Abstract: A processing apparatus includes a processing resource including a general-purpose parallel processing engine and a matrix accelerator. The matrix accelerator includes first circuitry to receive a command to perform operations associated with an instruction, second circuitry to configure the matrix accelerator according to a physical depth of a systolic array within the matrix accelerator and a logical depth associated with the instruction, third circuitry to read operands for the instruction from a register file associated with the systolic array, fourth circuitry to perform operations for the instruction via one or more passes through one or more physical pipeline stages of the systolic array based on a configuration performed by the second circuitry, and fifth circuitry to write output of the operations to the register file associated with the systolic array.

Abstract: Embodiments provide support for divergent control flow in heterogeneous compute operations on a fused execution unit. On embodiment provides for a processing apparatus comprising a fused execution unit including multiple graphics execution units having a common instruction pointer; logic to serialize divergent function calls by the fused execution unit, the logic configured to compare a call target of execution channels within the fused execution unit and create multiple groups of channels, each group of channels associated with a single call target; and wherein the fused execution unit is to execute a first group of channels via a first execution unit and a second group of channels via a second execution unit.

Abstract: Embodiments described herein provide a graphics processor in which dependency tracking hardware is simplified via the use of compiler provided software scoreboard information. In one embodiment the shader compiler for shader programs is configured to encode software scoreboard information into each instruction. Dependencies can be evaluated by the shader compiler and provided as scoreboard information with each instruction. The hardware can then use the provided information when scheduling instructions. In one embodiment, a software scoreboard synchronization instruction is provided to facilitate software dependency handling within a shader program. Using software to facilitate software dependency handling and synchronization can simplify hardware design, reducing the area consumed by the hardware. In one embodiment, dependencies can be evaluated by the shader compiler instead of the GPU hardware.

Abstract: A processing apparatus is described. The apparatus includes a graphics processing unit (GPU), including a plurality of execution units to process graphics context data and a register file having a plurality of registers to store the graphics context data; and register renaming logic to facilitate re-use of register data by partitioning a first part and a second part, the first part to include thread-independent code and the second part to include thread-dependent code.

Abstract: A processing apparatus is described. The apparatus includes a graphics processing unit (GPU), including a plurality of execution units to process graphics context data and a register file having a plurality of registers to store the graphics context data; and register renaming logic to facilitate dynamic renaming of the plurality of registers by logically partitioning the plurality of registers in the register file into a set of fixed registers and a set of shared registers.

Abstract: Embodiments are generally directed to global optimal path determination utilizing parallel processing. An embodiment of an apparatus includes a central processing unit (CPU); a graphical processing unit (GPU), the GPU being capable of a plurality of processing threads; and a memory to store data for a system under evaluation, the system under evaluation including a set of nodes having a first endpoint, a second endpoint, and multiple paths between the first endpoint and the second endpoint. The apparatus is to determine a most energy efficient path between the first endpoint and the second endpoint utilizing parallel processing of a push and relabel graph cut algorithm. Performance of the push and relabel algorithm includes a plurality of process iterations, each process iteration including performance of a relabel operation, a push operation in a first direction, and a push operation in a second direction.

Abstract: Embodiments described herein provide a graphics processor in which dependency tracking hardware is simplified via the use of compiler provided software scoreboard information. In one embodiment the shader compiler for shader programs is configured to encode software scoreboard information into each instruction. Dependencies can be evaluated by the shader compiler and provided as scoreboard information with each instruction. The hardware can then use the provided information when scheduling instructions. In one embodiment, a software scoreboard synchronization instruction is provided to facilitate software dependency handling within a shader program. Using software to facilitate software dependency handling and synchronization can simplify hardware design, reducing the area consumed by the hardware. In one embodiment, dependencies can be evaluated by the shader compiler instead of the GPU hardware.

Abstract: A processing apparatus is described. The apparatus includes a graphics processing unit (GPU), including a plurality of execution units to process graphics context data and a register file having a plurality of registers to store the graphics context data; and register renaming logic to facilitate re-use of register data by partitioning a first part and a second part, the first part to include thread-independent code and the second part to include thread-dependent code.

Abstract: Embodiments described herein provide a graphics processor in which dependency tracking hardware is simplified via the use of compiler provided software scoreboard information. In one embodiment the shader compiler for shader programs is configured to encode software scoreboard information into each instruction. Dependencies can be evaluated by the shader compiler and provided as scoreboard information with each instruction. The hardware can then use the provided information when scheduling instructions. In one embodiment, a software scoreboard synchronization instruction is provided to facilitate software dependency handling within a shader program. Using software to facilitate software dependency handling and synchronization can simplify hardware design, reducing the area consumed by the hardware. In one embodiment, dependencies can be evaluated by the shader compiler instead of the GPU hardware.

Abstract: Embodiments are generally directed to global optimal path determination utilizing parallel processing. An embodiment of an apparatus includes a central processing unit (CPU); a graphical processing unit (GPU), the GPU being capable of a plurality of processing threads; and a memory to store data for a system under evaluation, the system under evaluation including a set of nodes having a first endpoint, a second endpoint, and multiple paths between the first endpoint and the second endpoint. The apparatus is to determine a most energy efficient path between the first endpoint and the second endpoint utilizing parallel processing of a push and relabel graph cut algorithm. Performance of the push and relabel algorithm includes a plurality of process iterations, each process iteration including performance of a relabel operation, a push operation in a first direction, and a push operation in a second direction.

Abstract: Systems and methods may provide for inserting one or more preemption instructions while compiling a computer program. The one or more preemption instructions being inserted within a preemption window in the computer program reduces the number of live registers at each preemption instruction position. Further, the preemption instruction instructs which registers are to be saved at a particular program position, typically the registers that are live at that program position. The compiled program may be run in an execution unit. A preemption request may be made to the execution unit and executed at a next available preemption instruction in the program being run in the execution unit.

Abstract: A processing apparatus is described. The apparatus includes a graphics processing unit (GPU), including a plurality of execution units to process graphics context data and a register file having a plurality of registers to store the graphics context data; and register renaming logic to facilitate dynamic renaming of the plurality of registers by logically partitioning the plurality of registers in the register file into a set of fixed registers and a set of shared registers.

Abstract: Embodiments provide support for divergent control flow in heterogeneous compute operations on a fused execution unit. On embodiment provides for a processing apparatus comprising a fused execution unit including multiple graphics execution units having a common instruction pointer; logic to serialize divergent function calls by the fused execution unit, the logic configured to compare a call target of execution channels within the fused execution unit and create multiple groups of channels, each group of channels associated with a single call target; and wherein the fused execution unit is to execute a first group of channels via a first execution unit and a second group of channels via a second execution unit.

Abstract: Systems and methods may provide for inserting one or more preemption instructions while compiling a computer program. The one or more preemption instructions being inserted within a preemption window in the computer program reduces the number of live registers at each preemption instruction position. Further, the preemption instruction instructs which registers are to be saved at a particular program position, typically the registers that are live at that program position. The compiled program may be run in an execution unit. A preemption request may be made to the execution unit and executed at a next available preemption instruction in the program being run in the execution unit.

Abstract: Methods, systems, and computer program products for the performance of arithmetic operations on large numbers. The addition of large numbers may be parallelized by adding corresponding sections of the numbers in parallel. The multiplication of large numbers may be accomplished by applying a multiplier to a multiplicand after the latter is divided into sections, where the multiplication of the sections is performed in parallel. Products for each section are saved in high and low order vectors, which may then be aligned and added. The comparison of two large numbers may be performed by comparing the numbers, section by section, in parallel. In an embodiment, these processes may be performed in a graphics processing unit (GPU) having multiple cores. In an embodiment, such a GPU may be integrated into a larger die that also incorporates one or more conventional central processing unit (CPU) cores.

Abstract: A method for preventing gate oxide damage of a trench MOSFET during wafer processing while adding an ESD protection module atop the trench MOSFET includes fabricate numerous trench MOSFETs on a wafer; add a Si3N4 isolation layer, capable of preventing the LTO patterning process from damaging the gate oxide, atop the wafer; add numerous ESD protection modules atop the Si3N4 isolation layer.

Abstract: A method and device structure are disclosed for preventing gate oxide damage of a trench MOSFET during wafer processing while adding an ESD protection module atop the trench MOSFET. The ESD protection module has a low temperature oxide (LTO) bottom layer whose patterning process is found to cause the gate oxide damage. The method includes: a) Fabricate numerous trench MOSFETs on a wafer. b) Add a Si3N4 isolation layer, capable of preventing the LTO patterning process from damaging the gate oxide, atop the wafer. c) Add numerous ESD protection modules atop the Si3N4 isolation layer. d) Remove those portions of the Si3N4 isolation layer that are not beneath the ESD protection modules. In one embodiment, hydrofluoric acid is used as a first etchant for patterning the LTO while hot phosphoric acid is used as a second etchant for removing portions of the Si3N4 isolation layer.

Abstract: A device structure is disclosed for preventing gate oxide damage of a trench MOSFET during wafer processing while adding an ESD protection module atop the trench MOSFET. The ESD protection module has a low temperature oxide (LTO) bottom layer whose patterning process was found to cause the gate oxide damage before. The present invention structure includes a semiconductor substrate having an active area and a termination area; numerous trench MOSFET cells disposed in the active area; numerous electrostatic discharge (ESD) diodes disposed above the semiconductor substrate in the termination area; and an insulation layer comprising Oxide/Nitride/Oxide (ONO) sandwiched between the ESD diodes and the semiconductor substrate. In one embodiment, the active area does not contain the ONO insulation layer.

Abstract: A method and device structure are disclosed for preventing gate oxide damage of a trench MOSFET during wafer processing while adding an ESD protection module atop the trench MOSFET. The ESD protection module has a low temperature oxide (LTO) bottom layer whose patterning process is found to cause the gate oxide damage. The method includes: a) Fabricate numerous trench MOSFETs on a wafer. b) Add a Si3N4 isolation layer, capable of preventing the LTO patterning process from damaging the gate oxide, atop the wafer. c) Add numerous ESD protection modules atop the Si3N4 isolation layer. d) Remove those portions of the Si3N4 isolation layer that are not beneath the ESD protection modules. In one embodiment, hydrofluoric acid is used as a first etchant for patterning the LTO while hot phosphoric acid is used as a second etchant for removing portions of the Si3N4 isolation layer.

Abstract: A method and device structure are disclosed for preventing gate oxide damage of a trench MOSFET during wafer processing while adding an ESD protection module atop the trench MOSFET. The ESD protection module has a low temperature oxide (LTO) bottom layer whose patterning process is found to cause the gate oxide damage. The method includes: a) Fabricate numerous trench MOSFETs on a wafer. b) Add a Si3N4 isolation layer, capable of preventing the LTO patterning process from damaging the gate oxide, atop the wafer. c) Add numerous ESD protection modules atop the Si3N4 isolation layer. d) Remove those portions of the Si3N4 isolation layer that are not beneath the ESD protection modules. In one embodiment, hydrofluoric acid is used as a first etchant for patterning the LTO while hot phosphoric acid is used as a second etchant for removing portions of the Si3N4 isolation layer.