Abstract: A method for estimating a body surface model of a patient includes: (a) segmenting, by a computer processor, three-dimensional sensor image data to isolate patient data from environmental data; (b) categorizing, by the computer processor, a body pose of the patient from the patient data using a first trained classifier; (c) parsing, by the computer processor, the patient data to an anatomical feature of the patient using a second trained classifier, wherein the parsing is based on a result of the categorizing; and (d) estimating, by the computer processor, the body surface model of the patient based on a result of the parsing. Systems for estimating a body surface model of a patient are described.

Abstract: Methods and apparatus for post treating an oxide layer on a semiconductor substrate are disclosed. In one or more embodiments, the oxide layer is formed by thermal oxidation or plasma oxidation and treated with a plasma comprising helium. The helium-containing plasma may also include hydrogen, neon, argon and combinations thereof. In one or more embodiments, a SiO2 oxide layer is formed on a silicon substrate and treated with a plasma to improve the interface between the silicon substrate and the SiO2 oxide layer.

Abstract: Described herein are cyclic peptides, nanoparticles bound with cyclic peptides, and methods for using said cyclic peptides and/or said nanoparticles bound with cyclic peptides for intraoperative nerve tissue imaging.

Abstract: A method includes receiving a connection request at a connection server port via a network from a client, the connection request directed to an application server, duplicating a socket for the communication and passing the socket to the application server, and replying to the network client connection request to establish a direct connection between the client and the application server via the passed socket, and this method support SSL protocol via passed socket.

Abstract: A method, device and system for transmitting wireless data are disclosed. In the present disclosure, a local mobile terminal not only may exchange information with a base station, but also may exchange information with other mobile terminals by using a short distance transmission system of the mobile terminals, and transmit, by combining Local Area Network (LAN) communication and Wide Area Network (WAN) communication are combined, data simultaneously via an LAN and a WAN. A target mobile terminal may also receive and send data via the LAN and the WAN. The present disclosure can implement multi-channel transmission of wireless data, thus relieving network load greatly and improving the efficiency of data transmission.

Abstract: Mesoporous oxide nanoparticles, compositions comprising such nanoparticle, and methods of making and using such nanoparticles. The nanoparticles (e.g., compositions comprising the nanoparticles) have an average size of less than 15 nm and a narrow size distribution. The nanoparticles can be used in imaging applications and delivery of molecular cargo (e.g., a drug) to an individual.

Abstract: A method and apparatus for generating a 3D personalized mesh of a person from a depth camera image for medical imaging scan planning is disclosed. A depth camera image of a subject is converted to a 3D point cloud. A plurality of anatomical landmarks are detected in the 3D point cloud. A 3D avatar mesh is initialized by aligning a template mesh to the 3D point cloud based on the detected anatomical landmarks. A personalized 3D avatar mesh of the subject is generated by optimizing the 3D avatar mesh using a trained parametric deformable model (PDM). The optimization is subject to constraints that take into account clothing worn by the subject and the presence of a table on which the subject in lying.

Abstract: An apparatus and method for identifying batteries with different thickness, and an electronic device thereof, the apparatus comprises a buckle switch arranged at a position close to battery compartment in the electronic device, and a control circuit connected with the buckle switch. When a thin battery is mounted in the electronic device, the state of the buckle switch is ON; and when a thick battery is mounted in the electronic device, the state of the buckle switch is OFF. According to the ON/OFF state of the buckle switch, the control circuit identifies whether a thin battery or a thick battery is mounted in the electronic device. The apparatus and method can identify whether a thin battery or a thick battery is used in the electronic device, and thereby can adopt different drivers to manage the battery.

Abstract: The invention is directed to a computer implemented method and a system that implements an application performance profiler with hardware performance event information. The profiler provides dynamic tracing of application programs, and offers fine-grained hardware performance event profiling at function levels. To control the perturbation on target applications, the profiler also includes a control mechanism to constraint the function profiling overhead within a budget configured by users.

Abstract: A method, device and system for transmitting wireless data are disclosed. In the present disclosure, a local mobile terminal not only may exchange information with a base station, but also may exchange information with other mobile terminals by using a short distance transmission system of the mobile terminals, and transmit, by combining Local Area Network (LAN) communication and Wide Area Network (WAN) communication are combined, data simultaneously via an LAN and a WAN. A target mobile terminal may also receive and send data via the LAN and the WAN. The present disclosure can implement multi-channel transmission of wireless data, thus relieving network load greatly and improving the efficiency of data transmission.

Abstract: The time between illumination of adjacent zones of a workpiece edge is extended by a long cool-down period or delay, by interlacing a radiation beam scanning pattern. During the cool-down period, the beam successively scans (along the fast axis) two rows separated by about half the wafer diameter, and travels back and then forth (along the slow axis) across the distance between the two rows, while the radiation beam source continuously generates the beam.

Abstract: Embodiments of the invention contemplate a method, apparatus and system that are used to support and position a substrate on a surface that is at a different temperature than the initial, or incoming, substrate temperature. Embodiments of the invention may also include a method of controlling the transfer of heat between a substrate and substrate support positioned in a processing chamber. The apparatus and methods described herein generally may also provide an inexpensive and simple way of accurately positioning a substrate on a substrate support that is positioned in a semiconductor processing chamber. Substrate processing chambers that can benefit from the various embodiments described herein include, but are not limited to RTP, CVD, PVD, ALD, plasma etching, and/or laser annealing chambers.

Abstract: Embodiments of the invention contemplate a method, apparatus and system that are used to support and position a substrate on a surface that is at a different temperature than the initial, or incoming, substrate temperature. Embodiments of the invention may also include a method of controlling the transfer of heat between a substrate and substrate support positioned in a processing chamber. The apparatus and methods described herein generally may also provide an inexpensive and simple way of accurately positioning a substrate on a substrate support that is positioned in a semiconductor processing chamber. Substrate processing chambers that can benefit from the various embodiments described herein include, but are not limited to RTP, CVD, PVD, ALD, plasma etching, and/or laser annealing chambers.

Abstract: Embodiments of the invention contemplate a method, apparatus and system that are used to support and position a substrate on a surface that is at a different temperature than the initial, or incoming, substrate temperature. Embodiments of the invention may also include a method of controlling the transfer of heat between a substrate and substrate support positioned in a processing chamber. The apparatus and methods described herein generally may also provide an inexpensive and simple way of accurately positioning a substrate on a substrate support that is positioned in a semiconductor processing chamber. Substrate processing chambers that can benefit from the various embodiments described herein include, but are not limited to RTP, CVD, PVD, ALD, plasma etching, and/or laser annealing chambers.

Abstract: Methods and apparatus for forming an oxide layer on a semiconductor substrate are disclosed. A two frequency plasma source is used to form a plasma in a plasma reactor. In various embodiments, different quantities of power are supplied to a power source operating at the first frequency and a power source operating at the second frequency over time.

Abstract: Methods and apparatus for forming an oxide layer on a semiconductor substrate are disclosed. A two frequency plasma source is used to form a plasma in a plasma reactor. In various embodiments, different quantities of power are supplied to a power source operating at the first frequency and a power source operating at the second frequency over time.

Abstract: Methods and apparatus for post treating an oxide layer on a semiconductor substrate are disclosed. In one or more embodiments, the oxide layer is formed by thermal oxidation or plasma oxidation and treated with a plasma comprising helium. The helium-containing plasma may also include hydrogen, neon, argon and combinations thereof. In one or more embodiments, a SiO2 oxide layer is formed on a silicon substrate and treated with a plasma to improve the interface between the silicon substrate and the SiO2 oxide layer.

Abstract: The time between illumination of adjacent zones of a workpiece edge is extended by a long cool-down period or delay, by interlacing a radiation beam scanning pattern. During the cool-down period, the beam successively scans (along the fast axis) two rows separated by about half the wafer diameter, and travels back and then forth (along the slow axis) across the distance between the two rows, while the radiation beam source continuously generates the beam.

Abstract: Embodiments of the invention contemplate a method, apparatus and system that are used to support and position a substrate on a surface that is at a different temperature than the initial, or incoming, substrate temperature. Embodiments of the invention may also include a method of controlling the transfer of heat between a substrate and substrate support positioned in a processing chamber. The apparatus and methods described herein generally may also provide an inexpensive and simple way of accurately positioning a substrate on a substrate support that is positioned in a semiconductor processing chamber. Substrate processing chambers that can benefit from the various embodiments described herein include, but are not limited to RTP, CVD, PVD, ALD, plasma etching, and/or laser annealing chambers.

Abstract: A method of processing a thin film structure on a semiconductor substrate using an optically writable mask, the method includes placing the substrate in a reactor chamber, the substrate having on its surface a target layer to be exposed to a light source in accordance with a predetermined pattern, depositing an optically writable carbon-containing mask layer on the substrate by (a) introducing a carbon-containing process gas into the chamber, (b) generating a reentrant toroidal RF plasma current in a reentrant path that includes a process zone overlying the workpiece by coupling plasma RF source power to an external portion of the reentrant path, (c) coupling RF plasma bias power or bias voltage to the workpiece.