Abstract: An optical reflection element has a frame, a pair of meandering-shaped vibration elements, a mirror having a reflection surface, and a pair of protective beams. The vibration elements have their respective outer ends supported by confronting portions of an inside of the frame. The vibration elements support the mirror with respective inner ends thereof. The protective beams extend from the respective confronting portions of the inside of the frame toward the mirror with a predetermined space from the vibration elements and in parallel with a vibration axis of the vibration elements.

Abstract: An optical reflecting element includes a mirror, and a pair of high-frequency vibrators and a pair of low-frequency vibrators for vibrating the mirror. The high-frequency vibrators include a substrate, a bottom electrode layer formed on the substrate, a piezoelectric layer, and a drive electrode and a first monitor electrode as the top electrode layer. One end of the low-frequency vibrator has the substrate shared with the high-frequency vibrator, a bottom electrode layer, a piezoelectric layer, a drive electrode, and a second monitor electrode as the top electrode layer. The other end of the low-frequency vibrator has the substrate shared with the high-frequency vibrator, a bottom electrode layer, a piezoelectric layer, a drive electrode, a first monitor electrode, and an insulator layer as a dead zone for preventing a piezoelectric effect due to the piezoelectric layer from reaching the first monitor electrode.

Abstract: A piezoelectric element includes a substrate, and a lower electrode layer, a piezoelectric layer, and an upper electrode layer sequentially formed on the substrate. The substrate has a linear thermal expansion coefficient higher than that of the piezoelectric layer, and the piezoelectric layer includes a polycrystalline body having an in-plane stress in a compressive direction. Thus, the piezoelectric element realizes the piezoelectric layer having a high orientation in a polarization axis direction, high proportionality of a displacement amount with respect to an applied voltage, and a large absolute value of the displacement amount.

Abstract: A piezoelectric element includes a substrate, and a lower electrode layer, a piezoelectric layer, and an upper electrode layer sequentially formed on the substrate. The substrate has a linear thermal expansion coefficient higher than that of the piezoelectric layer, and the piezoelectric layer includes a polycrystalline body having an in-plane stress in a compressive direction. Thus, the piezoelectric element realizes the piezoelectric layer having a high orientation in a polarization axis direction, high proportionality of a displacement amount with respect to an applied voltage, and a large absolute value of the displacement amount.

Abstract: An optical reflecting element includes a mirror, and a pair of high-frequency vibrators and a pair of low-frequency vibrators for vibrating the mirror. The high-frequency vibrators include a substrate, a bottom electrode layer formed on the substrate, a piezoelectric layer, and a drive electrode and a first monitor electrode as the top electrode layer. One end of the low-frequency vibrator has the substrate shared with the high-frequency vibrator, a bottom electrode layer, a piezoelectric layer, a drive electrode, and a second monitor electrode as the top electrode layer. The other end of the low-frequency vibrator has the substrate shared with the high-frequency vibrator, a bottom electrode layer, a piezoelectric layer, a drive electrode, a first monitor electrode, and an insulator layer as a dead zone for preventing a piezoelectric effect due to the piezoelectric layer from reaching the first monitor electrode.

Abstract: In a production method of a piezoelectric element, an unneeded electric field is prevented from being applied to a piezoelectric thin film layer during the production process, resulting in a high performance piezoelectric element production method. The production method includes a first process for depositing an under electrode layer, a piezoelectric thin film layer and an upper electrode layer successively on a substrate such that the under electrode layer and the upper electrode layer form a short-circuit, a second process, after the first process, for etching including dry etching, the second process commenced while the under electrode layer and the upper electrode layer are short-circuited, a third process, after the second process, for polarizing by applying a voltage across the under electrode layer and the upper electrode layer, a fourth process, after the third process, for individualizing each piezoelectric element.

Abstract: A piezoelectric element includes a substrate, and a lower electrode layer, a piezoelectric layer, and an upper electrode layer sequentially formed on the substrate. The substrate has a linear thermal expansion coefficient higher than that of the piezoelectric layer, and the piezoelectric layer includes a polycrystalline body having an in-plane stress in a compressive direction. Thus, the piezoelectric element realizes the piezoelectric layer having a high orientation in a polarization axis direction, high proportionality of a displacement amount with respect to an applied voltage, and a large absolute value of the displacement amount.

Abstract: A meandering oscillator includes a plurality of oscillating plates bent and coupled in predetermined directions and piezoelectric actuators each including a lower electrode, a piezoelectric body, and an upper electrode stacked on the oscillating plate in this order, and wherein the piezoelectric actuators are alternately arranged on the oscillating plates. Thus, even when an element is made smaller, electrodes can be easily arranged. As a result, the productivity can be improved.

Abstract: An optical reflection device includes a mirror having a reflection surface configured to reflect light, a first support beam connected to the mirror, a tuning fork vibrator connected to the first support beam, a second support beam connected to the tuning fork vibrator, and a supporter connected to the second support beam. The first support beam has a first end connected to the mirror and a second end located on an opposite side to the first end, and extends along a center axis. The tuning fork vibrator includes a joining portion connected to the second end of the first support beam, a first arm extending from the first joining portion while separated from the first center axis, and a second arm extending from the first joining portion symmetrically to the first arm about the first center axis. The second support beam has a third end connected to the joining portion of the tuning fork vibrator and a fourth end located on an opposite side to the third end, and extends along the first center axis.

Abstract: A method for fabricating a piezoelectric element capable of ensuring high piezoelectric characteristics by preventing generation of unnecessary electric field in a piezoelectric thin film layer during the fabrication process. The method for fabricating a piezoelectric element comprises a first step for depositing a lower electrode layer, a piezoelectric thin film layer and an upper electrode layer sequentially on a substrate, a second step for performing etching including dry etching, a third step for performing polarization by applying a voltage between the lower electrode layer and the upper electrode layer, and a fourth step for segmenting into individual piezoelectric elements wherein the lower electrode layer and the upper electrode layer are held in short circuit state at least when dry etching is performed.

Abstract: A substrate is made of single crystal silicon and having a tuning folk shape. The substrate includes plural arms extending in parallel with each other and a joint section for connecting respecting ends of the arms with each other. An angular velocity sensor includes a barrier layer containing silicon oxide provided on each of the arms of the substrate, a first adhesion layer containing titanium provided on the barrier layer a first electrode layer containing at least one of titanium and titanium oxide provided on the first adhesion layer, an orientation control layer provided on the first electrode layer, a piezoelectric layer provided on the orientation control layer, a second adhesion layer provided on the piezoelectric layer, and a second electrode layer provided on the second adhesion layer. This angular velocity sensor has a small size and stable characteristics.

Abstract: The present invention relates to an infrared detector element to detect infrared rays by means of a pyroelectric material, and an infrared sensor unit and an infrared detecting device using the infrared detector element and has an object of realizing an omnidirectional infrared detector element that can gain an output against an object to be detected moving in whatever directions.

Abstract: A method whereby perovskite type oxide dielectric thin films with ABO.sub.3 structure are able to be formed with such features as good stability, uniformity, reproducibility, or the like, with high through-put by having a deposition process, wherein the thin films are deposited on a substrate, and a stabilization process, where no deposition of the thin films takes place, repeated alternatingly while the substrate temperature being kept near the temperature at which perovskite type oxide dielectric thin films are formed. Also, by employing (i) a processing method wherein a decomposing excitation of a reactive gas due to plasma takes place on or near the deposition surface in a gaseous atmosphere comprising a gas that reacts with the elements composing the thin films, (ii) a processing method wherein an oxidation reaction takes place on the deposition surface in a gaseous atmosphere comprising at least ozone (O.sub.

Abstract: A method whereby perovskite type oxide dielectric thin films with ABO.sub.3 structure are able to be formed with such features as good stability, uniformity, reproducibility, or the like, with high through-put by having a deposition process, wherein the thin films are deposited on a substrate, and a stabilization process, where no deposition of the thin films takes place, repeated alternatingly while the substrate temperature being kept near the temperature at which perovskite type oxide dielectric thin films are formed. Also, by employing (i) a processing method wherein a decomposing excitation of a reactive gas due to plasma takes place on or near the deposition surface in a gaseous atmosphere comprising a gas that reacts with the elements composing the thin films, (ii) a processing method wherein an oxidation reaction takes place on the deposition surface in a gaseous atmosphere comprising at least ozone (O.sub.