Abstract: An exposure apparatus exposes a substrate with exposure light that passes through a liquid. The exposure apparatus comprises: a porous member that has a first surface, which is capable of opposing an object disposed at an irradiation position of the exposure light, and a second surface, which is opposite the first surface, and forms a first space that is capable of holding the liquid between the first surface and the object; a supply port, which is capable of supplying the liquid to the first space; a prescribed member, which forms a second space that faces the second surface; an adjusting apparatus, which is capable of decreasing a pressure in the second space such that the liquid in the first space moves to the second space via holes in the porous member; and a control apparatus, which controls an operation of supplying the liquid via the supply ports and a pressure adjustment operation performed by the adjusting apparatus.

Abstract: An exposure apparatus EX includes a recovery port which recovers a liquid, a blow port which is provided outside the recovery port with respect to an optical path space and which blows a gas therefrom, and a gas discharge port which is provided between the recovery port and blow port and which discharges at least a part of the gas blown from the blow port. An exposure apparatus which makes it possible to avoid the leakage of the liquid with which the optical path space of the exposure light between a projection optical system and a substrate is filled is provided.

Abstract: An exposure apparatus (EX) includes: a substrate stage (ST1) that is movable while holding substrate (P); a first immersion mechanism (1) that fills an optical path space (K1) between a final optical member (LS1) and the substrate stage (ST1) with a liquid (LQ) when the substrate stage (ST1) is disposed opposite the final optical member (LS1) that is closest to the image plane of the projection optical system (PL); a measurement stage (ST2) in which the optical path space (K1) with the final optical member (LS1) is filled with the liquid (LQ) when the measurement stage (ST2) is disposed in place of the substrate stage (ST1) opposite the final optical member (LS1) in the projection optical system; a measuring device (60) that has an upper plate (65) that is disposed on the measurement stage (ST2), and that carries out specific measurements when the upper plate (65) is disposed opposite the final optical member (LS1) of the projection optical system with the liquid (LQ) held therebetween; and a second immersion

Abstract: An exposure method includes holding a substrate held by a substrate holder on a substrate stage moving on an image plane side of a projection optical system; forming an immersion area the image plane side of the projection optical system by using a liquid supplied from a liquid supplying mechanism; and exposing a substrate by exposure light via the projection optical system and the immersion area. During a period when exposure of the substrate is not performed, an upper portion of the substrate holder is cleaned by moving the substrate stage relative to the immersion area, and an upper portion of a measuring stage is cleaned by moving the measuring stage relative to the immersion area. A cleaning liquid can be used as a liquid for forming the immersion area during cleaning. High-resolution immersion exposure is performed at a high throughput by suppressing entering of foreign materials into the liquid.

Abstract: An exposure method for exposing a substrate with an exposure light via an projection optical system and a liquid includes: a first step of optically observing a liquid contact portion which comes into contact with the liquid and storing first image data obtained by the optical observation; a second step of optically observing the liquid contact portion after the liquid contact portion came into contact with the liquid, for example, after the liquid immersion exposure and obtaining second image data obtained by the optical observation; and a third step of comparing the first image data and the second image data to judge whether abnormality of observation objective portion is present or absent. It is possible to efficiently judge whether or not the abnormality of the liquid-contact portion, of the exposure apparatus which performs the exposure by the immersion method, is present or absent.

Abstract: An exposure apparatus includes a detector which detects a defect in a thin film formed on a substrates. When the detector is provided for liquid immersion exposure in which the substrate is exposed through liquid, outflow of the liquid due to by any defect in the thin film is detected before the liquid outflows, thereby suppressing reduction in throughput in producing device and preventing any problem or inconvenience from occurring in the exposure apparatus.

Abstract: A linear motor is equipped with a coil body (62), and a yoke (71) that supports a magnetism generating body (72) and that moves relative to the coil body (62). The yoke (71) has a first portion (73) that is formed from a magnetic material and disposed based on the saturation state of the magnetic field, which is generated by the magnetism generating body (72), in the yoke (71).

Abstract: An immersion type lithographic apparatus includes at least one immersion space and an immersion system configured to at least partially fill the immersion space with a liquid. The apparatus is configured to rinse at least part of the immersion space with a rinsing liquid before the apparatus is used to project a patterned beam of radiation onto a substrate.

Abstract: An exposure apparatus includes an optical element via which a patterned beam is projected onto a substrate through exposure liquid filled in a space between the optical element and the substrate. The apparatus also includes a member having a flow passage in which exposure liquid flows, the flow passage being in fluidic communication with the space. The apparatus also includes a cleaning system which cleans the member.

Abstract: An exposure apparatus includes an optical element via which a patterned beam is projected onto a substrate through exposure liquid filled in a space between the optical element and the substrate. The apparatus also includes a member having a surface and movable to a position at which the surface of the member faces the optical element. The apparatus also includes a cleaning system which cleans the surface of the member.

Abstract: A liquid immersion exposure apparatus includes an optical element via which a patterned beam is projected onto a substrate in an exposure operation, a liquid supply system having a supply port from which exposure liquid is supplied, and a member which has a surface and which is different from the substrate. In the exposure operation, the liquid supply system supplies the exposure liquid from the supply port to a space between the optical element and the substrate. In a cleaning operation, the member is moved to a position at which the surface of the member faces the optical element, and the liquid supply system supplies the exposure liquid from the supply port to a space between the optical element and the surface of the member.

Abstract: An exposure apparatus is provided with an optical system including a liquid, a sensor system for acquiring energy information of an energy beam which is incident on the liquid, and a controller which predicts variation of optical properties of the optical system including the liquid due to energy absorption of the liquid based on the energy information acquired using the sensor system and controls exposure operation with respect to an object based on the prediction results. According to the exposure apparatus, exposure operation without being influenced by the variation of the optical properties of the optical system including the liquid due to the energy absorption of the liquid becomes possible.

Abstract: An exposing method which exposes a substrate through a liquid, the pH value of the liquid is adjusted in accordance with a material of a surface layer of the substrate that contacts the liquid.

Abstract: Disclosed is a substrate processing method which includes an exposure step wherein an immersion area of a first liquid is formed on a substrate and the substrate is exposed by being irradiated with an exposure light through the first liquid, and an immersion step wherein the substrate is immersed in a second liquid before the exposure step. By this method, occurrences of problems caused by adhesion marks, which are always involved in immersion exposure, can be reduced.

Abstract: There is provided an exposure apparatus capable of forming a desirable device pattern by removing unnecessary liquid when performing exposure by projecting a pattern onto the substrate via a projection optical system and the liquid. The exposure device projects an image of the pattern onto the substrate P via the projection optical system and the liquid so as to expose the substrate P. The exposure device includes a liquid removing mechanism 40 which removes the liquid remaining on a part 7 arranged in the vicinity of the image plane of the projection optical system.

Abstract: An exposure method for exposing a substrate with exposure light that irradiates the substrate via a liquid, wherein the concentration of an eluted substance in the liquid on the substrate is set so as to satisfy the condition RW?RP?1.0×10?3 when RP is the transmittance of the liquid containing an eluted substance eluted from the substrate per 1 mm in the optical path direction of the exposure light, and RW is the transmittance of the liquid that does not contain the eluted substance per 1 mm in the optical path direction of the exposure light.

Abstract: There is provided an exposure apparatus capable of forming a desirable device pattern by removing unnecessary liquid when performing exposure by projecting a pattern onto the substrate via a projection optical system and the liquid. The exposure device projects an image of the pattern onto the substrate P via the projection optical system and the liquid so as to expose the substrate P. The exposure device includes a liquid removing mechanism 40 which removes the liquid remaining on a part 7 arranged in the vicinity of the image plane of the projection optical system.

Abstract: There is provided an exposure apparatus capable of forming a desirable device pattern by removing unnecessary liquid when performing exposure by projecting a pattern onto the substrate via a projection optical system and the liquid. The exposure device projects an image of the pattern onto the substrate P via the projection optical system and the liquid so as to expose the substrate P. The exposure device includes a liquid removing mechanism 40 which removes the liquid remaining on a part 7 arranged in the vicinity of the image plane of the projection optical system.

Abstract: To provide a substrate holding apparatus which can prevent a liquid from entering into a rear surface side of a substrate. A substrate holding apparatus (PH) is provided with a base material (PHB), a first holding portion (PH1) formed on the base material (PHB) for holding the substrate (P), and a second holding portion (PH2) formed on the base material (PHB) for holding a plate member (T) by surrounding the circumference of a processing substrate (P) held by the first holding portion (PH1). The second holding portion (PH2) holds the plate member (T) so as to form a second space (32) on the side of the rear surface (Tb) of the plate member (T). On the rear surface (Tb) of the plate member (T), an absorbing member (100) is arranged for absorbing the liquid (LQ) entered from a gap (A) between the substrate (P) held by the first holding portion (PH1) and the plate member (T) held by the second holding portion (PH2).

Abstract: Provided is an exposure apparatus that is able to prevent liquid from on a measuring part. An exposure apparatus comprises a measuring system (60), which has a first pattern (61) formed on the upper surface of a substrate stage, and a second area (S2) specified on the upper surface in the vicinity of a first area (S1), which includes the first pattern (61), and a second pattern (80) is formed in the second area (S2) so that the liquid (LQ) that has remained so as to span the first area (S1) and the second area (S2) retreats from the first area (S1) and collects in the second area (S2).