Abstract: The present invention provides a charged particle beam energy width reduction system. The system comprises a first element (110) acting in a focusing and dispersive manner in an x-z-plane; a second element (112) acting in a focusing and dispersive manner in the x-z-plane; a charged particle selection element (116; 116a; 116b) positioned between the first and the second element acting in a focusing and dispersive manner; and a focusing element (114; 314, 712; 714) positioned between the first and the second element acting in a focusing and dispersive manner.

Abstract: The present invention provides a charged particle beam device. The device comprises an emitter array (22) for emitting a plurality of charged particle beams (8). The plurality of charged particle beams are imaged with a lens (12). An electrode unit (14) is provided for accelerating the plurality of charged particle beams. The potential differences between a first potential of the emitter array, a second potential of the electrode unit, and a third potential of a specimen, are controlled by a first control unit (11) and a second control unit. Thereby, the second potential is capable of accelerating the plurality of charged particle beams with respect to the first potential, and the third potential is capable of decelerating the plurality of charged particle beams with respect to the second potential.

Abstract: The present invention relates to a focusing lens, a charged particle beam device, and a method for focusing a charged particle beam onto a specimen, wherein the focusing lens comprises an auxiliary electrode having an essentially planar electrode surface for focusing the charged particle beam at a tilted landing angle, wherein the essentially planar electrode surface includes an auxiliary electrode angle with the optical axis of the focusing lens that is smaller than 80 degrees. With such a focusing lens, it is possible to operate a charged particle beam device at a tilted landing angle where focusing field distortions, caused by the tilted landing angle, are reduced.

Abstract: A particle beam apparatus includes a source for providing a primary particle beam along a primary beam axis, an objective lens for focussing the primary particle beam onto a specimen so as to release particles therefrom, and a detection system for image generation. The objective lens includes an immersion lens for decelerating the primary particle. The detection system includes a converter with a conversion area to convert the released accelerated particles into secondary particles, an electrode for influencing the converted secondary particles and at least one detector for detecting the converted secondary particles. The detection system is arranged in front of the immersion lens. The converter and the electrode control the converted secondary particles so as to prevent the converted secondary particles released at a specific part of the conversion area from reaching the detector.

Abstract: A particle beam apparatus with a source for generating a primary particle beam, means for focussing the primary particle beam onto a specimen, a detection system for detecting particles released at the specimen, first means to accelerate the primary particle beam to a first energy, first means to decelerate the primary particle beam before the detection system from the first energy to a second lower energy, second means to accelerate the primary particle beam after the detection system from the second energy to a third higher energy and second means to decelerate the primary particle beam from the third energy to a final beam energy. The detection system further comprises a converter to convert particles released at the specimen into converted secondary particles which will be detected by the detector.

Abstract: A particle beam apparatus with a source for generating a primary particle beam, means for focussing the primary particle beam onto a specimen, a detection system for detecting particles released at the specimen, first means to accelerate the primary particle beam to a first energy, first means to decelerate the primary particle beam before the detection system from the first energy to a second lower energy, second means to accelerate the primary particle beam after the detection system from the second energy to a third higher energy and second means to decelerate the primary particle beam from the third energy to a final beam energy. The detection system further comprises a converter to convert particles released at the specimen into converted secondary particles which will be detected by the detector.

Abstract: A scanning particle mirror microscope and a method for imaging the surface of a specimen. The scanning particle mirror microscope includes a source for generating a primary particle beam, at least one lens arrangement for focussing the primary particle beam, a scan deflection system in order to deflect the primary particle beam over the specimen, and a detector for detecting particles. Furthermore, means are provided for generating a retarding field above the specimen, wherein the retarding field is adapted in that at least a part of the primary particle beam is reflected before it reaches the specimen and at least some of the reflected particles reach the detector. The scan deflection system is disposed really or virtually in the front focal plane of the lens arrangement.

Abstract: A deflection arrangement for separating two parties beams has an electrostatic deflector and a magnetic deflector having a common optical axis and generating crossed electrostatic and magnetic deflection fields, wherein the two particle beams pass the deflection arrangements from opposite sides. The two deflectors are adapted to deflect one of the two beams achromatically by an angle s and the ocher beam by an angle &bgr;≧3&agr; with respect to its angle of incidence, respectively.

Abstract: A system for inspecting and/or processing a sample on a stage with a probe or imaging apparatus, the probe or imaging apparatus is defined by an optical column having beam generating means and means to deflect the beam, the position of the stage relatively to the probe or imaging apparatus being controlled by position control means. The position control means comprises gyroscopic means fixed to the stage and/or the probe or imaging apparatus and is operatively connected with the deflection means in order to compensate unintentional movements of the stage relatively to the column.

Abstract: A device for reducing the energy width of a particle beam with a 1st and a 2nd Wien filter for dispersing the particle beam depending on the energy of the particles, and an aperture for selecting the particles within a certain reduced energy width. The device has the same functionality as one single Wien filter having the source of the particle beam at its center. Another aspect is a particle beam system with such a device for reducing the energy width of the particle beam.

Abstract: A method and a system for testing an electrical component in a non-contact manner at high speed with high reliability. The method includes the steps of positioning a primary particle beam onto the component, supplying an AC-signal to the electrode being positioned in front of the component and varying the frequency of the AC-signal, detecting secondary particles released at the component and penetrating the electrode to form a secondary particle signal, and evaluating the corresponding secondary particle signal.

Abstract: A method and an apparatus for surface imaging, whereby the surface of a specimen is scanned by a primary particle beam and the secondary and/or backscattered particles released at the surface are detected by a detector. The surface imaging apparatus includes a charge electrode in the region of the surface to be imaged which are supplied with a variable voltage in order to establish a constant surface potential on the specimen. The variable voltage is produced with use of an output voltage of the detector and is registered in synchronism with the position of the primary particle beam for generating an image of the surface.

Abstract: The invention relates to a corpuscular beam device with an objective lens for focussing a primary particle beam onto a specimen and a detector for detecting secondary and/or backscattered particles released at the specimen. Furthermore, there is a sieve electrode arranged above the specimen which has a central hole for the primary particle beam and a plurality of additional holes for the secondary and/or backscattered particles.

Abstract: The invention relates to a particle beam apparatus with a source for generating a primary particle beam, means for focussing the primary particle beam onto a specimen, means for decelerating back-scattered and/or secondary electrons released at the specimen, said detecting means being located between said source and said focussing means, means for accelerating the primary particle beam from a first energy to a second higher energy and means for decelerating the primary particle beam to a final beam energy. Furthermore, there are provided first additional means to decelerate the primary particle beam shortly before the detecting means and second additional means to accelerate the primary particle beam immediately after the detecting means.

Abstract: The invention relates to a particle beam system having a source for generating a particle beam, means for focussing the particle beam onto a specimen, means for correcting the chromatic aberration, means for detecting a signal generated by the particle beam, means for processing the data of the detecting means to generate an image of the specimen, the processing means being adapted to combine at least a first image of the specimen that is chromatically corrected in a first direction and a second image of the specimen that is corrected in a second direction to generate a chromatically corrected image in both directions. The means for correcting the chromatic aberration are adapted to correct the chromatic aberration in one direction and there are means for rotating the specimen from a first orientation in which the first image is taken to a second orientation in which the second image is taken.

Abstract: The invention relates to a particle beam apparatus, comprising

Abstract: The invention relates to a charged particle beam device and a method for inspecting a specimen, comprising a source for generating a charged particle beam, an objective lens with an optical axis for focussing said charged particle beam on a specimen, which consists of a magnetic lens and a superimposed electrostatic lens having at least two electrodes, deflection means for deflecting said charged particle beam on said specimen and detector means for detecting charged particles released at said specimen. The invention is further characterized by control means co-acting with said deflection means and one of the electrodes of the electrostatic lens for applying a dynamic voltage to said electrode, the amount of the voltage being dependent on the distance of said charged particle beam from said optical axis at the specimen, in order to increase the efficiency of detecting said charged particles released at image areas being located on the specimen with distance from the optical axis.

Abstract: Apparatus for particle beam induced modification of a specimen, comprising a source for generating a particle beam, nozzles for supplying a gas in the region of the specimen, and electrodes which can be supplied with a variable voltage. Said electrodes are forming a tube and the nozzles, being integrated in the electrodes, are leading into the tube.

Abstract: An electron beam lens has a magnetic lens provided with first and second pole pieces for influencing an electron beam and forming a magnetic field between the two pole pieces. A third pole piece is provided, but is not in magnetic contact with the two other pole pieces. The third pole piece is immersed in the magnetic field formed between the first and second pole pieces and extracts a part of such magnetic field. Also disclosed is a cathode lens and an electron beam device for use with such an electron beam lens.

Abstract: The invention relates to an objective lens for influencing a particle beam, particularly an electron beam with a magnetic single-pole lens and an electrostatic lens having a first and a second electrode which can be supplied with different potentials. The objective lens is characterized in that the electrostatic lens is disposed after the magnetic single-pole lens in the direction of the particle beam.