Patents by Inventor Katsuaki Saito

Katsuaki Saito has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Plasma processing apparatus and the method of the same
    Patent number: 5211825
    Abstract: A plasma processing apparatus performs a sample processing and cleaning processing. The sample processing is carried out by generating a reaction gas plasma within a vacuum vessel of the apparatus using an electron cyclotron resonance excitation. The cleaning processing is carried out to clean the inner wall of the vacuum vessel by generating a cleaning gas plasma within the vacuum vessel. Generation of the cleaning gas plasma takes place by using either one of the following processes:(1) The plasma diameter during the cleaning processing is made larger than that during the sample processing. The end of the plasma during cleaning processing is made to reach the inside wall of the vacuum vessel.(2) The cleaning gas plasma is scanned within the vacuum vessel.
    Type: Grant
    Filed: September 23, 1991
    Date of Patent: May 18, 1993
    Assignee: Hitachi, Ltd.
    Inventors: Katsuaki Saito, Takuya Fukuda, Michio Ohue, Tadasi Sonobe