Patents by Inventor Katsuhiko Kemmochi
Katsuhiko Kemmochi has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 9216923Abstract: A mold for making a fused silica crucible includes a cylindrical can having an interior bore. A graphite insert is received in the bore and has an upper surface adapted to form the lower surface of the crucible while the interior bore of the can forms the side wall of the crucible. Silica grain is deposited in the mold while it rotates. Bores formed in the can above the insert and in the insert draw air through the silica during fusion.Type: GrantFiled: July 25, 2011Date of Patent: December 22, 2015Assignee: Shin-Etsu Quartz Products Co., Ltd.Inventors: Katsuhiko Kemmochi, Larry Baer, Carl Hagstrom
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Patent number: 9003832Abstract: A silica crucible is made in a mold cavity of the type in which ambient atmosphere can be drawn through silica grain in the cavity. In one embodiment, a silica grain layer is formed in the mold cavity and gas, which may comprise helium, nitrogen, hydrogen, or a mixture thereof, is introduced into the mold cavity. The silica grain layer is heated while substantially no ambient atmosphere is drawn through the silica grain. Thereafter, at least a portion of the silica grain layer is fused while drawing ambient atmosphere through the silica grain. The gas displaces air in the mold cavity thereby reducing nitrogen oxides and ozone.Type: GrantFiled: November 20, 2009Date of Patent: April 14, 2015Assignees: Heraeus Shin-Etsu America, Inc., Heraeus Quarzglas GmbH & Co. KGInventors: Katsuhiko Kemmochi, Thomas Kayser, Robert Joseph Coolich, Walter Lehmann
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Publication number: 20140352605Abstract: Making a barium-doped silica crucible includes forming a crucible by introducing into a rotating crucible mold bulk silica grains to form a bulky wall. After heating the interior of the mold to fuse the bulk silica grains, an inner silica grain, doped with barium, is introduced into the crucible. Residual heat or additional heat at least partially melts the inner silica grain, allowing the barium-doped silica layer to fuse to the wall of the crucible to form a glossy inner layer. Next, at least a part of the barium-doped silica layer is roughened. Also described are the crucible made thereby as well as silicon ingots made using the crucibles as described herein.Type: ApplicationFiled: August 28, 2013Publication date: December 4, 2014Applicant: Heraeus Shin-Etsu America, Inc.Inventors: Michael R. Fallows, Jeffrey S. Bailey, JR., Katsuhiko Kemmochi
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Patent number: 8496752Abstract: During a CZ or similar process, a silica crucible is held in a graphite or similar susceptor while being heated to above between about 1580 and 1620 degrees C. Vents or grooves formed in at least one of the outer surface of the crucible and the inner surface of the susceptor permit gasses to vent upwardly and out from between the crucible and susceptor. This permits gas evolved from the crucible as a result of the heat to be vented rather than expanding between the crucible and susceptor thereby deforming the crucible.Type: GrantFiled: September 2, 2009Date of Patent: July 30, 2013Assignee: Heraeus Shin-Etsu America, Inc.Inventors: Katsuhiko Kemmochi, Robert Joseph Coolich, Michael Randall Fallows
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Publication number: 20130025319Abstract: A mold for making a fused silica crucible includes a cylindrical can having an interior bore. A graphite insert is received in the bore and has an upper surface adapted to form the lower surface of the crucible while the interior bore of the can forms the side wall of the crucible. Silica grain is deposited in the mold while it rotates. Bores formed in the can above the insert and in the insert draw air through the silica during fusion.Type: ApplicationFiled: July 25, 2011Publication date: January 31, 2013Applicant: HERAEUS SHIN-ETSU AMERICA, INC.Inventors: Katsuhiko Kemmochi, Larry Baer, Carl Hagstrom
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Patent number: 8361228Abstract: A fused glass crucible includes a collar of doped aluminum silica that defines uppermost and outermost surfaces of the crucible. The melt line that defines the surface of molten silicon in the crucible may be substantially at the lower end of the collar or slightly above it. Crystallization of the collar makes it hard and therefore supports the remaining uncrystallized portion of the crucible above the melt line. The melt line may also be below the lower end of the collar, especially if the melt is drawn down or poured early in the process. Because there is little or no overlap or because the overlap does not last long, the doped aluminum collar is not damaged by the heat of from the melt.Type: GrantFiled: April 1, 2010Date of Patent: January 29, 2013Assignees: Heraeus Shin-Etsu America, Inc., Shin-Etsu Quartz Products Co., Ltd.Inventors: Katsuhiko Kemmochi, Yasuo Ohama
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Patent number: 8272234Abstract: A method of making a silica crucible in a mold cavity of the type in which air is drawing through silica grain placed in the mold cavity. A pure silica grain layer is formed on top of a natural silica grain layer. At least a portion of the purse silica grain layer is fused while substantially no air is drawn through the silica grain. Any remaining pure silica grain and a least a portion of the natural silica grain layer is fused while drawing a substantially higher volume of air through the silica. At least a portion of the fused pure silica grain layer is then sublimated.Type: GrantFiled: February 12, 2009Date of Patent: September 25, 2012Assignee: Heraeus Shin-Etsu America, Inc.Inventors: Katsuhiko Kemmochi, Robert Joseph Coolich
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Patent number: 7993556Abstract: A rotating mold has a plurality of air channels that communicate with a cavity formed in the mold. Silica grain is deposited in the rotating mold and then formed into the shape of a crucible having a lower portion that comprises a substantially uniformly thick wall. An upper portion of the grain is formed into a substantially narrowed wall portion about the perimeter of the formed shape. The silica grain is heated, and a pump draws gas through the air channels while the silica fuses. There is a pressure drop across the narrowed wall portion. After fusing, the upper portion of the crucible, including the narrowed wall portion, is cut off.Type: GrantFiled: August 8, 2007Date of Patent: August 9, 2011Assignees: Heraeus Shin-Etsu America, Inc., Shin-Etsu Quartz Products Co., Ltd.Inventors: Katsuhiko Kemmochi, Yasuo Ohama
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Publication number: 20110123738Abstract: A silica crucible is made in a mold cavity of the type in which ambient atmosphere can be drawn through silica grain in the cavity. In one embodiment, a silica grain layer is formed in the mold cavity and gas, which may comprise helium, nitrogen, hydrogen, or a mixture thereof, is introduced into the mold cavity. The silica grain layer is heated while substantially no ambient atmosphere is drawn through the silica grain. Thereafter, at least a portion of the silica grain layer is fused while drawing ambient atmosphere through the silica grain. The gas displaces air in the mold cavity thereby reducing nitrogen oxides and ozone.Type: ApplicationFiled: November 20, 2009Publication date: May 26, 2011Applicants: HERAEUS SHIN-ETSU AMERICA, INC., HERAEUS QUARZGLAS GMBH & CO. KGInventors: Katsuhiko Kemmochi, Thomas Kayser, Robert Joseph Coolich, Walter Lehmann
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Publication number: 20110048315Abstract: During a CZ or similar process, a silica crucible is held in a graphite or similar susceptor while being heated to above between about 1580 and 1620 degrees C. Vents or grooves formed in at least one of the outer surface of the crucible and the inner surface of the susceptor permit gasses to vent upwardly and out from between the crucible and susceptor. This permits gas evolved from the crucible as a result of the heat to be vented rather than expanding between the crucible and susceptor thereby deforming the crucible.Type: ApplicationFiled: September 2, 2009Publication date: March 3, 2011Applicant: Heraeus Shin-Etsu America, Inc.Inventors: Katsuhiko Kemmochi, Robert Joseph Coolich, Michael Randall Fallows
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Publication number: 20100186662Abstract: A fused glass crucible includes a collar of doped aluminum silica that defines uppermost and outermost surfaces of the crucible. The melt line that defines the surface of molten silicon in the crucible may be substantially at the lower end of the collar or slightly above it. Crystallization of the collar makes it hard and therefore supports the remaining uncrystallized portion of the crucible above the melt line. The melt line may also be below the lower end of the collar, especially if the melt is drawn down or poured early in the process. Because there is little or no overlap or because the overlap does not last long, the doped aluminum collar is not damaged by the heat of from the melt.Type: ApplicationFiled: April 1, 2010Publication date: July 29, 2010Applicants: HERAEUS SHIN-ETSU AMERICA, INC., SHIN-ETSU QUARTZ PRODUCTS CO., LTD.Inventors: Katsuhiko Kemmochi, Yasuo Ohama
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Publication number: 20100154701Abstract: A method of making a silica crucible in a mold cavity of the type in which air is drawing through silica grain placed in the mold cavity. A pure silica grain layer is formed on top of a natural silica grain layer. At least a portion of the purse silica grain layer is fused while substantially no air is drawn through the silica grain. Any remaining pure silica grain and a least a portion of the natural silica grain layer is fused while drawing a substantially higher volume of air through the silica. At least a portion of the fused pure silica grain layer is then sublimated.Type: ApplicationFiled: February 12, 2009Publication date: June 24, 2010Applicant: HERAEUS SHIN-ETSU AMERICA, INC.Inventors: Katsuhiko Kemmochi, Robert Joseph Coolich
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Patent number: 7716948Abstract: A fused glass crucible includes a collar of doped aluminum silica that defines uppermost and outermost surfaces of the crucible. The melt line that defines the surface of molten silicon in the crucible may be substantially at the lower end of the collar or slightly above it. Crystallization of the collar makes it hard and therefore supports the remaining uncrystallized portion of the crucible above the melt line. The melt line may also be below the lower end of the collar, especially if the melt is drawn down or poured early in the process. Because there is little or no overlap or because the overlap does not last long, the doped aluminum collar is not damaged by the heat of from the melt.Type: GrantFiled: December 18, 2006Date of Patent: May 18, 2010Assignees: Heraeus Shin-Etsu America, Inc., Shin-Etsu Quartz Products Co., Ltd.Inventors: Katsuhiko Kemmochi, Yasuo Ohama
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Patent number: 7556764Abstract: A fused silica crucible having a nozzle is formed by first inserting a preformed silica glass tube into the lower portion of a graphite mold. The tube is aligned with a vertical axis about which the mold is rotated while silica grain is poured into the mold and shaped in the form of the crucible. A graphite plug inserted into the top of the tube keeps the grain out of the tube. Electrodes create a plasma gas ball that fuses the grain and forms it to the tube. Although the graphite plug is covered with grain, the molten silica recedes from the top of the plug during fusion thus forming the nozzle to the crucible.Type: GrantFiled: November 9, 2005Date of Patent: July 7, 2009Assignee: Heraeus Shin-Etsu America, Inc.Inventors: Katsuhiko Kemmochi, Yasuo Ohama
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Publication number: 20090041960Abstract: A rotating mold has a plurality of air channels that communicate with a cavity formed in the mold. Silica grain is deposited in the rotating mold and then formed into the shape of a crucible having a lower portion that comprises a substantially uniformly thick wall. An upper portion of the grain is formed into a substantially narrowed wall portion about the perimeter of the formed shape. The silica grain is heated, and a pump draws gas through the air channels while the silica fuses. There is a pressure drop across the narrowed wall portion. After fusing, the upper portion of the crucible, including the narrowed wall portion, is cut off.Type: ApplicationFiled: August 8, 2007Publication date: February 12, 2009Applicants: HERAEUS SHIN-ETSU AMERICA, INC., SHIN-ETSU QUARTZ PRODUCTS CO., LTD.Inventors: Katsuhiko Kemmochi, Yasuo Ohama
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Patent number: 7427327Abstract: A silica glass crucible includes a thin barium-doped inner layer, a stable, bubble-free intermediate layer, and a stable opaque outer layer. The fusion process of the present invention controls the dynamic gas balance at the fusion front where formed grain is melted to dense fused silica. The crucible demonstrates reduced bubble growth during a Czochralski process. As a result of the thin barium-doped layer and the reduced bubble growth, the inner surface of the crucible is uniformly minimally textured during a CZ process. The present crucible is especially suited for intense CZ processes for manufacturing silicon ingots used for solar cells or with silicon that is heavily doped with antimony, boron, or arsenic.Type: GrantFiled: September 28, 2006Date of Patent: September 23, 2008Assignee: Heraeus Shin-Etsu America, Inc.Inventors: Katsuhiko Kemmochi, Yasuo Ohama
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Publication number: 20080141929Abstract: A fused glass crucible includes a collar of doped aluminum silica that defines uppermost and outermost surfaces of the crucible. The melt line that defines the surface of molten silicon in the crucible may be substantially at the lower end of the collar or slightly above it. Crystallization of the collar makes it hard and therefore supports the remaining uncrystallized portion of the crucible above the melt line. The melt line may also be below the lower end of the collar, especially if the melt is drawn down or poured early in the process. Because there is little or no overlap or because the overlap does not last long, the doped aluminum collar is not damaged by the heat of from the melt.Type: ApplicationFiled: December 18, 2006Publication date: June 19, 2008Applicants: HERAEUS SHIN-ETSU AMERICA, INC., SHIN-ETSU QUARTZ PRODUCTS CO., LTD.Inventors: Katsuhiko Kemmochi, Yasuo Ohama
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Patent number: 7383696Abstract: A silica glass crucible includes a stable, bubble-free inner layer and an opaque outer layer, both layers demonstrating reduced bubble growth during a Czochralski process. When used in the CZ process, little volume change is observed in the crucible wall, and the crucible has little influence on melt level. The present crucible is especially suited for slow silicon ingot pulling with reduced crystalline defects. The fusion process of the present invention controls the dynamic gas balance at the fusion front where formed grain is melted to dense fused silica.Type: GrantFiled: September 8, 2005Date of Patent: June 10, 2008Assignee: Heraeus Shin-Etsu America, Inc.Inventors: Katsuhiko Kemmochi, Robert Mosier, Yasuo Ohama
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Publication number: 20070102133Abstract: A fused silica crucible having a nozzle is formed by first inserting a preformed silica glass tube into the lower portion of a graphite mold. The tube is aligned with a vertical axis about which the mold is rotated while silica grain is poured into the mold and shaped in the form of the crucible. A graphite plug inserted into the top of the tube keeps the grain out of the tube. Electrodes create a plasma gas ball that fuses the grain and forms it to the tube. Although the graphite plug is covered with grain, the molten silica recedes from the top of the plug during fusion thus forming the nozzle to the crucible.Type: ApplicationFiled: November 9, 2005Publication date: May 10, 2007Applicant: Heraeus Shin-Etsu America, Inc.Inventors: Katsuhiko Kemmochi, Yasuo Ohama
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Publication number: 20070051297Abstract: A silica glass crucible includes a thin barium-doped inner layer, a stable, bubble-free intermediate layer, and a stable opaque outer layer. The fusion process of the present invention controls the dynamic gas balance at the fusion front where formed grain is melted to dense fused silica. The crucible demonstrates reduced bubble growth during a Czochralski process. As a result of the thin barium-doped layer and the reduced bubble growth, the inner surface of the crucible is uniformly minimally textured during a CZ process. The present crucible is especially suited for intense CZ processes for manufacturing silicon ingots used for solar cells or with silicon that is heavily doped with antimony, boron, or arsenic.Type: ApplicationFiled: September 28, 2006Publication date: March 8, 2007Applicant: Heraeus Shin-Etsu America, Inc.Inventors: Katsuhiko Kemmochi, Yasuo Ohama