Abstract: Various options for improving throughput in an e-beam lithography apparatus are described. A slider lens moves in synchronism with the scanning motion of the electron beam.

Abstract: Electron-optical rotationally symmetrical lenses inevitably suffer from spherical aberration which often imposes a limit on the resolution. This lens defect cannot be eliminated by compensation by means of rotationally symmetrical fields. In order to enhance the resolution nevertheless, it has already been proposed to correct the spherical aberration by means of a correction device provided with two hexapoles (24, 26) and two rotationally symmetrical transmission lens systems (28, 30). Each transmission lens system in the known correction device consists of two lenses. According to the invention, one or both transmission lens systems can be replaced by a single lens without reducing the corrective capacity (when only one system 30 is replaced) or while reducing it only slightly (when both systems 28, 30 are replaced).

Abstract: In an electron microscope having a comparatively high resolution, a tilting motion about a point in an object to be imaged is imparted to the illuminating electron beam in order to adjust the coherence of the exposure of an object. For the exposure aperture, the aperture given by the degree of deflection then takes the place of the very small aperture of the illuminating electron beam. A preferred embodiment includes a correction device for the non-axial passage of the electron beam through a subsequent lens in the electron microscope. Operation with a conical exposure involving a present apex is also feasible.