Patents by Inventor Jyh HSIEH

Jyh HSIEH has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 11263192
    Abstract: Embodiments of the present invention provide a computer system, a computer program product, and a method that comprises generating a context data tree for each variable in a plurality of variables based on a received input; determining data folding points for each generated context data tree; conducting a hyper-folding process on the determined data folding points in each context data tree, wherein the hyper-folding process converts each generated context data tree into a single data tree; and automatically loading the single data tree into an application.
    Type: Grant
    Filed: November 18, 2019
    Date of Patent: March 1, 2022
    Assignee: International Business Machines Corporation
    Inventors: Chiwen Chang, Hsiang Chang, Ming Jyh Hsieh
  • Publication number: 20210149864
    Abstract: Embodiments of the present invention provide a computer system, a computer program product, and a method that comprises generating a context data tree for each variable in a plurality of variables based on a received input; determining data folding points for each generated context data tree; conducting a hyper-folding process on the determined data folding points in each context data tree, wherein the hyper-folding process converts each generated context data tree into a single data tree; and automatically loading the single data tree into an application.
    Type: Application
    Filed: November 18, 2019
    Publication date: May 20, 2021
    Inventors: Chiwen Chang, Hsiang Chang, Ming Jyh Hsieh
  • Patent number: 10610190
    Abstract: Provided is a portable medical device including a drive motor configured to provide power to move the portable medical device; at least one camera configured to capture an image of a periphery of the portable medical device; an ultrasonic sensor configured to emit an ultrasonic signal to the periphery of the portable medical device and detect the ultrasonic signal reflected from a first obstacle located in the periphery of the portable medical device; a torque sensor configured to detect a torque value of the drive motor; a processor configured to generate information about the first obstacle based on the image captured by the at least one camera and/or the detected ultrasonic signal and calculate an expected movement path of the portable medical device based on the torque value detected by the torque sensor; and a display configured to display a periphery image using the image captured by the at least one camera, the information about the first obstacle, and the expected movement path of the portable medical
    Type: Grant
    Filed: October 11, 2017
    Date of Patent: April 7, 2020
    Assignee: Samsung Electronics Co., Ltd.
    Inventor: Jong-jyh Hsieh
  • Publication number: 20180330818
    Abstract: A method, performed by an electronic device, of providing configuration information related to image scanning to a medical device includes obtaining identification information of the medical device and a list of a plurality of configuration information corresponding to information of an examinee; identifying first configuration information from the list of the plurality of configuration information as recommendation information based on a negative index; and displaying the first configuration information identified as the recommendation information on a display.
    Type: Application
    Filed: May 10, 2018
    Publication date: November 15, 2018
    Applicant: SAMSUNG ELECTRONICS CO., LTD.
    Inventors: Jong-jyh HSIEH, Woong LEE
  • Publication number: 20180110494
    Abstract: Provided is a portable medical device including a drive motor configured to provide power to move the portable medical device; at least one camera configured to capture an image of a periphery of the portable medical device; an ultrasonic sensor configured to emit an ultrasonic signal to the periphery of the portable medical device and detect the ultrasonic signal reflected from a first obstacle located in the periphery of the portable medical device; a torque sensor configured to detect a torque value of the drive motor; a processor configured to generate information about the first obstacle based on the image captured by the at least one camera and/or the detected ultrasonic signal and calculate an expected movement path of the portable medical device based on the torque value detected by the torque sensor; and a display configured to display a periphery image using the image captured by the at least one camera, the information about the first obstacle, and the expected movement path of the portable medical
    Type: Application
    Filed: October 11, 2017
    Publication date: April 26, 2018
    Inventor: Jong-jyh HSIEH
  • Publication number: 20170312754
    Abstract: A crushing apparatus includes a tank including a first aperture and a second aperture, a first blower around the first aperture, a grinder disposed within the tank, a separating device including a first hole connected to the second aperture, and a second hole, and a second blower disposed around the second hole.
    Type: Application
    Filed: April 29, 2016
    Publication date: November 2, 2017
    Inventors: Bao-Hung HUANG, Lin-Shyang TZENG, Chung-Jen CHEN, Yi-Chieh TSAI, Jyh HSIEH, Chun Che HSIEH
  • Patent number: 9513552
    Abstract: A composite mask suitable for multiple-patterning lithographic processes and a multiple-patterning photolithographic process utilizing the mask are disclosed. An exemplary embodiment includes receiving a mask having a plurality of sub-reticles and a substrate having one or more regions. A first sub-reticle of the plurality of sub-reticles is aligned with a first region of the one or more regions. A movement pattern is designated relative to the substrate. A first photolithographic process is performed including exposing the substrate using the mask to form a first exposed area on the substrate. An alignment of the mask relative to the substrate is shifted according to a first direction determined by the movement pattern. A second photolithographic process is performed including exposing the substrate using the mask to form a second exposed area on the substrate such that the second exposed area overlaps the first.
    Type: Grant
    Filed: March 23, 2015
    Date of Patent: December 6, 2016
    Assignee: TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.
    Inventors: Chue San Yoo, Chang-Jyh Hsieh, Li-Wei Kung, Yung-Cheng Chen
  • Publication number: 20150198887
    Abstract: A composite mask suitable for multiple-patterning lithographic processes and a multiple-patterning photolithographic process utilizing the mask are disclosed. An exemplary embodiment includes receiving a mask having a plurality of sub-reticles and a substrate having one or more regions. A first sub-reticle of the plurality of sub-reticles is aligned with a first region of the one or more regions. A movement pattern is designated relative to the substrate. A first photolithographic process is performed including exposing the substrate using the mask to form a first exposed area on the substrate. An alignment of the mask relative to the substrate is shifted according to a first direction determined by the movement pattern. A second photolithographic process is performed including exposing the substrate using the mask to form a second exposed area on the substrate such that the second exposed area overlaps the first.
    Type: Application
    Filed: March 23, 2015
    Publication date: July 16, 2015
    Inventors: Chue San Yoo, Chang-Jyh Hsieh, Li-Wei Kung, Yung-Cheng Chen
  • Patent number: 8986911
    Abstract: A composite mask suitable for multiple-patterning lithographic processes and a multiple-patterning photolithographic process utilizing the mask are disclosed. An exemplary embodiment includes receiving a mask having a plurality of sub-reticles and a substrate having one or more regions. A first sub-reticle of the plurality of sub-reticles is aligned with a first region of the one or more regions. A movement pattern is designated relative to the substrate. A first photolithographic process is performed including exposing the substrate using the mask to form a first exposed area on the substrate. An alignment of the mask relative to the substrate is shifted according to a first direction determined by the movement pattern. A second photolithographic process is performed including exposing the substrate using the mask to form a second exposed area on the substrate such that the second exposed area overlaps the first.
    Type: Grant
    Filed: December 20, 2012
    Date of Patent: March 24, 2015
    Assignee: Taiwan Semiconductor Manufacturing Company, Ltd.
    Inventors: Chue San Yoo, Yung-Cheng Chen, Li-Wei Kung, Chang-Jyh Hsieh
  • Publication number: 20140178803
    Abstract: A composite mask suitable for multiple-patterning lithographic processes and a multiple-patterning photolithographic process utilizing the mask are disclosed. An exemplary embodiment includes receiving a mask having a plurality of sub-reticles and a substrate having one or more regions. A first sub-reticle of the plurality of sub-reticles is aligned with a first region of the one or more regions. A movement pattern is designated relative to the substrate. A first photolithographic process is performed including exposing the substrate using the mask to form a first exposed area on the substrate. An alignment of the mask relative to the substrate is shifted according to a first direction determined by the movement pattern. A second photolithographic process is performed including exposing the substrate using the mask to form a second exposed area on the substrate such that the second exposed area overlaps the first.
    Type: Application
    Filed: December 20, 2012
    Publication date: June 26, 2014
    Applicant: Taiwan Semiconductor Manufacturing Company, Ltd.
    Inventors: Chue San Yoo, Yung-Cheng Chen, Li-Wei Kung, Chang-Jyh Hsieh
  • Patent number: 8650511
    Abstract: The present disclosure provides for many different embodiments. A mask fabrication method and system is provided. The method and system identify critical areas of an integrated circuit (IC) design layout that has undergone optical proximity correction. The critical areas are areas of the OPCed IC design layout that are at risk for hot spots. A lithography process check is then performed on the critical areas of the OPCed IC design layout.
    Type: Grant
    Filed: April 30, 2010
    Date of Patent: February 11, 2014
    Assignee: Taiwan Semiconductor Manufacturing Company, Ltd.
    Inventors: Chi-Ta Lu, Peng-Ren Chen, Dong-Hsu Cheng, Chang-Jyh Hsieh
  • Publication number: 20110271239
    Abstract: The present disclosure provides for many different embodiments. A mask fabrication method and system is provided. The method and system identify critical areas of an integrated circuit (IC) design layout that has undergone optical proximity correction. The critical areas are areas of the OPCed IC design layout that are at risk for hot spots. A lithography process check is then performed on the critical areas of the OPCed IC design layout.
    Type: Application
    Filed: April 30, 2010
    Publication date: November 3, 2011
    Applicant: TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.
    Inventors: Chi-Ta Lu, Peng-Ren Chen, Dong-Hsu Cheng, Chang-Jyh Hsieh
  • Patent number: 7297450
    Abstract: An integrated circuit layout includes dense figures and at least one isolated figure. A plurality of dummy patterns are formed to surround the isolated figure, so as to reduce the difference in pattern density of the integrated circuit layout. A transmitted light of the dummy patterns provides a phase difference of 0 or 180 degrees relative to a transmitted light of the integrated circuit layout. The integrated circuit layout and the plurality of dummy patterns are formed on a photo-mask.
    Type: Grant
    Filed: April 25, 2006
    Date of Patent: November 20, 2007
    Assignee: United Microelectronics Corp.
    Inventors: Jiunn-Ren Hwang, Jui-Tsen Huang, Chang-Jyh Hsieh
  • Publication number: 20060183031
    Abstract: An integrated circuit layout includes dense figures and at least one isolated figure. A plurality of dummy patterns are formed to surround the isolated figure, so as to reduce the difference in pattern density of the integrated circuit layout. A transmitted light of the dummy patterns provides a phase difference of 0 or 180 degrees relative to a transmitted light of the integrated circuit layout. The integrated circuit layout and the plurality of dummy patterns are formed on a photo-mask.
    Type: Application
    Filed: April 25, 2006
    Publication date: August 17, 2006
    Inventors: Jiunn-Ren Hwang, Jui-Tsen Huang, Chang-Jyh Hsieh
  • Patent number: 7063923
    Abstract: An integrated circuit layout includes dense figures and at least one isolated figure. A plurality of dummy patterns are formed to surround the isolated figure, so as to reduce the difference in pattern density of the integrated circuit layout. A transmitted light of the dummy patterns provides a phase difference of 0 or 180 degrees relative to a transmitted light of the integrated circuit layout. The integrated circuit layout and the plurality of dummy patterns are formed on a photo-mask.
    Type: Grant
    Filed: September 1, 2004
    Date of Patent: June 20, 2006
    Assignee: United Electronics Corp.
    Inventors: Jiunn-Ren Hwang, Jui-Tsen Huang, Chang-Jyh Hsieh
  • Publication number: 20050009344
    Abstract: An integrated circuit layout includes dense figures and at least one isolated figure. A plurality of dummy patterns are formed to surround the isolated figure, so as to reduce the difference in pattern density of the integrated circuit layout. A transmitted light of the dummy patterns provides a phase difference of 0 or 180 degrees relative to a transmitted light of the integrated circuit layout. The integrated circuit layout and the plurality of dummy patterns are formed on a photo-mask.
    Type: Application
    Filed: September 1, 2004
    Publication date: January 13, 2005
    Inventors: Jiunn-Ren Hwang, Jui-Tsen Huang, Chang-Jyh Hsieh
  • Publication number: 20040194050
    Abstract: An optical proximity correction (OPC) method first provides a predetermined integrated circuit layout. The integrated circuit layout is then formed on a surface of a photo-mask, and a plurality of nonprintable dummy patterns are formed outside the integrated circuit layout on the surface of the photo-mask. The plurality of dummy patterns are used to reduce the difference in pattern density on the surface of the photo-mask so as to modify optical proximity effect, and the dummy patterns are not transferred to a photoresist layer formed on a semiconductor wafer during a photolithography process.
    Type: Application
    Filed: April 2, 2004
    Publication date: September 30, 2004
    Inventors: Jiunn-Ren Hwang, Jui-Tsen Huang, Chang-Jyh Hsieh
  • Patent number: 6767679
    Abstract: The present invention is provided a method to use a pattern section without extra serif to correct the polygon feature pattern with at least one inner corner. Such that the polygon feature pattern with at least one inner corner can achieve effectively OPC (optical proximity correction) without adding any extra data point. Therefore, the present invention can instead of the conventional serif and achieves the effective OPC. In addition, the mask writing time is also improved since the original feature pattern is divided into a few rectangular-shaped mask writing units or trapeze-shaped mask writing units for regular mask writing, and the inner corner is/are not in the middle of each divided mask writing units. The mask inspection is also simplified and easier to calibration since a simple geometry other than complex serif is used.
    Type: Grant
    Filed: January 2, 2002
    Date of Patent: July 27, 2004
    Assignee: United Microelectronics Corp.
    Inventors: Chang-Jyh Hsieh, Jiunn-Ren Hwang, Jui-Tsen Huang
  • Publication number: 20040009409
    Abstract: An optical proximity correction (OPC) method first provides a predetermined integrated circuit layout. The integrated circuit layout is then formed on a surface of a photo-mask, and a plurality of nonprintable dummy patterns are formed outside the integrated circuit layout on the surface of the photo-mask. The plurality of dummy patterns are used to reduce the difference in pattern density on the surface of the photo-mask so as to modify optical proximity effect, and the dummy patterns are not transferred to a photoresist layer formed on a semiconductor wafer during a photolithography process.
    Type: Application
    Filed: July 11, 2002
    Publication date: January 15, 2004
    Inventors: Jiunn-Ren Hwang, Jui-Tsen Huang, Chang-Jyh Hsieh
  • Patent number: 6638664
    Abstract: A method of correcting an optical mask pattern. A third pattern having a first strip-like pattern and a second strip-like pattern is provided. The first strip-like pattern attaches to the mid-section of the second strip-like pattern. A first modification step is conducted. A pair of assistant patterns is added to the respective sides of the first strip-like pattern to form a first modified pattern. A second modification step is conducted to shrink a portion of the first strip-like pattern to form a second modified pattern. Dimension in the reduced portion of the first strip-like pattern is a critical dimension of a main pattern. A third modification step is conducted using an optical proximity correction method. The second modified pattern is modified to a third modified pattern.
    Type: Grant
    Filed: September 18, 2001
    Date of Patent: October 28, 2003
    Assignee: United Microelectronics Corp.
    Inventors: Chang-Jyh Hsieh, Jiunn-Ren Hwang, Kuei-Chun Hung, Chien-Ming Wang