Abstract: A manufacturing method of a magnetic recording medium includes follows: forming a magnetic recording layer on a substrate; forming an under layer and a metal release layer that forms an alloy with the under layer on the magnetic recording layer in this order and forming an alloyed release layer by alloying the under layer and the metal release layer; forming a mask layer on the alloyed release layer; forming a resist layer on the mask layer; providing a protrusion-recess pattern by patterning the resist layer; transferring the protrusion-recess pattern to the mask layer; transferring the protrusion-recess pattern to the alloyed release layer; transferring the protrusion-recess pattern to the magnetic recording layer; dissolving the alloyed release layer by using a stripping solution and removing a layer formed on the alloyed release layer from an upper side of the magnetic recording layer.

Abstract: According to one embodiment, a magnetic recording medium is formed by performing gas ion irradiation by using a magnetism deactivating gas on a stack including a perpendicular magnetic recording layer, an Ru nonmagnetic underlayer containing a magnetism deactivating element selected from chromium, titanium, and silicon, and a nonmagnetic substrate. Before gas ion irradiation, the perpendicular magnetic recording layer contains platinum and at least one of iron and cobalt. Gas ion irradiation is performed using nitrogen gas alone or a gas mixture of nitrogen gas and at least one gas selected from the group consisting of helium, hydrogen, and B2H6.

Abstract: According to one embodiment, a pattern formation method includes forming a surface treatment polymer film on a substrate, applying a solution containing a monomer or oligomer of a surface treatment polymer material to a surface of the surface treatment polymer film, forming a self-assembled layer by coating the surface treatment polymer film with a coating solution containing a block copolymer having at least two types of polymer chains, and forming a microphase-separated structure in the self-assembled layer by annealing, and optionally removing one type of a polymer layer from the microphase-separated structure, thereby forming convex patterns by a remaining polymer layer.

Abstract: According to one embodiment, there is provided a magnetic recording medium which includes a base, a magnetic recording layer having convex-shaped magnetic layers, which is formed on the base, and a protective film formed on the magnetic recording layer. There are gaps in a region surrounded by the protective film, the surface of the base, and each side wall of each magnetic layer.

Abstract: The present disclosure provides a photoelectric conversion layer containing a semiconductor and plural metal-containing minute structures dispersed therein. The minute structures are minute structures (A) comprising metal material (?) or otherwise minute structures (B) comprising metal material (?) and material (?) selected from the group consisting of oxide, nitride and oxynitride of substances and the semiconductor. In the minute structures (B), the material (?) is on the surface of the metal material (?). Each of the minute structures has an equivalent circle diameter of 1 nm to 10 nm inclusive on the basis of the projected area when observed from a particular direction. The closest distance between adjacent two of the minute structures is 3 nm to 50 nm inclusive. The present disclosure also provides applications of the photoelectric conversion layer to a solar cell, a photodiode and an image sensor.

Abstract: An object of the present invention is to provide methods of discovering drugs effective for tough targets, which have conventionally been discovered only with difficulty. The present invention relates to novel methods for cyclizing peptide compounds, and novel peptide compounds and libraries comprising the same, to achieve the above object.

Abstract: According to one embodiment, in a method of manufacturing a magnetic recording medium which is configured such that a ferromagnetic recording part is formed on a substrate in a desired track pattern or a desired bit pattern, a ferromagnetic film is formed on the substrate, and then a mask is formed on the ferromagnetic film, the mask having an opening above a region for isolating the ferromagnetic film between tracks or bits. Subsequently, a B-based gas is radiated on the region of the ferromagnetic film through the opening of the mask, thereby increasing a B content of the region to nonmagnetize the region.

Abstract: According to one embodiment, a magnetic recording layer is coated with a fine particle coating solution containing fine particles coated with a protective layer containing a first additive including a straight-chain structure for increasing wettability to the magnetic recording layer, and a carboxy group or the like, and a second additive including a carboxy group or the like and a polymerizable functional group, each fine particle having, on at least a surface thereof, a material selected from Al, Si, Ti, V, Cr, Mn, Fe, Co, Ni, Zn, Y, Zr, Sn, Mo, Ta, W, and oxides thereof, thereby forming a fine particle monolayer, and heat or light energy is applied, thereby curing the protective layer and forming a periodic pattern.

Abstract: According to one embodiment, there is provided a pattern formation method including forming a target layer to be processed on a substrate, adding a second dispersion containing a polymer material including a polymer chain having a base metal at a terminal end and a second solvent to a first dispersion containing noble-metal microparticles and a first solvent, thereby preparing a noble-metal microparticle layer coating solution in which microparticles covered with the polymer material are dispersed, arranging the noble-metal microparticles covered with the polymer material on the target layer by using the noble-metal microparticle layer coating solution, and transferring a projections pattern of the noble-metal microparticles covered with the polymer material to the target layer.

Abstract: A patterning method includes steps of forming a first copolymer layer comprising a first diblock copolymer which has portions which are phase incompatible. The first copolymer layer is annealed to form a first phase pattern including a first phase dispersed in a second surrounding phase. The first copolymer is then etched forming a first topographic pattern that corresponds to the first phase pattern. A second copolymer layer of a second diblock copolymer is then formed over the first topographic pattern, and then annealed to generate a second phase pattern offset from the first topographic pattern. Etching is used to form a second topographic pattern corresponding to the second phase pattern. The first and second topographic patterns are then transferred to the substrate. The patterning method can be used, for example, to form patterned recording layers for magnetic storage devices.

Abstract: According to one embodiment, there is provided a pattern formation method including coating a substrate or mask layer with a fine particle coating solution containing fine particles including a protective group having a close surface polarity and containing, on at least surfaces thereof, a material selected from the group consisting of Al, Ti, V, Cr, Mn, Fe, Co, Ni, Zn, Y, Zr, Sn, Mo, Ta, W, and oxides thereof, a viscosity modifier, and a solvent for adjusting mixing of the viscosity modifier and the fine particles having the protective group, thereby forming a fine particle layer on the substrate or mask layer.

Abstract: According to one embodiment, there is provided a pattern formation method including coating a substrate or mask layer with a fine particle coating solution containing fine particles including a protective group having a close surface polarity and containing, on at least surfaces thereof, a material selected from the group consisting of Al, Ti, V, Cr, Mn, Fe, Co, Ni, Zn, Y, Zr, Sn, Mo, Ta, W, Au, Ag, Pd, Cu, Pt and oxides thereof, a viscosity modifier, and a solvent for adjusting mixing of the viscosity modifier and the fine particles having the protective group to form a fine particle layer on the substrate or mask layer.

Abstract: According to one embodiment, there is provided a method for forming a pattern including forming an island-like metal underlayer comprised of a first metal, a phase-separated release layer including a first metal, a second metal, and a metal oxide, a mask layer, and a resist layer on a processed layer in this order, forming a concave-convex pattern on the resist layer, transferring the pattern to the mask layer, the phase-separated release layer, and the processed layer in this order, dissolving the phase-separated release layer using a peeling liquid for dissolving the first metal and the second metal, and removing the mask layer from the processed layer to expose the concave-convex pattern.

Abstract: A manufacturing method of a magnetic recording medium includes steps of forming a magnetic recording layer, a first mask layer, a second mask layer containing silicon as primary component, a strip layer, a third mask layer, and a resist layer, a step of patterning the resist layer to provide a pattern, steps of transferring the pattern to the third mask layer, to the strip layer, and to the second mask layer, a step of removing the strip layer by wet etching and of stripping the third mask layer and the resist layer above the magnetic recording layer, steps of transferring the pattern to the first mask layer and to the magnetic recording layer, and a step of stripping the first mask layer remaining on the magnetic recording layer.

Abstract: According to one embodiment, a magnetic recording medium including a substrate and a magnetic recording layer formed on the substrate and including a plurality of projections is obtained. The array of the plurality of projections includes a plurality of domains in which the projections are regularly arranged, and a boundary region between the domains, in which the projections are irregularly arranged. The boundary region is formed along a perpendicular bisector of a line connecting the barycenters of adjacent projections.

Abstract: According to exemplary embodiments, a pattern forming method includes: forming a diblock copolymer coating film by applying coating liquid containing a diblock copolymer including a chain of a first polymer and a chain of a second polymer which is not compatible with the first polymer, and a homopolymer having affinity with the first polymer, on a substrate, and drying the liquid; and performing phase separation of the first polymer and the second polymer by providing a coating film for solvent annealing using a solvent having compatibility with the second polymer.

Abstract: According to one embodiment, there is provided a magnetic recording medium which includes a base, a magnetic recording layer having convex-shaped magnetic layers, which is formed on the base, and a protective film formed on the magnetic recording layer. There are gaps in a region surrounded by the protective film, the surface of the base, and each side wall of each magnetic layer.

Abstract: According to one embodiment, there is provided a method for producing a magnetic recording medium which includes forming a mask layer on a magnetic recording layer, applying metal fine particles on the mask layer, covering the metal fine particles with an overcoat layer, irradiating with energy beams through the overcoat layer so as to deactivate a protective coating of the metal fine particles, transferring a metal fine particle pattern from the mask layer to the magnetic recording layer, and removing the mask layer from the magnetic recording layer.

Abstract: According to one embodiment, there is provided a magnetic recording medium manufacturing method including forming a resist layer on a magnetic recording layer, patterning the resist layer, forming a magnetic pattern by performing ion implantation through the resist layer, partially modifying the surface of the magnetic recording layer, removing the resist, applying a self-organization material to the surface of the magnetic recording layer and forming a dotted mask pattern, and patterning the magnetic recording layer.

Abstract: A magnetic recording medium is manufactured by forming a magnetic recording layer on a substrate, forming a protective layer on the magnetic recording layer, executing a sputtering process using a target containing a first ingredient and a second ingredient to form on the protective layer a grain-state mask layer that includes grains formed of the first ingredient and grain boundaries between the grains formed of the second ingredient, etching the grain boundaries so that a projection pattern of the grains is formed, and transferring the projection pattern of the grains to the magnetic recording layer.