Abstract: A calibration method for an X-ray measuring device includes mounting a calibration tool on a rotating table, identifying centroid positions from an output of an X-ray image detector, calculating projection transformation matrixes from the centroid positions and known relative positional intervals, repeating to identify the centroid positions from the output of the X-ray image detector and to calculate the projection transformation matrixes from the centroid positions and known relative positional intervals while the rotating table is rotated twice or more by a predetermined angle, and calculating a rotation center position of the rotating table on the basis of the projection transformation matrixes. The calibration method thereby allows easy calculation of the rotation center position of the rotating table on which an object to be measured is mounted in a rotatable manner, with the simple process.

Abstract: An illumination device has a light source unit, a lens unit, and a filter unit An imaging device receives object light, generated by the illumination light, from the measurement object at a predetermined observation solid angle, and pixels of the imaging device can each identify the different light wavelength ranges. A processing device includes an arithmetic unit configured to obtain a normal vector at each point of the measurement object corresponding to each pixel from inclusion relation between the plurality of solid angle regions, constituting the object light, and the predetermined observation solid angle, and a shape reconstruction unit configured to reconstruct the shape of the measurement object.

Abstract: The present invention provides a lens substrate stacking position calculating apparatus capable of calculating a stacking position at which the number of lens sets whose optical axis deviation falls within an allowable range is maximized, when a plurality of wafer lens arrays are bonded together even if the position of each lens formed on a wafer substrate is deviated between wafer lens arrays to be stacked. The lens substrate stacking position calculating apparatus calculates the positional relationship of two or more transparent substrates to be stacked when the two or more transparent substrates on which a plurality of lenses are two-dimensionally arranged are stacked to form a plurality of lens sets each including two or more lenses. A position of each lens is specified in advance in a common coordinate system.

Abstract: A calibration method of an X-ray measuring device includes: mounting a calibration tool 102 on a rotating table 120; a moving position acquisition step of parallelly moving a position of an j-th sphere 106 with respect to a position of a first sphere 106, irradiating the calibration tool 102 with an X-ray 118, and acquiring, form an output of an X-ray image detector 124, a moving position Mj where the magnitude of a differential position Erjofa centroid position ImDisjh_Sphr_j of a projected image of the j(2£j£N)-th sphere 106 with respect to a centroid position ImDis1_Sphr_1 of a projected image of the first sphere 106 becomes equal to or less than a specified value Vx; a relative position calculation step of performing the moving position acquisition step on the remaining spheres; a feature position calculation step; a transformation matrix calculation step; a rotation detection step; a position calculation step; and a center position calculation step.

Abstract: A calibration method of an X-ray measuring device includes: a front-stage feature position calculation step of parallelly moving spheres disposed in N places a plurality of times, and identifying centroid positions ImPos(1 to Q)_Dis(1 to M)_Sphr_(1 to N) of projected images of the spheres in the N places; an individual matrix calculation step of calculating an individual projection matrix PPj (j=1 to Q) for each of the spheres; an individual position calculation step of calculating moving positions Xb of the spheres on the basis of the individual projection matrix PPj (j=1 to Q); a coordinate integration step of calculating specific relative position intervals X(1 to N) of the spheres; a rear-stage feature position calculation step; a transformation matrix calculation step of calculating a projective transformation matrix Hk (k=1 to Q); a rotation detection step; a position calculation step; and a center position calculation step.

Abstract: A calibration method for an X-ray measuring device includes mounting a calibration tool on a rotating table, identifying centroid positions from an output of an X-ray image detector, calculating projection transformation matrixes from the centroid positions and known relative positional intervals, repeating to identify the centroid positions from the output of the X-ray image detector and to calculate the projection transformation matrixes from the centroid positions and known relative positional intervals while the rotating table is rotated twice or more by a predetermined angle, and calculating a rotation center position of the rotating table on the basis of the projection transformation matrixes. The calibration method thereby allows easy calculation of the rotation center position of the rotating table on which an object to be measured is mounted in a rotatable manner, with the simple process.

Abstract: A calibration method of an X-ray measuring device includes: mounting a calibration tool on a rotating table; a moving position acquisition step of parallelly moving a position of an j-th sphere with respect to a position of a first sphere, irradiating the calibration tool with an X-ray, and acquiring, form an output of an X-ray image detector, a moving position Mj where the magnitude of a differential position Erj of a centroid position ImDisjh_Sphr_j of a projected image of the j(2?j?N)-th sphere with respect to a centroid position ImDis1_Sphr_1 of a projected image of the first sphere becomes equal to or less than a specified value Vx; a relative position calculation step of performing the moving position acquisition step on the remaining spheres a feature position calculation step; a transformation matrix calculation step; a rotation detection step; a position calculation step; and a center position calculation step.

Abstract: A calibration method of an X-ray measuring device includes: a front-stage feature position calculation step of parallelly moving spheres disposed in N places a plurality of times, and identifying centroid positions ImPos(1 to Q)_Dis(1 to M)_Sphr_(1 to N) of projected images of the spheres in the N places; an individual matrix calculation step of calculating an individual projection matrix PPj (j=1 to Q) for each of the spheres; an individual position calculation step of calculating moving positions Xb of the spheres on the basis of the individual projection matrix PPj (j=1 to Q); a coordinate integration step of calculating specific relative position intervals X(1 to N) of the spheres; a rear-stage feature position calculation step; a transformation matrix calculation step of calculating a projective transformation matrix Hk (k=1 to Q); a rotation detection step; a position calculation step; and a center position calculation step.

Abstract: The present invention provides a lens substrate stacking position calculating apparatus capable of calculating a stacking position at which the number of lens sets whose optical axis deviation falls within an allowable range is maximized, when a plurality of wafer lens arrays are bonded together even if the position of each lens formed on a wafer substrate is deviated between wafer lens arrays to be stacked. The lens substrate stacking position calculating apparatus calculates the positional relationship of two or more transparent substrates to be stacked when the two or more transparent substrates on which a plurality of lenses are two-dimensionally arranged are stacked to form a plurality of lens sets each including two or more lenses. A position of each lens is specified in advance in a common coordinate system.

Abstract: A hardness tester has an indentation former forming an indentation by pressing an indenter against a surface of a sample; an image capture controller controlling a CCD camera to capture an image of the surface of the sample and obtain image data; an indentation area extractor extracting an indentation area based on the obtained image data; and a hardness calculator calculating hardness of the sample based on the extracted indentation area. The indentation area extractor has a reduced image generator reducing the image obtained from the image data of the surface of the sample at a scale ratio selected from a plurality of predetermined scale ratios and generating a reduced image; and a pattern matcher performing pattern matching with respect to the generated reduced image and extracting the indentation area.

Abstract: A light-interference measuring apparatus including: a light source of a broad band light; an objective lens section to branch an optical path of the broad band light into a reference optical path including a reference mirror and a measuring optical path including a measuring object and to output a superposed wave of two branched lights; and an optical path length changing section to change an optical path length of either the reference optical path or the measuring optical path; wherein the objective lens section includes a phase difference control member to control a phase difference between the reference light and the object light to generate destructive interference fringes, and a minimum luminance position detecting section to detect minimum luminance position of the destructive interference fringes.

Abstract: A hardness tester has an indentation former forming an indentation by pressing an indenter against a surface of a sample; an image capture controller controlling a CCD camera to capture an image of the surface of the sample and obtain image data; an indentation area extractor extracting an indentation area based on the obtained image data; and a hardness calculator calculating hardness of the sample based on the extracted indentation area. The indentation area extractor has a reduced image generator reducing the image obtained from the image data of the surface of the sample at a scale ratio selected from a plurality of predetermined scale ratios and generating a reduced image; and a pattern matcher performing pattern matching with respect to the generated reduced image and extracting the indentation area.

Abstract: A shape measuring method includes guiding light emitted from a light source to an object to be measured and a reference surface, combining light reflected from the object to be measured with light reflected from the reference surface, and taking a distribution image of an interference light intensity corresponding to each measurement position of the object to be measured, while changing an optical path length difference between a first optical path length and a second optical path length over a whole scanning zone, sequentially storing distribution images of the interference light intensity in the whole scanning zone, and obtaining an interference light intensity string at each measurement position based on the stored distribution images of the interference light intensity, and obtaining a position in an optical axis direction at each measurement position of the object to be measured from a peak position of the interference light intensity string.

Abstract: A data memory storing Gerber data containing closed area information of a work; a display displaying a pattern image based on the closed area information of the Gerber data; a detection specification information display program displaying on the display a detection tool specifying a location of edge to be detected, a detection direction and detection length, by superimposing on the pattern image; an image capturing program and an image capturer capturing an image of an area corresponding to the detection tool of the work; an edge detection program performing an edge detection of the location of the edge to be detected with respect to data of a captured image; and a condition determination program determining a light-dark change condition indicating whether an image is changing from a light section to a dark section or from a dark section to a light section along a detection direction.

Abstract: A shape measuring apparatus includes: an optical system configured to guide a light from a light source having a wideband spectrum to an object to be measured and a reference face; an imaging unit configured to image the interfering light intensity distribution image output from the optical system; an optical path length difference changing unit configured to change the optical path length difference; and an arithmetic processing unit configured to obtain the peak value of an interfering light intensity sequence indicating the change in the interfering light intensity due to the change in the optical path length difference at each measurement position of the interfering light intensity distribution images stored in the image storing unit, and configured to obtain the peak value as the position in the direction of the optical axis at each measurement position of the object to be measured.

Abstract: A form measuring device includes: a measuring unit configured to detect a height at each position in a reference axis direction of a measured object and measure a cross-sectional form of the measured object; and an arithmetic unit configured to synthesize a plurality of form measurement data, obtained by repeated measurements of the form of the same measured object by the measuring unit, and calculate synthesized form measurement data. In the synthesis of the form measurement data, the arithmetic unit is configured to calculate shift amounts in the reference axis direction and a height direction of the form measurement data with respect to the synthesized form measurement data and align the form measurement data in the reference axis direction and the height direction based on the calculated shift amount.

Abstract: A shape measuring method includes guiding light emitted from a light source to an object to be measured and a reference surface, combining light reflected from the object to be measured with light reflected from the reference surface, and taking a distribution image of an interference light intensity corresponding to each measurement position of the object to be measured, while changing an optical path length difference between a first optical path length and a second optical path length over a whole scanning zone, sequentially storing distribution images of the interference light intensity in the whole scanning zone, and obtaining an interference light intensity string at each measurement position based on the stored distribution images of the interference light intensity, and obtaining a position in an optical axis direction at each measurement position of the object to be measured from a peak position of the interference light intensity string.

Abstract: A shape measuring apparatus includes: an optical system configured to guide a light from a light source having a wideband spectrum to an object to be measured and a reference face; an imaging unit configured to image the interfering light intensity distribution image output from the optical system; an optical path length difference changing unit configured to change the optical path length difference; and an arithmetic processing unit configured to obtain the peak value of an interfering light intensity sequence indicating the change in the interfering light intensity due to the change in the optical path length difference at each measurement position of the interfering light intensity distribution images stored in the image storing unit, and configured to obtain the peak value as the position in the direction of the optical axis at each measurement position of the object to be measured.

Abstract: A data memory storing Gerber data containing closed area information of a work; a display displaying a pattern image based on the closed area information of the Gerber data; a detection specification information display program displaying on the display a detection tool specifying a location of edge to be detected, a detection direction and detection length, by superimposing on the pattern image; an image capturing program and an image capturer capturing an image of an area corresponding to the detection tool of the work; an edge detection program performing an edge detection of the location of the edge to be detected with respect to data of a captured image; and a condition determination program determining a light-dark change condition indicating whether an image is changing from a light section to a dark section or from a dark section to a light section along a detection direction.

Abstract: A light-interference measuring apparatus including: a light source of a broad band light; an objective lens section to branch an optical path of the broad band light into a reference optical path including a reference mirror and a measuring optical path including a measuring object and to output a superposed wave of two branched lights; and an optical path length changing section to change an optical path length of either the reference optical path or the measuring optical path; wherein the objective lens section includes a phase difference control member to control a phase difference between the reference light and the object light to generate destructive interference fringes, and a minimum luminance position detecting section to detect minimum luminance position of the destructive interference fringes.