Patents by Inventor Kazuaki Inoue

Kazuaki Inoue has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20230090680
    Abstract: An electronic performance device includes a storage mechanism 1, a detection mechanism 2 and an output mechanism 3. The storage mechanism 1 is configured to store data waveforms per level of hit strength. The detection mechanism 2 is configured to transmit a detection signal at the time of hitting. The output mechanism 3 is configured to output data waveforms corresponding to the hit strength indicated by the detection signal. The storage mechanism 1 stores basic data waveforms corresponding to each level of strength of a hit on a musical instrument. An additional element that is produced based on waveform data extracted separately from the basic waveform data and applicable to multiple levels of the hit strength. The output mechanism 3 outputs output waveform data where the additional element is applied to the basic waveform data.
    Type: Application
    Filed: November 28, 2022
    Publication date: March 23, 2023
    Inventors: Kazuaki Inoue, Yoshiaki Mori
  • Patent number: 10730755
    Abstract: A subject of this invention is to provide a dispersion liquid of a silica-based composite particle, which can rapidly polish silica film, Si wafer or even hard-to-process material, can concurrently achieve high surface accuracy (less scratches, etc.), and can suitably be used for surface polishing of semiconductor devices including semiconductor substrate and wiring board, by virtue of its impurity-free nature. The subject is solved by a dispersion liquid of a silica-based composite particle that contains a silica-based composite particle that has a core particle mainly composed of amorphous silica, and bound thereto a ceria particle mainly composed of crystalline ceria, further has a silica film that covers them.
    Type: Grant
    Filed: March 30, 2016
    Date of Patent: August 4, 2020
    Assignee: JGC Catalysts and Chemicals Ltd.
    Inventors: Yuji Tawarazako, Yoshinori Wakamiya, Shingo Kashiwada, Kazuaki Inoue, Kazuhiro Nakayama, Michio Komatsu
  • Publication number: 20180105428
    Abstract: A subject of this invention is to provide a dispersion liquid of a silica-based composite particle, which can rapidly polish silica film, Si wafer or even hard-to-process material, can concurrently achieve high surface accuracy (less scratches, etc.), and can suitably be used for surface polishing of semiconductor devices including semiconductor substrate and wiring board, by virtue of its impurity-free nature. The subject is solved by a dispersion liquid of a silica-based composite particle that contains a silica-based composite particle that has a core particle mainly composed of amorphous silica, and bound thereto a ceria particle mainly composed of crystalline ceria, further has a silica film that covers them.
    Type: Application
    Filed: March 30, 2016
    Publication date: April 19, 2018
    Inventors: Yuji Tawarazako, Yoshinori Wakamiya, Shingo Kashiwada, Kazuaki Inoue, Kazuhiro Nakayama, Michio Komatsu
  • Patent number: 8187351
    Abstract: The present invention provides a sol of spinous inorganic oxide particles not containing coarse particles, in which particles having extremely homogeneous particles are dispersed in a solvent. An acidic silicic acid is added to a dispersion liquid of core particles to grow core particles, and then again the acidic silicic acid is added at the addition rate 1.2 to 1.8 higher than that in the previous step to prepare a sol of spinous inorganic oxide particles. Then the sol is subjected to centrifugation to remove coarse particles having the diameter of 800 nm or more, thus spinous inorganic oxide particles having peculiar form such as a spinous one being obtained.
    Type: Grant
    Filed: November 29, 2007
    Date of Patent: May 29, 2012
    Assignee: JGC Catalysts and Chemicals Ltd.
    Inventors: Kazuhiro Nakayama, Mami Tokunaga, Akira Nakashima, Kazuaki Inoue, Osamu Yoshida, Yoshinori Wakamiya, Hiroyasu Nishida
  • Patent number: 8118898
    Abstract: The present invention provides a sol of spinous silica-based particles in which silica-based particles having peculiar forms, spinous forms are dispersed in a solvent. The spinous silica-based particles have verrucous projections formed on surfaces of spherical silica-based particles. In the spinous particles, a value of the surface roughness (SA1/SA2, SA1 indicating a specific surface area measured by the BET method or the Sears method and SA2 indicating a specific surface area converted from an average particle diameter (D2) measured by the image analysis method) is in the range from 1.7 to 10. Furthermore the average diameter (D2) measured by the image analysis method is in the range from 7 to 150 nm.
    Type: Grant
    Filed: October 11, 2007
    Date of Patent: February 21, 2012
    Assignee: JGC Catalysts and Chemicals Ltd.
    Inventors: Yoshinori Wakamiya, Hiroyasu Nishida, Yuji Tawarazako, Kazuaki Inoue, Osamu Yoshida, Akira Nakashima
  • Patent number: 7901652
    Abstract: Porous silica-based particles with relatively larger average diameter of 1 micron or more and a low particle density are prepared. The method includes the steps of (a) preparing two-layer separated liquid including an organic silicon compound layer and a water layer, then adding an organic solvent, an alkali, and a surfactant into the water layer while agitating at least the water layer so that the organic silicon compound layer and the water layer are not completely mixed with each other, further hydrolyzing and/or partial hydrolyzing the organic silicon compound in the mixed aqueous solution to prepare silica-based particle precursors, (b) adding sodium aluminate into the mixed aqueous solution containing the silica-based particle precursors and then preparing silica-based particles having pores, cavities or voids inside the particles, and (c) washing and drying the silica-based particles. The particles are useful for various applications such as microcapsules, adsorbents, catalysts, and so on.
    Type: Grant
    Filed: December 15, 2005
    Date of Patent: March 8, 2011
    Assignee: JGC Catalysts and Chemicals Ltd.
    Inventors: Kazuaki Inoue, Kazuhiro Nakayama, Akira Nakashima
  • Publication number: 20080160276
    Abstract: Provided is a method of producing porous silica-based particles with the relatively larger average diameter of 1 micron or more and also having a low particle density. The method comprises the steps of (a) preparing two-layer separated liquid consisting of an organic silicon compound layer and a water layer, then adding an organic solvent, an alkali, and a surfactant into the water layer while agitating at least the water layer so that the organic silicon compound layer and the water layer are not completely mixed with each other, further hydrolyzing and/or partial hydrolyzing the organic silicon compound in the mixed aqueous solution to prepare silica-based particle precursors, (b) adding sodium aluminate into the mixed aqueous solution containing the silica-based particle precursors and then preparing silica-based particles having pores, cavities or voids inside the particles, and (c) washing and drying the silica-based particles.
    Type: Application
    Filed: December 15, 2005
    Publication date: July 3, 2008
    Applicant: CATALYSTS & CHEMICALS INDUSTRIES CO., LTD.
    Inventors: Kazuaki Inoue, Kazuhiro Nakayama, Akira Nakashima
  • Publication number: 20080131571
    Abstract: The present invention provides a sol of spinous inorganic oxide particles not containing coarse particles, in which particles having extremely homogeneous particles are dispersed in a solvent. An acidic silicic acid is added to a dispersion liquid of core particles to grow core particles, and then again the acidic silicic acid is added at the addition rate 1.2 to 1.8 higher than that in the previous step to prepare a sol of spinous inorganic oxide particles. Then the sol is subjected to centrifugation to remove coarse particles having the diameter of 800 nm or more, thus spinous inorganic oxide particles having peculiar form such as a spinous one being obtained.
    Type: Application
    Filed: November 29, 2007
    Publication date: June 5, 2008
    Applicant: CATALYSTS& CHEMICALS INDUSTRIES CO., LTD
    Inventors: Kazuhiro Nakayama, Mami Tokunaga, Akira Nakashima, Kazuaki Inoue, Osamu Yoshida, Yoshinori Wakamiya, Hiroyasu Nishida
  • Publication number: 20080086951
    Abstract: The present invention provides a sol of spinous silica-based particles in which silica-based particles having peculiar forms, spinous forms are dispersed in a solvent. The spinous silica-based particles have verrucous projections formed on surfaces of spherical silica-based particles. In the spinous particles, a value of the surface roughness (SA1/SA2, SA1 indicating a specific surface area measured by the BET method or the Sears method and SA2 indicating a specific surface area converted from an average particle diameter (D2) measured by the image analysis method) is in the range from 1.7 to 10. Furthermore the average diameter (D2) measured by the image analysis method is in the range from 7 to 150 nm.
    Type: Application
    Filed: October 11, 2007
    Publication date: April 17, 2008
    Applicant: CATALYSTS & CHEMICALS INDUSTRIES CO., LTD
    Inventors: Yoshinori Wakamiya, Hiroyasu Nishida, Yuji Tawarazako, Kazuaki Inoue, Osamu Yoshida, Akira Nakashima
  • Patent number: 7112739
    Abstract: An electronic percussion instrument modifies the effect applied to note generated in response to a strike based on the intensity of the strike. A plurality of patches are stored in the waveform memory. Each patch includes settings for the effects applied to each pad of the instrument. The patch also includes a setting indicating whether the parameters of the effects applied to the pads are to be modified in accordance with strike intensity. Subsequently, during performance, when a strike is detected the intensity of the strike is used to determine whether the parameters of the effect applied to the note are to be modified, and if so the parameters are modified in correspondence to the intensity of the strike. This allows the performer to easily modify the effect applied to the notes of the percussion instrument during performance.
    Type: Grant
    Filed: April 2, 2004
    Date of Patent: September 26, 2006
    Assignee: Roland Corporaton
    Inventors: Chiharu Mori, Kazuaki Inoue
  • Patent number: 7078610
    Abstract: An electronic percussion instrument samples an input waveform. An unused waveform number may be automatically assigned to the sampled waveform upon sampling or when a user-specified waveform number is already in use for another waveform. Musical time parameters for the input waveform may be specified in advance of sampling, and an endpoint for the sampled waveform may be automatically set in response to a stop sampling command so that length of the waveform is a whole number of musical time units such as bars or beats. The endpoint of the sampled waveform may be set to the beginning or the end of the musical time unit during which the stop command is received, depending on the time at which the stop command is received. The sampled waveform may be edited by manually moving the starting point by a specified amount and automatically moving the end point by a corresponding amount, by changing the specified tempo of the waveform, or by specifying a different number of musical time units.
    Type: Grant
    Filed: April 2, 2004
    Date of Patent: July 18, 2006
    Assignee: Roland Corporation
    Inventors: Chiharu Mori, Kazuaki Inoue
  • Publication number: 20040255764
    Abstract: An electronic percussion instrument samples an input waveform. An unused waveform number may be automatically assigned to the sampled waveform upon sampling or when a user-specified waveform number is already in use for another waveform. Musical time parameters for the input waveform may be specified in advance of sampling, and an endpoint for the sampled waveform may be automatically set in response to a stop sampling command so that length of the waveform is a whole number of musical time units such as bars or beats. The endpoint of the sampled waveform may be set to the beginning or the end of the musical time unit during which the stop command is received, depending on the time at which the stop command is received. The sampled waveform may be edited by manually moving the starting point by a specified amount and automatically moving the end point by a corresponding amount, by changing the specified tempo of the waveform, or by specifying a different number of musical time units.
    Type: Application
    Filed: April 2, 2004
    Publication date: December 23, 2004
    Applicant: ROLAND CORPORATION
    Inventors: Chiharu Mori, Kazuaki Inoue
  • Publication number: 20040255765
    Abstract: An electronic percussion instrument modifies the effect applied to note generated in response to a strike based on the intensity of the strike. A plurality of patches are stored in the waveform memory. Each patch includes settings for the effects applied to each pad of the instrument. The patch also includes a setting indicating whether the parameters of the effects applied to the pads are to be modified in accordance with strike intensity. Subsequently, during performance, when a strike is detected the intensity of the strike is used to determine whether the parameters of the effect applied to the note are to be modified, and if so the parameters are modified in correspondence to the intensity of the strike. This allows the performer to easily modify the effect applied to the notes of the percussion instrument during performance.
    Type: Application
    Filed: April 2, 2004
    Publication date: December 23, 2004
    Applicant: Roland Corporation
    Inventors: Chiharu Mori, Kazuaki Inoue
  • Patent number: 6455154
    Abstract: A coating liquid for forming porous silica coating, comprising a product of reaction between a short fiber silica and a hydrolyzate of an alkoxysilane of the formula XnSi(OR)4-n or a halogenated silane of the formula XnSiX′4-n (in the formula, X represents a hydrogen atom, a fluorine atom, an alkyl group having 1 to 8 carbon atoms, an aryl group or a vinyl group; R represents a hydrogen atom, an alkyl group having 1 to 8 carbon atoms, an aryl group or a vinyl group; X′ represents a chlorine atom or a bromine atom; and n is an integer of 0 to 3). A coated substrate comprising a porous silica coating film formed from the above coating liquid for forming porous silica coating. A short fiber silica having an average diameter (D) of 10 to 30 nm, a length (L) of 30 to 100 nm and an aspect ratio (L/D) of 3 to 10.
    Type: Grant
    Filed: April 28, 2000
    Date of Patent: September 24, 2002
    Assignee: Catallysts & Chemicals Industries Co., Ltd.
    Inventors: Akira Nakashima, Kazuaki Inoue, Ryo Muraguchi, Michio Komatsu
  • Patent number: 6090446
    Abstract: The present invention provides a method of forming on a substrate a particle layer highly adherent to the substrate, which comprises the steps of spreading a dispersion (I) comprising a dispersing medium and, dispersed therein, solid particles being surface treated with a compound acting as a binder on a liquid (II) having a specific gravity higher than that of the dispersing medium, said liquid (II) being immiscible with the dispersing medium, subsequently removing the dispersing medium from the dispersion (I) to thereby arrange the solid particles on the liquid (II) so that a particle layer is formed on the liquid (II) and thereafter transferring the particle layer onto a substrate.
    Type: Grant
    Filed: April 12, 1996
    Date of Patent: July 18, 2000
    Assignee: Catalysts & Chemicals Industries Co., Ltd.
    Inventors: Akira Nakashima, Michio Komatsu, Kenji Ohno, Kuniharu Teramoto, Kazuaki Inoue
  • Patent number: 6083314
    Abstract: A coating liquid for forming porous silica coating, comprising a product of reaction between a short fiber silica and a hydrolyzate of an alkoxysilane of the formula X.sub.n Si(OR).sub.4-n or a halogenated silane of the formula X.sub.n SiX'.sub.4-n (in the formula, X represents a hydrogen atom, a fluorine atom, an alkyl group having 1 to 8 carbon atoms, an aryl group or a vinyl group; R represents a hydrogen atom, an alkyl group having 1 to 8 carbon atoms, an aryl group or a vinyl group; X' represents a chlorine atom or a bromine atom; and n is an integer of 0 to 3). A coated substrate comprising a porous silica coating film formed from the above coating liquid for forming porous silica coating. A short fiber silica having an average diameter (D) of 10 to 30 nm, a length (L) of 30 to 100 nm and an aspect ratio (L/D) of 3 to 10.
    Type: Grant
    Filed: August 6, 1998
    Date of Patent: July 4, 2000
    Assignee: Catalysts & Chemicals Industries Co., Ltd.
    Inventors: Akira Nakashima, Kazuaki Inoue, Ryo Muraguchi, Michio Komatsu
  • Patent number: 5923084
    Abstract: A semiconductor device comprising a low-heat-resistance heat discharging route suitable for small semiconductor devices, such as an IC card, is disclosed. Heat arising from electronic parts is efficiently dispersed to the outside, thereby accomplishing a decrease in size and a heightening of function. In a specific embodiment, a CPU is mounted on a substrate in a position of thermal via holes. A high-heat-conducting material such as semifluid silicone rubber is placed between a CPU mounting face of the substrate and lower panel located on the opposite side of the substrate. The high-heat-conducting material is a filler having the ability to change shape and the property of electrical nonconductivity. A greater part of the heat arising from the CPU is transmitted through the thermal via holes from the CPU mounting face of the substrate to the opposite side, and further to the high-heat-conducting material which conveys the heat to the lower panel.
    Type: Grant
    Filed: June 5, 1996
    Date of Patent: July 13, 1999
    Assignee: Seiko Epson Corporation
    Inventors: Kazuaki Inoue, Hiroyuki Yamashita, Norio Nakamura, Hiroyuki Yoda
  • Patent number: 5864347
    Abstract: A display control circuit that enables efficient image rotation, and scaling of bit-mapped image data stored in image memory, in synchronization with dot clock, line, or frame timing of a target display device without requiring re-writing of the display memory contents. Addresses output from a memory address counter are modified by multiplication and summation with desired image display parameters to generate new addresses for retrieving desired image data from memory locations that are physically mapped to the modifications desired for a new output image. The basic image data is not itself modified. Timing of multiplication and summation processes is synchronized to the timing of the target display device and is performed during horizontal or vertical retrace line intervals. Additional summations of address values with the display parameters is performed by dot and line.
    Type: Grant
    Filed: March 18, 1997
    Date of Patent: January 26, 1999
    Assignee: Seiko Epson Corporation
    Inventor: Kazuaki Inoue
  • Patent number: 5204177
    Abstract: Transparent conductive coatings excellent in transparency are provided on substrates such as glass, plastics, etc. by the use of conductive coating materials obtained by maintaining aqueous solutions of hydrolyzable tin containing or indium containing compounds at pH of 8-12, and gradually hydrolyzing said compounds in the solutions to form sols containing colloidal particles, followed by drying and calcining.
    Type: Grant
    Filed: August 27, 1991
    Date of Patent: April 20, 1993
    Assignee: Catalysts & Chemicals Industries, Co., Ltd.
    Inventors: Goro Sato, Michio Komatsu, Tsuguo Koyanagi, Masayuki Matsuda, Hiroo Yoshidome, Akira Nakashima, Kazuaki Inoue
  • Patent number: 5179692
    Abstract: An interface device for changing the serial data format of the video signal output of a computer intended for display on a cathode ray tube, to a video signal having parallel data format for a liquid crystal display is provided. The device includes a read/write control circuit which responds to a clock signal corresponding to the synchronizing signal of the serial signal and to an asynchronous clock signal. Data signals which were removed from the serial signal and temporarily stored in memory are read out as parallel data signals at the next read cycle when read address counter is counted.
    Type: Grant
    Filed: June 27, 1989
    Date of Patent: January 12, 1993
    Assignee: Seiko Epson Corporation
    Inventor: Kazuaki Inoue