Patents by Inventor Katsutoshi Ono

Katsutoshi Ono has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20120190273
    Abstract: A polishing method polishes a surface (surface to be polished) of a substrate at a sufficient polishing rate and obtains a desired polishing profile while preventing an unpolished portion from remaining on the surface of the substrate after polishing. The polishing method polishes a surface to be polished with a polishing pad while controlling the temperature of the polishing pad by blowing a gas toward the polishing pad. The polishing method includes monitoring the polishing state of the substrate to be polished during polishing while PID-controlling the flow rate or the blow direction of the gas, and changing the control temperature of the polishing pad when a predetermined thickness of a film to be polished is reached.
    Type: Application
    Filed: January 12, 2012
    Publication date: July 26, 2012
    Inventors: Katsutoshi ONO, Hisanori MATSUO
  • Publication number: 20120164917
    Abstract: A polishing apparatus for polishing a substrate is provided. The polishing apparatus includes: a polishing table holding a polishing pad; a top ring configured to press the substrate against the polishing pad; first and second optical heads each configured to apply the light to the substrate and to receive reflected light from the substrate; spectroscopes each configured to measure at each wavelength an intensity of the reflected light received; and a processor configured to produce a spectrum indicating a relationship between intensity and wavelength of the reflected light. The first optical head is arranged so as to face a center of the substrate, and the second optical head is arranged so as to face a peripheral portion of the substrate.
    Type: Application
    Filed: December 20, 2011
    Publication date: June 28, 2012
    Inventors: Itsuki KOBATA, Yoichi Kobayashi, Katsutoshi Ono, Masaki Kinoshita, Toshifumi Kimba
  • Publication number: 20110159782
    Abstract: An apparatus for polishing a substrate is provided. The apparatus includes: a rotatable polishing table supporting a polishing pad; a substrate holder configured to hold a substrate and press the substrate against a polishing surface of the polishing pad on the rotating polishing table so as to polish the substrate; a pad-temperature detector configured to measure a temperature of the polishing surface of the polishing pad; a pad-temperature regulator configured to contact the polishing surface to regulate the temperature of the polishing surface; and a temperature controller configured to control the temperature of the polishing surface by controlling the pad-temperature regulator based on information on the temperature of the polishing surface detected by the pad-temperature detector.
    Type: Application
    Filed: December 21, 2010
    Publication date: June 30, 2011
    Inventors: Tadakazu SONE, Yasuyuki MOTOSHIMA, Toru MARUYAMA, Katsutoshi ONO, Yoichi SHIOKAWA
  • Patent number: 7264765
    Abstract: This invention relates to a method and an apparatus for smelting titanium metal by the thermal reduction of titanium oxide (TiO2) to titanium metal (Ti); a mixed salt of calcium chloride (CaCl2) and calcium oxide (CaO) contained in a reaction vessel is heated to form a molten salt which constitutes a reaction region, the molten salt in the reaction region is electrolyzed thereby converting the molten salt into a strongly reducing molten salt containing monovalent calcium ions (Ca+) and/or calcium (Ca), titanium oxide is supplied to the strongly reducing molten salt and the titanium oxide is reduced and the resulting titanium metal is deoxidized by the monovalent calcium ions and/or calcium. The method and the apparatus make it feasible to produce commercially titanium metal suitable for a variety of applications from titanium oxide.
    Type: Grant
    Filed: October 11, 2002
    Date of Patent: September 4, 2007
    Assignee: Nippon Light Metal Company, Ltd.
    Inventors: Katsutoshi Ono, Ryosuke Suzuki
  • Patent number: 7189139
    Abstract: A polishing apparatus can detect completion of initialization of a polishing pad quantitatively. The polishing apparatus has a polishing table having a polishing pad attached thereto and a substrate holder configured to bring a surface of a substrate into contact with the polishing pad and press the substrate against the polishing pad. The polishing apparatus also has a drive mechanism operable to drive at least one of the polishing table and the substrate holder so as to provide a relative movement between the polishing pad and the substrate. The polishing apparatus includes a current sensor operable to detect a drive current supplied to the driving mechanism. The polishing apparatus also includes a polishing pad condition detector operable to detect a condition of the polishing pad based on the drive current detected by the current sensor when the dummy substrate is polished by a relative movement between the polishing pad and a dummy substrate held by the substrate holder.
    Type: Grant
    Filed: April 5, 2005
    Date of Patent: March 13, 2007
    Assignee: Ebara Corporation
    Inventor: Katsutoshi Ono
  • Publication number: 20050221720
    Abstract: A polishing apparatus can detect completion of initialization of a polishing pad quantitatively. The polishing apparatus has a polishing table having a polishing pad attached thereto and a substrate holder configured to bring a surface of a substrate into contact with the polishing pad and press the substrate against the polishing pad. The polishing apparatus also has a drive mechanism operable to drive at least one of the polishing table and the substrate holder so as to provide a relative movement between the polishing pad and the substrate. The polishing apparatus includes a current sensor operable to detect a drive current supplied to the driving mechanism. The polishing apparatus also includes a polishing pad condition detector operable to detect a condition of the polishing pad based on the drive current detected by the current sensor when the dummy substrate is polished by a relative movement between the polishing pad and a dummy substrate held by the substrate holder.
    Type: Application
    Filed: April 5, 2005
    Publication date: October 6, 2005
    Inventor: Katsutoshi Ono
  • Publication number: 20040237711
    Abstract: This invention relates to a method and an apparatus for smelting titanium metal by the thermal reduction of titanium oxide (TiO2) to titanium metal (Ti); a mixed salt of calcium chloride (CaCl2) and calcium oxide (CaO) contained in a reaction vessel is heated to form a molten salt which constitutes a reaction region, the molten salt in the reaction region is electrolyzed thereby converting the molten salt into a strongly reducing molten salt containing monovalent calcium ions (Ca+) and/or calcium (Ca), titanium oxide is supplied to the strongly reducing molten salt and the titanium oxide is reduced and the resulting titanium metal is deoxidized by the monovalent calcium ions and/or calcium. The method and the apparatus make it feasible to produce commercially titanium metal suitable for a variety of applications from titanium oxide.
    Type: Application
    Filed: March 31, 2004
    Publication date: December 2, 2004
    Inventors: Katsutoshi Ono, Ryosuke Suzuki
  • Patent number: 6548139
    Abstract: In a glass substrate for use in a magnetic recording medium, a surface roughness of at least a principal surface of the glass substrate is measured by the use of the interatomic force microscope (AFM), Ra falls within the range between 0.2 and 2.5 nm, Rmax falls within the range between 3 and 25 nm, and Rmax/Ra falls within the range between 3 and 35.
    Type: Grant
    Filed: February 14, 2002
    Date of Patent: April 15, 2003
    Assignee: Hoya Corporation
    Inventors: Hiroyuki Sakai, Katsutoshi Ono, Syoji Matsuda
  • Publication number: 20020142191
    Abstract: In a glass substrate for use in a magnetic recording medium, a surface roughness of at least a principal surface of the glass substrate is measured by the use of the interatomic force microscope (AFM), Ra falls within the range between 0.2 and 2.5 nm, Rmax falls within the range between 3 and 25 nm, and Rmax/Ra falls within the range between 3 and 35.
    Type: Application
    Filed: February 14, 2002
    Publication date: October 3, 2002
    Applicant: HOYA CORPORATION
    Inventors: Hiroyuki Sakai, Katsutoshi Ono, Syoji Matsuda
  • Patent number: 6383404
    Abstract: In a glass substrate for use in a magnetic recording medium, a surface roughness of at least a principal surface of the glass substrate is measured by the use of the interatomic force microscope (AFM), Ra falls within the range between 0.2 and 2.5 nm, Rmax falls within the range between 3 and 25 nm, and Rmax/Ra falls within the range between 3 and 35.
    Type: Grant
    Filed: August 19, 1999
    Date of Patent: May 7, 2002
    Assignee: Hoya Corporation
    Inventors: Hiroyuki Sakai, Katsutoshi Ono, Syoji Matsuda
  • Patent number: 6119483
    Abstract: An object of the present invention is to prevent the dhesion of particles such as fine iron powders onto a glass substrate upon the production of a glass substrate for an information recording medium.
    Type: Grant
    Filed: December 29, 1997
    Date of Patent: September 19, 2000
    Assignee: Hoya Corporation
    Inventors: Koji Takahashi, Kazuhiko Maeda, Shinji Eda, Jun Ozawa, Katsutoshi Ono, Kinobu Osakabe, Nobuyuki Eto
  • Patent number: 5104573
    Abstract: A green light emitting phosphor comprising tetravalent elements added to a green light emitting phosphor, Y.sub.3 (Al,Ga).sub.5 O.sub.12 :Tb, wherein the green light emitting phosphor can prevent a so-called electron beam burning even when excited by electron beams of high energy. The green light emitting phosphor is, particularly suitable to be applied to a projector tube or a high-brightness phosphor display tube.
    Type: Grant
    Filed: October 16, 1989
    Date of Patent: April 14, 1992
    Assignee: Sony Corporation
    Inventors: Katsutoshi Ono, Tomohiko Abe, Tsuneo Kusunoki, Yuichi Kimizuka
  • Patent number: 4104981
    Abstract: An indicator comprises first means adapted for emitting a ray of light; and second means having an indicating surface for receiving the ray of light to permit the ray of light to illuminate the indicating surface. The first and second means are movable relative to each other to vary intensity of illumination of the indicating surface.
    Type: Grant
    Filed: August 30, 1976
    Date of Patent: August 8, 1978
    Assignee: Nissan Motor Company, Ltd.
    Inventors: Katsutoshi Ono, Koichi Sekiguchi
  • Patent number: 4095553
    Abstract: A lever fixed to a metal cap or speed cup of a speedometer is vibratably engageable with projections provided on a rotating ring member when a speed pointer rotatable with the metal cap deflects beyond a predetermined maximum index, so that the speed pointer is vibrated to give a warning to the vehicle driver.
    Type: Grant
    Filed: October 22, 1976
    Date of Patent: June 20, 1978
    Inventors: Katsutoshi Ono, Yasumasa Takagi