Patents by Inventor Karen K. Gleason

Karen K. Gleason has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 10583677
    Abstract: Methods of printing nanoparticulate ink using nanoporous print stamps are disclosed. A nanoporous print stamp can include a substrate, a patterned arrangement of carbon nanotubes disposed on the substrate, and a secondary material disposed on the carbon nanotubes to reduce capillary-induced deformation of the patterned arrangement of carbon nanotubes when printing nanoparticulate ink. Some methods include loading a nanoporous print stamp with nanoparticulate colloidal ink such that the nanoparticulate colloidal ink is drawn into microstructures of the patterned arrangement of carbon nanotubes via capillary wicking. Nanoparticulate colloidal ink can include nanoparticles dispersed in a solution.
    Type: Grant
    Filed: December 6, 2017
    Date of Patent: March 10, 2020
    Assignee: Massachusetts Institute of Technology
    Inventors: Anastasios John Hart, Sanha Kim, Hossein Sojoudi, Karen K. Gleason
  • Patent number: 10543516
    Abstract: Liquid-impregnated textured coatings containing one or more materials on a variety of surfaces are described herein. The coatings can be prepared by chemical vapor deposition techniques or other techniques known in the art. The texture can be random, fractal, or patterned. The texture can be pores, cavities, and/or micro- and/or nanoscale features/structures. The capillary forces arising from the nano- or microscopic texture of the coating stabilizes the liquid within the textured features and at the surface of the coating resulting in non-wetting properties for a variety of surfaces. They coatings may be formed in a single layer or as multiple layers. In order to maximize ease of deposition and processing, the coating may be formed of graded composition to optimize both bulk and surface properties without the need for multiple coatings.
    Type: Grant
    Filed: April 29, 2014
    Date of Patent: January 28, 2020
    Assignee: GVD Corporation
    Inventors: Aleksandr J. White, William Shannan O'Shaughnessy, Seth Johnson, Karen K. Gleason
  • Publication number: 20200020489
    Abstract: Disclosed are methods for fabricating supercapacitors (SCs) via vapor printing, specifically oxidative chemical vapor deposition (oCVD). Also disclosed are methods of using the supercapacitors, in particular for energy storage devices and photovoltaics.
    Type: Application
    Filed: February 7, 2018
    Publication date: January 16, 2020
    Inventors: Andong Liu, Karen K. Gleason, Peter Kovacik
  • Patent number: 10519326
    Abstract: Disclosed are methods of preparing antifouling and chlorine-resistant coatings on reverse osmosis membranes with initiated chemical vapor deposition. The coatings enhance the stability and lifetime of membranes without sacrificing performance characteristics, such as permeability or salt retention.
    Type: Grant
    Filed: April 7, 2014
    Date of Patent: December 31, 2019
    Assignee: Massachusetts Institute of Technology
    Inventors: Karen K. Gleason, Rong Yang
  • Patent number: 10510971
    Abstract: Described are materials and methods for fabricating low-voltage MHz ion-gel-gated thin film transistor devices using patternable defect-free ionic liquid gels. Ionic liquid gels made by the initiated chemical vapor deposition methods described herein exhibit a capacitance of about 1 ?F cm?2 at about 1 MHz, and can be as thin as about 20 nm to about 400 nm.
    Type: Grant
    Filed: July 18, 2018
    Date of Patent: December 17, 2019
    Assignee: Massachusetts Institute of Technology
    Inventors: Andong Liu, Karen K. Gleason, Minghui Wang
  • Publication number: 20190241785
    Abstract: Disclosed are thermally conductive quinoid-type conjugated polymer thin films. One such film comprises conjugated poly(3-hexylthiophene) (P3HT). The thin films can be fabricated using oxidative chemical vapor deposition (oCVD), which offers unique advantages for integrating polymer films into various devices. By avoiding the use of solvents in the deposition of monomers and oxidants and undesirable solvent-derived surface-tension driven effects, such as dewetting, the oCVD coatings can conformally coat complex geometries, can be scaled to large areas, and can be fabricated at relatively low substrate temperatures on electrically insulating substrates. Disclosed is the formation of ordered polymer structures with rigid backbones achieved by oCVD with stacking in the transverse direction via ?-? interactions. P3HT films with record-high thermal conductivity of 2.2 W/m-K near room temperature have been prepared.
    Type: Application
    Filed: January 17, 2019
    Publication date: August 8, 2019
    Inventors: Gang Chen, Karen K. Gleason, Yanfei Xu, Xiaoxue Wang
  • Publication number: 20190131554
    Abstract: Described are materials and methods for fabricating low-voltage MHz ion-gel-gated thin film transistor devices using patternable defect-free ionic liquid gels. Ionic liquid gels made by the initiated chemical vapor deposition methods described herein exhibit a capacitance of about 1 ?F cm?2 at about 1 MHz, and can be as thin as about 20 nm to about 400 nm.
    Type: Application
    Filed: July 18, 2018
    Publication date: May 2, 2019
    Inventors: Andong Liu, Karen K. Gleason, Minghui Wang
  • Publication number: 20190055371
    Abstract: Disclosed are compositions of electroactive polymers (EAPs) having improved performance stability. In the EAP compositions, a cross-linked polymer is deposited onto the surface of the EAP by vapor-deposition methods. Upon contact with an aqueous solution (e.g., an aqueous electrolyte solution), the vapor-deposited polymeric network becomes a hydrogel that encapsulates the EAPs. By modulating precursors and vapor deposition conditions, the mesh size of the resultant hydrogel coatings can be controlled to accommodate the key species that interact with the EAPs.
    Type: Application
    Filed: July 16, 2018
    Publication date: February 21, 2019
    Inventors: Andong Liu, Karen K. Gleason, T. Alan Hatton, Xianwen Mao
  • Publication number: 20190022594
    Abstract: Disclosed are methods of preparing antifouling coatings on reverse osmosis membranes with initiated vapor deposition or oxidative vapor deposition. The coatings enhance the stability and lifetime of membranes without sacrificing performance characteristics, such as permeability or salt retention.
    Type: Application
    Filed: July 20, 2018
    Publication date: January 24, 2019
    Inventors: Minghui Wang, Karen K. Gleason, Peter Kovacik
  • Patent number: 10155843
    Abstract: Described herein are facile, one-step initiated plasma enhanced chemical vapor deposition (iPECVD) methods of synthesizing hyper-thin (e.g., sub-100 nm) and flexible metal organic covalent network (MOCN) layers. As an example, the MOCN may be made from zinc tetraphenylporphyrin (ZnTPP) building units. When deposited on a membrane support, the MOCN layers demonstrate gas separation exceeding the upper bounds for multiple gas pairs while reducing the flux as compared to the support alone.
    Type: Grant
    Filed: November 18, 2016
    Date of Patent: December 18, 2018
    Assignees: Massachusetts Institute of Technology, Luxembourg Institute of Science and Technology
    Inventors: Karen K. Gleason, Minghui Wang, Nicolas D. Boscher, Patrick Choquet
  • Patent number: 10118426
    Abstract: A nanoporous stamp for printing a variety of materials is disclosed. The nanoporous stamp may include a substrate and an array of carbon nanotubes disposed on and attached to the substrate. The array of carbon nanotubes can have an etched top surface and a wettable, nanoporous structure, and may include a coating thereon. The nanoporous stamp can be used in a variety of printing applications, and can print, among other things, colloidal and non-colloidal inks on a variety of substrates with a high degree of accuracy and fidelity.
    Type: Grant
    Filed: November 25, 2015
    Date of Patent: November 6, 2018
    Assignee: MASSACHUSETTS INSTITUTE OF TECHNOLOGY
    Inventors: Anastasios John Hart, Sanha Kim, Hossein Sojoudi, Karen K. Gleason
  • Publication number: 20180122648
    Abstract: Disclosed is a method for the fabrication of polymeric topcoat via initiated chemical vapor deposition (iCVD) or photoinitiated chemical vapor deposition (piCVD) in conjunction with directed self-assembly (DSA) of block copolymers to generate high resolution patterns. A topcoat deposited by iCVD or piCVD allows for conformal, ultra-thin, uniform, pinhole-free coatings. iCVD or piCVD topcoat enables the use of a diversity of block copolymer (BCP) materials for DSA and facilitates the direct and seamless integration of the topcoats for a pattern transfer process.
    Type: Application
    Filed: August 24, 2017
    Publication date: May 3, 2018
    Inventors: Do Han Kim, Hyo Seon Suh, Priya Moni, Karen K. Gleason, Paul Franklin Nealey
  • Patent number: 9957618
    Abstract: Described herein are reactors capable of sequentially or simultaneously depositing thin-film polymers onto a substrate by oxidative chemical vapor deposition (oCVD), initiated chemical vapor deposition (iCVD), and plasma-enhanced chemical vapor deposition (PECVD). The single-unit CVD reactors allow for the use of more than one CVD process on the same substrate without the risk of inadvertently exposing the substrate to ambient conditions when switching processes. Furthermore, the ability to deposit simultaneously polymers made by two different CVD processes allows for the exploration of new materials. In addition to assisting in the deposition of polymer films, plasma processes may be used to pretreat substrate surfaces before polymer deposition, or to clean the internal surfaces of the reactor between experiments.
    Type: Grant
    Filed: February 28, 2012
    Date of Patent: May 1, 2018
    Assignee: Massachusetts Institute of Technology
    Inventors: Dhiman Bhattacharyya, Karen K. Gleason, Miles C. Barr
  • Publication number: 20180104972
    Abstract: Methods of printing nanoparticulate ink using nanoporous print stamps are disclosed. A nanoporous print stamp can include a substrate, a patterned arrangement of carbon nanotubes disposed on the substrate, and a secondary material disposed on the carbon nanotubes to reduce capillary-induced deformation of the patterned arrangement of carbon nanotubes when printing nanoparticulate ink. Some methods include loading a nanoporous print stamp with nanoparticulate colloidal ink such that the nanoparticulate colloidal ink is drawn into microstructures of the patterned arrangement of carbon nanotubes via capillary wicking. Nanoparticulate colloidal ink can include nanoparticles dispersed in a solution.
    Type: Application
    Filed: December 6, 2017
    Publication date: April 19, 2018
    Inventors: Anastasios John HART, Sanha KIM, Hossein SOJOUDI, Karen K. GLEASON
  • Patent number: 9884341
    Abstract: Disclosed is an organic coating with a high degree of global planarization. Further disclosed is an iPECVD-based method of coating a substrate with an organic layer having a high degree of global planarization. Disclosed is a flexible, alternating organic and inorganic multi-layer coating with low water permeability, a high-degree of transparency, and a high-degree of global planarization. Also disclosed is an iPECVD-based method of coating a substrate with the alternating organic and inorganic multi-layer coating.
    Type: Grant
    Filed: August 10, 2012
    Date of Patent: February 6, 2018
    Assignee: Massachusetts Institute of Technology
    Inventors: Karen K. Gleason, Anna M. Coclite
  • Publication number: 20180009001
    Abstract: Disclosed are methods for forming thin polymeric films on a surface of an article by deposition from the vapor phase. In certain embodiments, the method comprises depositing the polymeric film in situ inside a space or enclosure contained within the article. In other embodiments, the method comprises depositing a film from vapor phase by thermal degradation of an initiator precursor without the need for an external filament.
    Type: Application
    Filed: January 29, 2016
    Publication date: January 11, 2018
    Inventors: Adam T. Paxson, David C. Borrelli, Kripa K. Varanasi, Karen K. Gleason
  • Patent number: 9849483
    Abstract: Coated articles and methods and systems for coating the articles are described herein. The methods and systems described herein include, but are not limited to, steps for actively or passively controlling the temperature during the coating process, steps for providing intimate contact between the substrate and the support holding the substrate in order to maximize energy transfer, and/or steps for preparing gradient coatings. Methods for depositing high molecular weight polymeric coatings, end-capped polymer coatings, coatings covalently bonded to the substrate or one another, metallic coatings, and/or multilayer coatings are also disclosed. Deposition of coatings can be accelerated and/or improved by applying an electrical potential and/or through the use of inert gases.
    Type: Grant
    Filed: June 17, 2016
    Date of Patent: December 26, 2017
    Assignee: GVD Corporation
    Inventors: Erik S. Handy, Aleksander J. White, W. Shannan O'Shaughnessy, Hilton G. Pryce Lewis, Neeta P. Bansal, Karen K. Gleason
  • Patent number: 9816070
    Abstract: Articles and methods for stem cell differentiation are generally described. In some embodiments, an article for stem cell differentiation may comprise an oxygen permeable substrate having at least a portion of a surface coated with a matrix. The matrix may allow the surface chemistry of the substrate to be altered, such that the cell-substrate surface interactions may be finely controlled without substantially affecting the oxygen permeability of the substrate. The surface chemistry may be altered to promote directed stem cell differentiation by, e.g., modification of the matrix surface with a specific density of biological molecules. In some embodiments, methods for stem cell differentiation may comprise directing the differentiation of stem cells on the articles, described herein, under suitable environmental conditions.
    Type: Grant
    Filed: June 13, 2014
    Date of Patent: November 14, 2017
    Assignee: Massachusetts Institute of Technology
    Inventors: Clark K. Colton, Karen K. Gleason, Anna M. Coclite, Amanda R. Dilenno
  • Patent number: 9793479
    Abstract: Embodiments described herein provide methods for processing various polymer materials for use in devices, such as photovoltaic devices. In some cases, oxidative chemical vapor deposition (oCVD) may be used to process conjugated polymers, including relatively insoluble conjugated polymers. The methods described herein provide processing techniques that may be used to synthesize and/or process polymers, such as unsubstituted thiophene.
    Type: Grant
    Filed: December 14, 2012
    Date of Patent: October 17, 2017
    Assignee: Massachusetts Institute of Technology
    Inventors: Karen K. Gleason, Vladimir Bulovic, Miles C. Barr, David C. Borrelli
  • Patent number: 9714463
    Abstract: Electrowetting devices coated with one or more polymeric layers and methods of making and using thereof are described herein. The coatings may be formed in a single layer or as multiple layers. In one embodiment the first layer deposited serves as an insulating layer of high dielectric strength while the second layer deposited serves as a hydrophobic layer of low surface energy. These materials may themselves be deposited as multiple layers to eliminate pinhole defects and maximize device yield. In one embodiment the insulating layer would be a vapor deposited silicone polymeric material including, but not limited to, polytrivinyltrimethylcyclotrisiloxane or polyHVDS. In another embodiment the insulating layer may be a vapor deposited ceramic such as SiO2 with very little carbon content. In a further embodiment the insulating layer may be composed of alternating layers of a siloxane material and a ceramic material.
    Type: Grant
    Filed: December 28, 2012
    Date of Patent: July 25, 2017
    Assignee: GVD Corporation
    Inventors: Aleksandr J. White, W. Shannan O'Shaughnessy, Erik S. Handy, Hilton G. Pryce Lewis, Karen K. Gleason