Patents by Inventor Kaori Kimura

Kaori Kimura has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 7978434
    Abstract: A magnetic recording medium includes recording regions formed on a substrate, isolation regions formed between the recording regions so as to define the recording regions, and recording dots formed of a dot-like magnetic recording layer and arrayed in the recording regions, the recording dots including first recording dots arrayed in a line in each edge part of each recording region along the isolation region and second recording dots arrayed into a regular lattice in a central part of each recording region. A distance between a first recording dot and a second recording dot which are nearest neighboring is larger than a distance between second recording dots which are nearest neighboring.
    Type: Grant
    Filed: September 18, 2007
    Date of Patent: July 12, 2011
    Assignee: Kabushiki Kaisha Toshiba
    Inventors: Kaori Kimura, Masatoshi Sakurai, Yoshiyuki Kamata
  • Publication number: 20110164337
    Abstract: In an example magnetic recording medium substrate, a plurality of recording tracks are formed on a substrate, each recording track being formed of a magnetic material. Non-recording sections are formed on the substrate, each non-recording section separating adjacent recording tracks. Each recording track includes a plurality of recording sections and connecting sections for connecting the recording sections adjacent thereto in a track longitudinal direction, and each connecting section has a cross-sectional area in a track width direction that is smaller than a cross-sectional area in a track width direction of adjacent recording sections.
    Type: Application
    Filed: March 14, 2011
    Publication date: July 7, 2011
    Applicant: Kabushiki Kaisha Toshiba
    Inventors: Kaori KIMURA, Masatoshi SAKURAI, Akira KIKITSU, Yoshiyuki KAMATA, Satoshi SHIROTORI, Hiroyuki HIEDA
  • Publication number: 20110165438
    Abstract: According to one embodiment, a method of manufacturing a discrete track recording medium includes forming protruded magnetic patterns on a substrate, and repeating processes of depositing a nonmagnetic material so as to be filled in recesses between the magnetic patterns and etching back the nonmagnetic material two or more times with rotating the substrate in a plane thereof by an angle less than one revolution.
    Type: Application
    Filed: March 15, 2011
    Publication date: July 7, 2011
    Applicant: KABUSHIKI KAISHA TOSHIBA
    Inventors: Yoshiyuki Kamata, Satoshi Shirotori, Kaori Kimura, Masatoshi Sakurai
  • Patent number: 7972523
    Abstract: According to one embodiment, a method of manufacturing a magnetic recording medium includes forming a magnetic recording layer, an oxidation inhibiting layer, a hard mask layer includes carbon on a substrate, coating the hard mask layer with a resist, transferring patterns of protrusions and recesses to the resist by imprinting to form resist patterns, sequentially performing etching of the hard mask layer using the resist patterns as masks, etching of the oxidation inhibiting layer, and etching and/or magnetism deactivation of the magnetic recording layer to form patterns of the magnetic recording layer, and sequentially performing stripping of the resist patterns, stripping of the hard mask layer and stripping of the oxidation inhibiting layer, in which ion beam etching is used for stripping the oxidation inhibiting layer.
    Type: Grant
    Filed: July 24, 2009
    Date of Patent: July 5, 2011
    Assignee: Kabushiki Kaisha Toshiba
    Inventors: Kaori Kimura, Yousuke Isowaki, Yoshiyuki Kamata, Masatoshi Sakurai
  • Patent number: 7967993
    Abstract: According to one embodiment, a method of manufacturing a magnetic recording medium includes forming a hard mask and a resist on a magnetic recording layer, imprinting a stamper on the resist to transfer patterns of protrusions and recesses, removing resist residues left in the recesses of the patterned resist, etching the hard mask using the patterned resist as a mask to transfer the patterns of protrusions and recesses, stripping the resist, and performing ion beam etching to remove the remaining hard mask and to modify a surface of the magnetic recording layer uncovered with the remaining hard mask.
    Type: Grant
    Filed: July 23, 2009
    Date of Patent: June 28, 2011
    Assignee: Kabushiki Kaisha Toshiba
    Inventors: Yousuke Isowaki, Kaori Kimura, Yoshiyuki Kamata, Masatoshi Sakurai
  • Patent number: 7936537
    Abstract: It is possible to improve the recording and reproducing S/N ratio, the reproduction signal intensity, and the degree of high density recording. There are provided a plurality of recording tracks formed on a substrate, each recording track being formed of a magnetic material, and non-recording sections formed on the substrate, each non-recording section separating adjacent recording tracks, each recording track including a plurality of recording sections and connecting sections for connecting the recording sections adjacent thereto in a track longitudinal direction, and each connecting section having a cross-sectional area in a track width direction that is smaller than a cross-sectional area in a track width direction of adjacent recording sections.
    Type: Grant
    Filed: July 15, 2009
    Date of Patent: May 3, 2011
    Assignee: Kabushiki Kaisha Toshiba
    Inventors: Kaori Kimura, Masatoshi Sakurai, Akira Kikitsu, Yoshiyuki Kamata, Satoshi Shirotori, Hiroyuki Hieda
  • Patent number: 7927467
    Abstract: According to one embodiment, a method of manufacturing a discrete track recording medium includes forming protruded magnetic patterns on a substrate, and repeating processes of depositing a nonmagnetic material so as to be filled in recesses between the magnetic patterns and etching back the nonmagnetic material two or more times with rotating the substrate in a plane thereof by an angle less than one revolution.
    Type: Grant
    Filed: March 9, 2009
    Date of Patent: April 19, 2011
    Assignee: Kabushiki Kaisha Toshiba
    Inventors: Yoshiyuki Kamata, Satoshi Shirotori, Kaori Kimura, Masatoshi Sakurai
  • Patent number: 7923136
    Abstract: According to one embodiment, a magnetic recording medium includes magnetic patterns made of a ferromagnetic recording layer containing Co, and a nonmagnetic layer which separates the magnetic patterns and has a lower Co concentration than the magnetic patterns.
    Type: Grant
    Filed: April 28, 2009
    Date of Patent: April 12, 2011
    Assignee: Kabushiki Kaisha Toshiba
    Inventors: Kaori Kimura, Yoshiyuki Kamata, Satoshi Shirotori, Masatoshi Sakurai
  • Patent number: 7898768
    Abstract: A patterned media has a substrate, and a magnetic recording layer on the substrate including protruded magnetic patterns and a nonmagnetic material filled in between the protruded magnetic patterns. In the patterned media, a depth Db and a depth Da, which are defined that Db is a depth from a surface of the magnetic patterns to a surface of the nonmagnetic material filled in a first central part between the magnetic patterns adjacent to each other in a cross-track direction or a down-track direction, and Da is a depth from a surface of the magnetic patterns to a surface of the nonmagnetic material filled in a second central part in a portion surrounded by the magnetic patterns, have a relationship that the depth Da is greater than the depth Db.
    Type: Grant
    Filed: March 15, 2007
    Date of Patent: March 1, 2011
    Assignee: Kabushiki Kaisha Toshiba
    Inventors: Yoshiyuki Kamata, Masatoshi Sakurai, Satoshi Shirotori, Kaori Kimura
  • Publication number: 20110011830
    Abstract: A magnetic recording media includes a toroidal substrate, a surface thereof is divided into a recording area located in a central part between an outer peripheral edge and an inner peripheral edge, edge areas located within 100 ?m or more and 2,000 ?m or less from the outer and inner peripheral edges, respectively, and adjacent areas located between the edge areas and the recording area, respectively, a magnetic film on the substrate, and a protective film on the magnetic film, in which the magnetic film is thinner in the edge areas than that in the adjacent areas, and at least a part of the protective film in the edge areas is thicker than that in the adjacent areas.
    Type: Application
    Filed: September 27, 2010
    Publication date: January 20, 2011
    Applicant: Kabushiki Kaisha Toshiba
    Inventors: Satoshi Shirotori, Masatoshi Sakurai, Akira Kikitsu, Yoshiyuki Kamata, Kaori Kimura
  • Publication number: 20110014496
    Abstract: According to one embodiment, there is provided a method of manufacturing a magnetic recording medium, including forming a first hard mask including carbon as a main component, a second hard mask including a main component other than carbon and a resist on a magnetic recording layer, contacting a stamper to the resist to transfer patterns of protrusions and recesses to the resist, removing residues in the recesses of the patterned resist, etching the second hard mask, etching the first hard mask, patterning the magnetic recording layer, and removing the first hard mask, the method further including, between etching the first hard mask and removing the first hard mask, removing the second hard mask remaining on the protrusions of the first hard mask, and removing a contaminating layer on a surface of the first hard mask by a mixed gas of oxygen-based gas and a fluorine compound.
    Type: Application
    Filed: July 16, 2010
    Publication date: January 20, 2011
    Applicant: KABUSHIKI KAISHA TOSHIBA
    Inventors: Kaori KIMURA, Yousuke ISOWAKI, Yoshiyuki KAMATA, Masatoshi SAKURAI
  • Publication number: 20110000880
    Abstract: According to one embodiment, a method of manufacturing a magnetic recording medium includes forming a resist on a magnetic recording layer, imprinting a stamper to the resist to transfer patterns of protrusions and recesses, and partially etching the magnetic recording layer in areas not covered with patterns of the resist used as masks by ion beam etching using a mixed gas of He and N2 as well as modifying a remainder of the magnetic recording layer to leave behind a nonmagnetic layer having a reduced thickness.
    Type: Application
    Filed: September 14, 2010
    Publication date: January 6, 2011
    Applicant: Kabushiki Kaisha Toshiba
    Inventors: Yoshiyuki Kamata, Kaori Kimura, Yousuke Isowaki, Masatoshi Sakurai
  • Publication number: 20100302679
    Abstract: A patterned media has a substrate, and a magnetic recording layer on the substrate including protruded magnetic patterns and a nonmagnetic material filled in between the protruded magnetic patterns. In the patterned media, a depth Db and a depth Da, which are defined that Db is a depth from a surface of the magnetic patterns to a surface of the nonmagnetic material filled in a first central part between the magnetic patterns adjacent to each other in a cross-track direction or a down-track direction, and Da is a depth from a surface of the magnetic patterns to a surface of the nonmagnetic material filled in a second central part in a portion surrounded by the magnetic patterns, have a relationship that the depth Da is greater than the depth Db.
    Type: Application
    Filed: August 2, 2010
    Publication date: December 2, 2010
    Applicant: Kabushiki Kaisha Toshiba
    Inventors: Yoshiyuki Kamata, Masatoshi Sakurai, Satoshi Shirotori, Kaori Kimura
  • Patent number: 7826176
    Abstract: A magnetic recording media includes a toroidal substrate, a surface thereof is divided into a recording area located in a central part between an outer peripheral edge and an inner peripheral edge, edge areas located within 100 ?m or more and 2,000 ?m or less from the outer and inner peripheral edges, respectively, and adjacent areas located between the edge areas and the recording area, respectively, a magnetic film on the substrate, and a protective film on the magnetic film, in which the magnetic film is thinner in the edge areas than that in the adjacent areas, and at least a part of the protective film in the edge areas is thicker than that in the adjacent areas.
    Type: Grant
    Filed: March 22, 2007
    Date of Patent: November 2, 2010
    Assignee: Kabushiki Kaisha Toshiba
    Inventors: Satoshi Shirotori, Masatoshi Sakurai, Akira Kikitsu, Yoshiyuki Kamata, Kaori Kimura
  • Publication number: 20100247974
    Abstract: It is possible to improve the recording and reproducing S/N ratio, the reproduction signal intensity, and the degree of high density recording. There are provided a plurality of recording tracks formed on a substrate, each recording track being formed of a magnetic material, and non-recording sections formed on the substrate, each non-recording section separating adjacent recording tracks, each recording track including a plurality of recording sections and connecting sections for connecting the recording sections adjacent thereto in a track longitudinal direction, and each connecting section having a cross-sectional area in a track width direction that is smaller than a cross-sectional area in a track width direction of adjacent recording sections.
    Type: Application
    Filed: June 2, 2010
    Publication date: September 30, 2010
    Applicant: Kabushiki Kaisha Toshiba
    Inventors: Kaori Kimura, Masatoshi Sakurai, Akira Kikitsu, Yoshiyuki Kamata, Satoshi Shirotori, Hiroyuki Hieda
  • Publication number: 20100214695
    Abstract: According to one embodiment, a method of manufacturing a magnetic recording medium includes forming a first hard mask, a second hard mask and a resist on a magnetic recording layer, imprinting a stamper to the resist to transfer patterns of protrusions and recesses to the resist, removing residues remaining in the recesses of the patterned resist by means of a first etching gas, etching the second hard mask by means of the first etching gas using the patterned resist as a mask to transfer the patterns to the second hard mask, etching the first hard mask by means of a second etching gas different from the first etching gas using the second hard mask as a mask to transfer the patterns to the first hard mask, and performing ion beam etching in order to deactivate the magnetic recording layer exposed in the recesses and to remove the second hard mask.
    Type: Application
    Filed: February 12, 2010
    Publication date: August 26, 2010
    Applicant: KABUSHIKI KAISHA TOSHIBA
    Inventors: Yousuke Isowaki, Kaori Kimura, Yoshiyuki Kamata, Masatoshi Sakurai
  • Publication number: 20100214694
    Abstract: According to one embodiment, a method of manufacturing a magnetic recording medium includes forming a first hard mask, a second hard mask and a resist on a magnetic recording layer, imprinting a stamper to the resist to transfer patterns of protrusions and recesses to the resist, removing residues remaining in the recesses of the patterned resist, etching the second hard mask by using the patterned resist as a mask to transfer the patterns of protrusions and recesses to the second hard mask, etching the first hard mask by using the second hard mask as a mask to transfer the patterns of protrusions and recesses to the first hard mask, removing the second hard mask remaining on the protrusions of the first hard mask, and deactivating the magnetic recording layer exposed in the recesses by means of ion beam irradiation.
    Type: Application
    Filed: February 12, 2010
    Publication date: August 26, 2010
    Applicant: KABUSHIKI KAISHA TOSHIBA
    Inventors: Kaori KIMURA, Yousuke ISOWAKI, Yoshiyuki KAMATA, Masatoshi SAKURAI
  • Publication number: 20100215989
    Abstract: According to one embodiment, a method of manufacturing a magnetic recording medium includes forming a first hard mask, a second hard mask and a resist on a magnetic recording layer, imprinting a stamper to the resist to transfer patterns of protrusions and recesses to the resist, removing residues remaining in the recesses of the patterned resist, etching the second hard mask by using the patterned resist as a mask to transfer the patterns of protrusions and recesses to the second hard mask, etching the first hard mask by using the second hard mask as a mask to transfer the patterns of protrusions and recesses to the first hard mask, subjecting the magnetic recording layer exposed in the recesses to modifying treatment to change an etching rate, and deactivating the magnetic recording layer exposed in the recesses.
    Type: Application
    Filed: February 12, 2010
    Publication date: August 26, 2010
    Applicant: KABUSHIKI KAISHA TOSHIBA
    Inventors: Yousuke ISOWAKI, Kaori KIMURA, Yoshiyuki KAMATA, Masatoshi SAKURAI
  • Patent number: 7760467
    Abstract: It is possible to improve the recording and reproducing S/N ratio, the reproduction signal intensity, and the degree of high density recording. There are provided a plurality of recording tracks formed on a substrate, each recording track being formed of a magnetic material, and non-recording sections formed on the substrate, each non-recording section separating adjacent recording tracks, each recording track including a plurality of recording sections and connecting sections for connecting the recording sections adjacent thereto in a track longitudinal direction, and each connecting section having a cross-sectional area in a track width direction that is smaller than a cross-sectional area in a track width direction of adjacent recording sections.
    Type: Grant
    Filed: April 5, 2006
    Date of Patent: July 20, 2010
    Assignee: Kabushiki Kaisha Toshiba
    Inventors: Kaori Kimura, Masatoshi Sakurai, Akira Kikitsu, Yoshiyuki Kamata, Satoshi Shirotori, Hiroyuki Hieda
  • Publication number: 20100147791
    Abstract: According to one embodiment, a method of manufacturing a magnetic recording medium includes forming a first hard mask, a second hard mask and a resist film on a magnetic recording layer, imprinting a stamper on the resist film to transfer patterns of recesses and protrusions, removing residues remained in recess of the patterned resist film, etching the second hard mask using the patterned resist film as a mask to transfer patterns of recesses and protrusions, etching the first hard mask using the patterned second hard mask as a mask to transfer patterns of recesses and protrusions, and deactivating magnetism of the magnetic recording layer exposed in the recesses together with removing the second hard mask by ion-beam etching.
    Type: Application
    Filed: December 11, 2009
    Publication date: June 17, 2010
    Applicant: KABUSHIKI KAISHA TOSHIBA
    Inventors: Yousuke ISOWAKI, Kaori KIMURA, Yoshiyuki KAMATA, Masatoshi SAKURAI