Patents by Inventor Katsuhisa Kitano

Katsuhisa Kitano has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 11977059
    Abstract: A light source emits excitation light to discharge gas that flows through a dielectric tube. A ground electrode unit includes a first ground electrode and a second ground electrode arranged at a distance from each other in an axial direction of the dielectric tube. A high-voltage electrode is provided between the first ground electrode and the second ground electrode. A first distance between the first ground electrode and the high-voltage electrode is shorter than a second distance between the second ground electrode and the high-voltage electrode. A cover is provided on an outer wall of the dielectric tube at a position between the first ground electrode and the high-voltage electrode. The light source is arranged to emit excitation light such that an optical axis thereof is directed toward a position where the cover is not provided on the outer wall of the dielectric tube.
    Type: Grant
    Filed: September 20, 2021
    Date of Patent: May 7, 2024
    Assignees: Shimadzu Corporation, OSAKA UNIVERSITY
    Inventors: Kei Shinada, Satoshi Matsuoka, Katsuhisa Kitano
  • Patent number: 11558952
    Abstract: A BID includes: a discharger (2) including a dielectric pipe (8) and a pair of electrodes (14, 16) attached on an outer wall of the dielectric pipe, the pair of electrodes (14, 16) being arranged at a distance from each other in a direction along a central axis of the dielectric pipe (8), the discharger (2) being arranged so that plasma generating gas is introduced from a first end of the dielectric pipe (8) and configured to generates dielectric barrier discharge inside the dielectric pipe (8) to generate plasma; a detection section (4) including a sample gas introduction section (31) and a collection electrode (26) for collecting ions, the detection section (4) being configured to ionize components in the sample gas using light emitted from the plasma generated in the discharger (2) and to detect the generated ions by collecting them using the collection electrode (26); and a voltage supply (6; 6?) for generating a potential difference between the pair of electrodes (14, 16).
    Type: Grant
    Filed: December 12, 2019
    Date of Patent: January 17, 2023
    Assignees: Shimadzu Corporation, OSAKA UNIVERSITY
    Inventors: Kei Shinada, Katsuhisa Kitano
  • Publication number: 20220099636
    Abstract: A light source emits excitation light to discharge gas that flows through a dielectric tube. A ground electrode unit includes a first ground electrode and a second ground electrode arranged at a distance from each other in an axial direction of the dielectric tube. A high-voltage electrode is provided between the first ground electrode and the second ground electrode. A first distance between the first ground electrode and the high-voltage electrode is shorter than a second distance between the second ground electrode and the high-voltage electrode. A cover is provided on an outer wall of the dielectric tube at a position between the first ground electrode and the high-voltage electrode. The light source is arranged to emit excitation light such that an optical axis thereof is directed toward a position where the cover is not provided on the outer wall of the dielectric tube.
    Type: Application
    Filed: September 20, 2021
    Publication date: March 31, 2022
    Inventors: Kei SHINADA, Satoshi MATSUOKA, Katsuhisa KITANO
  • Patent number: 10739309
    Abstract: A dielectric barrier discharge ionization detector capable of achieving a high signal-to-noise ratio is provided. The detector includes: a discharging section for generating plasma from argon-containing gas by electric discharge; and a charge-collecting section for ionizing a component in a sample gas by an effect of the plasma and for detecting ion current formed by the ionized component. The discharging section includes a cylindrical dielectric tube having a high-voltage electrode connected to AC power source as well as upstream-side and downstream-side ground electrodes and formed on its outer circumferential wall. A semiconductor film is formed on the inner circumferential surface of the tube. The upstream-side and downstream-side ground electrodes are respectively made longer than the initiation distances for a creeping discharge between the high-voltage electrode and a tube-line tip member as well as between the high-voltage electrode and the charge-collecting section.
    Type: Grant
    Filed: September 7, 2017
    Date of Patent: August 11, 2020
    Assignees: Shimadzu Corporation, Osaka University
    Inventors: Kei Shinada, Katsuhisa Kitano
  • Publication number: 20200236772
    Abstract: A BID includes: a discharger (2) including a dielectric pipe (8) and a pair of electrodes (14, 16) attached on an outer wall of the dielectric pipe, the pair of electrodes (14, 16) being arranged at a distance from each other in a direction along a central axis of the dielectric pipe (8), the discharger (2) being arranged so that plasma generating gas is introduced from a first end of the dielectric pipe (8) and configured to generates dielectric barrier discharge inside the dielectric pipe (8) to generate plasma; a detection section (4) including a sample gas introduction section (31) and a collection electrode (26) for collecting ions, the detection section (4) being configured to ionize components in the sample gas using light emitted from the plasma generated in the discharger (2) and to detect the generated ions by collecting them using the collection electrode (26); and a voltage supply (6; 6?) for generating a potential difference between the pair of electrodes (14, 16).
    Type: Application
    Filed: December 12, 2019
    Publication date: July 23, 2020
    Inventors: Kei Shinada, Katsuhisa Kitano
  • Patent number: 10499648
    Abstract: A sterilization method is provided which acquires microbicidal activity equivalent to plasma-treated solution or more powerful than the same without the use of a plasma generation device. The sterilization method includes applying liquid containing peroxynitric acid (HOONO2) produced by chemical reaction to an object to be sterilized under acidic conditions of a pH value of 4.8 or lower. The liquid containing the peroxynitric acid is produced by mixing nitrous acid and peroxide together, for example, mixing nitrite and peroxide together.
    Type: Grant
    Filed: March 1, 2017
    Date of Patent: December 10, 2019
    Inventors: Katsuhisa Kitano, Atsushi Tani, Satoshi Ikawa, Yoichi Nakashima
  • Patent number: 10436750
    Abstract: The dielectric barrier discharge ionization detector includes: a dielectric tube through which a plasma generation gas is passed; a high-voltage electrode formed on the outer wall of the dielectric tube; two ground electrodes and formed on the outer wall of the dielectric tube, with the high-voltage electrode in between; a voltage supplier for applying AC voltage between the high-voltage electrode and each ground electrode to generate electric discharge within the dielectric tube and thereby generate plasma from the plasma generation gas; and a charge-collecting section for detecting an ion current formed by ionized sample-component gas produced by the plasma. The distance between one ground electrode and the high-voltage electrode is longer than a discharge initiation distance between these two electrodes, while the distance between the other ground electrode and the high-voltage electrode is shorter than the discharge initiation distance between these two electrodes.
    Type: Grant
    Filed: September 7, 2017
    Date of Patent: October 8, 2019
    Assignees: Shimadzu Corporation, Osaka University
    Inventors: Kei Shinada, Katsuhisa Kitano
  • Publication number: 20180067082
    Abstract: A dielectric barrier discharge ionization detector capable of achieving a high signal-to-noise ratio is provided. The detector includes: a discharging section for generating plasma from argon-containing gas by electric discharge; and a charge-collecting section for ionizing a component in a sample gas by an effect of the plasma and for detecting ion current formed by the ionized component. The discharging section includes a cylindrical dielectric tube having a high-voltage electrode connected to AC power source as well as upstream-side and downstream-side ground electrodes and formed on its outer circumferential wall. A semiconductor film is formed on the inner circumferential surface of the tube. The upstream-side and downstream-side ground electrodes are respectively made longer than the initiation distances for a creeping discharge between the high-voltage electrode and a tube-line tip member as well as between the high-voltage electrode and the charge-collecting section.
    Type: Application
    Filed: September 7, 2017
    Publication date: March 8, 2018
    Applicants: Shimadzu Corporation, Osaka University
    Inventors: Kei SHINADA, Katsuhisa KITANO
  • Publication number: 20180067079
    Abstract: The dielectric barrier discharge ionization detector includes: a dielectric tube through which a plasma generation gas is passed; a high-voltage electrode formed on the outer wall of the dielectric tube; two ground electrodes and formed on the outer wall of the dielectric tube, with the high-voltage electrode in between; a voltage supplier for applying AC voltage between the high-voltage electrode and each ground electrode to generate electric discharge within the dielectric tube and thereby generate plasma from the plasma generation gas; and a charge-collecting section for detecting an ion current formed by ionized sample-component gas produced by the plasma. The distance between one ground electrode and the high-voltage electrode is longer than a discharge initiation distance between these two electrodes, while the distance between the other ground electrode and the high-voltage electrode is shorter than the discharge initiation distance between these two electrodes.
    Type: Application
    Filed: September 7, 2017
    Publication date: March 8, 2018
    Applicants: Shimadzu Corporation, Osaka University
    Inventors: Kei SHINADA, Katsuhisa KITANO
  • Publication number: 20170172149
    Abstract: A sterilization method is provided which acquires microbicidal activity equivalent to plasma-treated solution or more powerful than the same without the use of a plasma generation device. The sterilization method includes applying liquid containing peroxynitric acid (HOONO2) produced by chemical reaction to an object to be sterilized under acidic conditions of a pH value of 4.8 or lower. The liquid containing the peroxynitric acid is produced by mixing nitrous acid and peroxide together, for example, mixing nitrite and peroxide together.
    Type: Application
    Filed: March 1, 2017
    Publication date: June 22, 2017
    Inventors: Katsuhisa KITANO, Atsushi TANI, Satoshi IKAWA, Yoichi NAKASHIMA
  • Patent number: 9455152
    Abstract: A hydrogenation method according to the present invention includes preparing a plasma generation section (20), preparing a hermetic member (30), disposing an amorphous silicon film (S) inside the hermetic member (30), and performing plasma treatment on the amorphous silicon film (S) in a manner that the plasma generation section (20) allows a gas at a pressure around an atmospheric pressure containing a hydrogen gas to generate plasma in at least a partial region inside the hermetic member (30). Suitably, the disposing an amorphous silicon film (S) includes forming the amorphous silicon film (S) inside the hermetic member (30) with the use of a solution in which a silane compound is dissolved.
    Type: Grant
    Filed: July 19, 2012
    Date of Patent: September 27, 2016
    Assignee: Nissan Chemical Industries, Ltd.
    Inventor: Katsuhisa Kitano
  • Publication number: 20160074829
    Abstract: An apparatus includes a pipe line, water supplying devices, gas supplying devices, a plasma generation device, a cooling device for cooling water flowing in the pipe line, and a vessel. The plasma generation device has a high-voltage electrode and a ground electrode which are provided outside the pipe line to face each other with the pipe line interposed therebetween and applies a plasma treatment continuously to the water flowing in the pipe line by generating dielectric barrier discharge between the high-voltage electrode and the ground electrode. The cooling device cools the water to have a low temperature of 10° C. or lower. The plasma treatment is applied to generate a plasma-treated solution in which superoxide anion radicals (O2?.) or a precursor thereof is diffused in the water and a microbicidal activity is sustained.
    Type: Application
    Filed: November 23, 2015
    Publication date: March 17, 2016
    Applicant: OSAKA UNIVERSITY
    Inventors: Katsuhisa KITANO, Satoshi IKAWA, Yoichi NAKASHIMA
  • Publication number: 20150294877
    Abstract: A hydrogenation method according to the present invention includes preparing a plasma generation section (20), preparing a hermetic member (30), disposing an amorphous silicon film (S) inside the hermetic member (30), and performing plasma treatment on the amorphous silicon film (S) in a manner that the plasma generation section (20) allows a gas at a pressure around an atmospheric pressure containing a hydrogen gas to generate plasma in at least a partial region inside the hermetic member (30). Suitably, the disposing an amorphous silicon film (S) includes forming the amorphous silicon film (S) inside the hermetic member (30) with the use of a solution in which a silane compound is dissolved.
    Type: Application
    Filed: July 19, 2012
    Publication date: October 15, 2015
    Applicant: Nissan Chemical Industries, Ltd.
    Inventor: Katsuhisa Kitano
  • Publication number: 20150086423
    Abstract: A sterilization treatment method includes producing a plasma-treated solution in which biocidal activity is held by diffusing, in a liquid, superoxide anion radicals (O2?.) or a precursor of the superoxide anion radicals (O2?.) by plasma generated in a vicinity of or in a manner to make contact with the liquid; freezing the plasma-treated solution to produce solid ice and store the solid ice in a frozen state; thawing the solid ice to the plasma-treated solution in which biocidal activity by the superoxide anion radicals (O2?.) or the precursor of the superoxide anion radicals (O2?.) is held; and applying a sterilization treatment by any one of the following: allowing the plasma-treated solution to have a pH value of 4.8 or lower to apply the resultant plasma-treated solution to an object, and applying the plasma-treated solution to an object of which a pH value is 4.8 or lower.
    Type: Application
    Filed: October 24, 2014
    Publication date: March 26, 2015
    Applicant: OSAKA UNIVERSITY
    Inventors: Katsuhisa KITANO, Satoshi Ikawa
  • Publication number: 20150010430
    Abstract: An active species radiation device is for efficiently radiating active species (active oxygen or nitrogen) by using a plasma source not in contact with an irradiated object. An active species radiation device (100) includes: a chamber (110) in which flows of plasma generation gas and active species generation gas enter and which has an active species radiation port (110c) through which active species are radiated; an upstream electrode (120) positioned in a part of the chamber (110) corresponding to an upstream portion of the flow of the plasma generation gas; and a downstream electrode (130) positioned in a part of the chamber (110) corresponding to a more downstream portion of the flow of the plasma generation gas than the upstream electrode (120). The chamber (110) is configured so that the active species generation gas flows into a position between the upstream electrode (120) and the active species radiation port (110c).
    Type: Application
    Filed: January 11, 2013
    Publication date: January 8, 2015
    Applicant: OSAKA UNIVERSITY
    Inventors: Katsuhisa Kitano, Atsushi Tani
  • Patent number: 8871146
    Abstract: An object of the present invention is to efficiently sterilize microorganisms present in or on a surface of a liquid. Plasma is generated in a vicinity of or in a manner to make contact with a liquid whose pH value is adjusted to become 4.8 or lower, more preferably 4.5 or lower. The plasma is generated in an atmospheric gas containing nitrogen, e.g., in the air. Superoxide anion radicals (O2?.) that are generated by the plasma react with protons (H+) in the liquid to form hydroperoxy radicals (HOO.). Further, nitrogen and oxygen included in the air are combined together by the action of plasma to form nitrogen oxide such as nitric oxide (NO.). The nitric oxide (NO.) combines with the hydroperoxy radicals (HOO.) to become peroxynitrite (ONOOH(ONOO?)) having a high microbiocidal activity.
    Type: Grant
    Filed: April 30, 2010
    Date of Patent: October 28, 2014
    Inventors: Satoshi Ikawa, Katsuhisa Kitano, Satoshi Hamaguchi
  • Patent number: 8829913
    Abstract: A technique for reducing an electromagnetic noise entering an electrode or a drift of a signal due to a fluctuation in the ambient temperature is provided to improve the S/N ratio of a signal originating from a component of interest. A dummy electrode having the same structure as an ion-collecting electrode is provided within a lower gas passage at a position where dilution gas with no sample gas mixed therein flows. A differential amplifier is provided to perform differential detection between output A of a current amplifier connected to the ion-collecting electrode and output B of a current amplifier connected to the dummy electrode. The differential signal is free from a common mode noise or drift and hence accurately reflects the amount of the component of interest.
    Type: Grant
    Filed: June 23, 2011
    Date of Patent: September 9, 2014
    Assignees: Shimadzu Corporation, Osaka University
    Inventors: Kei Shinada, Shigeyoshi Horiike, Takahiro Nishimoto, Katsuhisa Kitano
  • Patent number: 8797041
    Abstract: A discharge ionization current detector using a low-frequency dielectric barrier discharge with an improved S/N ratio is provided. A current detector 20 is disposed between an excitation high-voltage power source 8 and a discharge electrode 5 to detect a discharge current flowing in pulses due to plasma generation. The detection signal of the current detector 20 and an output signal from a current amplifier 18 for amplifying an ion current are inputted into an output extraction unit 21. The output extraction unit 21 detects a precipitous-rise portion of the discharge current detection signal and generates a trigger signal, and then extracts an ion current signal for a predetermined time period from the trigger signal. This can remove an influence of a noise appearing in a signal during a time period where no plasma emission is generated, thereby improving the S/N ratio of the detection signal.
    Type: Grant
    Filed: April 21, 2011
    Date of Patent: August 5, 2014
    Assignees: Shimadzu Corporation, Osaka University
    Inventors: Kei Shinada, Shigeyoshi Horiike, Takahiro Nishimoto, Katsuhisa Kitano
  • Patent number: 8758010
    Abstract: A dental clinical apparatus having a function which conventional instruments for dental treatment have not had and having a novel constitution. The dental clinical apparatus includes a syringe which has a fluid jetting system for dental treatment and a plasma jet applying means for producing a plasma jet from the end by allowing a low-frequency high-voltage power supply to apply a low-frequency high voltage between electrodes on the outer peripheral surface of a rare gas tube through which a rare gas having a low dielectric breakdown voltage under the atmospheric pressure is flowed, and thereby causing electrical discharge.
    Type: Grant
    Filed: July 17, 2009
    Date of Patent: June 24, 2014
    Assignees: Yoshida Creation Inc., Osaka University, Technology Research Institute of Osaka Prefecture
    Inventors: Michizo Yamanaka, Tsuneo Kawahara, Katsuhisa Kitano, Satoshi Ikawa
  • Patent number: 8524804
    Abstract: A resin composition includes a fiber and a polyolefin resin and can provide a molded article having excellent mechanical strength such as flexural strength and impact resistance. The resin composition includes (i) a surface-treated fiber (A) which comprises 100 parts by weight of a fiber (A-I) comprising a polyalkylene terephthalate and/or a polyalkylene naphthalene dicarboxylate and 0.1 to 10 parts by weight of a sizing agent (A-II) adhered to the surface of the fiber (A-I), and (ii) a polyolefin resin modified with an unsaturated carboxylic acid and/or an unsaturated carboxylic acid derivative (a modified polyolefin resin (B)) as a resin component.
    Type: Grant
    Filed: January 22, 2009
    Date of Patent: September 3, 2013
    Assignees: Sumitomo Chemical Company, Limited, Teijin Fibers Limited
    Inventors: Katsuhisa Kitano, Kenji Watanabe, Kenji Atarashi, Shinichi Takahashi