Patents by Inventor Kazuhiko Sugiyama

Kazuhiko Sugiyama has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 5314603
    Abstract: A plasma processing apparatus has a process chamber and a pair of electrodes provided in the process chamber to oppose each other. An RF power supply outputs an RF power to be supplied to at least one of the pair of electrodes in the process chamber. A power detector detects an actual RF power to be applied to one of the electrodes in the process chamber. A controller controls the RF power output from the RF power supply to a predetermined value in accordance with the actual RF power detected by the power detector.
    Type: Grant
    Filed: July 24, 1992
    Date of Patent: May 24, 1994
    Assignee: Tokyo Electron Yamanashi Limited
    Inventors: Kazuhiko Sugiyama, Masafumi Shimizu, Yukio Naito, Eiichi Nishimura, Kouichi Oshima
  • Patent number: 5241987
    Abstract: When a process gas obtained by mixing a source gas with a diluting gas is supplied to a predetermined process apparatus, by supplying the process gas to the predetermined process apparatus through a gas contacting part connecting at least one source gas supplying pipe with at least one diluting gas supplying pipe, no chance that the source gas is exposed to air contamination is provided. Moreover, in particular, by forming the gas contacting part which is to be in contact with the above source gas, diluting gas and the like using such a material as metal, ceramic or the like, emission of materials having bad influences on the process gas, such as organic materials in particular, is eliminated. Furthermore, by providing a branching pipe or exhausting pipe, the degree of diluting the source gas can be varied stepwise, and by further combining with a flow rate adjuster, it can be varied continuously.
    Type: Grant
    Filed: December 2, 1991
    Date of Patent: September 7, 1993
    Assignee: Tadahiro Ohmi
    Inventors: Tadahiro Ohmi, Kazuhiko Sugiyama, Fumio Nakahara
  • Patent number: 5226968
    Abstract: A metal oxidation treatment apparatus to form the passivation film on the surface of the metal to be oxidized such as stainless steel or the like, comprising an oxidation furnace, a gas inlet to introduce gas into said oxidation furnace, a discharge outlet to discharge the gas from said oxidation furnace, and a heater to heat said oxidation furnace to the predetermined temperature, so that the metal to be oxidized is heated and oxidized in dry oxidation atmosphere while gas is passed in said oxidation furnace.
    Type: Grant
    Filed: November 5, 1990
    Date of Patent: July 13, 1993
    Assignee: Tadahiro Ohmi
    Inventors: Tadahiro Ohmi, Kazuhiko Sugiyama, Fumio Nakahara, Satoshi Mizokami
  • Patent number: 5224998
    Abstract: A metal oxidation treatment apparatus to form the passivation film on the surface of the metal to be oxidized such as stainless steel or the like, comprising an oxidation furnace, a gas inlet to introduce gas into said oxidation furnace, a discharge outlet to discharge the gas from said oxidation furnace, and a heater to heat said oxidation furnace to the predetermined temperature, so that the metal to be oxidized is heated and oxidized in dry oxidation atmosphere while gas is passed in said oxidation furnace.
    Type: Grant
    Filed: November 28, 1990
    Date of Patent: July 6, 1993
    Assignees: Tadahiro Ohmi, Sanso Kogyo Kabushiki Kaisha
    Inventors: Tadahiro Ohmi, Kazuhiko Sugiyama, Fumio Nakahara, Satoshi Mizokami
  • Patent number: 5147493
    Abstract: A plasma generating apparatus comprising a transformer including a primary winding connected to a high frequency power source and a secondary winding having two end terminals and a plurality of tap terminals connected between the end terminals, the transformer being adapted to deliver first and second high frequency electric powers with a phase difference of 180.degree. from the end terminals, upper and lower electrodes disposed in a vacuum chamber so as to be opposed at a distance from each other and supplied with the first and second high frequency powers, respectively, and a power ratio selector for switching the tap terminals to select the ratio between the first and second high frequency powers supplied to the electrodes, wherein a to-be-processed object placed on the lower electrode is processed by means of plasma formed between the electrodes.
    Type: Grant
    Filed: June 12, 1991
    Date of Patent: September 15, 1992
    Assignees: Tokyo Electron Limited, Tokyo Electron Yamanashi Limited
    Inventors: Eiichi Nishimura, Akihito Toda, Kazuhiko Sugiyama, Yukio Naitou
  • Patent number: 5087289
    Abstract: A herbicidal alkanoic acid derivative of the formula: ##STR1## wherein R.sup.3 is a hydrogen atom, a halogen atom, a halogen-substituted alkyl group, an alkyl group, a cycloalkyl group, an alkylthioalkyl group, a hydroxyalkyl group, a hydroxyl group, a cyano group, an acyloxyalkyl group, a thienyl group, a naphthyl group, a dihydronaphthyl group ##STR2## wherein R.sup.8 is a hydrogen atom, a halogen atom, a nitro group, an alkyl group, an alkoxy group or --S(O).sub.n R.sup.9 wherein R.sup.9 is an alkyl group, and n is an integer of from 0 to 2, m is an integer of from 0 to 2, each of R.sup.2 and R.sup.4 which may be the same or different is a hydrogen atom or an alkyl group, or R.sup.2 and R.sup.4 form together with the adjacent carbon atom a 3-, 4-, 5- or 6-membered ring which may contain an oxygen atom and may be substituted by one or two alkyl groups, each of R.sup.5 and R.sup.6 which may be the same or different is a hydrogen atom or an alkyl group, R.sup.7 is an alkyl group or a phenyl group, or R.sup.
    Type: Grant
    Filed: August 23, 1990
    Date of Patent: February 11, 1992
    Assignees: Kumiai Chemical Industry Co., Ltd., Ihara Chemical Industry Co., Ltd.
    Inventors: Koichiro Kaku, Nobuhide Wada, Akira Takeuchi, Yasufumi Toyokawa, Takeshige Miyazawa, Ryo Yoshida, Kazuhiko Sugiyama
  • Patent number: 4968340
    Abstract: A herbicidal alkanoic acid derivative of the formula: ##STR1## wherein R is ##STR2## wherein R.sup.3 is a hydrogen atom, a halogen atom, a halogen-substituted alkyl group, an alkyl group, a cycloalkyl group, an alkylthioalkyl group, a hydroxyalkyl group, a hydroxyl group, a cyano group, an acyloxyalkyl group, a thienyl group, a naphthyl group, a dihydronaphthyl group or ##STR3## wherein R.sup.8 is a hydrogen atom, a halogen atom, a nitro group, an alkyl group, an alkoxy group or --S(O).sub.n R.sup.9 wherein R.sup.9 is an alkyl group, and n is an integer of from 0 to 2, m is an integer of from 0 to 2, each of R.sup.2 and R.sup.4 which may be the same or different is a hydrogen atom or an alkyl group, or R.sup.2 and R.sup.4 form together with the adjacent carbon atom a 3-, 4-, 5- or 6-membered ring which may contain an oxygen atom and may be substituted by one or two alkyl groups, each of R.sup.5 and R.sup.6 which may be the same or different is a hydrogen atom or an alkyl group, R.sup.
    Type: Grant
    Filed: June 20, 1989
    Date of Patent: November 6, 1990
    Assignees: Kumiai Chemical Industry Co., Ltd., Ihara Chemical Industry Co., Ltd.
    Inventors: Koichiro Kaku, Nobuhide Wada, Akira Takeuchi, Yasufumi Toyokawa, Takeshige Miyazawa, Ryo Yoshida, Kazuhiko Sugiyama
  • Patent number: 4869301
    Abstract: The cylinder cabinet piping system of this invention has a system to supply a purge gas continuously to the main line, or to the main line and the branch line, thereby to prevent stagnation of gas in the purge gas line and to supply a super-high-purity gas to a process unit.
    Type: Grant
    Filed: May 17, 1988
    Date of Patent: September 26, 1989
    Assignee: Tadahiro OHMI
    Inventors: Tadahiro Ohmi, Kazuhiko Sugiyama, Fumio Nakahara, Masaru Umeda
  • Patent number: 4770691
    Abstract: As new compounds are provided 2-(4',6'-di-substituted pyrimidine-2'-yl)oxy- or thio-benzoic acid derivatives of the formula ##STR1## wherein R is hydrogen, hydroxy, alkoxy, alkenyloxy, alkylthio or other substituents, R.sup.1 and R.sup.2 are each a halo, alkyl, alkoxy or other substituents; and X is oxygen or sulfur atom. These new compounds are useful as herbicidal agent effective to inhibit the growth of annual weeds and also perennial weeds predominant in irrigated fields of aquatic rice plants and in plowed fields.
    Type: Grant
    Filed: October 15, 1986
    Date of Patent: September 13, 1988
    Assignees: Kumiai Chemical Industry Co., Ltd., Ihara Chemical Industry Co., Ltd.
    Inventors: Yukio Nezu, Kazuhiko Sugiyama, Shoji Kusano, Yasufumi Toyokawa, Takeshige Miyazawa, Ikuo Kajiwara