Patents by Inventor Jurgen Leib

Jurgen Leib has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 10954591
    Abstract: The invention relates to a method for producing a structured coating on a substrate, wherein the method comprises the following steps: providing a substrate having a surface to be coated and producing a structured coating on the surface of the substrate to be coated by depositing at least one evaporation coating material, namely aluminium oxide, silicon dioxide, silicon nitride, or titanium dioxide, on the surface of the substrate to be coated by means of thermal evaporation of the at least one evaporation coating material and using additive structuring. The invention further relates to a coated substrate and a semi-finished product having a coated substrate.
    Type: Grant
    Filed: July 22, 2010
    Date of Patent: March 23, 2021
    Assignee: MSG LITHOGLAS AG
    Inventors: Jürgen Leib, Ulli Hansen, Simon Maus
  • Patent number: 8966748
    Abstract: The invention relates to a method for manufacturing an arrangement with a component on a carrier substrate, wherein the method encompasses the following steps: Manufacturing spacer elements on the rear side of a cover substrate, arranging a component on a cover surface of a carrier substrate, and arranging the spacer elements formed on the carrier substrate so as to situate the component in the at least one hollow space and close the latter. In addition, the invention relates to an arrangement, a method for manufacturing a semi-finished product for a component arrangement, as well as a semi-finished product for a component arrangement.
    Type: Grant
    Filed: September 24, 2010
    Date of Patent: March 3, 2015
    Assignee: MSG Lithoglas AG
    Inventors: Jürgen Leib, Simon Maus, Ulli Hansen
  • Patent number: 8742588
    Abstract: The present invention provides a method of forming a via hole (9), or a via (7), from a lower side (5) of a substrate (3) for electronic devices towards an upper side (4) of a substrate (3) at least partly through the substrate (3). The method comprises the steps of: etching a first lengthwise portion (11) of the via hole (9) and etching a second lengthwise portion (12) of the via hole (9); whereby the first lengthwise portion (11) and the second lengthwise portion (12) substantially form the via hole (9) and a constriction (23) is formed in the via hole (9). The constriction (23) defines an aperture (24) of the via hole (9) and the method further comprises the step of opening the via hole (9) by etching, with the constriction (23) functioning as an etch mask. A via is formed by at least partly filling the via hole with conductive material. A substrate for electronic devices comprising a via is also provided.
    Type: Grant
    Filed: October 15, 2009
    Date of Patent: June 3, 2014
    Assignee: ÅAC Microtec AB
    Inventors: Peter Nilsson, Jürgen Leib, Robert Thorslund
  • Patent number: 8659206
    Abstract: The invention relates to a method for producing a dielectric layer (3) in an electroacoustic component (1), in particular a component operating with acoustic surface waves or bulk acoustic waves, comprising a substrate and an associated electrode structure, in which the dielectric layer (3) is formed at least in part by depositing by a thermal vapor deposition process at least one evaporation material selected from the following group of layer vaporising materials: vapor deposition glass material such as borosilicate glass, silicon nitride and aluminum oxide. The invention further relates to an electroacoustic component.
    Type: Grant
    Filed: July 23, 2009
    Date of Patent: February 25, 2014
    Assignee: MSG Lithoglas AG
    Inventors: Ulli Hansen, Jürgen Leib, Simon Maus
  • Patent number: 8349707
    Abstract: A process for producing electrical contact connections for a component integrated in a substrate material is provided, the substrate material having a first surface region, and at least one terminal contact being arranged at least partially in the first surface region for each component, which is distinguished in particular by application of a covering to the first surface region and production of at least one contact passage which, in the substrate material, runs transversely with respect to the first surface region, in which process, in order to form at least one contact location in a second surface region which is to be provided, at least one electrical contact connection from the contact location to at least one of the terminal contacts is produced via the respective contact passages.
    Type: Grant
    Filed: September 30, 2010
    Date of Patent: January 8, 2013
    Assignee: Wafer-Level Packaging Portfolio LLC
    Inventors: Dipl.-Ing. Florian Bieck, Jürgen Leib
  • Publication number: 20120314393
    Abstract: The invention relates to a method for manufacturing an arrangement with a component on a carrier substrate, wherein the method encompasses the following steps: Manufacturing spacer elements on the rear side of a cover substrate, arranging a component on a cover surface of a carrier substrate, and arranging the spacer elements formed on the carrier substrate so as to situate the component in the at least one hollow space and close the latter. In addition, the invention relates to an arrangement, a method for manufacturing a semi-finished product for a component arrangement, as well as a semi-finished product for a component arrangement.
    Type: Application
    Filed: September 24, 2010
    Publication date: December 13, 2012
    Applicant: MSG LITHOGLAS AG
    Inventors: Jürgen Leib, Simon Maus, Ulli Hansen
  • Patent number: 8273671
    Abstract: A glass material for producing insulation layers is provided. The glass material can improve the radio-frequency properties of radio-frequency substrates or radio-frequency conductor arrangements. In one embodiment, the glass material for producing insulation layers for radio-frequency substrates or radio-frequency conductor arrangements is an applied layer with a layer thickness in the range between 0.05 ?m and 5?mm and has a loss factor tan ? of less than or equal to 70*10?4 in at least a frequency range above 1 GHz.
    Type: Grant
    Filed: May 23, 2003
    Date of Patent: September 25, 2012
    Assignee: Schott AG
    Inventors: Jürgen Leib, Dietrich Mund
  • Publication number: 20120231212
    Abstract: The invention relates to a method for producing a structured coating on a substrate, wherein the method comprises the following steps: providing a substrate having a surface to be coated and producing a structured coating on the surface of the substrate to be coated by depositing at least one evaporation coating material, namely aluminium oxide, silicon dioxide, silicon nitride, or titanium dioxide, on the surface of the substrate to be coated by means of thermal evaporation of the at least one evaporation coating material and using additive structuring. The invention further relates to a coated substrate and a semi-finished product having a coated substrate.
    Type: Application
    Filed: July 22, 2010
    Publication date: September 13, 2012
    Inventors: Jürgen Leib, Ulli Hansen, Simon Maus
  • Patent number: 8114304
    Abstract: In order to achieve an integration of functional structures into the housing of electronic components, provision is made of a method for producing an electronic component comprising at least one semiconductor element having at least one sensor-technologically active and/or emitting device on at least one side, the method comprising the following steps: provision of at least one die on a wafer, production of at least one patterned support having at least one structure which is functional for the sensor-technologically active and/or emitting device, joining together of the wafer with the at least one support, so that that side of the die which has the sensor-technologically active and/or emitting device faces the support, separation of the die.
    Type: Grant
    Filed: November 22, 2006
    Date of Patent: February 14, 2012
    Assignee: Wafer-Level Packaging Portfolio LLC
    Inventors: Jürgen Leib, Florian Bieck
  • Publication number: 20110201197
    Abstract: The present invention provides a method of forming a via hole (9), or a via (7), from a lower side (5) of a substrate (3) for electronic devices towards an upper side (4) of a substrate (3) at least partly through the substrate (3). The method comprises the steps of: etching a first lengthwise portion (1 1) of the via hole (9) and etching a second lengthwise portion (12) of the via hole (9); whereby the first lengthwise portion (11) and the second lengthwise portion (12) substantially form the via hole (9) and a constriction (23) is formed in the via hole (9). The constriction (23) defines an aperture (24) of the via hole (9) and the method further comprises the step of opening the via hole (9) by etching, with the constriction (23) functioning as an etch mask. A via is formed by at least partly filling the via hole with conductive material. A substrate for electronic devices comprising a via is also provided.
    Type: Application
    Filed: October 15, 2009
    Publication date: August 18, 2011
    Inventors: Peter Nilsson, Jürgen Leib, Robert Thorslund
  • Publication number: 20110175487
    Abstract: The invention relates to a method for producing a dielectric layer (3) in an electroacoustic component (1), in particular a component operating with acoustic surface waves or bulk acoustic waves, comprising a substrate and an associated electrode structure, in which the dielectric layer (3) is formed at least in part by depositing by a thermal vapour deposition process at least one evaporation material selected from the following group of layer vaporising materials: vapour deposition glass material such as borosilicate glass, silicon nitride and aluminium oxide. The invention further relates to an electroacoustic component.
    Type: Application
    Filed: July 23, 2009
    Publication date: July 21, 2011
    Inventors: Ulli Hansen, Jürgen Leib, Simon Maus
  • Patent number: 7880179
    Abstract: A process for producing electrical contact connections for a component integrated in a substrate material is provided, the substrate material having a first surface region, and at least one terminal contact being arranged at least partially in the first surface region for each component, which is distinguished in particular by application of a covering to the first surface region and production of at least one contact passage which, in the substrate material, runs transversely with respect to the first surface region, in which process, in order to form at least one contact location in a second surface region which is to be provided, at least one electrical contact connection from the contact location to at least one of the terminal contacts is produced via the respective contact passages.
    Type: Grant
    Filed: November 20, 2009
    Date of Patent: February 1, 2011
    Assignee: Wafer-Level Packaging Portfolio LLC
    Inventors: Dipl.-Ing. Florian Bieck, Jürgen Leib
  • Publication number: 20110021002
    Abstract: A process for producing electrical contact connections for a component integrated in a substrate material is provided, the substrate material having a first surface region, and at least one terminal contact being arranged at least partially in the first surface region for each component, which is distinguished in particular by application of a covering to the first surface region and production of at least one contact passage which, in the substrate material, runs transversely with respect to the first surface region, in which process, in order to form at least one contact location in a second surface region which is to be provided, at least one electrical contact connection from the contact location to at least one of the terminal contacts is produced via the respective contact passages.
    Type: Application
    Filed: September 30, 2010
    Publication date: January 27, 2011
    Inventors: Dipl.-Ing. Florian Bieck, Jürgen Leib
  • Patent number: 7863200
    Abstract: A process to encapsulate electronic modules in a manner which is substantially resistant to water diffusion yet is carried out at moderate temperatures below 300° C., preferably below 150° C. is provided. The process forms a housing for electronic modules, in particular sensors, integrated circuits and optoelectronic components. The process includes the steps of: providing a substrate, of which at least a first substrate side is to be encapsulated; providing a vapor-deposition glass source; arranging the first substrate side in such a manner with respect to the vapor-deposition glass source that the first substrate side can be vapor-coated; and vapor-coating the first substrate side with a glass layer.
    Type: Grant
    Filed: April 15, 2003
    Date of Patent: January 4, 2011
    Assignee: Schott AG
    Inventors: Jürgen Leib, Dietrich Mund
  • Patent number: 7825029
    Abstract: A method for the patterned coating of a substrate with at least one surface is provided. The method is suitable for the rapid and inexpensive production of precise patterns. The method includes the steps of: producing at least one negatively patterned first coating on the at least one surface, depositing at least one second layer, which includes a material with a vitreous structure, on the surface, and at least partially removing the first coating.
    Type: Grant
    Filed: April 15, 2003
    Date of Patent: November 2, 2010
    Assignee: Schott AG
    Inventors: Jurgen Leib, Florian Bieck, Dietrich Mund
  • Patent number: 7821106
    Abstract: A process for producing electrical contact connections for a component integrated in a substrate material is provided, the substrate material having a first surface region, and at least one terminal contact being arranged at least partially in the first surface region for each component, which is distinguished in particular by application of a covering to the first surface region and production of at least one contact passage which, in the substrate material, runs transversely with respect to the first surface region, in which process, in order to form at least one contact location in a second surface region which is to be provided, at least one electrical contact connection from the contact location to at least one of the terminal contacts is produced via the respective contact passages.
    Type: Grant
    Filed: March 4, 2008
    Date of Patent: October 26, 2010
    Assignee: Schott AG
    Inventors: Florian Bieck, Jürgen Leib
  • Patent number: 7786002
    Abstract: The invention provides a process for producing a substrate having a conductor arrangement that is suitable for radio-frequency applications, with improved radio-frequency properties. For this purpose, the process includes the steps of: depositing a structured glass layer having at least one opening over a contact-connection region by evaporation coating on the substrate and applying at least one conductor structure to the structured glass layer so that the at least one conductor has electrical contact with the contact-connection region.
    Type: Grant
    Filed: May 23, 2003
    Date of Patent: August 31, 2010
    Assignee: Schott AG
    Inventors: Jürgen Leib, Dietrich Mund
  • Publication number: 20100130246
    Abstract: The invention generally concerns optical systems and, in particular, a method and device for joining at least one first and one second optical element to an optical composite element, as well as an optical composite element itself. In order to produce optical systems having at least two optical elements more easily and more economically, the invention provides a method for joining at least one first and one second optical element, in which the first optical element contains a first glass or a crystalline material, the second optical element contains a second glass, and the first glass or the crystalline material has a transformation temperature Tg1 or a melting temperature that differs from the transformation temperature Tg2 of the second glass, and at least the glass of the second optical element is heated and brought into contact with the glass or with the crystalline material of the first optical element.
    Type: Application
    Filed: August 5, 2005
    Publication date: May 27, 2010
    Applicant: SCHOTT AG
    Inventors: Ralf Biertümpfel, Piotr Rosanka, Ulrike Stöhr, Bernd Wölfing, Wolfgang Semar, Jürgen Leib
  • Patent number: 7700957
    Abstract: The invention proposes a process for producing electrical contact connections for at least one component which is integrated in a substrate material, the substrate material having a first surface region, and at least one terminal contact being arranged at least partially in the first surface region for each component, which is distinguished in particular by application of a covering to the first surface region and production of at least one contact passage which, in the substrate material, runs transversely with respect to the first surface region, in which process, in order to form at least one contact location in a second surface region which is to be provided, at least one electrical contact connection from the contact location to at least one of the terminal contacts is produced via the respective contact passages.
    Type: Grant
    Filed: September 22, 2004
    Date of Patent: April 20, 2010
    Assignee: Schott AG
    Inventors: Florian Bieck, Jürgen Leib
  • Publication number: 20100065883
    Abstract: A process for producing electrical contact connections for a component integrated in a substrate material is provided, the substrate material having a first surface region, and at least one terminal contact being arranged at least partially in the first surface region for each component, which is distinguished in particular by application of a covering to the first surface region and production of at least one contact passage which, in the substrate material, runs transversely with respect to the first surface region, in which process, in order to form at least one contact location in a second surface region which is to be provided, at least one electrical contact connection from the contact location to at least one of the terminal contacts is produced via the respective contact passages.
    Type: Application
    Filed: November 20, 2009
    Publication date: March 18, 2010
    Inventors: Dipl.-Ing. Florian Bieck, Jurgen Leib