Patents by Inventor Karel Diederick Van Der Mast
Karel Diederick Van Der Mast has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 11024481Abstract: A scanning electron microscope. The scanning electron microscope may include a sliding vacuum seal between the electron optical imaging system and the sample carrier with a first plate having a first aperture associated with the electron optical imaging system and resting against a second plate having a second aperture associated with the sample carrier. The first plate and/or the second plate includes a groove circumscribing the first and/or second aperture. The scanning electron microscope may include a detector movable relative to the electron beam. The scanning electron microscope may include a motion control unit for moving a sample carrier along a collision free path.Type: GrantFiled: August 31, 2020Date of Patent: June 1, 2021Assignee: FEI CompanyInventors: Karel Diederick Van Der Mast, Adrianus Franciscus Johannes Hammen, Wilhelmus Henrica Cornelis Theuws, Sander Richard Marie Stoks
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Publication number: 20200402760Abstract: A scanning electron microscope. The scanning electron microscope may include a sliding vacuum seal between the electron optical imaging system and the sample carrier with a first plate having a first aperture associated with the electron optical imaging system and resting against a second plate having a second aperture associated with the sample carrier. The first plate and/or the second plate includes a groove circumscribing the first and/or second aperture. The scanning electron microscope may include a detector movable relative to the electron beam. The scanning electron microscope may include a motion control unit for moving a sample carrier along a collision free path.Type: ApplicationFiled: August 31, 2020Publication date: December 24, 2020Inventors: Karel Diederick VAN DER MAST, Adrianus Franciscus Johannes HAMMEN, Wilhelmus Henrica Cornelis THEUWS, Sander Richard Marie STOKS
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Patent number: 10796879Abstract: A scanning electron microscope (1) including a sliding vacuum seal (20) between an electron optical imaging system (2) and a sample carrier (10) with a first plate (22) having a first aperture (24) associated with the electron optical imaging system and resting against a second plate (26) having a second aperture (28) associated with the sample carrier. The first plate and/or the second plate includes a groove (40) circumscribing the first and/or second aperture. The scanning electron microscope may include a detector (8) movable relative to the electron beam. The scanning electron microscope may include a motion control unit for moving a sample carrier along a collision free path.Type: GrantFiled: March 3, 2017Date of Patent: October 6, 2020Assignee: Phenom-World Holding B.V.Inventors: Karel Diederick Van Der Mast, Adrianus Franciscus Johannes Hammen, Wilhelmus Henrica Cornelis Theuws, Sander Richard Marie Stoks
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Patent number: 10580613Abstract: Sample stage, e.g. for use in a scanning electron microscope. The sample stage includes a base, a sample carrier, and an actuator assembly arranged for moving the sample carrier in at least one direction substantially parallel to the base. The actuator assembly is arranged so as not to contribute to the mechanical stiffness of the sample stage from the sample carrier to the base.Type: GrantFiled: June 3, 2019Date of Patent: March 3, 2020Assignee: Phenom-World Holding B.V.Inventors: Gerhardus Bernardus Stamsnijder, Paul Cornelis Maria van den Bos, Ton Antonius Cornelis Henricus Kluijtmans, Sander Richard Marie Stoks, Adrianus Franciscus Johannes Hammen, Karel Diederick van der Mast
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Publication number: 20190287756Abstract: Sample stage, e.g. for use in a scanning electron microscope. The sample stage includes a base, a sample carrier, and an actuator assembly arranged for moving the sample carrier in at least one direction substantially parallel to the base. The actuator assembly is arranged so as not to contribute to the mechanical stiffness of the sample stage from the sample carrier to the base.Type: ApplicationFiled: June 3, 2019Publication date: September 19, 2019Applicant: Phenom-World Holding B.V.Inventors: Gerhardus Bernardus Stamsnijder, Paul Cornelis Maria van den Bos, Ton Antonius Cornelis Henricus Kluijtmans, Sander Richard Marie Stoks, Adrianus Franciscus Johannes Hammen, Karel Diederick van der Mast
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Publication number: 20190103245Abstract: A scanning electron microscope (1) including a sliding vacuum seal (20) between an electron optical imaging system (2) and a sample carrier (10) with a first plate (22) having a first aperture (24) associated with the electron optical imaging system and resting against a second plate (26) having a second aperture (28) associated with the sample carrier. The first plate and/or the second plate includes a groove (40) circumscribing the first and/or second aperture. The scanning electron microscope may include a detector (8) movable relative to the electron beam. The scanning electron microscope may include a motion control unit for moving a sample carrier along a collision free path.Type: ApplicationFiled: March 3, 2017Publication date: April 4, 2019Inventors: Karel Diederick VAN DER MAST, Adrianus Franciscus Johannes HAMMEN, Wilhelmus Henrica Cornelis; THEUWS, Sander Richard Marie STOKS
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Publication number: 20170316913Abstract: Sample stage, e.g. for use in a scanning electron microscope. The sample stage includes a base, a sample carrier, and an actuator assembly arranged for moving the sample carrier in at least one direction substantially parallel to the base. The actuator assembly is arranged so as not to contribute to the mechanical stiffness of the sample stage from the sample carrier to the base.Type: ApplicationFiled: November 11, 2015Publication date: November 2, 2017Inventors: Gerhardus Bernardus Stamsnijder, Paul Cornelis Maria van den Bos, Ton Antonius Cornelis Henricus Kluijtmans, Sander Richard Marie Stoks, Adrianus Franciscus Johannes Hammen, Karel Diederick van der Mast
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Patent number: 9610727Abstract: An imprint lithography apparatus is disclosed that has a first array of template holders, a second array of template holders, and a substrate table arranged to support a substrate to be imprinted, wherein the first array of template holders is arranged to hold an array of imprint templates that can be used to imprint a first array of patterns onto the substrate, and the second array of template holders is arranged hold an array of imprint templates that can be used to imprint a second array of patterns onto the substrate, the patterns imprinted by the second array being interspersed between the patterns imprinted by the first array.Type: GrantFiled: June 13, 2014Date of Patent: April 4, 2017Assignee: ASML NETHERLANDS B.V.Inventors: Yvonne Wendela Kruijt-Stegeman, Johan Frederik Dijksman, Aleksey Yurievich Kolesnychenko, Karel Diederick Van Der Mast, Klaus Simon, Raymond Jacobus Wilhelmus Knaapen, Krassimir Todorov Krastev, Sander Frederik Wuister
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Publication number: 20140291879Abstract: An imprint lithography apparatus is disclosed that has a first array of template holders, a second array of template holders, and a substrate table arranged to support a substrate to be imprinted, wherein the first array of template holders is arranged to hold an array of imprint templates that can be used to imprint a first array of patterns onto the substrate, and the second array of template holders is arranged hold an array of imprint templates that can be used to imprint a second array of patterns onto the substrate, the patterns imprinted by the second array being interspersed between the patterns imprinted by the first array.Type: ApplicationFiled: June 13, 2014Publication date: October 2, 2014Applicant: ASML NETHERLANDS B.V.Inventors: Yvonne Wendela KRUIJT-STEGEMAN, Johan Frederik Dijksman, Aleksey Yurievich Kolesnychenko, Karel Diederick Van Der Mast, Klaus Simon, Raymond Jacobus Knaapen, Krassimir Todorov Krastev, Sander Frederik Wuister
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Patent number: 8848195Abstract: In a method for determining one or more properties of a substrate, scatterometry spectra can be measured from one or more targets on the substrate. Reconstructions of each of said spectra can be performed to derive one or more values for the property of the substrate, by comparing representations of each of the measured spectra with one or more modeled representations of spectra calculated using variable parameter values. At least one parameter in the reconstruction for each spectrum can be linked to the value of the parameter used in the reconstruction for a different spectrum.Type: GrantFiled: October 22, 2009Date of Patent: September 30, 2014Assignee: ASML Netherlands B.V.Inventors: Christian Marinus Leewis, Marcus Adrianus Van De Kerkhof, Karel Diederick Van Der Mast, Peter Clement Paul Vanoppen, Ruben Alvarez Sanchez
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Patent number: 8753557Abstract: An imprint lithography apparatus is disclosed that has a first array of template holders, a second array of template holders, and a substrate table arranged to support a substrate to be imprinted, wherein the first array of template holders is arranged to hold an array of imprint templates that can be used to imprint a first array of patterns onto the substrate, and the second array of template holders is arranged hold an array of imprint templates that can be used to imprint a second array of patterns onto the substrate, the patterns imprinted by the second array being interspersed between the patterns imprinted by the first array.Type: GrantFiled: December 20, 2011Date of Patent: June 17, 2014Assignee: ASML Netherlands B.V.Inventors: Yvonne Wendela Kruijt-Stegeman, Johan Frederik Dijksman, Aleksey Yurievich Kolesnychenko, Karel Diederick Van Der Mast, Klaus Simon, Raymond Jacobus Knaapen, Krassimir Todorov Krastev, Sander Frederik Wuister
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Patent number: 8363220Abstract: A method of determining an overlay error in which asymmetry of a first order of a diffraction pattern is modeled as being a weighted sum of harmonics. Both the first order harmonic and higher order harmonics are non-negligible and weights for both are calculated. The weights are calculated using three or more of sets of superimposed patterns using a least mean square method.Type: GrantFiled: April 15, 2010Date of Patent: January 29, 2013Assignee: ASML Netherlands B.V.Inventors: Willem Marie Julia Marcel Coene, Karel Diederick Van Der Mast, Maurits Van Der Schaar
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Publication number: 20120091629Abstract: An imprint lithography apparatus is disclosed that has a first array of template holders, a second array of template holders, and a substrate table arranged to support a substrate to be imprinted, wherein the first array of template holders is arranged to hold an array of imprint templates that can be used to imprint a first array of patterns onto the substrate, and the second array of template holders is arranged hold an array of imprint templates that can be used to imprint a second array of patterns onto the substrate, the patterns imprinted by the second array being interspersed between the patterns imprinted by the first array.Type: ApplicationFiled: December 20, 2011Publication date: April 19, 2012Applicant: ASML NETHERLANDS B.V.Inventors: Yvonne Wendela KRUIJT-STEGEMAN, Raymond Jacobus Knaapen, Johan Frederik Dijksman, Krassimir Todorov Krastev, Sander Frederik Wuister, Aleksey Yurievich Kolesnychencko, Karel Diederick Van Der Mast, Klaus Simon
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Publication number: 20120092636Abstract: A metrology apparatus is configured to measure a property of a substrate. The metrology apparatus includes an illumination system configured to condition a radiation beam, an objective lens configured to project radiation onto the substrate, a detector configured to detect radiation reflected from a surface of the substrate, and an image field selecting device in the path of the reflected radiation constructed and arranged to select an area of an image field associated with the substrate. The selected area corresponds with a predetermined portion of the substrate. This arrangement may enable selection of different shapes and sizes of targets on the substrate and may enable in-die measurement of selected parameters.Type: ApplicationFiled: April 30, 2009Publication date: April 19, 2012Applicant: ASML Netherlands B.V.Inventors: Karel Diederick Van Der Mast, Nicolaas Antonius Allegondu Van Asten, Arie Jeffrey Den Boef, Marcus Adrianus Van De Kerkhof
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Publication number: 20120033223Abstract: In a method for determining one or more properties of a substrate, scatterometry spectra can be measured from one or more targets on the substrate. Reconstructions of each of said spectra can be performed to derive one or more values for the property of the substrate, by comparing representations of each of the measured spectra with one or more modeled representations of spectra calculated using variable parameter values. At least one parameter in the reconstruction for each spectrum can be linked to the value of the parameter used in the reconstruction for a different spectrum.Type: ApplicationFiled: October 22, 2009Publication date: February 9, 2012Applicant: ASML Netherlands B.V.Inventors: Christian Marinus Leewis, Marcus Adrianus Van De Kerkhof, Karel Diederick Van Der Mast, Peter Clement Paul Vanoppen, Ruben Alvarez Sanchez
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Patent number: 8100684Abstract: An imprint lithography apparatus is disclosed that has a first array of template holders, a second array of template holders, and a substrate table arranged to support a substrate to be imprinted, wherein the first array of template holders is arranged to hold an array of imprint templates that can be used to imprint a first array of patterns onto the substrate, and the second array of template holders is arranged hold an array of imprint templates that can be used to imprint a second array of patterns onto the substrate, the patterns imprinted by the second array being interspersed between the patterns imprinted by the first array.Type: GrantFiled: February 24, 2009Date of Patent: January 24, 2012Assignee: ASML Netherlands B.V.Inventors: Yvonne Wendela Kruijt-Stegeman, Johan Frederik Dijksman, Aleksey Yurievich Kolesnychenko, Karel Diederick Van Der Mast, Klaus Simon, Raymond Jacobus Knaapen, Krassimir Todorov Krastev, Sander Frederik Wuister
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Patent number: 7961309Abstract: A metrology tool is arranged to measure a parameter of a substrate that has been provided with a pattern in a lithographic apparatus. The metrology tool includes a base frame, a substrate table, a sensor, a displacement system, a balance mass, and a bearing. The substrate table is constructed and arranged to hold the substrate. The sensor is constructed and arranged to measure a parameter of the substrate. The displacement system is configured to displace the substrate table or the sensor with respect to the other in a first direction. The bearing is configured to movably support the first balance mass so as to be substantially free to translate in a direction opposite of the first direction in order to counteract a displacement of the substrate table or sensor in the first direction.Type: GrantFiled: August 5, 2009Date of Patent: June 14, 2011Assignee: ASML Netherlands B.V.Inventors: Reinder Teun Plug, Arie Jeffrey Maria Den Boef, Karel Diederick Van Der Mast
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Patent number: 7878791Abstract: A lithographic apparatus is disclosed that has a first substrate table arranged to hold a substrate and a second substrate table arranged to hold a substrate, an imprint template holder arranged to hold an imprint template, and an imprintable medium dispenser, wherein the first substrate table is moveable between a first position located at or adjacent to the imprintable medium dispenser, and a second position located at or adjacent to the imprint template holder, and the second substrate table is moveable between the first and second positions, such that the first and second substrate tables swap positions.Type: GrantFiled: March 1, 2006Date of Patent: February 1, 2011Assignee: ASML Netherlands B.V.Inventors: Klaus Simon, Karel Diederick Van Der Mast, Johan Frederik Dijksman
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Publication number: 20100284008Abstract: A method of determining an overlay error in which asymmetry of a first order of a diffraction pattern is modeled as being a weighted sum of harmonics. Both the first order harmonic and higher order harmonics are non-negligible and weights for both are calculated. The weights are calculated using three or more of sets of superimposed patterns using a least mean square method.Type: ApplicationFiled: April 15, 2010Publication date: November 11, 2010Applicant: ASML Netherlands B.V.Inventors: Willem Marie Julia Marcel COENE, Karel Diederick VAN DER MAST, Maurits VAN DER SCHAAR
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Patent number: 7656518Abstract: In a method of measuring asymmetry in a scatterometer, a target portion is illuminated twice, first with 0° of substrate rotation and secondly with 180° of substrate rotation. One of those images is rotated and then that rotated image is subtracted from the other image. In this way, asymmetry of the scatterometer can be corrected.Type: GrantFiled: March 30, 2007Date of Patent: February 2, 2010Assignee: ASML Netherlands B.V.Inventors: Arie Jeffrey Den Boef, Karel Diederick Van Der Mast, Maurits Van Der Schaar