Patents by Inventor Kazuhiko Sakamoto

Kazuhiko Sakamoto has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 7005544
    Abstract: A method for effectively preventing polymerization of acrylic acid during an azeotropic dehydration distillation in an acrylic acid manufacturing process and thus enabling stable operation of the azeotropic dehydration column over an extended period of time. The acrylic acid is separated in an azeotropic dehydration column from an acrylic acid aqueous solution fed therein, and the method includes withdrawing from the bottom of the azeotropie dehydration column a bottom effluent containing 50% or more of glyoxal (including the hydrates thereof) contained in the acrylic acid aqueous solution fed into the azeotropic dehydration column.
    Type: Grant
    Filed: August 29, 2003
    Date of Patent: February 28, 2006
    Assignee: Nippon Shokubai Co., Ltd.
    Inventors: Kazuo Ohkouchi, Tomohiro Nakae, Kazuhiko Sakamoto
  • Patent number: 6996803
    Abstract: A program is generated by combining program modules by displaying programs for guiding the combination of program modules and selecting one of the programs. Program modules stored in a memory are displayed on a display device by a command inputted from the input device, navigation programs for guiding the combination of program modules stored in the memory are retrieved by a command inputted from the input device, the retrieved navigation program group are displayed on the display device, a desired navigation program is selected from the navigation program group displayed on the display device, the navigation program is executed, a guide parameter outputted by the navigation program for the combination of program modules is designated, a connector module for combining program modules is generated from the guide parameter inputted from the input device, and the generated connector module is stored in the memory.
    Type: Grant
    Filed: September 19, 2001
    Date of Patent: February 7, 2006
    Assignee: Hitachi, Ltd.
    Inventors: Kazuhiko Sakamoto, Tetsuya Masuishi, Takashi Okoda
  • Publication number: 20060011374
    Abstract: A method is provided for manufacturing a flexible flat cable that is prepared by covering a conductor unit including a plurality of tin-alloy plated conductors with an insulation base material such that the conductor unit is stripped at both ends. The method includes a first step of preparing the conductor unit including the tin-alloy plated conductors and an insulator that is present between the tin-alloy plated conductors; a second step of heat treating the prepared conductor unit; and a third step of covering the heat-treated conductor unit with the insulation base material such that the conductor unit is stripped at both ends.
    Type: Application
    Filed: May 18, 2005
    Publication date: January 19, 2006
    Inventor: Kazuhiko Sakamoto
  • Publication number: 20060009655
    Abstract: A method for quickly starting up a reactor and a reactor system therefor are provided. A shell-and-tube reactor in the system is adapted to circulate a heat medium having a solid point in the range of 50-250° C. to the outside of the reaction tubes and characterized by initiating temperature elevation of the reactor by introducing a gas of a temperature in the range of 100-400° C. to the reaction tubes' side and then circulating the heat medium in a heated state to the outside of the reaction tubes. By introducing a gas of an elevated temperature preparatorily to the reaction tubes, it is made possible to prevent the heat medium after circulation from being solidified again and enable the reactor to be quickly started up.
    Type: Application
    Filed: September 7, 2005
    Publication date: January 12, 2006
    Inventors: Yukihiro Matsumoto, Takeshi Nishimura, Hideki Sogabe, Kazuhiko Sakamoto, Osamu Dodo
  • Patent number: 6966973
    Abstract: The present invention provides an apparatus for producing (meth)acrylic acid and a process for producing (meth)acrylic acid with this apparatus wherein the apparatus enables the production of (meth)acrylic acid stably for a long period of time by effectively inhibiting the polymerization of (meth)acrylic acid in its production process (for example, in a reboiler). At least a part of the apparatus is made of a nickel-chromium-iron alloy with a molybdenum content of 3 to 20 mass %, but not including 3 mass %, or with a molybdenum content of 1 to 4 mass % and a copper content of 0.5 to 7 mass %.
    Type: Grant
    Filed: July 1, 2002
    Date of Patent: November 22, 2005
    Assignee: Nippon Shokubai Co., Ltd.
    Inventors: Sei Nakahara, Kazuhiko Sakamoto, Yukihiro Matsumoto, Kenji Sanada, Masatoshi Ueoka
  • Patent number: 6946573
    Abstract: A method for quickly starting up a reactor and a reactor system therefor are provided. A shell-and-tube reactor in the system is adapted to circulate a heat medium having a solid point in the range of 50-250° C. to the outside of the reaction tubes and characterized by initiating temperature elevation of the reactor by introducing a gas of a temperature in the range of 100-400° C. to the reaction tubes' side and then circulating the heat medium in a heated state to the outside of the reaction tubes. By introducing a gas of an elevated temperature preparatorily to the reaction tubes, it is made possible to prevent the heat medium after circulation from being solidified again and enable the reactor to be quickly started up.
    Type: Grant
    Filed: April 30, 2001
    Date of Patent: September 20, 2005
    Assignee: Nippon Shokaubai Co., Ltd.
    Inventors: Yukihiro Matsumoto, Takeshi Nishimura, Hideki Sogabe, Kazuhiko Sakamoto, Osamu Dodo
  • Publication number: 20050178267
    Abstract: A method and apparatus for preventing contamination of a substrate or a substrate surface, and particularly relates to prevention of contamination of raw materials, semi-finished products, base materials of products and substrate surface in a high-tech industry such as in the production of semiconductors and liquid crystals. A gas coming into contact with a base material or substrate is purified by dust removing means and adsorption and/or absorption means so that the concentration of fine particles in the gas is below class 1,000 and a non-methane hydrocarbon concentration is below 0.2 ppm. Thereafter, the base material or the substrate surface is exposed to this gas.
    Type: Application
    Filed: March 15, 2005
    Publication date: August 18, 2005
    Applicant: Ebara Research Co., Ltd.
    Inventors: Toshiaki Fujii, Tsukuru Suzuki, Hidetomo Suzuki, Kazuhiko Sakamoto
  • Patent number: 6930198
    Abstract: A method for producing an unsaturated carboxylic ester is provided, which can prevent the raw material compounds and the product of the reaction from splashing and adhering on the inner wall of the reaction vessel and succumbing to polymerization on the inner wall. Specifically, it is characterized by the fact that the difference between the outer periphery of the reaction vessel heated by the heating means and the reaction solution in temperature is not higher than 80° C.
    Type: Grant
    Filed: April 24, 2002
    Date of Patent: August 16, 2005
    Assignee: Nippon Shokubai Co., Ltd.
    Inventors: Kazuto Okazaki, Yukihiro Matsumoto, Kazuhiko Sakamoto, Yuji Miyahara
  • Patent number: 6911064
    Abstract: A method and apparatus for preventing contamination of a substrate or a substrate surface, and particularly relates to prevention of contamination of raw materials, semi-finished products, base materials of products and substrate surface in a high-tech industry such as an in the production of semiconductors and liquid crystals. A gas coming into contact with a base material or substrate is purified by dust removing apparatus and adsorption and/or absorption apparatus so that the concentration of fine particles in the gas is below class 1,000 and a non-methane hydrocarbon concentration is below 0.2 ppm. Thereafter, the base material or the substrate surface is exposed to this gas.
    Type: Grant
    Filed: December 29, 2003
    Date of Patent: June 28, 2005
    Assignee: Ebara Research Co., Ltd.
    Inventors: Toshiaki Fujii, Tsukuru Suzuki, Hidetomo Suzuki, Kazuhiko Sakamoto
  • Patent number: 6900346
    Abstract: A method for the decomposition of a Michael type adduct, characterized by causing a Michael type adduct to react in the presence of an N-oxyl compound thereby decomposing the Michael type adduct into acrylic acid and/or the acrylic ester and/or the alcohol and a method for the production of acrylic acid and/or the acrylic ester, characterized by comprising a step of recovering a Michael type adduct formed in the process for the production of acrylic acid or acrylic ester and a step of decomposing the recovered Michael type adduct by the method of decomposition mentioned above. This invention, therefore, allows promotion of efficient utilization of the raw materials.
    Type: Grant
    Filed: June 27, 2002
    Date of Patent: May 31, 2005
    Assignee: Nippon Shokubai Co., Inc.
    Inventors: Fumio Shibusawa, Naoki Serata, Kazuhiko Sakamoto
  • Patent number: 6899452
    Abstract: An apparatus for the preparation and supply of a polymerization inhibitor which constantly effects stable supply of a polymerization inhibitor solution adjusted to a prescribed concentration and enables a compound handled at the next step to be prevented from polymerization is provided. The apparatus for the preparation and supply of a polymerization inhibitor has at least two tanks and a stirring device, a liquid level detector, a polymerization inhibitor input port, a concentration-adjusting liquid input port, and a polymerization inhibitor solution feed opening, each being installed in at least one of said tanks.
    Type: Grant
    Filed: September 18, 2002
    Date of Patent: May 31, 2005
    Assignee: Nippon Shokubai Co., Inc.
    Inventors: Kei Hamamoto, Takeshi Nishimura, Kazuhiko Sakamoto, Kunihiko Suzuki
  • Patent number: 6888026
    Abstract: An object of this invention is to provide a method for producing acrylic acid that enables to suppress adverse influence of byproducts during distillation and to accomplish long-term continuous operation of the acrylic acid production apparatus. This invention is directed to a method for producing (meth)acrylic acid comprising the step of isolating (meth)acrylic acid from a liquid containing (meth)acrylic acid by distillation wherein the liquid contains glyoxal (including its hydrate) in a concentration of 0.1 mass % or less.
    Type: Grant
    Filed: September 26, 2002
    Date of Patent: May 3, 2005
    Assignee: Nippon Shokubai Co., Ltd.
    Inventors: Kazuhiko Sakamoto, Kazuo Ohkouchi, Tomohiro Nakae
  • Patent number: 6870066
    Abstract: A method for the decomposition of a Michael type adduct of an acrylic acid and/or an acrylic ester represented by the following formula [I] or [II] is disclosed, wherein decomposing the Michael type adduct in the presence of at least one copper salt and at least one metal salt selected from the group consisting of an alkali metal salt and an alkaline earth metal salt into an acrylic acid and/or an acrylic ester and/or an alcohol. CH2?CHCOO(—X—COO)n—R1??[I] R2—O(—X—COO)m—R3??[II] (wherein n and m denote an integer in the range of 1-5, R1, R2, and R3 independently denote a hydrogen atom or an alkyl group, and —X— denotes —CH2CH2— or —CH(CH3)—, and —X— may be identical or different when n is 2 or more).
    Type: Grant
    Filed: March 10, 2003
    Date of Patent: March 22, 2005
    Assignee: Nippon Shokubai Co., LTD
    Inventors: Fumio Shibusawa, Naoki Serata, Kazuhiko Sakamoto
  • Patent number: 6848501
    Abstract: In an apparatus provided with a plate type heat exchanger as a heater and/or a cooler and operated to treat a gas containing an easily blocking substance, a method for preventing the plate type heat exchanger from being blocked is disclosed which is characterized by i) setting the width of a flow path on a plate of the plate type heat exchanger in the apparatus in a range of 6-25 mm and ii) setting the average flow rate of the gas passing the plate type heat exchanger in the apparatus per unit cross-sectional area of the flow path on the plate in the range of 3-15 m/s. In the exchange of heat of an easily blocking substance by the use of a plate type heat exchanger, a method for preventing the plate type heat exchanger from blockage is disclosed which has the plate type heat exchanger provided in the port for introducing a gas containing an easily blocking substance with a gas dispersion plate.
    Type: Grant
    Filed: January 31, 2003
    Date of Patent: February 1, 2005
    Assignee: Nippon Shokubai Co., LTD
    Inventors: Harunori Hirao, Yukihiro Matsumoto, Sei Nakahara, Osamu Dodo, Tetsuji Mitsumoto, Takeshi Nishimura, Kazuhiko Sakamoto, Hiroo Iwato
  • Patent number: 6831195
    Abstract: A method for producing an organic acid and/or an organic acid ester which utilizes a steam system permitting stable production of an organic acid and/or an organic acid ester and realizing a high thermal efficiency constantly relative to the waste heat generated in the process of the production is provided. More particularly, this invention concerns a method for the production of an organic acid and/or an organic acid ester, wherein heat generated in the process for producing an organic acid and/or an organic acid ester is recovered in the form of steam, and the steam is used in any of the following forms: {circle around (1)} thermal energy, {circle around (2)} dynamic energy, and {circle around (3)} electrical energy in the process for producing an organic acid and/or an organic acid ester.
    Type: Grant
    Filed: August 21, 2002
    Date of Patent: December 14, 2004
    Assignee: Nippon Shokubai, Co., LTD
    Inventors: Takeshi Nishimura, Tetsuji Mitsumoto, Kazuhiko Sakamoto, Hidefumi Haramaki
  • Publication number: 20040230074
    Abstract: A method for distilling (meth)acrylic acid and/or the ester thereof by withdrawing vapor generated in a distillation column by distillation from the top of the column, condensing the vapor to give a condensate, and circulating part of the condensate as reflux liquid into the distillation column from the top thereof, comprising the step of adding a polymerization inhibitor to said condensate and said reflux liquid. This method enables maintaining the purity and quality of (meth)acrylic acid and/or the ester thereof at a certain level or higher, suppressing generation of polymers in the rectification column and suppressing polymerization of the condensate obtained by distillation in the incident facilities of the column such as condenser, condensate tank, and the like. In addition, the method enables reduction in the amount of polymerization inhibitor used while suppressing polymerization in the intermediate distillation columns (except the final rectification column).
    Type: Application
    Filed: May 7, 2004
    Publication date: November 18, 2004
    Inventors: Sei Nakahara, Kazuhiko Sakamoto, Yukihiro Matsumoto
  • Patent number: 6787001
    Abstract: A method for distilling a raw material liquid containing (meth)acrylic acid substantially free from azeotropic solvents, collected with a collection agent from a mixed gas obtained by gas phase catalytic oxidation reactions which includes feeding to a distillation column the raw material liquid which temperature is substantially equal to that of the entrance place in the column.
    Type: Grant
    Filed: March 1, 2002
    Date of Patent: September 7, 2004
    Assignee: Nippon Shokubai Co. Ltd.
    Inventors: Kazuhiko Sakamoto, Sei Nakahara, Yukihiro Matsumoto, Kenji Sanada, Masatoshi Ueoka
  • Publication number: 20040149128
    Abstract: A method and apparatus for preventing contamination of a substrate or a substrate surface, and particularly relates to prevention of contamination of raw materials, semi-finished products, base materials of products and substrate surface in a high-tech industry such as in the production of semiconductors and liquid crystals. A gas coming into contact with a base material or substrate is purified by dust removing means and adsorption and/or absorption means so that the concentration of fine particles in the gas is below class 1,000 and a non-methane hydrocarbon concentration is below 0.2 ppm. Thereafter, the base material or the substrate surface is exposed to this gas.
    Type: Application
    Filed: December 29, 2003
    Publication date: August 5, 2004
    Applicant: EBARA RESEARCH CO., LTD.
    Inventors: Toshiaki Fujii, Tsukuru Suzuki, Hidetomo Suzuki, Kazuhiko Sakamoto
  • Publication number: 20040110914
    Abstract: In order to produce inexpensively with high productivity a water-absorbent resin of which: the residual monomer content and the water-extractable content are both low, and the properties are high, and the colorability is low; there is provided a process for producing a water-absorbent resin, which is a process for producing a crosslinked water-absorbent resin by polymerizing a monomer component including acrylic acid and/or its salt in a major proportion wherein the acrylic acid is a product obtained by catalytic gas phase oxidation of propylene and/or propane, with the process being characterized by comprising the steps of: preparing the monomer component from an acrylic acid composition that includes the unneutralized acrylic acid and a methoxyphenol and has a methoxyphenol content of 10 to 160 ppm by weight (based on the unneutralized acrylic acid); and then carrying out radical and/or ultraviolet polymerization of the resultant monomer component.
    Type: Application
    Filed: September 16, 2003
    Publication date: June 10, 2004
    Inventors: Sei Nakahara, Kunihiko Ishizaki, Hirotama Fujimaru, Yasuhisa Nakashima, Kazuhiko Sakamoto
  • Patent number: 6733570
    Abstract: A method and apparatus for preventing contamination of a substrate or a substrate surface, and particularly relates to prevention of contamination of raw materials, semi-finished products, base materials of products and substrate surface in a high-tech industry such as in the production of semiconductors and liquid crystals. A gas coming into contact with a base material or substrate is purified by dust removing apparatus and adsorption and/or absorption apparatus so that the concentration of fine particles in the gas is below class 1,000 and a non-methane hydrocarbon concentration is below 0.2 ppm. Thereafter, the base material or the substrate surface is exposed to this gas.
    Type: Grant
    Filed: June 2, 1995
    Date of Patent: May 11, 2004
    Assignee: Ebara Research Co., Ltd.
    Inventors: Toshiaki Fujii, Tsukuru Suzuki, Hidetomo Suzuki, Kazuhiko Sakamoto