Abstract: The present disclosure relates to a semiconductor structure and a manufacturing method thereof. The semiconductor structure includes: a substrate; a transistor, including a control terminal, a first terminal, and a second terminal; a first magnetic memory structure, a bottom electrode of which is electrically connected to the first terminal of the transistor; a second magnetic memory structure, a top electrode of which is electrically connected to the first terminal of the transistor, the bottom electrode of the first magnetic memory structure is located in a same layer with a bottom electrode of the second magnetic memory structure; a first bit line, electrically connected to a top electrode of the first magnetic memory structure; a second bit line, electrically connected to the bottom electrode of the second magnetic memory structure; and a selection line, electrically connected to a second terminal of the transistor.

Abstract: A sense amplifier, a memory and a method for controlling the sense amplifier are provided. The sense amplifier includes: an amplification module, arranged to read data in a memory cell; and a control module, electrically connected to the amplification module. In a first offset compensation stage of the sense amplifier, the control module is arranged to configure the amplification module to include a first inverter and a second inverter, and each of the first inverter and the second inverter is an inverter an input terminal and an output terminal connected to each other; and in a second offset compensation stage of the sense amplifier, the control module is arranged to configure the amplification module to include a current mirror structure.

Abstract: The sense amplifier includes: an amplification module configured to amplify a voltage transmitted by a bit line or a reference bit line, when the sense amplifier is at an amplification stage; a first switch module configured to control the amplification module to be disconnected from the reference bit line, when the sense amplifier performs a read operation for the bit line and is at the amplification stage. In the disclosure, the power consumption of the sense amplifier may be reduced.

Abstract: The disclosure provides a Sense Amplifier (SA), a memory and a method for controlling the SA, and relates to the technical field of semiconductor memories. The SA includes: an amplifier module; an offset voltage storage unit electrically connected to the amplifier module and configured to store an offset voltage of the amplifier module in an offset elimination stage of the SA; and a load compensation unit electrically connected to the amplifier module and configured to compensate a difference between loads of the amplifier module in an amplification stage of the SA. The disclosure may improve an accuracy of reading data of the SA.

Abstract: Embodiments of the disclosure provide a semiconductor structure and a method for manufacturing the same. The semiconductor structure includes: a substrate; a semiconductor pillar located on the substrate and a gate pillar located on the semiconductor pillar, in which the semiconductor pillar and the gate pillar both extend in a direction perpendicular to a plane of the substrate; a first word line extending in a first direction parallel to the plane of the substrate and surrounding the semiconductor pillar; and a semiconductor layer located above the semiconductor pillar and at least surrounding a sidewall of the gate pillar.

Abstract: A sense amplifier includes an amplification module and a control module electrically connected to the amplification module. Herein, in a case of reading a data in a memory cell on a first bit line, at an offset compensation stage of the sense amplifier, the control module is arranged to configure the amplification module to include a first diode structure, a first current mirror structure, and a first inverter with an input terminal and an output terminal connected to each other. In a case of reading a data in a memory cell on a second bit line, at the offset compensation stage of the sense amplifier, the control module is arranged to configure the amplification module to include a second diode structure, a second current mirror structure, and a second inverter with an input terminal and an output terminal connected to each other.

Abstract: A sense amplifier includes: an amplification circuit, configured to read data of a memory cell on a first bit line or a second bit line; and a first offset voltage storage cell and a second offset voltage storage cell, respectively and electrically connected to the amplification circuit, wherein in a case where the data in the memory cell on the first bit line is read, in an offset elimination stage of the sense amplifier, the sense amplifier is configured to store an offset voltage of the sense amplifier in the first offset voltage storage cell; and in a case where the data in the memory cell on the second bit line is read, in the offset elimination stage of the sense amplifier, the sense amplifier is configured to store the offset voltage of the sense amplifier in the second offset voltage storage cell.

Abstract: A sense amplifier, a memory and a method for controlling the sense amplifier are provided. The sense amplifier includes: an amplification module configured to read data in a storage unit on a first or second bit line; a control module electrically connected to the amplification module. When data in the storage unit on the first bit line is read, in a first amplification phase of the sense amplifier, the control module configures the amplification module to include a first current mirror structure and connects a mirror terminal of the first current mirror structure to the second bit line; when data in the storage unit on the second bit line is read, in the first amplification phase of the sense amplifier, the control module configures the amplification module to include a second current mirror structure and connects a mirror terminal of the second current mirror structure to the first bit line.

Abstract: The present disclosure provides a sense amplifier, a memory, and a data readout method, and relates to the field of semiconductor memory technologies. The sense amplifier includes a first PMOS transistor, a second PMOS transistor, a first NMOS transistor, a second NMOS transistor, a first switch, a second switch, a third switch, and a fourth switch. During the offset compensation stage of the sense amplifier, the switching states of the first switch to the fourth switch are controlled so that the first NMOS transistor and the second NMOS transistor are configured to be in a cross-coupled amplification mode, and the first PMOS transistor and the second PMOS transistor are configured to be in a diode connection mode. The present disclosure enables to realize the offset compensation of the sense amplifier and improves the correctness of data readout by the memory.

Abstract: The present disclosure relates to a semiconductor structure and a forming method thereof. The semiconductor structure includes: a substrate; a capacitive structure, located on a top surface of the substrate and including a plurality of capacitors arranged in an array along a first direction and a second direction, wherein the first direction and the second direction are each parallel to the top surface of the substrate, and the first direction intersects with the second direction; a transistor structure, located above the capacitive structure and including a plurality of active pillars and a plurality of word lines, wherein the active pillar is electrically connected to the capacitor, and the word line extends along the second direction and continuously cover the active pillars arranged at intervals along the second direction; and a bit line structure, located above the transistor structure and including a plurality of bit lines.

Abstract: Disclosed in the embodiments of the disclosure are a semiconductor structure and a manufacturing method therefor. The semiconductor structure includes: a substrate; a plurality of grooves, located in the substrate and extending in a first direction; a plurality of word line structures, located in the grooves; and a plurality of semiconductor layers, each at least partially located between a word line structure and an inner wall of a groove. The semiconductor layer includes oxide semiconductor material.

Abstract: A semiconductor structure includes a storage chip, a control chip, and a capacitor structure. The storage chip includes an array area. The control chip includes a peripheral area. The control chip and the storage chip are connected in a face-to-face bonding manner. The capacitor structure is located on a surface, away from a bonding surface, of the storage chip. The capacitor structure includes capacitors electrically connected to corresponding transistors in the array area.

Abstract: The present disclosure provides a semiconductor structure and a manufacturing method thereof. The method of manufacturing the semiconductor structure provided by the present disclosure includes: providing a substrate; forming a base pattern on the substrate, where the base pattern includes a plurality of bit lines arranged in parallel, and an isolation structure is disposed between adjacent two of the bit lines; forming a plurality of semiconductor pillars arranged in a direction of the bit line on a surface of each of the bit lines, where the bit line is electrically connected to the semiconductor pillar; forming a gate-all-around structure on a surface of the semiconductor pillar, where the gate-all-around structure includes a first insulating layer, a gate structure layer, and a second insulating layer that are sequentially disposed on a side surface of the semiconductor pillar.

Abstract: The present disclosure relates to the technical field of semiconductors, and provides a method of processing a photoresist layer, and a photoresist layer. The method of processing a photoresist layer includes: forming a photoresist layer on a target layer, where the photoresist layer includes a first part close to the target layer and a second part away from the target layer; performing first exposure processing on the photoresist layer, and forming an exposure image in the first part of the photoresist layer; processing the second part of the photoresist layer by using a first process, such that the second part forms a third part, where a photosensitivity of the third part is higher than that of the first part; and stripping the third part.

Abstract: The present disclosure relates to the technical field of semiconductors, and provides a method of processing a photoresist layer, and a photoresist layer. The method of processing a photoresist layer includes: forming a photoresist layer on a target layer, where the photoresist layer includes a first part away from the target layer and a second part close to the target layer; processing the photoresist layer by using a first process, such that a light absorption rate of the first part is less than a light absorption rate of the second part; performing first exposure processing on the photoresist layer to form an exposure image in the second part; and stripping the first part and performing first development processing on the photoresist layer, to pattern the second part into a photoresist pattern.

Abstract: The present disclosure provides a method of forming a photoresist pattern and a projection exposure apparatus. The forming method includes: providing a photoresist layer, and disposing the photoresist layer under a projection objective, wherein a light refracting plate is located between the photoresist layer and the projection objective; and performing an exposure processing on the photoresist layer through the projection objective and the light refracting plate, and forming an exposure image in the photoresist layer, wherein the light refracting plate is configured to reduce a wavelength of optical waves entering the photoresist layer.

Abstract: The present disclosure relates to the technical field of semiconductors, and provides a method of forming a photoresist pattern, and a photoresist structure. The method of forming a photoresist pattern includes: forming a photoresist structure on a target layer, where the photoresist structure includes a photoresist layer provided on the target layer, and an optical wave transmission layer provided on the photoresist layer; and performing exposure processing on the photoresist structure in a first medium, to form an exposure image in the photoresist layer, where the optical wave transmission layer is configured to improve lithographic resolution of the photoresist layer.

Abstract: Embodiment provides a semiconductor structure and a fabrication method thereof, and relates to the field of semiconductor technology. The method includes: providing a substrate having an array region including a first region and a second region arranged adjacently; and forming a first memory in the first region and forming a second memory in the second region by means of a same fabrication process, the fabrication process being a process configured for fabricating the first memory.

Abstract: Embodiments provide a layout and a processing method thereof, a storage medium and a program product. The layout has a first memory area and a second memory area. The layout includes a base substrate array pattern and a storage pattern, the base substrate array pattern includes a plurality of plug patterns spaced apart; and the storage pattern includes a magnetic tunnel junction pattern in the first memory area and a capacitor pattern in the second memory area. The magnetic tunnel junction pattern shares a partially overlapped area with a given one of the plurality of plug patterns in the first memory area, and the capacitor pattern shares a partially overlapped area with a given one of the plurality of plug patterns in the second memory area.

Abstract: Embodiment provides a semiconductor structure and a fabrication method thereof, and relates to the field of semiconductor technology. The fabrication method includes providing a substrate including a peripheral circuit region and an array region having a memory cell, where the peripheral circuit region includes a first region and a second region. In the present disclosure, a logic device configured to control the memory cell and a magnetic memory device are simultaneously fabricated in the peripheral circuit region by means of a process for fabricating a dynamic random access memory (DRAM), such that the same semiconductor structure has two types of memory structures at the same time. Compared with a technology for fabricating two types of memory structures separately, fabricating steps can be simplified, and fabricating costs can be reduced.