: 20150198881Abstract: A polymeric compound having a structural unit represented by general formula (a0-1), and a resist composition containing the same (in which R represents a hydrogen atom, an alkyl group of 1 to 5 carbon atoms or a halogenated alkyl group of 1 to 5 carbon atoms; Va01 and Va02 each independently represents a hydrocarbon group of 2 to 10 carbon atoms; Va01-La0— represents Va01-C(?O)O— or Va01-OC(?O)—; Ra0 represents an acid dissociable, branched hydrocarbon group of 8 or more carbon atoms, an acid dissociable, monocyclic hydrocarbon group of 4 or more carbon atoms, or an acid dissociable, polycyclic hydrocarbon group, provided that methyl adamantyl group is excluded.Type: ApplicationFiled: January 15, 2015Publication date: July 16, 2015Inventors: Takashi Nagamine, Junichi Tsuchiya, Masatoshi Arai, Yoshitaka Komuro
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Publication number: 20150118616Abstract: A resist pattern formation method with enhanced resolution and process margin in forming a resist pattern. The method includes using a resist composition containing a high-molecular weight compound having a constituent unit represented by the general formula (a0-1) and conducting patterning by negative type development with a developing solution containing an organic solvent to forma resist pattern in which R represents a hydrogen atom, an alkyl group having 1 to 5 carbon atoms, or a halogenated alkyl group having 1 to 5 carbon atoms; Va0 represents a divalent hydrocarbon group; na0 is an integer of 0 to 2; R1 represents a chain or cyclic aliphatic hydrocarbon group; R2 represents a group for forming a monocyclic group together with the carbon atom to which R1 is bonded; and R3 represents an optionally substituted cyclic group.Type: ApplicationFiled: October 21, 2014Publication date: April 30, 2015Inventors: Takayoshi Mori, Junichi Tsuchiya, Yusuke Suzuki
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Patent number: 8927191Abstract: A resist composition including a base component (A) which exhibits changed solubility in a developing solution under action of acid and an acid-generator component (B) which generates acid upon exposure, wherein the base component (A) includes a polymeric compound (A1) having a structural unit (a5) represented by general formula (a5-1). In the formula (a5-1), R represents a hydrogen atom, an alkyl group of 1 to 5 carbon atoms or a halogenated alkyl group of 1 to 5 carbon atoms; each of Ra and Rb independently represents a hydrocarbon group which may have a substituent, and Ra and Rb may be mutually bonded to form a ring.Type: GrantFiled: January 17, 2012Date of Patent: January 6, 2015Assignee: Tokyo Ohka Kogyo Co., Ltd.Inventors: Junichi Tsuchiya, Daichi Takaki, Masatoshi Arai, Daiju Shiono, Tomoyuki Hirano
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Patent number: 8911928Abstract: A resist composition including a base component (A) that exhibits changed solubility in a developing solution under action of acid and an acid generator component (B) that generates acid upon exposure, wherein the base component (A) contains a resin component (A1) including a structural unit (a0) represented by general formula (a0-1) shown below and a structural unit (a1)) containing an acid decomposable group that exhibits increased polarity under action of acid, and the amount of the structural unit (a0) is less than 50 mol %, wherein R represents a hydrogen atom, an alkyl group of 1 to 5 carbon atoms or a halogenated alkyl group of 1 to 5 carbon atoms; R1 represents a divalent linking group; R2 represents a —SO2— containing cyclic group; and v represents 0 or 1.Type: GrantFiled: May 22, 2012Date of Patent: December 16, 2014Assignee: Tokyo Ohka Kogyo Co., Ltd.Inventors: Tomoyuki Hirano, Daiju Shiono, Daichi Takaki, Junichi Tsuchiya
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Publication number: 20140363772Abstract: A resist composition including a high-molecular weight compound having a constituent unit represented by general formula (a0-1), a constituent unit (a1) containing a group containing a monocyclic group or a chain group among acid decomposable groups whose polarity increases by action of acid, a constituent unit (a1?) containing a group containing a polycyclic group among acid decomposable groups whose polarity increases by the action of an acid, and a constituent unit (a2) containing a lactone-containing monocyclic group, with a proportion of the constituent unit (a1) being equal to a proportion of the constituent unit (a1?) or more; and a method for forming a resist pattern using the resist composition.Type: ApplicationFiled: May 29, 2014Publication date: December 11, 2014Applicant: Tokyo Ohka Kogyo Co., Ltd.Inventors: Junichi Tsuchiya, Yuta Iwasawa
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Publication number: 20140356787Abstract: A resist composition comprising a compound (m0) (wherein Rb1 represents an electron withdrawing group; Rb2 and Rb3 each independently represents an aryl group, an alkyl group or an alkenyl group, provided that Rb2 and Rb3 may be mutually bonded to form a ring with the sulfur atom; and X0? represents a monovalent counteranion).Type: ApplicationFiled: May 30, 2014Publication date: December 4, 2014Applicant: Tokyo Ohka Kogyo Co., Ltd.Inventors: Yoshitaka Komuro, Takaaki Kaiho, Toshiaki Hato, Akiya Kawaue, Junichi Tsuchiya, Yoshiyuki Utsumi
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Publication number: 20140287362Abstract: A resist composition which generates an acid upon exposure and exhibits changed solubility in a developing solution by the action of the acid contains a high-molecular weight compound (A1) having a constituent unit (a0) represented by a general formula (a0-1) and a constituent unit (a1-1) including a monocyclic group-containing acid decomposable group whose polarity increases by the action of an acid. In the formula (a0-1), R represents a hydrogen atom, an alkyl group having 1 to 5 carbon atoms, or a halogenated alkyl group having 1 to 5 carbon atoms; Ya01 represents a single bond or a divalent linking group; X01 represents a sulfur atom or an oxygen atom; and Ra01 represents an optionally substituted cyclic group, chain alkyl group, or chain alkenyl group.Type: ApplicationFiled: March 19, 2014Publication date: September 25, 2014Applicant: Tokyo Ohka Kogyo Co., Ltd.Inventors: Tsuyoshi Nakamura, Kazuishi Tanno, Naoto Motoike, Junichi Tsuchiya, Yoichi Hori
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Publication number: 20140272727Abstract: A method of producing a copolymer, including copolymerizing a monomer (am0) containing a partial structure represented by formula (am0-1) shown below, a monomer (am1) containing an acid decomposable group which exhibits increased polarity by the action of acid and a monomer (am5) containing an —SO2— containing cyclic group in the presence of a nitrogen-containing compound (X) having a conjugated acid with an acid dissociation constant of less than 10 (in the formula, *0 to *4 each represents a valence bond).Type: ApplicationFiled: March 12, 2014Publication date: September 18, 2014Applicant: Tokyo Ohka Kogyo Co., Ltd.Inventors: Tomoyuki Hirano, Yoshiyuki Utsumi, Junichi Tsuchiya, Yoichi Hori
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Publication number: 20140205956Abstract: A method for forming a negative type resist pattern having a high residual film rate of exposed areas of a resist film by heating an exposed resist film and subjecting it to patterning by negative type development with a developing solution containing an organic solvent, in which a resist composition containing a high-molecular weight compound having a constituent unit represented by a particular general formula.Type: ApplicationFiled: January 14, 2014Publication date: July 24, 2014Applicant: Tokyo Ohka Kogyo Co., LtdInventors: Yuta Iwasawa, Kotaro Endo, Junichi Tsuchiya
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Patent number: 8735052Abstract: A surface modifying material for forming a surface modifying layer provided between a substrate and a resist film, the surface modifying material including an epoxy resin having a weight average molecular weight of 1,000 to 50,000; a method of forming a resist pattern, including: forming a surface modifying layer on a substrate using the surface modifying material, forming a resist film on the substrate, on which the surface modified layer has been formed, using a resist composition, conducting exposure of the resist film, and alkali developing the resist film to form a resist pattern; and a method of forming a pattern, including: etching the substrate, on which a resist pattern has been formed by the method of forming a resist pattern.Type: GrantFiled: March 14, 2011Date of Patent: May 27, 2014Assignee: Tokyo Ohka Kogyo Co., Ltd.Inventors: Isao Hirano, Junichi Tsuchiya
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Patent number: 8658343Abstract: A resist composition including a base component (A) which exhibits changed solubility in a developing solution under the action of acid, and an acid generator component (B) which generates acid upon exposure, wherein the base component (A) contains a polymeric compound (A1) having a structural unit (a5) represented by general formula (a5-1). In formula (a5-1), R represents a hydrogen atom, an alkyl group or a halogenated alkyl group, X represents single bond or divalent linking group, W represents a cyclic alkylene group which may include an oxygen atom at arbitrary position, each of Ra and Rb independently represents a hydrogen atom or an alkyl group which may include an oxygen atom at arbitrary position, or alternatively, Ra and Rb may be bonded to each other to form a ring together with the nitrogen atom in the formula, and p represents integer of 1 to 3.Type: GrantFiled: December 5, 2011Date of Patent: February 25, 2014Assignee: Tokyo Ohka Kogyo Co., Ltd.Inventors: Masatoshi Arai, Junichi Tsuchiya, Daiju Shiono, Tomoyuki Hirano, Daichi Takaki
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Patent number: 8609320Abstract: A resist composition, a method of forming a resist pattern using the resist composition, a novel polymeric compound and a compound useful as a monomer for the polymeric compound, the resist composition including a base component (A) that exhibits changed solubility in a developing solution under action of acid and an acid generator component (B) that generates acid upon exposure, the base component (A) containing a resin component (A0) including a structural unit (a0) represented by general formula (a0) shown below in which A represents a divalent linking group; and R1 represents a hydrogen atom or a hydrocarbon group of 1 to 6 carbon atoms which may have a substituent.Type: GrantFiled: November 28, 2011Date of Patent: December 17, 2013Assignee: Tokyo Ohka Kogyo Co., Ltd.Inventors: Yoshiyuki Utsumi, Takehiro Seshimo, Tomoyuki Hirano, Daichi Takaki, Junichi Tsuchiya