Abstract: A ternary copolymer comprising units of ?-trifluoromethylacrylic carboxylate having acid labile groups substituted thereon, units of ?-trifluoromethylacrylic carboxylate having adhesive groups substituted thereon, and units of styrene having hexafluoroalcohol pendants is highly transparent to VUV radiation and resistant to plasma etching. A resist composition using the polymer as a base resin is sensitive to high-energy radiation below 200 nm, has excellent sensitivity, and is suited for lithographic microprocessing.

Abstract: A resist composition comprising a blend of a cyclic polymer having alcoholic groups as soluble groups and a polymer having carboxyl or hexafluoroalcohol groups whose hydrogen atoms are replaced by acid labile groups as a base resin forms a resist film which is improved in transparency, alkali dissolution contrast and plasma etching resistance.

Abstract: In an immersion lithography process, a pattern is formed by forming a photoresist layer on a wafer, forming a protective coating on the photoresist layer from an overlay material, exposing the layer structure to light in water, and developing. A water-insoluble, alkali-soluble material is used as the overlay material.

Abstract: A fluorine-containing cyclic ester is represented by the formula 1: wherein each R1 independently represents —H or —F, wherein R2 is one selected from the group consisting of —H, —F, —CF3, —OH, —COOH and —COOR4, where R4 is an alkyl group having a carbon atom number of 1–15, and wherein R3 is a substituent selected from the group consisting of —F, —CF3, and —R5C(CF3)2OR6, where R5 is one selected from the group consisting of CH2, C2H4, and OCH2, and R6 is H or an acid-labile protecting group.

Abstract: A polyamide resin/rubber-reinforced styrene-based resin composition, particularly, a polyamide resin/ABS resin composition, excellent in the balance between impact strength and fluidity as well as in the heat resistance, chemical resistance and paintability, as well as a shaped article thereof, are provided. The resin composition comprises 100 parts by weight of a thermoplastic resin comprising (A) from 79.5 to 20 parts by weight of a polyamide resin, (B) from 20 to 79.5 parts by weight of a polymer obtained by grafting an aromatic vinyl-based monomer and a vinyl cyanide-based monomer to a specific rubber-like polymer, (C) from 0.

Abstract: A magnetic disk glass substrate manufacturing method includes a step of polishing a surface of a glass substrate to a mirror surface, a gas heating process step of causing a heated atmosphere and the glass substrate to contact each other so as to heat the glass substrate at a temperature T0, a step of causing a chemically strengthening salt melted exceeding a freezing temperature TF and the glass substrate to contact each other so as to chemically strengthen the glass substrate at a temperature T1, a gas cooling process step of causing a gas coolant and the glass substrate to contact each other so as to cool the glass substrate to a temperature T2, and a liquid cooling process step of causing a liquid coolant and the glass substrate to contact each other so as to cool the glass substrate to a temperature T3, the above-mentioned steps being included in this order, wherein the temperature T2 is set to a temperature less than the freezing temperature TF of the chemical strengthening salt in a gas cooling process

Abstract: An antenna unit is provided in a wireless communication apparatus which performs wireless communication. The antenna unit has a radio wave resonance part through which a radio wave is transmitted or received, an antenna ground part electrically connected to the radio wave resonance part, and a connection part which fixes the antenna ground part at such a position that the antenna ground part is closer to the radio wave resonance part than other ground parts of the wireless communication apparatus.

Abstract: A resist composition comprising a polymer containing vinyl sulfonate units having fluorinated hydrophilic groups as a base resin has excellent transparency, substrate adhesion and developer penetrability as well as plasma etching resistance, and is suited for lithographic microprocessing.

Abstract: The present invention relates to a top coat composition, which is characterized in that it is applied to a photoresist top surface by using a polymer containing at least one structure represented by the formula [1], [2] or [3]. It is possible to produce a top coat composition solution by dissolving this top coat composition in an organic solvent. These top coat composition and top coat composition solution can be used in immersion lithography.

Abstract: A chemically amplified resist composition using an alternating copolymer of ?-trifluoroacrylic acid with norbornene as a base polymer lends itself to ArF laser lithographic micropatterning and is improved in transparency, plasma etching resistance, and line edge roughness.

Abstract: A resist composition comprising a polymer containing vinyl sulfonate units having fluorinated hydrophilic groups as a base resin has excellent transparency, substrate adhesion and developer penetrability as well as plasma etching resistance, and is suited for lithographic microprocessing.

Abstract: A copolymer of an acrylate monomer containing fluorine at ?-position with a fluorinated hydroxystyrene derivative is highly transparent to VUV radiation and resistant to plasma etching. A resist composition using the polymer as a base resin is sensitive to high-energy radiation below 200 nm, has excellent sensitivity, resolution, transparency, substrate adhesion and plasma etching resistance, and is suited for lithographic microprocessing.

Abstract: A chemically amplified resist composition comprising an alternating copolymer of an acrylate monomer having a fluoroalkyl group at alpha-position with a norbornene derivative, when processed through ArF excimer laser exposure by lithography, is improved in resolution and dry etching resistance and minimized in line edge roughness.

Abstract: A process for producing an acrylic ester compound includes reacting in the presence of alkene an alcohol represented by the formula (1), wherein R1 represents a hydrogen atom, a fluorine atom, a straight-chain or branched hydrocarbon group, a fluorine-containing alkyl group, or an aromatic or aliphatic ring and optionally contains oxygen, sulfur or a carbonyl bond, with an acid halide represented by the formula (2), wherein R2 represents a hydrogen atom, a halogen atom, a hydrocarbon group, or a fluorine-containing alkyl group, and X represents a halogen atom.

Abstract: A resist composition comprising a base polymer having a fluorinated sulfonate or fluorinated sulfone introduced therein is sensitive to high-energy radiation, has excellent transparency, contrast and adherence, and is suited for lithographic microprocessing.

Abstract: A polymer comprising recurring units of formula (1) and recurring units of formulae (2a) to (2d) wherein R1 is F or fluoroalkyl, R2 is a single bond or an alkylene or fluoroalkylene, R3 and R4 are H, F, alkyl or fluoroalkyl, at least one of R3 and R4 contains F, R5 is H or an acid labile group, R6 is an acid labile group, adhesive group, alkyl or fluoroalkyl, and “a” is 1 or 2 is used as a base resin to formulate a resist composition which has advantages including high transparency to radiation having a wavelength of up to 200 nm, substrate adhesion, developer affinity and dry etching resistance.

Abstract: A polymer comprising recurring units having a partial structure of formula (1) wherein R1 is a single bond or alkylene or fluoroalkylene, R2 and R3 are H or alkyl or fluoroalkyl, at least one of R2 and R3 contains at least one fluorine atom is used as a base resin to formulate a resist composition which has advantages including high transparency to radiation having a wavelength of up to 200 nm, substrate adhesion, developer affinity and dry etching resistance.