Patents by Inventor Katsumi Midorikawa

Katsumi Midorikawa has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20010021539
    Abstract: A process for the formation of a cap layer for semiconductors with a low degree of contamination wherein the cap layer is easily formed on the surface of a semiconductor, and binding force thereof with the surface of the semiconductor is strong and stabilized, besides only the cap layer is selectively removed easily, comprises the steps of introducing nitrogen atom into a surface of a semiconductor; combining a component element of the semiconductor in the vicinity of the surface of the semiconductor into which the nitrogen atom has been introduced with the nitrogen atom to form a nitride compound being a compound of the component element of the semiconductor and the nitrogen atom; and utilizing the nitride compound as a cap layer for the surface of the semiconductor.
    Type: Application
    Filed: January 26, 2001
    Publication date: September 13, 2001
    Inventors: Toshimitsu Akane, Koji Sugioka, Katsumi Midorikawa, Jan J. Dubowski
  • Patent number: 6180915
    Abstract: In order to form a fine pattern at high speed with respect to a material such as quartz glass exhibiting a remarkable band gap, having a short wavelength at absorption edge of light, and having high bond energy between constituent atoms, laser beam being transparent as to a material to be worked is irradiated thereupon, at the same time, plasma is produced at a place close to an objective surface of the material to be worked, and ablation is generated on the objective surface of the material to be worked by means of interactions between the plasma and laser beam irradiated upon the material to be worked, thereby to work the material.
    Type: Grant
    Filed: January 21, 1999
    Date of Patent: January 30, 2001
    Assignee: The Institute For Physical And Chemical Research
    Inventors: Koji Sugioka, Jie Zhang, Katsumi Midorikawa
  • Patent number: 5193095
    Abstract: A multi-mode Raman laser system wherein Raman conversion is performed by injecting exciting laser beam from transversely excited atmospheric pressure CO.sub.2 laser system into a Raman cell. Unstable resonator type oscillator is used as transversely excited atmospheric pressure CO.sub.2 laser system; and multi-mode Raman cell is used as the Raman cell. The quantity required for an excited CO.sub.2 laser system can thus be extensively reduced. Also, it is possible to reduce the input electric required for obtaining the same energy of 16 .mu.m light which is scattered light, because saturated conversion of excited light, can be achieved by multi-mode Raman cell, and system efficiency can be increased.
    Type: Grant
    Filed: March 27, 1991
    Date of Patent: March 9, 1993
    Assignee: Doryokuro Kakunenryo Kaihatsu Jigyodan
    Inventors: Hideo Tashiro, Katsumi Midorikawa, Mitsutoshi Suzuki