Abstract: According to one embodiment, a template is provided with a transferring pattern on a first surface of a substrate. The transferring pattern includes a first projecting portion that projects from the first surface with a first height and extends in a first direction along the first surface, a second projecting portion that projects from the first surface with a second height higher than the first height and extends in a second direction along the first surface, a first columnar portion that is arranged at a position overlapping with the first projecting portion and has a top surface with a third height higher than the second height as a height from the first surface, and a second columnar portion that is arranged at a position overlapping with the second projecting portion and has a top surface with the third height as a height from the first surface.

Abstract: According to one embodiment, a template includes a base material with a first surface at a first level. A first pattern on the template includes first protruding portions in a first region that protrude to a second level beyond the first level, a first recess portion between an adjacent pair of first protruding portions in a central portion of the first region, and a second recess portion between another adjacent pair of first protruding portions in an outer peripheral portion of the first region. A second pattern on the template includes a protrusion portion in a second region outside the first region. The protrusion portion protrudes to a third level. An optical layer is in the first recess portion and at least a portion of a bottom surface of the second recess portion is not covered by the optical layer.

Abstract: According to one embodiment, an imprint lithography template comprises a substrate transparent to ultraviolet light. A first mesa region is on the substrate. A surface of the first mesa region includes a pattern region to be pressed into a photocurable resist film. The pattern region having four sides. A second mesa region is also on the substrate. The first mesa region protrudes from a surface of the second mesa region. A blocking film is adjacent to two sides of the four sides pattern region. The two sides to which the blocking film is adjacent are connected to each other at a corner of the pattern region. The blocking film blocks ultraviolet light.

Abstract: A semiconductor device manufacturing method includes forming, on a substrate, a stacked body including a plurality of first films and a plurality of second films alternately stacked in a height direction; and forming a number (m × n) of holes through the stacked body that haves a number (m × n) of depths. The number (m) depths are arranged in a first direction intersecting the height direction and the number (n) depths are arranged in a second direction intersecting the height direction and the first direction. Further, the step of forming a number (m × n) of holes includes forming, on the stacked body, a mask member having a number (m) of heights in the first direction; and forming, in the stacked body, a number (m × n) of holes having number (m) depths in the first direction and number (n) depths based on the mask member.

Abstract: A design pattern generation method of an embodiment is a method for generating a design pattern of a template. The design pattern generation method includes: generating an actual pattern including a first pattern protruding from a contact surface of the template with a material layer and extending in a predetermined direction along the contact surface, and a second pattern further protruding from an upper surface of the first pattern; calculating a volume of the first pattern and the second pattern per unit area on the contact surface; and adding, when a difference in the volume of the first pattern and the second pattern per unit area between regions on the contact surface exceeds a specified value, a third pattern to a region where the volume of the first pattern and the second pattern per unit area is small.

Abstract: According to the embodiment, the template includes: a first substrate; a pattern projected from a principal surface of the first substrate; a first mark projected from the principal surface of the first substrate, the first mark surrounding a recessed portion disposed in an inside region of the first mark; and a second mark recessed from the principal surface of the first substrate; wherein the first mark is provided with, in a planar view, an inner portion having a pair of first sides opposed to each other and a pair of second sides opposed to each other, the first sides extending in a first direction along the first substrate, the second sides extending in a second direction intersecting with the first direction along the first substrate, the inner portion surrounding the recessed portion of the first mark, and an outer portion having a pair of third sides opposed to each other and a pair of fourth sides opposed to each other, the third sides extending in the first direction, the fourth sides extending in t

Abstract: A fuel cell unit structure includes: power generation cells; separators; a flow passage portion formed between the separators and including flow passages configured to supply gas to the power generation cells; gas flow-in ports configured to allow the gas to flow into the flow passage portion; gas flow-out ports configured to allow the gas to flow out from the flow passage portion; and an adjustment portion configured to adjust an amount of the gas flowing through the flow passages. The adjustment portion includes a first auxiliary flow passage provided between the power generation cells arranged to be opposed to each other on a same plane with a gas flow-in port of the gas flow-in ports being located on an extended line of an extending direction of the first auxiliary flow passage.

Abstract: According to one embodiment, a template is provided with a transferring pattern on a first surface of a substrate. The transferring pattern includes a first projecting portion that projects from the first surface with a first height and extends in a first direction along the first surface, a second projecting portion that projects from the first surface with a second height higher than the first height and extends in a second direction along the first surface, a first columnar portion that is arranged at a position overlapping with the first projecting portion and has a top surface with a third height higher than the second height as a height from the first surface, and a second columnar portion that is arranged at a position overlapping with the second projecting portion and has a top surface with the third height as a height from the first surface.

Abstract: According to one embodiment, there is provided a template including: a substrate having a first surface; a trench that is recessed from the first surface at a predetermined depth and extends along the first surface in a first direction, the trench includes a first portion having a second width in a second direction intersecting with the first direction and a second portion having a third width in the second direction; and a hole that is arranged is the first portion of the trench and extends from a bottom surface of the trench, and the first width is smaller than the second width, and the third width is smaller than the first width.

Abstract: A semiconductor device includes: a semiconductor substrate having a first surface; a device area that is formed on the semiconductor substrate and includes a semiconductor element; and a conductive member that surrounds the device area and extends in a first direction perpendicularly intersecting the first surface. The conductive member is formed on the semiconductor substrate, and includes a first pattern and a second pattern, the second pattern overlapping the first pattern in the first direction. A pitch of the first pattern in a second direction intersecting the first direction is different from a pitch of the second pattern in the second direction.

Abstract: A fuel cell stack includes cell units and separators that are alternately stacked, in which each of the cell units includes a single cell. Each of the separators includes: at least one first ridge that is disposed on a first main surface of each of the separators at a predetermined interval to form at least one first gas channel; and at least one second ridge that is disposed on a second main surface of each of the separators at a predetermined interval to form at least one second gas channel. The at least one first ridge and the at least one second ridge are disposed at a regular interval around a center of each of the separators in a cross section perpendicular to the first or second gas channel.

Abstract: A method of manufacturing a template, includes: covering a part of a first region of a substrate; processing another part of the first region to form a first pattern including a protrusion; covering the first region; and processing at least part of a second region of the substrate to form a second pattern including a depression.

Abstract: According to one embodiment, an imprint lithography template comprises a substrate transparent to ultraviolet light. A first mesa region is on the substrate. A surface of the first mesa region includes a pattern region to be pressed into a photocurable resist film. The pattern region having four sides. A second mesa region is also on the substrate. The first mesa region protrudes from a surface of the second mesa region. A blocking film is adjacent to two sides of the four sides pattern region. The two sides to which the blocking film is adjacent are connected to each other at a corner of the pattern region. The blocking film blocks ultraviolet light.

Abstract: A pattern forming method includes forming a first resist pattern on a substrate using imprint lithography. And forming a resist onto the substrate at least at positions corresponding to a second resist pattern and then curing the resist to form the second resist pattern on the substrate.

Abstract: A pattern forming method includes forming a first resist pattern on a substrate using imprint lithography. And forming a resist onto the substrate at least at positions corresponding to a second resist pattern and then curing the resist to form the second resist pattern on the substrate.

Abstract: A fuel cell unit structure includes: power generation cells; separators; a flow passage portion formed between the separators and including flow passages configured to supply gas to the power generation cells; gas flow-in ports configured to allow the gas to flow into the flow passage portion; gas flow-out ports configured to allow the gas to flow out from the flow passage portion; and an adjustment portion configured to adjust an amount of the gas flowing through the flow passages. The adjustment portion includes a first auxiliary flow passage provided between the power generation cells arranged to be opposed to each other on a same plane with a gas flow-in port of the gas flow-in ports being located on an extended line of an extending direction of the first auxiliary flow passage.

Abstract: A pattern forming method includes forming a first resist pattern on a substrate using imprint lithography. And forming a resist onto the substrate at least at positions corresponding to a second resist pattern and then curing the resist to form the second resist pattern on the substrate.

Abstract: A fuel cell stack includes cell units and separators that are alternately stacked, in which each of the cell units includes a single cell. Each of the separators includes: at least one first ridge that is disposed on a first main surface of each of the separators at a predetermined interval to form at least one first gas channel; and at least one second ridge that is disposed on a second main surface of each of the separators at a predetermined interval to form at least one second gas channel. The at least one first ridge and the at least one second ridge are disposed at a regular interval around a center of each of the separators in a cross section perpendicular to the first or second gas channel.

Abstract: According to an embodiment, a template substrate is provided. The template substrate is formed by a board-shaped member. The template substrate includes topography that is non-planar deviation in a predetermined region on a pattern surface of the board-shaped member on which a template pattern is formed.

Abstract: A template for patterning processes has a first protrusion portion on a first surface with a first step portion in a first region and a second step portion in a second region. The first step portion includes a plurality of first steps, at least one of which has a first step height and a first step width. The second step portion includes a plurality of second steps, at least one of which has the first step height and the first step width. The template includes a first recess portion on the first surface between the first and second regions on the first protrusion portion. The first recess portion has at least one of a recess depth different from the first step height and a recess width different from the first step width.