Patents by Inventor Jy-An Wang
Jy-An Wang has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 7097778Abstract: A process for fabricating a micro-optical lens comprises forming a wall post structure on a substrate, coating with a polymeric film on the wall post, then making it adhering over both sides of the wall post structure by a transverse etching on the substrate around the base of posts. After an isolating process and a proper heating treatment, said polymeric film cohering to form a plano-convex lens. By controlling the respective amount of the polymeric film on both sides of said wall post structure, the polymeric film can combine with the wall post structure to form a composite material biconvex micro-lens, plano-convex micro-lens and the like. Alternatively, a single material micro-lens can be formed by imaging the profile of the polymeric micro-lens on the wall post structure via an etching process.Type: GrantFiled: April 28, 2004Date of Patent: August 29, 2006Assignee: Chunghwa Telecom Co., Ltd.Inventors: Chong-Long Ho, Wen-Jeng Ho, Jy-Wang Liaw
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Publication number: 20060182710Abstract: An amphiphilic block copolymer and a pharmaceutical formulation comprising the same. The amphiphilic block copolymer comprises a poly(lactide) as a hydrophobic block and a poly(oxazoline) as a hydrophilic block.Type: ApplicationFiled: December 22, 2005Publication date: August 17, 2006Inventors: Ging-Ho Hsiue, Chau-Hui Wang, Wen-Hsiang Chang, Chin-I Lin, Shian-Jy Wang
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Publication number: 20060140865Abstract: A nano-micelle carrier used in near infrared image detection. The carrier includes a nano-micelle comprising a plurality of block copolymers having critical micelle concentration (CMC) and a near infrared dye grafted onto the micelle surface, wherein the carrier has a hydrophobic interior and a hydrophilic surface. The invention also provides a method of detecting a near infrared image.Type: ApplicationFiled: December 27, 2005Publication date: June 29, 2006Inventors: Wen Chang, Chao-Hung Kao, Chi-Min Chau, Chin-I Lin, Shian-Jy Wang
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Publication number: 20060141149Abstract: A method for forming a superparamagnetic nanoparticle. The method includes providing an aqueous solution comprising Fe2+ and Fe3+ ions and adding alkali to the aqueous solution. An iron oxide nanoparticle is formed by subjecting the aqueous solution to ultrasonic vibration and collected.Type: ApplicationFiled: April 8, 2005Publication date: June 29, 2006Inventors: Ming-Yao Chen, Wen-Hsiang Chang, Chin-I Lin, Shian-Jy Wang, Yuh-Jiuan Lin
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Publication number: 20050242056Abstract: A process for fabricating a micro-optical lens comprises forming a wall post structure on a substrate, coating with a high molecular weight polymeric film on the wall post, then making it adhering over both sides of the wall post structure by a transverse etching on the substrate around the base of posts. After an isolating process and a proper heating treatment, said high molecular weight polymeric film cohering to form a plano-convex lens. By controlling the respective amount of the high molecular weight polymeric film on both sides of said wall post structure, the high molecular weight polymeric film can combine with the wall post structure to form a composite material biconvex micro-lens, plano-convex micro-lens and the like. Alternatively, a single material micro-lens can be formed by imaging the profile of the high molecular weight polymeric micro-lens on the wall post structure via an etching process.Type: ApplicationFiled: April 28, 2004Publication date: November 3, 2005Inventors: Chong-Long Ho, Wen-Jeng Ho, Jy-Wang Liaw
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Publication number: 20050032997Abstract: A resin with low polydispersity index and a process for preparing the same. The process includes polymerizing at least one monomer with an initiator and a chain transfer reagent, wherein the monomer is an acrylate monomer having at least one ethylenically unsaturated bonds or norbornene derivatives. Furthermore, a photoresist composition containing the resin composition according to the present invention can increase pattern resolution in lithography process.Type: ApplicationFiled: November 14, 2003Publication date: February 10, 2005Inventors: Ting-Yu Lee, Choa-Ying Yu, Meei-Yu Hsu, Shian-Jy Wang, Ching Ting, Kuo-Chen Shih
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Patent number: 6808957Abstract: An edge-coupled photodetector, especially a compound semiconductor edge-coupled photodetectors, has a light funnel integrated right in front of the coupling aperture for enhancing the optical coupling efficiency. The light funnel is formed utilizing either a wet etched, crystallographically defined semiconductor slope or a dry etched, resist-profile-defined semiconductor slope covered by the planarized dielectrics. The funnel internals can be partially or fully metallized for total mirror reflection. The lightwave entering the funnel and propagating along the optical axis converges through mirror reflection or total internal reflection. Through such an invention, the edge-coupled photodetector can have both high operation speed and high quantum efficiency with enlarged alignment tolerance.Type: GrantFiled: July 31, 2003Date of Patent: October 26, 2004Assignee: Chunghwa Telecom Co., Ltd.Inventors: Chong-Long Ho, Gong-Cheng Lin, I-Ming Liu, Chia-Ju Lin, Yao-Shing Chen, Wen-Jeng Ho, Jy-Wang Liaw
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Patent number: 6588283Abstract: A method for determining fracture toughness KIC of materials ranging from metallic alloys, brittle ceramics and their composites, and weldments. A cylindrical specimen having a helical V-groove with a 45° pitch is subjected to pure torsion. This loading configuration creates a uniform tensile-stress crack-opening mode, and a transverse plane-strain state along the helical groove. The full length of the spiral groove is equivalent to the thickness of a conventional compact-type specimen. KIC values are determined from the fracture torque and crack length measured from the test specimen using a 3-D finite element program (TOR3D-KIC) developed for the purpose. In addition, a mixed mode (combined tensile and shear stress mode) fracture toughness value can be determined by varying the pitch of the helical groove. Since the key information needed for determining the KIC value is condensed in the vicinity of the crack tip, the specimen can be significantly miniaturized without the loss of generality.Type: GrantFiled: June 25, 2001Date of Patent: July 8, 2003Assignee: UT-Battelle, LLCInventors: Jy-An Wang, Kenneth C. Liu
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Publication number: 20030024323Abstract: A method for determining fracture toughness KIC of materials ranging from metallic alloys, brittle ceramics and their composites, and weldments. A cylindrical specimen having a helical V-groove with a 45° pitch is subjected to pure torsion. This loading configuration creates a uniform tensile-stress crack-opening mode, and a transverse plane-strain state along the helical groove. The full length of the spiral groove is equivalent to the thickness of a conventional compact-type specimen. KIC values are determined from the fracture torque and crack length measured from the test specimen using a 3-D finite element program (TOR3D-KIC) developed for the purpose. In addition, a mixed mode (combined tensile and shear stress mode) fracture toughness value can be determined by varying the pitch of the helical groove. Since the key information needed for determining the KIC value is condensed in the vicinity of the crack tip, the specimen can be significantly miniaturized without the loss of generality.Type: ApplicationFiled: June 25, 2001Publication date: February 6, 2003Inventors: Jy-An Wang, Kenneth C. Liu
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Patent number: 6503770Abstract: A self-aligned fabrication method utilizes dielectric planarization process for fabricating ridge waveguide semiconductor lasers. The dielectric planarization process starts with depositing a thick dielectric film onto the ridge-structured semiconductor wafer surface, and then the resulting corrugated dielectric surface is polished into a flat surface in a self-terminated manner. This dielectric flat surface is able to uniformly expose its semiconductor ridge tops by an overall etch-back process.Type: GrantFiled: May 7, 2002Date of Patent: January 7, 2003Assignee: Chunghwa Telecom Co., Ltd.Inventors: Chong-Long Ho, Chia-Ju Lin, Wen-Jeng Ho, Jy-Wang Liaw
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Patent number: 6297392Abstract: A novel Group IV elements-bridged metallocene complex is disclosed which is represented by the following formula (I): wherein R and R1 are different and are independently selected from the group consisting of &eegr;5-cyclopentadienyl group, substituted &eegr;5-cyclopentadienyl group, indenyl group, and fluorenyl group; R2 is selected from the group consisting of —N(CH3)2, —N(C2H5)2, halogen, alkoxy, —(C═O)NH2, and C6-12 hydrocarbyl group; M is a Group IVA element; and M1 is a Group IVB metal. When employing the metallocene complex to prepare olefin polymers, since it is bridged by a Group IV element, there are two catalytic sites in the single metallocene complex catalyst. Therefore, the olefin monomers can be polymerized to a bimodal olefin polymer by a single catalyst in a single reactor, resulting in lowered capital costs.Type: GrantFiled: June 23, 1997Date of Patent: October 2, 2001Assignee: Industrial Technology Research InstituteInventors: Jing C. Tsai, Kuang-Kai Liu, Shu-Hwa Chan, Shian-Jy Wang, Mu-Jen Young
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Patent number: 6211106Abstract: A catalyst composition for preparing high-syndiotacticity polystyrene polymers which comprises: (a) a titanium complex represented by the following formula of TiR′1R′2R′3R′4 or TiR′1R′2R′3, wherein R′1, R′2, R′3, and R′4 are, independently, an alkyl group, an aryl group, an alkoxy group, an aryloxy group, an amino group, a hydrogen atom, or a halogen atom; (b) a cyclopentadienyl complex represented by the following formula: wherein R1-R13 are, independently, alkyl group, aryl group, silyl group, halogen atom, or hydrogen atom; Ra and Rb are, independently, alkyl group, aryl group, alkoxy, aryloxy group, cyclopentadienyl group, hydrogen atom, or halogen atom; and Xa is a Group IIA element and Xb is a Group IIIA element.Type: GrantFiled: June 18, 1998Date of Patent: April 3, 2001Assignee: Industrial Technology Research InstituteInventors: Jing-Cherng Tsai, Yi-Chun Chen, Sheng Te Yang, Meei-Hwa Wang, Shian-Jy Wang
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Patent number: 6150529Abstract: A novel organometallic compound is disclosed which can be used, in conjunction with a trialkyl or bialkyl aluminum cocatalyst, for catalyzing the polymerization and copolymerization of ethylene without requiring the use of either methyl aluminoxane or borate as cocatalyst. The organometallic compound is represented by the formula of (C.sub.5 R.sub.n H.sub.5-n)(L)MX.sub.a Y.sub.b ; wherein: (a) C.sub.5 R.sub.n H.sub.5-n is a substituted or unsubstituted cyclopentadienyl group, in which n is an integer between 0 and 5, and R is C.sub.1 to C.sub.6 alkyl group; (b) L is tetrapyrazolyl borate, hydrotrispyrazolyl borate, dihydrobispyrazolyl borate or hydrotris(3,5-dimethylpyrazolyl) borate; (c) M is a Group IIIB, Grcup IVB, or Group VB transitional metal; (d) a and b are integers such that a+b=m-2, where m is the valance of M; and (e) X and Y, which can be the same of different from each other, are halogen atoms or ligands represented by the formula of ER.sup.1 or ER.sup.1 R.sup.Type: GrantFiled: February 12, 1999Date of Patent: November 21, 2000Assignee: Industrial Technology Research InstituteInventors: Shian-Jy Wang, Yi-Chun Chen, Shu-Hua Chan, Jing-Cherng Tsai, Ching Ting
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Patent number: 5914375Abstract: An catalyst composition for preparing high-syndiotacticity polystyrene polymers which comprises: (a) a titanium complex represented by the following formula of TiR'.sub.1 R'.sub.2 R'.sub.3 R'.sub.4 or TiR'.sub.1 R'.sub.2 R'.sub.3, wherein R'.sub.1, R'.sub.2, R'.sub.3, and R'.sub.4 are, independently, an alkyl group, an aryl group, an alkoxy group, an aryloxy group, an amino group, a hydrogen atom, or a halogen atom; (b) a cyclopentadienyl complex of silicon (Si), germanium (Ge), or tin (Sn) represented by the following formula: ##STR1## wherein R.sub.1, R.sub.2, R.sub.3, R.sub.4 and R.sub.Type: GrantFiled: August 4, 1997Date of Patent: June 22, 1999Assignee: Industrial Technology Research InstituteInventors: Jing-Cheng Cheng Tsai, Shian-Jy Wang, Shu-Ling Peng, Mickey Sue
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Patent number: 5891816Abstract: A novel organometallic compound is disclosed which can be used, in conjunction with a trialkyl or bialkyl aluminum cocatalyst, for catalyzing the polymerization and copolymerization of ethylene without requiring the use of either methyl aluminoxane or borate as cocatalyst. The organometallic compound is represented by the formula of (CR.sub.5 R.sub.n H.sub.5-n)(L)MX.sub.a Y.sub.b ; wherein: (a) C.sub.5 R.sub.n H.sub.5-n is a substituted or unsubstituted cyclopentadienyl group, in which n is an integer between 0 and 5, and R is C.sub.1 to C.sub.6 alkyl group; (b) L is tetrapyrazolyl borate, hydrotrispyrazolyl borate, dihydrobispyrazolyl borate or hydrotris(3,5-dimethylpyrazolyl) borate; (c) M is a Group IIIB, Group IVB, or Group VB transitional metal; (d) a and b are integers such that a+b=m-2, where m is the valance of M; and (e) X and Y, which can be the same of different from each other, are halogen atoms or ligands represented by the formula of ER.sup.1, where E is a Group VA or VIA element, and R.sup.Type: GrantFiled: July 21, 1997Date of Patent: April 6, 1999Assignee: Industrial Technology Research InstituteInventors: Shian-Jy Wang, Yi-Chun Chen, Shu-Hua Chan, Jing-Cherng Tsai, Ching Ting
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Patent number: 5756610Abstract: A novel titanium (III)-based .beta.-diketonate-coordinated compound is disclosed for catalyzing the polymerization reaction of syndiotactic polystyrenes. The titanium (III)-based compound is represented by the following formula 1: ##STR1## wherein X is a C.sub.1 .about.C.sub.12 alkoxy or amine group, or a halogen atom; R is a C.sub.1 .about.C.sub.12 alkyl, aryl, or alkylsilane group. Preferably, X is N(SiMe.sub.3).sub.2 -- or OMe--, and R is phenyl, methyl, or t-butyl. The titanium (III)-based compounds are prepared by reacting titanium trichloride with diketone and tetrahydrofuran to form an intermediate product, then reacting the intermediate product Ti(AcAc)Cl.sub.2 (THF).sub.2 with either aminosilane or alcohol.Type: GrantFiled: January 10, 1997Date of Patent: May 26, 1998Assignee: Industrail Technoloy Research InstituteInventors: Jing-Chemg Tsai, Kuang Kai Liu, Shu-Ling Peng, Shian-Jy Wang
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Patent number: 5684098Abstract: A novel organometallic compound is disclosed which can be used, in conjunction with a trialkyl or bialkyl aluminum cocatalyst, for catalyzing the polymerization and copolymerization of ethylene without requiring the use of either methyl aluminoxane or borate as cocatalyst. The organometallic compound is represented by the formula of (C.sub.5 R.sub.n H.sub.5-n)(L)MX.sub.a Y.sub.b ; wherein: (a) C.sub.5 R.sub.n H.sub.5-n is a substituted or unsubstituted cyclopentadienyl group, in which n is an integer between 0 and 5, and R is C.sub.1 to C.sub.6 alkyl group; (b) L is tetrapyrazolyl borate, hydrotrispyrazolyl borate, dihydrobispyrazolyl borate or hydrotris(3,5-dimethylpyrazolyl) borate; (c) M is a Group IIIB, Group IVB, or Group VB transitional metal; (d) a and b are integers such that a+b=m-2, where m is the valance of M; and (e) X and Y, which can be the same of different from each other, are halogen atoms or ligands represented by the formula of ER.sup.1, where E is a Group VA or VIA element, and R.sup.Type: GrantFiled: February 15, 1996Date of Patent: November 4, 1997Assignee: Industrial Technology Research InstituteInventors: Shian-Jy Wang, Yi-Chun Chen, Shu-Hua Chan, Jing-Cheing Tsai, Ching Ting
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Patent number: 5644009Abstract: An catalyst composition for preparing high-syndiotacticity polystyrene polymers which comprises: (a) a titanium complex represented by the following formula of TiR'.sub.1 R'.sub.2 R'.sub.3 R'.sub.4 or TiR'.sub.1 R'.sub.2 R'.sub.3, wherein R'.sub.1, R'.sub.2, R'.sub.3, and R'.sub.4 are, independently, an alkyl group, an aryl group, an alkoxy group, an aryloxy group, an amino group, a hydrogen atom, or a halogen atom; (b) a cyclopentadienyl complex of silicon (Si), germanium (Ge), or tin (Sn) represented by the following formula: ##STR1## wherein R.sub.1, R.sub.2, R.sub.3, and R.sub.Type: GrantFiled: November 27, 1995Date of Patent: July 1, 1997Assignee: Industrial Technology Research InstituteInventors: Jing-Cherng Tsai, Shian-Jy Wang, Shu-Ling Peng, Mickey Sue
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Patent number: 5519099Abstract: A catalyst composition is disclosed for catalyzing the polymerization and copolymerization reactions of ethylene monomers, with or without another olefin monomer. The catalyst composition comprises a metallocene compound represented by the the formula of (C.sub.5 R.sub.n H.sub.5-n)(L)MXY or the formula of (C.sub.5 R.sub.n H.sub.5-n)(L)MX.sup.+ A.sup.- ; wherein: (a) C.sub.5 R.sub.n H.sub.5-n is a substituted or unsubstituted cyclopendadienyl group; (b) L is tetrapyrazolyl borate, hydrotrispyrazolyl borate, dihydrotrispyrazolyl borate or hydrotris-3,5-dimethyl; (c) M is Group IIIB, Group IVB, or Group VB transitional metal; (d) X is a C.sub.1 to C.sub.4 alkyl or alkenyl group, an aromatic group, an alkylaryl, a halogen, a hydrogen, or a silane group; (e) Y, which can the same as or different from X, is a C.sub.1 to C.sub.4 alkyl or alkenyl group, an aromatic group, an alkylaryl, a halogen, a hydrogen, or a silane group; and (f) A.sup.- is non-coordinated or loosely coordinated bulky anion. Examples of the (C.Type: GrantFiled: June 7, 1995Date of Patent: May 21, 1996Assignee: Industrial Technology Research InstituteInventors: Shian-Jy Wang, Yi-Chun Chen, Shu-Hua Chan, Jing-Cherng Tsai, Yu-Hwa E. Sheu
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Patent number: 5473084Abstract: A heterogeneous catalytic chlorination process for making chlorinated aromatic compounds with high para-selectivity. Examples of chlorinated aromatic compounds that can be prepared using the process disclosed in the present invention include those compounds represented by the following formula: ##STR1## wherein R can be a C1-C3 alkyl, floride, chloride, bromide, iodide, or hydroxyl group. The chlorination process utilizes a de-aluminated zeolite which is prepared by H.sub.4 EDTA or Na.sub.4 EDTA extraction of L-type zeolite to reduce the alumina content thereof. The SiO.sub.2 /Al.sub.2 O.sub.3 ratio of the de-aluminated zeolite is preferably between about 9 and about 40. The de-aluminated zeolite can be ion-exchanged with Group IA or IIA metal ions to further improve its para-selectivity.Type: GrantFiled: June 2, 1993Date of Patent: December 5, 1995Assignee: Industrial Technology Research InstituteInventors: Shian-Jy Wang, Po-Yu Chen, Ying-Tse Chuang, Wen-Chyi Lin