Patents by Inventor Katsuhiko Murakami

Katsuhiko Murakami has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20210289156
    Abstract: A solid-state image capturing element includes: a pair of first floating diffusion layers arranged in a direction perpendicular to a predetermined direction; a pair of second floating diffusion layers arranged in the perpendicular direction and adjacent to the pair of first floating diffusion layers in the predetermined direction; a first connection circuit configured to select at least one of the pair of first floating diffusion layers and to connect the selected first floating diffusion layer to a predetermined first wire; a second connection circuit configured to select at least one of the pair of second floating diffusion layers and to connect the selected second floating diffusion layer to the first wire; and an output circuit configured to output a signal according to an amount of charge of at least one of the pair of first floating diffusion layers or the pair of second floating diffusion layers.
    Type: Application
    Filed: March 13, 2020
    Publication date: September 16, 2021
    Applicant: Sony Semiconductor Solutions Corporation
    Inventors: Katsuhiko Hanzawa, Yoshikazu Nitta, Hirotaka Murakami, Kazumasa Nishimura, Pude Mark, Christopher Moule Eric
  • Publication number: 20210140225
    Abstract: A first end portion of a connecting part of a connecting member reaches a locked member arranged such that the thickness direction of one of two construction materials is an axial direction N, and a second end portion of the connecting part reaches the other one of the two construction materials. The second end portion is formed to have a torsion angle ? as an inclination angle to the axial direction N. When the second end portion is coupled with the other construction material by a coupling fitting, the torsion angle ? reduces or disappears, a torsion angle to the axial direction N is generated in the first end portion, the first end portion locks on the locked member, and the connecting member connects the two construction materials.
    Type: Application
    Filed: July 2, 2019
    Publication date: May 13, 2021
    Inventors: Masanori KOBAYASHI, Shigeo YAMAGAMI, Katsuhiko MURAKAMI
  • Publication number: 20200373012
    Abstract: Samples each including a feature amount and a label indicating one of a first value and a second value are classified into three or more clusters according to their feature amounts. Some of the clusters are combined to form a combined cluster on the basis of information on the number of samples with labels of the first value. The accuracy level of each sample with respect to the first value or the second value is calculated on the basis of the result of classifying into the combined cluster and the remaining clusters. Then, machine learning is performed using samples whose accuracy levels do not meet a prescribed condition more preferentially than samples whose accuracy levels meet the prescribed condition.
    Type: Application
    Filed: May 15, 2020
    Publication date: November 26, 2020
    Applicant: FUJITSU LIMITED
    Inventor: Katsuhiko Murakami
  • Patent number: 10126660
    Abstract: A multilayer film reflector is a multilayer film reflector that includes a first uniform period multilayer film, an adjustment layer, and a second uniform period multilayer film in this order from a substrate side. A combination of the following (a) to (c) is set to each region or each position within a reflection surface. (a) Reflection characteristics of the single first uniform period multilayer film, (b) reflection characteristics of the single second uniform period multilayer film, and (c) a film thickness of the adjustment layer.
    Type: Grant
    Filed: January 5, 2016
    Date of Patent: November 13, 2018
    Assignee: NIKON CORPORATION
    Inventors: Noriaki Kandaka, Katsuhiko Murakami
  • Publication number: 20170052290
    Abstract: A multilayer film reflective mirror for reflecting incident light is provided with: a substrate; a first multilayer film formed by alternately layering a Mo layer and a Si layer on a surface of the substrate; a detachable layer detachable from the first multilayer film; and a second multilayer film formed by alternately layering the Mo layer and the Si layer on the detachable layer, and the second multilayer film is removable by detaching the detachable layer by dissolving it with acid. When reflectance of the multilayer film reflective mirror is reduced, the reflectance can be increased by a simple operation.
    Type: Application
    Filed: August 23, 2016
    Publication date: February 23, 2017
    Applicant: NIKON CORPORATION
    Inventor: Katsuhiko MURAKAMI
  • Publication number: 20160246178
    Abstract: A multilayer film reflector is a multilayer film reflector that includes a first uniform period multilayer film, an adjustment layer, and a second uniform period multilayer film in this order from a substrate side. A combination of the following (a) to (c) is set to each region or each position within a reflection surface. (a) Reflection characteristics of the single first uniform period multilayer film, (b) reflection characteristics of the single second uniform period multilayer film, and (c) a film thickness of the adjustment layer.
    Type: Application
    Filed: January 5, 2016
    Publication date: August 25, 2016
    Inventors: Noriaki KANDAKA, Katsuhiko MURAKAMI
  • Patent number: 8809818
    Abstract: Provided is an EUV light source which brings a target into the plasma state to radiate EUV light from the generated plasma. The target is one of a plurality of discrete targets. The surface area of each target is 1.5 times or more of that of a sphere which has the same material and the same mass as those of the target.
    Type: Grant
    Filed: November 30, 2009
    Date of Patent: August 19, 2014
    Assignee: Nikon Corporation
    Inventor: Katsuhiko Murakami
  • Patent number: 8121254
    Abstract: On a multilayer film mirror, a protective layer is formed having a varied composition in the depth direction. The protective layer includes an interface side layer formed on a thin film layer, i.e., the outermost layer of a multilayer film, a surface side layer provided on the interface side layer as the outermost surface of an optical element, and an intermediate layer. The interface side layer has properties such as providing relative absorption of non-exposure light from a light source. The surface side layer suppresses oxidation of the surface of the multilayer film.
    Type: Grant
    Filed: July 24, 2009
    Date of Patent: February 21, 2012
    Assignee: Nikon Corporation
    Inventors: Katsuhiko Murakami, Takaharu Komiya
  • Publication number: 20100190113
    Abstract: On a multilayer film mirror, a protective layer is formed having a varied composition in the depth direction. The protective layer includes an interface side layer formed on a thin film layer, i.e., the outermost layer of a multilayer film, a surface side layer provided on the interface side layer as the outermost surface of an optical element, and an intermediate layer. The interface side layer has properties such as providing relative absorption of non-exposure light from a light source. The surface side layer suppresses oxidation of the surface of the multilayer film.
    Type: Application
    Filed: July 24, 2009
    Publication date: July 29, 2010
    Inventors: Katsuhiko Murakami, Takaharu Komiya
  • Patent number: 7741616
    Abstract: A liquid in which fine solid Sn particles are dispersed in a resin is accommodated inside the heated tank 4. The resin pressurized by a pressurizing pump is conducted to a nozzle 1, so that a liquid-form resin is caused to jet from the tip end of the nozzle 1 that is disposed inside a vacuum chamber 7. The liquid-form resin which is caused to jet from the nozzle 1 assumes a spherical shape as a result of surface tension, and is solidified by being cooled in a vacuum, so that a solid-form target 2 is formed. A laser introduction window 10 used for the introduction of laser light is formed in the vacuum chamber 7, and laser light generated from a laser light source 8 disposed on the outside of the vacuum chamber 7 is focused by a lens 9 and conducted into the vacuum chamber 7, so that the target is converted into a plasma, thus generating EUV light.
    Type: Grant
    Filed: June 22, 2005
    Date of Patent: June 22, 2010
    Assignee: Nikon Corporation
    Inventor: Katsuhiko Murakami
  • Patent number: 7706058
    Abstract: A multilayer mirror aims to reduce incidence angle dependence of reflectivity. A substrate is made of low thermal polished expansion glass with 0.2 nm RMS or less roughness of the surface. On the surface thereof formed is a Ru/Si multilayer having a wide full-width half maximum of peak reflectivity, and on the Ru/Si multilayer formed is a Mo/Si multilayer having a high peak reflectivity value. This enables higher reflectivity than when Ru/Si alone provided and a reflectivity peak having a wider full-width half maximum than when the Mo/Si multilayer alone provided. Since Ru absorbs EUV ray more than Mo does, higher reflectivity is obtainable than that of a structure having the Ru/Si multilayer formed on the Mo/Si multilayer. The multilayer with a wide full-width half maximum has small incidence angle dependence of reflectivity in spectral reflectivity, thereby achieving high imaging performance in projection optical system.
    Type: Grant
    Filed: September 12, 2008
    Date of Patent: April 27, 2010
    Assignee: Nikon Corporation
    Inventors: Noriaki Kandaka, Katsuhiko Murakami, Takaharu Komiya, Masayuki Shiraishi
  • Publication number: 20100097593
    Abstract: Provided is an EUV light source which brings a target into the plasma state to radiate EUV light from the generated plasma. The target is one of a plurality of discrete targets. The surface area of each target is 1.5 times or more of that of a sphere which has the same material and the same mass as those of the target.
    Type: Application
    Filed: November 30, 2009
    Publication date: April 22, 2010
    Applicant: NIKON CORPORATION
    Inventor: Katsuhiko Murakami
  • Publication number: 20090097104
    Abstract: A multilayer mirror aims to reduce incidence angle dependence of reflectivity. A substrate is made of low thermal polished expansion glass with 0.2 nm RMS or less roughness of the surface. On the surface thereof formed is a Ru/Si multilayer having a wide full-width half maximum of peak reflectivity, and on the Ru/Si multilayer formed is a Mo/Si multilayer having a high peak reflectivity value. This enables higher reflectivity than when Ru/Si alone provided and a reflectivity peak having a wider full-width half maximum than when the Mo/Si multilayer alone provided. Since Ru absorbs EUV ray more than Mo does, higher reflectivity is obtainable than that of a structure having the Ru/Si multilayer formed on the Mo/Si multilayer. The multilayer with a wide full-width half maximum has small incidence angle dependence of reflectivity in spectral reflectivity, thereby achieving high imaging performance in projection optical system.
    Type: Application
    Filed: September 12, 2008
    Publication date: April 16, 2009
    Applicant: Nikon Corporation
    Inventors: Noriaki Kandaka, Katsuhiko Murakami, Takaharu Komiya, Masayuki Shiraishi
  • Patent number: 7456417
    Abstract: Target 1 that is arranged in the disc direction is sprayed from nozzle 2 that has a slit-shaped aperture. Target 1 is conveyed on a gas stream. He gas is used in this example. Nozzle 2 may be vibrated by a piezo apparatus to spray disc-shaped target 1. Target 1 that is sprayed from nozzle 2 reaches the irradiation position of laser light with its direction unchanged since the exterior of nozzle 2 is maintained in a high vacuum. Synchronized with delivery of target 1, pulse laser light 5 from Nd:YAG light source 4 is focused by lens 3 and irradiated onto target 1. The spot diameter of the laser is the same 1 mm diameter as that of target 1. The thickness is not more than 1000 nm. Therefore, virtually the entire target is converted into plasma, debris generation is inhibited and the conversion efficiency is elevated.
    Type: Grant
    Filed: January 11, 2006
    Date of Patent: November 25, 2008
    Assignee: Nikon Corporation
    Inventors: Katsuhiko Murakami, Hideya Inoue
  • Publication number: 20080268380
    Abstract: An optical apparatus comprises a plurality of multilayer-film reflective mirrors that are capable of reflecting an electromagnetic wave in an extreme ultraviolet region. The multilayer-film reflective mirrors are arranged along an optical axis of the electromagnetic wave, and at least two of the multilayer-film reflective mirrors have reflecting wavelength characteristics being different from each other, in a wavelength region other than the extreme ultraviolet region.
    Type: Application
    Filed: April 4, 2008
    Publication date: October 30, 2008
    Inventors: Katsuhiko Murakami, Takaharu Komiya
  • Publication number: 20080266651
    Abstract: An optical apparatus comprises a plurality of multilayer-film reflective mirrors that are capable of reflecting a electromagnetic wave in an extreme ultraviolet region. The multilayer-film reflective mirrors are arranged along an optical axis of the electromagnetic wave, and at least two of the multilayer-film reflective mirrors have reflecting, wavelength characteristics being different from each other, in a wavelength region other than the extreme ultraviolet region.
    Type: Application
    Filed: February 20, 2008
    Publication date: October 30, 2008
    Inventors: Katsuhiko Murakami, Takaharu Komiya
  • Patent number: 7440182
    Abstract: A multilayer mirror aims to reduce incidence angle dependence of reflectivity. A substrate is made of low thermal polished expansion glass with 0.2 nm RMS or less roughness of the surface. On the surface thereof formed is a Ru/Si multilayer having a wide full-width half maximum of peak reflectivity, and on the Ru/Si multilayer formed is a Mo/Si multilayer having a high peak reflectivity value. This enables higher reflectivity than when Ru/Si alone provided and a reflectivity peak having a wider full-width half maximum than when the Mo/Si multilayer alone provided. Since Ru absorbs EUV ray more than Mo does, higher reflectivity is obtainable than that of a structure having the Ru/Si multilayer formed on the Mo/Si multilayer. The multilayer with a wide full-width half maximum has small incidence angle dependence of reflectivity in spectral reflectivity, thereby achieving high imaging performance in projection optical system.
    Type: Grant
    Filed: October 17, 2007
    Date of Patent: October 21, 2008
    Assignee: Nikon Corporation
    Inventors: Noriaki Kandaka, Katsuhiko Murakami, Takaharu Komiya, Masayuki Shiraishi
  • Patent number: 7417708
    Abstract: An extreme ultraviolet exposure apparatus comprising a light source that emits extreme ultraviolet light, a plurality of illumination reflective mirrors that direct the extreme ultraviolet light emitted from the light source to a mask, a plurality of projection reflective mirrors that direct the extreme ultraviolet light reflected by the mask onto a sensitive substrate and that project and focus an image of the mask on this sensitive substrate, and a projection system optical housing that accommodates at least one of the projection reflective mirrors and at least one of the illumination reflective mirrors.
    Type: Grant
    Filed: April 20, 2005
    Date of Patent: August 26, 2008
    Assignee: Nikon Corporation
    Inventor: Katsuhiko Murakami
  • Patent number: 7385212
    Abstract: A light source unit of EUV light is provided as a light source unit comprising a plasma light source for emitting EUV light, a collective mirror which has a reflecting surface of an ellipsoid of revolution and at a first focal point of which the plasma light source is located, and an auxiliary collective mirror which has a reflecting surface of a spherical surface and a spherical center of which is located as displaced from a position of the plasma light source.
    Type: Grant
    Filed: January 9, 2006
    Date of Patent: June 10, 2008
    Assignee: Nikon Corporation
    Inventor: Katsuhiko Murakami
  • Patent number: 7382527
    Abstract: A multilayer mirror aims to reduce incidence angle dependence of reflectivity. A substrate is made of low thermal polished expansion glass with 0.2 nm RMS or less roughness of the surface. On the surface thereof formed is a Ru/Si multilayer having a wide full-width half maximum of peak reflectivity, and on the Ru/Si multilayer formed is a Mo/Si multilayer having a high peak reflectivity value. This enables higher reflectivity than when Ru/Si alone provided and a reflectivity peak having a wider full-width half maximum than when the Mo/Si multilayer alone provided. Since Ru absorbs EUV ray more than Mo does, higher reflectivity is obtainable than that of a structure having the Ru/Si multilayer formed on the Mo/Si multilayer. The multilayer with a wide full-width half maximum has small incidence angle dependence of reflectivity in spectral reflectivity, thereby achieving high imaging performance in projection optical system.
    Type: Grant
    Filed: April 12, 2006
    Date of Patent: June 3, 2008
    Assignee: Nikon Corporation
    Inventors: Noriaki Kandaka, Katsuhiko Murakami, Takaharu Komiya, Masayuki Shiraishi
  • Patent number: 5064871
    Abstract: Disclosed herein is a composition comprising an isocyanate-reactive compound and a catalyst comprising a bismuth carboxylate and a zirconium carboxylate, wherein the catalyst is present in an amount sufficient to catalyze a reaction with the isocyanate-reactive compound and a polyisocyanate. Also disclosed is a process for preparing a composition, which comprises contacting an isocyanate-reactive compound with a polyisocyanate, in the presence of an effective amount of a catalyst comprising a bismuth carboxylate and a zirconium carboxylate, under reaction conditions sufficient to form a composition containing at least one urethane group.
    Type: Grant
    Filed: November 13, 1990
    Date of Patent: November 12, 1991
    Assignee: Essex Specialty Products, Inc.
    Inventor: Deborah A. Sciangola