Patents by Inventor Katsumi Nakagawa

Katsumi Nakagawa has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20060286975
    Abstract: A wireless communication apparatus includes wireless communicating unit that carries out a wireless communication with a telephone base unit to be connected to a communication line and carries out the wireless communication with a telephone remote unit that performs the wireless communication with the telephone base unit, communicating unit connected to a communication remote unit, and control unit that communicates with the telephone base unit and the telephone remote unit by using a communication frame including a first slot pair having a descending slot to be used for receiving a signal from the telephone base unit which is disposed earlier on a time basis and an ascending slot to be used for transmitting a signal to the telephone base unit which is disposed later on the time basis, and a second slot pair having a descending slot to be used for transmitting data to the telephone remote unit which is disposed earlier on the time basis and an ascending slot to be used for receiving data from the telephone re
    Type: Application
    Filed: June 13, 2006
    Publication date: December 21, 2006
    Applicant: MATSUSHITA ELECTRIC INDUSTRIAL CO., LTD.
    Inventors: Toshiyuki Sugitani, Katsumi Nakagawa, Etsuko Satoh, Takatsugu Ito, Shinji Fukuda
  • Publication number: 20060194417
    Abstract: A polycrystalline silicon substrate for a solar cell formed by growing a high purity polycrystalline silicon layer on a surface of a base obtained by slicing a polycrystalline silicon ingot obtained by melting metallurgical grade silicon and performing one-direction solidification, wherein one-direction solidification is performed on a melt prepared by adding B to molten metallurgical grade silicon at an amount of 2×1018 cm?3 to 5×1019 cm?3 based on the concentration in the melt to produce the polycrystalline silicon ingot. With this structure, it is possible to easily obtain a polycrystalline silicon substrate having resistivity and the type of conductivity suitable for manufacture of a solar cell.
    Type: Application
    Filed: October 10, 2003
    Publication date: August 31, 2006
    Applicant: Canon Kabushiki Kaisha
    Inventors: Shunichi Ishihara, Katsumi Nakagawa, Hiroshi Sato, Takehito Yoshino, Shoji Nishida, Noritaka Ukiyo, Masaaki Iwane, Yukiko Iwasaki, Masaki Mizutani
  • Publication number: 20060160336
    Abstract: A solar cell is produced by dipping a multicrystalline silicon substrate 28 in a solution 24 containing silicon, growing a silicon layer on the substrate 28 while decreasing with time the temperature drop rate of the solution during the dipping of the substrate in the solution, and forming a pn junction in the silicon layer. Thereby, there is provided a silicon layer production method that can form a thick layer while restraining the degree of roughness, whereby a low-cost, multicrystalline-silicon solar cell production method is provided that realizes both a large current and a high FF.
    Type: Application
    Filed: May 17, 2005
    Publication date: July 20, 2006
    Applicant: Canon Kabushiki Kaisha
    Inventors: Masaki Mizutani, Shoji Nishida, Katsumi Nakagawa
  • Patent number: 7077901
    Abstract: A process for producing a single crystal silicon wafer, comprising the steps of forming a porous layer on a single crystal silicon substrate comprising a silicon whose concentration of mass number 28 silicon isotope is less than 92.5% on an average; dissolving a starting silicon whose concentration of mass number 28 silicone isotope whose mass number is more than 98% on an average in a melt for liquid-phase epitaxy until said starting silicon becomes to be a supersaturated state in said melt under reductive atmosphere maintained at high temperature: immersing said single crystal silicon substrate in said melt to grow a single crystal silicon layer on the surface of said porous layer of said single crystal silicon substrate; and peeling said single crystal silicon layer from a portion of said porous layer.
    Type: Grant
    Filed: March 31, 2003
    Date of Patent: July 18, 2006
    Assignee: Canon Kabushiki Kaisha
    Inventors: Katsumi Nakagawa, Takao Yonehara, Kazuaki Ohmi, Shoji Nishida
  • Publication number: 20060113539
    Abstract: A novel field-effect transistor is provided which employs an amorphous oxide. In an embodiment of the present invention, the transistor comprises an amorphous oxide layer containing electron carrier at a concentration less than 1×10?18/cm3, and the gate-insulating layer is comprised of a first layer being in contact with the amorphous oxide and a second layer different from the first layer.
    Type: Application
    Filed: November 9, 2005
    Publication date: June 1, 2006
    Applicants: CANON KABUSHIKI KAISHA, TOKYO INSTITUTE OF TECHNOLOGY
    Inventors: Masafumi Sano, Katsumi Nakagawa, Hideo Hosono, Toshio Kamiya, Kenji Nomura
  • Publication number: 20060108636
    Abstract: A novel amorphous oxide applicable, for example, to an active layer of a TFT is provided. The amorphous oxide comprises microcrystals.
    Type: Application
    Filed: November 9, 2005
    Publication date: May 25, 2006
    Applicants: CANON KABUSHIKI KAISHA, TOKYO INSTITUTE OF TECHNOLOGY
    Inventors: Masafumi Sano, Katsumi Nakagawa, Hideo Hosono, Toshio Kamiya, Kenji Nomura
  • Patent number: 7050821
    Abstract: For the purpose of being capable of performing direct inter-handset communications while maintaining inter-handset communications via a base unit, smoothly making a transition from inter-handset communications via a base unit to direct inter-handset communications, and switching to inter-handset communications via a base unit without releasing the communications even in case direct inter-handset communications cannot be established, a local handset includes a direct inter-handset communications controller and a direct inter-handset communications transition controller for making control to establish direct inter-handset communications while maintaining communications with a base unit as well as transmitting control channels for direct inter-handset communications in vacant slots in the receiving time zones for communications with the base unit, while a distant handset includes a direct inter-handset communications controller and a direct inter-handset communications transition controller for scanning control
    Type: Grant
    Filed: October 28, 2003
    Date of Patent: May 23, 2006
    Assignee: Matsushita Electric Industrial Co., Ltd.
    Inventors: Koji Nitta, Katsumi Nakagawa, Shinji Fukuda, Yoshihiro Takehisa, Takatsugu Ito
  • Patent number: 7022181
    Abstract: In a liquid phase growth process comprising immersing a substrate in a melt held in a crucible, a crystal material having been dissolved in the melt, and growing a crystal on the substrate, at least a group of substrates to be immersed in the melt held in the crucible are fitted to the supporting rack at a position set aside from the center of rotation of the crucible or supporting rack, and the crystal is grown on the surface of the substrate thus disposed. This can provide a liquid phase growth process which can attain a high growth rate, can enjoy uniform distribution of growth rate in each substrate and between the substrates even when substrates are set in a large number in one batch, and can readily keep the melt from reaction and contamination even when the system has a large size, and provide a liquid phase growth system suited for carrying out the process.
    Type: Grant
    Filed: December 14, 2001
    Date of Patent: April 4, 2006
    Assignee: Canon Kabushiki Kaisha
    Inventors: Katsumi Nakagawa, Tetsuro Saito, Tatsumi Shoji, Takehito Yoshino, Shoji Nishida, Noritaka Ukiyo, Masaaki Iwane, Masaki Mizutani
  • Patent number: 7014711
    Abstract: A liquid-phase growth apparatus for growing a crystal on a substrate includes a crucible containing a solution that contains a raw material for forming the crystal, and a substrate holder for vertically holding the substrate. The substrate holder includes connectors, a receiving component, and a push component. The receiving component and the push component are opposite to each other and are connected by the connectors. The push component holds an upper portion of the substrate while the receiving component holds a lower portion of the substrate. The substrate holder containing the vertically held substrate is dipped into the solution. The receiving component ascends with buoyancy in the solution contained in the crucible, so that the substrate is now held securely and prevented from cracking due to thermal expansion.
    Type: Grant
    Filed: March 12, 2003
    Date of Patent: March 21, 2006
    Assignee: Canon Kabushiki Kaisha
    Inventors: Masaki Mizutani, Katsumi Nakagawa, Takehito Yoshino, Shoji Nishida
  • Publication number: 20060054078
    Abstract: A liquid-phase growth apparatus for growing a crystal on a substrate includes a crucible containing a solution that contains a taw material for forming the crystal, and a substrate holder for vertically holding the substrate. The substrate holder includes connectors, a receiving component, and a push component. The receiving component and the push component are opposite to each other and are connected by the connectors. The push component holds an upper portion of the substrate while the receiving component holds a lower portion of the substrate. The substrate holder containing the vertically held substrate is dipped into the solution. The receiving component ascends with buoyancy in the solution contained in the crucible, so that the substrate is now held securely and prevented from cracking due to thermal expansion.
    Type: Application
    Filed: November 10, 2005
    Publication date: March 16, 2006
    Applicant: CANON KABUSHIKI KAISHA
    Inventors: Masaki Mizutani, Katsumi Nakagawa, Takehito Yoshino, Shoji Nishida
  • Patent number: 6951585
    Abstract: A liquid-phase growth method for immersing a polycrystalline substrate in a melt in a crucible wherein crystal ingredients are dissolved, thereby growing poly crystals upon the substrate, comprises a first step for growing poly crystals to a predetermined thickness, and a second step for melting back a part of the poly crystals grown in the first step in the melt, wherein the relative position between the substrate and melt is changed between the first step and second step, bringing melt with different temperature into contact with the polycrystalline surface. The obtained poly crystals have properties rivaling those of poly crystals used in conventional solar cells but with little risk of trouble such as line breakage of grid electrodes in application to solar cells, and can be obtained in great quantities at low costs.
    Type: Grant
    Filed: March 27, 2003
    Date of Patent: October 4, 2005
    Assignee: Canon Kabushiki Kaisha
    Inventors: Katsumi Nakagawa, Shunichi Ishihara, Hiroshi Sato, Shoji Nishida, Yasuyoshi Takai
  • Patent number: 6930094
    Abstract: The present invention relates to the use of tissue factor for influencing blood vessel formation, particularly for activating blood vessel formation, above all for wound healing.
    Type: Grant
    Filed: May 8, 1998
    Date of Patent: August 16, 2005
    Assignee: Merckle GmbH
    Inventors: Peter Nawroth, Katsumi Nakagawa, Youming Zhang
  • Publication number: 20050124139
    Abstract: There is provided a process of producing a multicrystalline silicon substrate having excellent characteristics as a solar cell substrate. A multicrystalline silicon ingot made by directional solidification 10 is cut such that a normal line of a principal surface 14 of a multicrystalline silicon substrate 13 is substantially perpendicular to a longitudinal direction of crystal grains 11 of the multicrystalline silicon ingot made by directional solidification 10.
    Type: Application
    Filed: February 21, 2003
    Publication date: June 9, 2005
    Inventors: Masaki Mizutani, Shunichi Ishihara, Katsumi Nakagawa, Hiroshi Sato, Takehito Yoshino, Shoji Nishida, Noritaka Ukiyo, Masaaki Iwane, Yukiko Iwasaki
  • Publication number: 20050066881
    Abstract: Provided is a continuous production method for crystalline silicon, including: retaining melted silicon in a crucible; solidifying a portion close to a surface of raw material silicon by providing a negative temperature gradient upward from the crucible; holding the solidified crystalline silicon by a pulling means; and pulling the solidified crystalline silicon at a predetermined rate, while shaping a sectional shape of the solidified crystalline silicon by bringing the solidified crystalline silicon in contact with an opened heater when the solidified crystalline silicon passes through an opening portion of the opened heater having an opening of a predetermined shape and maintained at a temperature higher than a melting point of the raw material silicon. The method allows continuous production of a crystalline silicon ingot having uniform crystallinity or impurity concentration and high quality at low cost even when low purity raw material silicon such as metallurgical grade silicon is used.
    Type: Application
    Filed: September 13, 2004
    Publication date: March 31, 2005
    Applicant: Canon Kabushiki Kaisha
    Inventors: Katsumi Nakagawa, Shunichi Ishihara, Hiroshi Sato, Shoji Nishida
  • Patent number: 6872248
    Abstract: A liquid-phase growth process comprising immersing a base substrate in a solution containing reactant species to be grown dissolved therein which is accommodated in a crucible and growing a crystal film on said substrate, characterized in that a capping member is kept afloat on the surface of said solution before said substrate is immersed in said solution and said capping member is subsided in said solution upon immersing said substrate in said solution. A liquid-phase growth apparatus suitable for practicing said liquid-phase growth process.
    Type: Grant
    Filed: March 28, 2003
    Date of Patent: March 29, 2005
    Assignee: Canon Kabushiki Kaisha
    Inventors: Masaki Mizutani, Katsumi Nakagawa, Tetsuro Saito, Tatsumi Shoji, Takehito Yoshino, Shoji Nishida
  • Patent number: 6824609
    Abstract: A liquid phase growth method is provided which comprises dipping a seed substrate in a solution in a vessel having a crystal raw material melted therein and growing a crystal on the substrate, wherein a fin is provided on a bottom of the vessel, for regulating a flow of the solution from a central portion outside in a radial direction in the vessel; a flow-regulating plate is provided in the vicinity of an inner sidewall of the vessel, for regulating a flow of the solution from the bottom upwardly; and the vessel is rotated while regulating a flow of the solution by an action of the fin and the flow-regulating plate to bring the solution into contact with the seed substrate. Thus, there is provided a liquid phase growth method and apparatus capable of providing a high growth rate and showing little difference in the growth rate among the substrates or within the same substrate even when a number of substrates are charged in one batch.
    Type: Grant
    Filed: August 28, 2002
    Date of Patent: November 30, 2004
    Assignee: Canon Kabushiki Kaisha
    Inventors: Tetsuro Saito, Katsumi Nakagawa, Tatsumi Shoji, Takehito Yoshino, Shoji Nishida, Masaki Mizutani
  • Patent number: 6802900
    Abstract: Provided are a liquid phase growth method including a step of immersing a substrate in a crucible storing a solvent having a growth material dissolved therein; and a step of cooling the solvent from an interior thereof, and a liquid phase growth apparatus for use in the method, by which a temperature difference of a solution is decreased and by which a deposited film is formed in a uniform thickness.
    Type: Grant
    Filed: December 20, 2001
    Date of Patent: October 12, 2004
    Assignee: Canon Kabushiki Kaisha
    Inventors: Masaaki Iwane, Katsumi Nakagawa, Tetsuro Saito, Tatsumi Shoji, Takehito Yoshino, Shoji Nishida, Noritaka Ukiyo, Masaki Mizutani
  • Patent number: 6802926
    Abstract: A method of producing a semiconductor thin film is provided. While a semiconductor thin film formed on a substrate is supported on a curved surface of a support member having the curved surface, the support member is rotated, thereby peeling the semiconductor thin film away from the substrate. Also provided is a method of producing a semiconductor thin film having the step of peeling a semiconductor thin film formed on a substrate away from the substrate, wherein the peeling step is carried out after the substrate is secured on a substrate support member without an adhesive. According to these methods, it is possible to peel the semiconductor thin film away from the substrate without damage and to hold the substrate without contamination.
    Type: Grant
    Filed: March 21, 2001
    Date of Patent: October 12, 2004
    Assignee: Canon Kabushiki Kaisha
    Inventors: Masaki Mizutani, Isao Tanikawa, Katsumi Nakagawa, Tatsumi Shoji, Noritaka Ukiyo, Yukiko Iwasaki
  • Patent number: 6756289
    Abstract: To accomplish both of higher performance of a crystal and lower cost in a semiconductor member, and to produce a solar cell having a high efficiency and a flexible shape at low cost, the semiconductor member is produced by the following steps, (a) forming a porous layer in the surface region of a substrate, (b) immersing the porous layer into a melting solution in which elements for forming a semiconductor layer to be grown is dissolved, under a reducing atmosphere at a high temperature, to grow a crystal semiconductor layer on the surface of the porous layer, (c) bonding another substrate onto the surface of the substrate on which the porous layer and the semiconductor layer are formed and (d) separating the substrate from the another substrate at the porous layer.
    Type: Grant
    Filed: August 15, 2000
    Date of Patent: June 29, 2004
    Assignee: Canon Kabushiki Kaisha
    Inventors: Katsumi Nakagawa, Takao Yonehara, Shoji Nishida, Kiyofumi Sakaguchi
  • Publication number: 20040118337
    Abstract: According to the present invention, at the time of growing a silicon film by liquid epitaxy on a substrate, a bulk portion having substantially no void is formed and then a surface portion having plural protrusions that overhang in a lateral direction is formed. As a result, it is possible to form a silicon film having an uneven structure suitable for increasing optical path length on a surface layer of a semiconductor substrate without performing an additional process for forming an uneven structure. Therefore, it is possible to obtain a semiconductor substrate particularly suitable for a solar cell having an improved short circuit current property at low cost. Accordingly, it is possible to provide a solar cell having high efficiency and being low in price.
    Type: Application
    Filed: September 26, 2003
    Publication date: June 24, 2004
    Applicant: CANON KABUSHIKI KAISHA
    Inventors: Masaki Mizutani, Shunichi Ishihara, Katsumi Nakagawa, Takehito Yoshino, Shoji Nishida