Patents by Inventor Kazuhiro Nakayama
Kazuhiro Nakayama has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 11891307Abstract: A silica-based particle dispersion including a silica-based particle group and a high polishing rate and high surface precision is achieved to a silica-based substrate or a NiP-plated substrate to be polished or the like. A silica-based particle dispersion containing a group including irregularly-shaped and non-irregularly-shaped silica-based particles, wherein the irregularly-shaped silica-based particles each have a plurality of small holes thereinside and a covering silica layer which covers the core, and the silica-based particle group satisfies [1]-[3]. [1] Having an average particle size (D1) of 100-600 nm, and a particle size (D2) of 30-300 nm in terms of specific surface area. [2] An irregular-shape degree D (D=D1/D3) represented by the average particle size (D1) and a projected area-equivalent particle size (D3) being in the range of 1.1-5.0. [3] When waveform separation is performed on a volume-reference particle size distribution, a multi-peak distribution in which three or more peaks are detected.Type: GrantFiled: October 4, 2019Date of Patent: February 6, 2024Assignee: JGC CATALYSTS AND CHEMICALS LTD.Inventors: Michio Komatsu, Kazuhiro Nakayama, Tetsuya Tanaka, Yuji Tawarazako, Tatsuya Mukai, Yuki Miwa
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Publication number: 20240002712Abstract: A method of producing a dispersion of irregularly shaped silica-based fine particles according to the invention includes steps (a) to (f) below: Step (a): obtaining a seed particle precursor dispersion by adjusting an aqueous alkali silicate solution so that ionic strength is 0.4 or more; Step (b): subjecting the seed particle precursor dispersion to heat-aging; Step (c): obtaining a seed particle dispersion by adding an acidic silicic acid solution to the seed particle precursor dispersion subjected to the heat-aging; Step (d): adjusting the seed particle dispersion so that the ionic strength is 0.25 or more; Step (e): subjecting the seed particle dispersion, of which SiO2 concentration and ionic strength are adjusted, to heat-aging: and Step (f): obtaining a dispersion of irregularly shaped silica-based fine particles that contains irregularly shaped silica-based fine particles by adding an acidic silicic acid solution to the seed particle dispersion subjected to the heat-aging.Type: ApplicationFiled: July 30, 2021Publication date: January 4, 2024Applicant: JGC CATALYSTS AND CHEMICALS LTD.Inventors: Kazuhiro NAKAYAMA, Daisuke YAMADA
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Patent number: 11505717Abstract: An object of the present invention is to provide a nanobubble-containing inorganic oxide fine particle dispersion having excellent concentration stability in a process used as an abrasive. The object is achieved by the nanobubble-containing inorganic oxide fine particle dispersion including: inorganic oxide fine particles having an average particle size of 1 to 500 nm and containing fine particles containing Ce; and nanobubbles having an average cell size of 50 to 500 nm and being at least one non-oxidizing gas selected from a group consisting of N2 and H2.Type: GrantFiled: May 21, 2018Date of Patent: November 22, 2022Assignee: JGC CATALYSTS AND CHEMICALS LTD.Inventors: Michio Komatsu, Hiroyasu Nishida, Kazuhiro Nakayama
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Publication number: 20220163240Abstract: The degree of freedom when a refrigerant cycle system is constructed in a building or the like is increased. A refrigerant cycle system according to the present disclosure includes a refrigerant cycle, a first power feed unit, a second power feed unit, a first transmission line, and a second transmission line. The power feed unit feeds auxiliary power to a utilization unit of which a power source has been interrupted. The first transmission line connects a heat source unit and the first power feed unit to each other. The second transmission line connects the first power feed unit and the second power feed unit to each other. The second power feed unit is connected to the heat source unit via the first power feed unit.Type: ApplicationFiled: March 12, 2020Publication date: May 26, 2022Applicant: DAIKIN INDUSTRIES, LTD.Inventors: Shin HIGASHIYAMA, Kensuke URATA, Hiroshi DOHMAE, Kazuhiro NAKAYAMA
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Publication number: 20220146131Abstract: Provided is an air conditioning system capable of detecting in advance a device that consumes more power than the power that can be fed by a power feed unit. An air conditioning system includes a refrigerant cycle, a power feed unit, and a controller. The refrigerant cycle includes an outdoor unit and a plurality of indoor units. In a case where a power source for at least one indoor unit of the plurality of indoor units has been interrupted, the power feed unit feeds power from an auxiliary power source to the indoor unit for which the power source has been interrupted. When a predetermined device has been connected to at least part of the plurality of indoor units and the power feed unit, the controller performs deactivation of at least one of functions of the device.Type: ApplicationFiled: May 22, 2020Publication date: May 12, 2022Applicant: DAIKIN INDUSTRIES, LTD.Inventors: Kazuhiro NAKAYAMA, Atsushi OKAMOTO
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Publication number: 20220146173Abstract: An air conditioning system includes a refrigerant cycle, a power feed unit, a controller, and a processor. The refrigerant cycle includes an outdoor unit and a plurality of indoor units. The outdoor unit includes a compressor. In a case where a power source for at least one indoor unit of the plurality of indoor units is interrupted, the power feed unit feeds power from an auxiliary power source to the at least one indoor unit. The controller controls at least the compressor. In the case where the power source for the at least one indoor unit of the plurality of indoor units is interrupted, the processor makes one of a determination to stop the compressor and a determination to cause the compressor to continue operating. The processor transmits to the controller an instruction corresponding to the determination that has been made.Type: ApplicationFiled: April 8, 2020Publication date: May 12, 2022Applicant: DAIKIN INDUSTRIES, LTD.Inventors: Kazuhiro NAKAYAMA, Atsushi OKAMOTO
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Patent number: 11267715Abstract: Aiming at providing a ceria-based composite particle dispersion capable of polishing silica film, Si wafer or even hard-to-process material at high polishing rate, and can give high surface accuracy, disclosed is a ceria-based composite particle dispersion that contains a ceria-based composite particle that has an average particle size of 50 to 350 nm, to solve the aforementioned problem, featured by that the ceria-based composite particle has a mother particle, a cerium-containing silica layer, a child particle, and an easily soluble silica-containing layer; the mother particle contains amorphous silica as a major ingredient; the child particle contains crystalline ceria as a major ingredient; ratio of the mass of the easily soluble silica-containing layer relative to the mass of the ceria-based composite particle falls in a specific range; mass ratio of silica and ceria in the ceria-based composite particle falls in a specific range; the ceria-based composite particle, when analyzed by X-ray diffractometry,Type: GrantFiled: May 23, 2018Date of Patent: March 8, 2022Assignee: JGC Catalysts and Chemicals Ltd.Inventors: Michio Komatsu, Hiroyasu Nishida, Yuji Tawarazako, Shinya Usuda, Kazuhiro Nakayama
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Publication number: 20220055908Abstract: A silica-based particle dispersion including a silica-based particle group and a high polishing rate and high surface precision is achieved to a silica-based substrate or a NiP-plated substrate to be polished or the like. A silica-based particle dispersion containing a group including irregularly-shaped and non-irregularly-shaped silica-based particles, wherein the irregularly-shaped silica-based particles each have a plurality of small holes thereinside and a covering silica layer which covers the core, and the silica-based particle group satisfies [1]-[3]. [1] Having an average particle size (D1) of 100-600 nm, and a particle size (D2) of 30-300 nm in terms of specific surface area. [2] An irregular-shape degree D (D=D1/D3) represented by the average particle size (D1) and a projected area-equivalent particle size (D3) being in the range of 1.1-5.0. [3] When waveform separation is performed on a volume-reference particle size distribution, a multi-peak distribution in which three or more peaks are detected.Type: ApplicationFiled: October 4, 2019Publication date: February 24, 2022Applicant: JGC CATALYSTS AND CHEMICALS LTD.Inventors: Michio KOMATSU, Kazuhiro NAKAYAMA, Tetsuya TANAKA, Yuji TAWARAZAKO, Tatsuya MUKAI, Yuki MIWA
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Patent number: 11059997Abstract: A polishing composition comprising an abrasive grain; a modified microfibril cellulose in which at least a part of the cellulose units has a hydroxyl group at the C6 position oxidized to a carboxyl group; and a dispersion medium, wherein each content of Na and K is 100 ppm or less relative to the solids weight.Type: GrantFiled: December 28, 2017Date of Patent: July 13, 2021Assignee: JGC CATALYSTS AND CHEMICALS LTD.Inventors: Michio Komatsu, Yukihiro Iwasaki, Hiroyasu Nishida, Yuji Tawarazako, Kazuhiro Nakayama
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Patent number: 10920120Abstract: A ceria composite particle dispersion has ceria composite particles having an average particle size of 50 to 350 nm and having the features described below. Each ceria composite particle has a mother particle, a cerium-containing silica layer on the surface thereof, and child particles dispersed inside the cerium-containing silica layer, the mother particles being amorphous silica-based and the child particles being crystalline ceria-based. The child particles have a coefficient of variation (CV value) in a particle size distribution of 14 to 40%. The ceria composite particles have a mass ratio of silica to ceria of 100:11-316. Only the crystal phase of ceria is detected when the ceria composite particles are subjected to X-ray diffraction. The average crystallite size of the crystalline ceria measured by subjecting the ceria composite particles to X-ray diffraction is 10 to 25 nm.Type: GrantFiled: October 6, 2017Date of Patent: February 16, 2021Assignee: JGC CATALYSTS AND CHEMICALS LTD.Inventors: Michio Komatsu, Yuji Tawarazako, Shinya Usuda, Kazuhiro Nakayama, Shota Kawakami
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Patent number: 10844259Abstract: Disclosed is a silica-based composite fine particle dispersion including a silica-based composite fine particle which comprises a mother particle containing amorphous silica as a main component with a child particle containing crystalline ceria as a main component on a surface thereof. Features of the silica-based composite fine particle include a silica to ceria mass ratio of 100:11 to 316, and when subjected to X-ray diffraction, only the crystalline phase of ceria is detected, and when subjected to X-ray diffraction for measurement, the crystalline ceria has a crystallite diameter of 10 to 25 nm.Type: GrantFiled: April 5, 2017Date of Patent: November 24, 2020Assignee: JGC Catalysts and Chemicals Ltd.Inventors: Yuji Tawarazako, Michio Komatsu, Kazuhiro Nakayama, Yukihiro Iwasaki, Yoshinori Wakamiya, Shota Kawakami, Shinya Usuda
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Patent number: 10730755Abstract: A subject of this invention is to provide a dispersion liquid of a silica-based composite particle, which can rapidly polish silica film, Si wafer or even hard-to-process material, can concurrently achieve high surface accuracy (less scratches, etc.), and can suitably be used for surface polishing of semiconductor devices including semiconductor substrate and wiring board, by virtue of its impurity-free nature. The subject is solved by a dispersion liquid of a silica-based composite particle that contains a silica-based composite particle that has a core particle mainly composed of amorphous silica, and bound thereto a ceria particle mainly composed of crystalline ceria, further has a silica film that covers them.Type: GrantFiled: March 30, 2016Date of Patent: August 4, 2020Assignee: JGC Catalysts and Chemicals Ltd.Inventors: Yuji Tawarazako, Yoshinori Wakamiya, Shingo Kashiwada, Kazuaki Inoue, Kazuhiro Nakayama, Michio Komatsu
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Publication number: 20200109312Abstract: An object of the present invention is to provide a nanobubble-containing inorganic oxide fine particle dispersion having excellent concentration stability in a process used as an abrasive. The object is achieved by the nanobubble-containing inorganic oxide fine particle dispersion including: inorganic oxide fine particles having an average particle size of 1 to 500 nm and containing fine particles containing Ce; and nanobubbles having an average cell size of 50 to 500 nm and being at least one non-oxidizing gas selected from a group consisting of N2 and H2.Type: ApplicationFiled: May 21, 2018Publication date: April 9, 2020Applicant: JGC CATALYSTS AND CHEMICALS LTD.Inventors: Michio KOMATSU, Hiroyasu NISHIDA, Kazuhiro NAKAYAMA
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Publication number: 20200087554Abstract: Aiming at providing a ceria-based composite particle dispersion capable of polishing silica film, Si wafer or even hard-to-process material at high polishing rate, and can give high surface accuracy, disclosed is a ceria-based composite particle dispersion that contains a ceria-based composite particle that has an average particle size of 50 to 350 nm, to solve the aforementioned problem, featured by that the ceria-based composite particle has a mother particle, a cerium-containing silica layer, a child particle, and an easily soluble silica-containing layer; the mother particle contains amorphous silica as a major ingredient; the child particle contains crystalline ceria as a major ingredient; ratio of the mass of the easily soluble silica-containing layer relative to the mass of the ceria-based composite particle falls in a specific range; mass ratio of silica and ceria in the ceria-based composite particle falls in a specific range; the ceria-based composite particle, when analyzed by X-ray diffractometry,Type: ApplicationFiled: May 23, 2018Publication date: March 19, 2020Inventors: Michio Komatsu, Hiroyasu Nishida, Yuji Tawarazako, Shinya Usuda, Kazuhiro Nakayama
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Publication number: 20190367777Abstract: A polishing composition comprising an abrasive grain; a modified microfibril cellulose in which at least a part of the cellulose units has a hydroxyl group at the C6 position oxidized to a carboxyl group; and a dispersion medium, wherein each content of Na and K is 100 ppm or less relative to the solids weight.Type: ApplicationFiled: December 28, 2017Publication date: December 5, 2019Applicant: JGC CATALYSTS AND CHEMICALS LTD.Inventors: Michio KOMATSU, Yukihiro IWASAKI, Hiroyasu NISHIDA, Yuji TAWARAZAKO, Kazuhiro NAKAYAMA
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Publication number: 20190248668Abstract: A ceria composite particle dispersion has ceria composite particles having an average particle size of 50 to 350 nm and having the features described below. Each ceria composite particle has a mother particle, a cerium-containing silica layer on the surface thereof, and child particles dispersed inside the cerium-containing silica layer, the mother particles being amorphous silica-based and the child particles being crystalline ceria-based. The child particles have a coefficient of variation (CV value) in a particle size distribution of 14 to 40%. The ceria composite particles have a mass ratio of silica to ceria of 100:11-316. Only the crystal phase of ceria is detected when the ceria composite particles are subjected to X-ray diffraction. The average crystallite size of the crystalline ceria measured by subjecting the ceria composite particles to X-ray diffraction is 10 to 25 nm.Type: ApplicationFiled: October 6, 2017Publication date: August 15, 2019Applicant: JGC CATALYSTS AND CHEMICALS LTD.Inventors: Michio KOMATSU, Yuji TAWARAZAKO, Shinya USUDA, Kazuhiro NAKAYAMA, Shota KAWAKAMI
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Publication number: 20190153279Abstract: Disclosed is a silica-based composite fine particle dispersion including a silica-based composite fine particle which comprises a mother particle containing amorphous silica as a main component with a child particle containing crystalline ceria as a main component on a surface thereof. Features of the silica-based composite fine particle include a silica to ceria mass ratio of 100:11 to 316, and when subjected to X-ray diffraction, only the crystalline phase of ceria is detected, and when subjected to X-ray diffraction for measurement, the crystalline ceria has a crystallite diameter of 10 to 25 nm.Type: ApplicationFiled: April 5, 2017Publication date: May 23, 2019Inventors: Yuji Tawarazako, Michio Komatsu, Kazuhiro Nakayama, Yukihiro Iwasaki, Yoshinori Wakamiya, Shota Kawakami, Shinya Usuda
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Patent number: 10160894Abstract: Provided is a non-spherical silica sol containing non-spherical silica fine particles dispersed in a dispersion medium, the non-spherical silica fine particles having an average particle diameter in a range of 3 to 150 nm as measured by dynamic light scattering, a minor-diameter/major-diameter ratio in a range of 0.01 to 0.8, and a specific surface area in a range of 10 to 800 m2/g, and also having a plurality of wart-like projections on the surfaces thereof, and a process for producing the non-spherical silica sol. The non-spherical silica fine particles contained in the non-spherical silica sol have a unique structure different from the structure of ordinary non-spherical silica fine particles.Type: GrantFiled: November 20, 2015Date of Patent: December 25, 2018Assignee: JGC Catalysts and Chemicals Ltd.Inventors: Hiroyasu Nishida, Kazuhiro Nakayama
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Publication number: 20180105428Abstract: A subject of this invention is to provide a dispersion liquid of a silica-based composite particle, which can rapidly polish silica film, Si wafer or even hard-to-process material, can concurrently achieve high surface accuracy (less scratches, etc.), and can suitably be used for surface polishing of semiconductor devices including semiconductor substrate and wiring board, by virtue of its impurity-free nature. The subject is solved by a dispersion liquid of a silica-based composite particle that contains a silica-based composite particle that has a core particle mainly composed of amorphous silica, and bound thereto a ceria particle mainly composed of crystalline ceria, further has a silica film that covers them.Type: ApplicationFiled: March 30, 2016Publication date: April 19, 2018Inventors: Yuji Tawarazako, Yoshinori Wakamiya, Shingo Kashiwada, Kazuaki Inoue, Kazuhiro Nakayama, Michio Komatsu
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Patent number: 9598611Abstract: A method for producing a high purity silica sol is provided. This method has enabled use of water glass for the starting material, and the resulting silica sol has a reduced metal impurity Cu and Ni content compared to conventional methods. The method comprises (1) ultrafiltration of an aqueous solution of an alkali silicate; (2) ion exchange process for removal of at least a part of cationic components in the purified aqueous solution of an alkali silicate; (3) another ion exchange process using a chelating ion exchange resin to obtain high purity silicate solution; and (4) adjustment of a part of the high purity silicate solution (seed solution) to alkaline pH and mixing of this solution with another part of the solution (feed solution) to produce a high purity silica sol having a Cu concentration and a Ni concentration (in relation to the dry silica) of up to 50 ppb.Type: GrantFiled: December 27, 2012Date of Patent: March 21, 2017Assignee: JGC Catalysts and Chemicals Ltd.Inventors: Kazuhiro Nakayama, Akira Nakashima, Michio Komatsu