Abstract: A photoresist material for lithography using a light of 220 nm or less which comprises at least a polymer represented by the following formula (2) and a photo-acid generator for generating an acid by exposure: wherein R1, R2, R3 and R5 are each a hydrogen atom or a methyl group; R4 is an acid-labile group or one of a specified subset of alicyclic hydrocarbon groups, alicyclic hydrocarbon groups, or hydrocarbon groups; R6 is a hydrogen atom or one of a specified subset of hydrocarbon groups or alicyclic hydrocarbon groups; x, y and z are optional values which meet x+y+z=1, 0<x?1, 0?y<1 and 0?z<1. Also disclosed is a resin having a (meth)acrylate unit of an alicyclic lactone structure represented by the formula (3): wherein R8 is a hydrogen atom or a methyl group, and R9 is one of a specified subset of hydrocarbon groups.

Abstract: A photoresist material comprising a polymer with at least two acrylate derivatives incorporated therein, and a photo-acid generator for generating an acid by exposure, wherein at least one of the two acrylate derivatives incorporated therein comprises a norbornyl moiety having a lactone structure, and at least one of the two acrylate derivatives comprises an ester-substituted tetracyclododecyl moiety.

Abstract: A photoresist material comprising a polymer with at least two acrylate derivatives incorporated therein, and a photo-acid generator for generating an acid by exposure, wherein at least one of the two acrylate derivatives incorporated therein comprises a norbornyl moiety having a lactone structure, and at least one of the two acrylate derivatives comprises an ester-substituted tetracyclododecyl moiety.

Abstract: A photoresist material for lithography using a light of 220 nm or less which comprises at least a polymer represented by the following formula (2) and a photo-acid generator for generating an acid by exposure: wherein R1, R2, R3 and R5 are each a hydrogen atom or a methyl group; R4 is an acid-labile group or one of a specified subset of alicyclic hydrocarbon groups, alicyclic hydrocarbon groups, or hydrocarbon groups; R6 is a hydrogen atom or one of a specified subset of hydrocarbon groups or alicyclic hydrocarbon groups; x, y and z are optional values which meet x+y+z=1, 0<x?1, 0?y<1 and 0?z<1. Also disclosed is a resin having a (meth)acrylate unit of an alicyclic lactone structure represented by the formula (3): wherein R8 is a hydrogen atom or a methyl group, and R9 is one of a specified subset of hydrocarbon groups.

Abstract: There can be provided an energy storage device comprising a positive electrode comprising a nitroxyl compound having a nitroxyl cation partial structure in an oxidized state and having a nitroxyl radical partial structure in a reduced state; a negative electrode comprising a carbon material which lithium ions can be reversibly intercalated into and deintercalated from; and an electrolytic solution comprising a lithium salt and an aprotic organic solvent, wherein the negative electrode is a negative electrode comprising the carbon material which lithium ions are previously intercalated into, apart from lithium ions associated with a capacity A of lithium capable of being intercalated and deintercalated in charge and discharge, thereby allowing the energy storage device to simultaneously achieve high energy density, high output characteristics, low environmental load, and high stability in charge and discharge cycles.

Abstract: The present invention has an object to provide a photosensitive resin composition for optical waveguide formation, which has low transmission loss and can form a waveguide pattern with high shape accuracy at low cost; an optical waveguide; and a method for producing an optical waveguide. The present invention provides a photosensitive resin composition for optical waveguide formation comprising at least: a polymer containing at least a (meth)acrylate structure unit having an epoxy structure, and a (meth)acrylate structure unit having a lactone structure and/or a vinyl monomer structure unit having an aromatic structure; and a photoacid generator, of which one or both of a core layer and a cladding layer are formed of a cured product.

Abstract: A method of producing an optical waveguide connector in which the productivity of a ferrule member can be improved, and the connection loss with a counter connector can be suppressed to a low level is obtained. An optical waveguide connector 11 is obtained by performing: an aligning step of restricting the position of the tip end of an optical waveguide 2 passed through an insertion hole 13b of a ferrule member 13, by a positioning portion of a positioning member 16 which is opposedly placed at the tip end of the ferrule member 13, thereby aligning the optical waveguide 2 to the ferrule member 13; and a bonding step of filing a gap between the optical waveguide 2 which is passed through the insertion hole 13b, and the insertion hole 13b, with an adhesive agent to fix the optical waveguide 2 to the ferrule member 13.

Abstract: An optical connector 1 is for connecting a connection object 10 to an optical module 21. A slider 3 is slidably held by a housing 2 adapted for positioning the connection object and the optical module. The housing has a first positioning portion for receiving the connection object. The slider has a first pressing portion 3a for elastically pressing the connection object in a first direction toward the first positioning portion and a second pressing portion 3e that elastically acts in a second direction perpendicular to the first direction.

Abstract: Photoresist material for lithography using a light of 220 nm or less comprising at least a polymer represented by following formula (2) and a photo-acid generator for generating an acid by exposure: wherein R1, R2, R3 and R5, each a hydrogen atom or a methyl group; R4, an acid-labile group or one of a specified subset of alicyclic hydrocarbon groups, alicyclic hydrocarbon groups, or hydrocarbon groups; R6, a hydrogen atom, a specified subset of hydrocarbon groups or alicyclic hydrocarbon groups; x, y and z are optional values which meet x+y+z=1, 0<x?1, 0?y<1 and 0?z<1; resin having a (meth)acrylate unit of an alicyclic lactone structure represented by formula (3): wherein R8, a hydrogen atom or a methyl group, and R9, one of a specified subset of hydrocarbon groups.

Abstract: A secondary battery including: a positive electrode which comprises an oxide which absorbs and releases lithium ions; a negative electrode which comprises a material which absorbs and releases the lithium ions; and a first electrolyte solution which transports charge carriers between the positive electrode and the negative electrode; wherein the positive electrode comprises a compound, which is represented by the composition formula LiaM1bOd or LiaM1bM2cOd, and the positive electrode is formed by electrically combining lithium metal and a lithium-containing transition metal oxide in a second electrolyte solution which includes lithium ions. In the formulae, a, b, c and d represent a composition ratio of the above composition formulae, and are numbers in ranges of: 1.2?a?2, 0<b, c?2, and 2?d?4, M1 and M2 in the above formulae represent any one kind of elements selected from the group consisting of Co, Ni, Mn, Fe, Al, Sn, Mg, Ge, Si and P, and M1 and M2 are different from each other.

Abstract: There can be provided an energy storage device comprising a positive electrode comprising a nitroxyl compound having a nitroxyl cation partial structure in an oxidized state and having a nitroxyl radical partial structure in a reduced state; a negative electrode comprising a carbon material which lithium ions can be reversibly intercalated into and deintercalated from; and an electrolytic solution comprising a lithium salt and an aprotic organic solvent, wherein the negative electrode is a negative electrode comprising the carbon material which lithium ions are previously intercalated into, apart from lithium ions associated with a capacity A of lithium capable of being intercalated and deintercalated in charge and discharge, thereby allowing the energy storage device to simultaneously achieve high energy density, high output characteristics, low environmental load, and high stability in charge and discharge cycles.

Abstract: A photoresist material for lithography using a light of 220 nm or less which comprises at least a polymer represented by the following formula (2) and a photo-acid generator for generating an acid by exposure: wherein R1, R2, R3 and R5 are each a hydrogen atom or a methyl group; R4 is an acid-labile group or one of a specified subset of alicyclic hydrocarbon groups, alicyclic hydrocarbon groups, or hydrocarbon groups; R6 is a hydrogen atom or one of a specified subset of hydrocarbon groups or alicyclic hydrocarbon groups; x, y and z are optional values which meet x+y+z=1, 0<x?1, 0?y<1 and 0?z<1. Also disclosed is a resin having a (meth)acrylate unit of an alicyclic lactone structure represented by the formula (3): wherein R8 is a hydrogen atom or a methyl group, and R9 is one of a specified subset of hydrocarbon groups.

Abstract: There are here disclosed a photoresist material for lithography using a light of 220 nm or less which comprises at least a polymer represented by the following formula (2) and a photo-acid generator for generating an acid by exposure: wherein R1, R2, R3 and R5 are each a hydrogen atom or a methyl group; R4 is an acid-labile group, an alicyclic hydrocarbon group having 7 to 13 carbon atoms, which has an acid labile group, an alicyclic hydrocarbon group having 7 to 13 carbon atoms, which has a carboxyl group, or a hydrocarbon group having 3 to 13 carbon atoms, which has an epoxy group; R6 is a hydrogen atom, a hydrocarbon group having 1 to 12 carbon atoms, or an alicyclic hydrocarbon group having 7 to 13 carbon atoms, which has a carboxyl group; x, y and z are optional values which meet x+y+z=1, 0<x?1, 0?y<1 and 0?z<1; and a weight-average molecular weight of the polymer is in the range of 2000 to 200000, and a resin having a (meth)acrylate unit of an alicyclic lactone structure represented by the

Abstract: An object of this invention is to provide a highly safe secondary battery employing a non-flammable electrolyte solution. The secondary battery has a positive pole comprising an oxide for storing and releasing lithium ions, a negative pole comprising a carbon material for storing and releasing lithium ions, and an electrolyte solution. The electrolyte solution comprises 1.5 mol/L or more of a lithium salt, or 1.0 mol/L or more of a lithium salt and 20% by volume or more of a phosphate ester derivative.

Abstract: The present invention has an object to provide a photosensitive resin composition for optical waveguide formation, which has low transmission loss and can form a waveguide pattern with high shape accuracy at low cost; an optical waveguide; and a method for producing an optical waveguide. The present invention provides a photosensitive resin composition for optical waveguide formation comprising at least: a polymer containing at least a (meth)acrylate structure unit having an epoxy structure, and a (meth)acrylate structure unit having a lactone structure and/or a vinyl monomer structure unit having an aromatic structure; and a photoacid generator, of which one or both of a core layer and a cladding layer are formed of a cured product.

Abstract: Provided are: a resin composition for the formation of an optical waveguide, which shows low transmission loss and high heat stability and enables to form a waveguide pattern at high shape accuracy and at low cost; an optical waveguide; a method of forming an optical waveguide; and an optical element using the method. A photosensitive resin composition is used, which includes a polyamic acid represented by a general formula (I) or a polyamic acid ester (A), a compound (B) having an epoxy group, and a compound (C) which generates an acid by being exposed to light.

Abstract: The present invention has an object to provide a photosensitive resin composition for optical waveguide formation, which has low transmission loss and can form a waveguide pattern with high shape accuracy at low cost; an optical waveguide; and a method for producing an optical waveguide. The present invention provides a photosensitive resin composition for optical waveguide formation comprising at least: a polymer containing at least a (meth)acrylate structure unit having an epoxy structure, and a (meth)acrylate structure unit having a lactone structure and/or a vinyl monomer structure unit having an aromatic structure; and a photoacid generator, of which one or both of a core layer and a cladding layer are formed of a cured product.

Abstract: There are provided polymer optical waveguide forming material, a polymer optical waveguide and a manufacturing method of the polymer optical waveguide which reduces transmission loss with good processability. The polymer optical waveguide forming material is comprised of a polymer containing norbornene-based structural units including a hydroxy group; a photoacid generator for generating acid by irradiation of an actinic ray; and a monomer component polymerized by acid generated by said photoacid generator.

Abstract: An optical connector 1 is for connecting a connection object 10 to an optical module 21. A slider 3 is slidably held by a housing 2 adapted for positioning the connection object and the optical module. The housing has a first positioning portion for receiving the connection object. The slider has a first pressing portion 3a for elastically pressing the connection object in a first direction toward the first positioning portion and a second pressing portion 3e that elastically acts in a second direction perpendicular to the first direction.

Abstract: A method of producing an optical waveguide connector in which the productivity of a ferrule member can be improved, and the connection loss with a counter connector can be suppressed to a low level is obtained. An optical waveguide connector 11 is obtained by performing: an aligning step of restricting the position of the tip end of an optical waveguide 2 passed through an insertion hole 13b of a ferrule member 13, by a positioning portion of a positioning member 16 which is opposedly placed at the tip end of the ferrule member 13, thereby aligning the optical waveguide 2 to the ferrule member 13; and a bonding step of filing a gap between the optical waveguide 2 which is passed through the insertion hole 13b, and the insertion hole 13b, with an adhesive agent to fix the optical waveguide 2 to the ferrule member 13.