Patents by Inventor Junji Nakamura

Junji Nakamura has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20140213822
    Abstract: Disclosed is a triphenylamine derivative represented by general formula (1): wherein R1, R2, R3, and R5 each independently represent a hydrogen atom, a substituted or unsubstituted alkyl group, a substituted or unsubstituted alkoxy group, or a substituted or unsubstituted phenyl group, R4 represents a hydrogen atom, a substituted or unsubstituted alkyl group, or a substituted or unsubstituted phenyl group, Ar represents a substituted or unsubstituted phenyl group, and m represents an integer of 1 to 3.
    Type: Application
    Filed: January 15, 2014
    Publication date: July 31, 2014
    Applicant: TAKASAGO INTERNATIONAL CORPORATION
    Inventors: Junji NAKAMURA, Yuji NAKAYAMA
  • Patent number: 8568986
    Abstract: A marker for determining the onset of periodontal disease and a marker far determining the progression stage of periodontal disease, each containing autoinducer-2.
    Type: Grant
    Filed: June 21, 2012
    Date of Patent: October 29, 2013
    Assignee: Kao Corporation
    Inventors: Hatsumi Souno, Hidetake Fujinaka, Junji Nakamura
  • Patent number: 8403550
    Abstract: A surface light source device can be configured to increase front luminance as compared to certain conventional light sources. The surface light source device can include a light guiding plate having a first end surface and a second end surface, a light exiting surface formed to have a light exiting portion and a tapered surface disposed opposite to the light exiting surface. A light source can be disposed along the first end surface of the light guiding plate, and a reflection sheet can be disposed on the tapered surface of the light guiding plate. A prism sheet having a prism surface can face toward the light exiting portion of the light guiding plate. The light exiting portion can be disposed a predetermined entrance length away from the first end surface along the light exiting surface so that the light exiting surface can form a predetermined taper angle with the tapered surface.
    Type: Grant
    Filed: March 8, 2011
    Date of Patent: March 26, 2013
    Assignee: Stanley Electric Co., Ltd.
    Inventors: Junji Nakamura, Yoji Oki, Fumitoshi Isobe
  • Publication number: 20120276546
    Abstract: A marker for determining the onset of periodontal disease and a marker far determining the progression stage of periodontal disease, each containing autoinducer-2.
    Type: Application
    Filed: June 21, 2012
    Publication date: November 1, 2012
    Applicant: Kao Corportation
    Inventors: Hatsumi Souno, Hidetake Fujinaka, Junji Nakamura
  • Patent number: 8293478
    Abstract: A marker for determining the onset of periodontal disease and a marker for determining the progression stage of periodontal disease, each containing autoinducer-2.
    Type: Grant
    Filed: April 15, 2010
    Date of Patent: October 23, 2012
    Assignee: Kao Corporation
    Inventors: Hatsumi Souno, Hidetake Fujinaka, Junji Nakamura
  • Patent number: 8252118
    Abstract: There is provided a substrate support device capable of preventing powder dust from being produced. A thermoconductive intermediate member is interposed between a base table and a substrate support table and has a communication aperture path for communicating the aperture path of the base table with the aperture path of the substrate support table. An elastic member such as bellows tube is disposed in the communication aperture path of the thermoconductive intermediate member, for insulating the thermoconductive intermediate member from the inert gas which flows through the communication aperture path.
    Type: Grant
    Filed: April 14, 2009
    Date of Patent: August 28, 2012
    Assignee: Canon Anelva Corporation
    Inventors: Yohsuke Shibuya, Yasuyuki Shirai, Hirofumi Asanuma, Junji Nakamura
  • Patent number: 8147153
    Abstract: The present invention provides a rinsing method capable of satisfactorily rinsing the surface of a resist film regardless of the condition of the surface of the resist film so that development defects caused by residuals produced by development may be reduced. A rinsing method of rinsing a substrate processed by a developing process for developing an exposed pattern comprises the steps of discharging a rinsing liquid onto a central part of the substrate processed by the developing process and coated with a developer puddle while the substrate is stopped or rotated (step 5), stopping discharging the rinsing liquid in a state where the developer puddle remains at least in a peripheral part of the substrate (step 6), and rotating the substrate at a high rotating speed to shake the developer remaining on the substrate off the substrate together with the rinsing liquid (step 7).
    Type: Grant
    Filed: October 27, 2010
    Date of Patent: April 3, 2012
    Assignee: Tokyo Electron Limited
    Inventors: Hirofumi Takeguchi, Junji Nakamura, Kousuke Yoshihara
  • Publication number: 20120022293
    Abstract: An object of the present invention is to provide a charge transport material and an electrophotographic photoreceptor using the charge transport material, the charge transport material sufficiently satisfying characteristics conventionally desired for a charge transport material for an electrophotographic photoreceptor, specifically, the charge transport material having a good solubility in a binder polymer, allowing formation of a stable and high-concentration organic thin film therefrom, and having a high carrier mobility. To achieve the object, the present invention provides a tris(4-styrylphenyl)amine derivative represented by the following general formula (1): wherein R1 represents a methyl group or methoxy group, and R2 represents a hydrogen atom, methyl group, or methoxy group, provided that a case where R1 and R2 are a methyl group and R2 is at the meta-position is excluded; wherein 50% or more of geometrical isomers have three double bonds which are all trans.
    Type: Application
    Filed: July 18, 2011
    Publication date: January 26, 2012
    Applicant: TAKASAGO INTERNATIONAL CORPORATION
    Inventors: Junji NAKAMURA, Tohru KOBAYASHI
  • Publication number: 20120015397
    Abstract: A marker for determining the onset of periodontal disease and a marker for determining the progression stage of periodontal disease, each containing autoinducer-2.
    Type: Application
    Filed: April 15, 2010
    Publication date: January 19, 2012
    Applicant: Kao Corporation
    Inventors: Hatsumi Souno, Hidetake Fujinaka, Junji Nakamura
  • Patent number: 8029624
    Abstract: A rinse method for rinsing a substrate having an exposure pattern thereon developed includes presetting conditions for a rinse process according to surface states of the substrate, measuring a surface state of the substrate, selecting a corresponding condition for the rinse process based on the measured surface state of the substrate, and performing the rinse process under the selected condition.
    Type: Grant
    Filed: November 21, 2006
    Date of Patent: October 4, 2011
    Assignee: Tokyo Electron Limited
    Inventors: Kousuke Yoshihara, Junji Nakamura, Hirofumi Takeguchi, Taro Yamamoto
  • Publication number: 20110228557
    Abstract: A surface light source device can be configured to increase front luminance as compared to certain conventional light sources. The surface light source device can include a light guiding plate having a first end surface and a second end surface, a light exiting surface formed to have a light exiting portion and a tapered surface disposed opposite to the light exiting surface. A light source can be disposed along the first end surface of the light guiding plate, and a reflection sheet can be disposed on the tapered surface of the light guiding plate. A prism sheet having a prism surface can face toward the light exiting portion of the light guiding plate. The light exiting portion can be disposed a predetermined entrance length away from the first end surface along the light exiting surface so that the light exiting surface can form a predetermined taper angle with the tapered surface.
    Type: Application
    Filed: March 8, 2011
    Publication date: September 22, 2011
    Inventors: JUNJI NAKAMURA, Yoji Oki, Fumitoshi Isobe
  • Patent number: 7947002
    Abstract: A pressure-sensing massage machine that resolves the problems of difficult assembly and adjustment and the occurrence of operational errors common to a sensing mechanism that uses many components and devices. The massage machine of the present invention is able to monitor the pressure applied to the massage recipient by a motor-driven movably extending massaging member. A flexible member is provided in the transmission located between the massage member and the motor that drives the massage member, and a pressure sensing mechanism monitors the pressure applied to the massage recipient through the flexible displacement of the flexible member.
    Type: Grant
    Filed: March 9, 2007
    Date of Patent: May 24, 2011
    Assignee: Panasonic Electric Works Co., Ltd.
    Inventors: Souichirou Mizoguchi, Junji Nakamura, Masatoshi Dairin, Munekiyo Ikebe, Masahiro Kirigaya
  • Patent number: 7901514
    Abstract: A cleaning method of cleaning a surface of a substrate that is processed by a developing process. The method includes pouring a cleaning liquid onto a central part of the substrate. A dry area that is not wetted with the cleaning liquid is created in a central part of the substrate by stopping pouring the cleaning liquid or by shifting a cleaning liquid pouring position to which the cleaning liquid is poured from the central part while the substrate holding device is rotating. The dry area is expanded outward from the central part of the substrate by rotating the substrate holding device at a rotating speed not lower than 1500 rpm without pouring the cleaning liquid onto the dry area. The cleaning liquid is poured onto an outer area contiguously surrounding the dry area on the surface of the substrate.
    Type: Grant
    Filed: July 15, 2009
    Date of Patent: March 8, 2011
    Assignee: Tokyo Electron Limited
    Inventors: Junji Nakamura, Kousuke Yoshihara, Kentaro Yamamura, Fumiko Iwao, Hirofumi Takeguchi
  • Publication number: 20110045414
    Abstract: The present invention provides a rinsing method capable of satisfactorily rinsing the surface of a resist film regardless of the condition of the surface of the resist film so that development defects caused by residuals produced by development may be reduced. A rinsing method of rinsing a substrate processed by a developing process for developing an exposed pattern comprises the steps of discharging a rinsing liquid onto a central part of the substrate processed by the developing process and coated with a developer puddle while the substrate is stopped or rotated (step 5), stopping discharging the rinsing liquid in a state where the developer puddle remains at least in a peripheral part of the substrate (step 6), and rotating the substrate at a high rotating speed to shake the developer remaining on the substrate off the substrate together with the rinsing liquid (step 7).
    Type: Application
    Filed: October 27, 2010
    Publication date: February 24, 2011
    Applicant: TOKYO ELECTRON LIMITED
    Inventors: Hirofumi TAKEGUCHI, Junji NAKAMURA, Kousuke YOSHIHARA
  • Publication number: 20110009781
    Abstract: A chair-type massage machine has a seat, a backrest part, and a treatment mechanism that is provided in the backrest part so as to able to move up and down, and the treatment mechanism comprises: a treatment arm having a treatment element at substantially a tip end thereof; a massage power selection mechanism for adjusting massage strength by displacing the treatment arm between a weak state in which the treatment arm is substantially parallel to a backrest face of the backrest part and a strong state in which the treatment arm is erected substantially perpendicular to the backrest face; and a push-out member that is provided closer to a base end side than the treatment element of the treatment arm and is positioned below the treatment element when the treatment arm is in the strong state.
    Type: Application
    Filed: August 5, 2008
    Publication date: January 13, 2011
    Applicant: PANASONIC ELECTRIC WORKS CO., LTD.
    Inventors: Junji Nakamura, Munekiyo Ikebe, Masatoshi Dairin, Yousuke Kurata
  • Patent number: 7841787
    Abstract: The present invention provides a rinsing method capable of satisfactorily rinsing the surface of a resist film regardless of the condition of the surface of the resist film so that development defects caused by residuals produced by development may be reduced. A rinsing method of rinsing a substrate processed by a developing process for developing an exposed pattern comprises the steps of discharging a rinsing liquid onto a central part of the substrate processed by the developing process and coated with a developer puddle while the substrate is stopped or rotated (step 5), stopping discharging the rinsing liquid in a state where the developer puddle remains at least in a peripheral part of the substrate (step 6), and rotating the substrate at a high rotating speed to shake the developer remaining on the substrate off the substrate together with the rinsing liquid (step 7).
    Type: Grant
    Filed: October 30, 2006
    Date of Patent: November 30, 2010
    Assignee: Tokyo Electron Limited
    Inventors: Hirofumi Takeguchi, Junji Nakamura, Kousuke Yoshihara
  • Patent number: 7832226
    Abstract: An indoor unit of an air conditioner includes a front panel and a coating layer. A first panel and a second panel of the front panel are formed from a transparent material in which luminous grains are mixed. The coating layer exhibits a color scheme or a pattern, and is provided to a reverse side of the first panel and the second panel.
    Type: Grant
    Filed: August 23, 2004
    Date of Patent: November 16, 2010
    Assignee: Daikin Industries, Ltd.
    Inventor: Junji Nakamura
  • Patent number: D634828
    Type: Grant
    Filed: September 7, 2010
    Date of Patent: March 22, 2011
    Assignee: Daikin Industries Ltd.
    Inventor: Junji Nakamura
  • Patent number: D658280
    Type: Grant
    Filed: October 14, 2011
    Date of Patent: April 24, 2012
    Assignee: Daikin Industries Ltd.
    Inventors: Kentarou Niki, Junji Nakamura
  • Patent number: D662577
    Type: Grant
    Filed: October 14, 2011
    Date of Patent: June 26, 2012
    Assignee: Daikin Industries Ltd.
    Inventors: Junji Nakamura, Kentarou Niki, Mana Yamashita