Abstract: An appropriate user interface corresponding to a use state of an apparatus is provided. An imaging system includes an imaging apparatus and an information processing apparatus. The imaging apparatus has a control related to an imaging operation performed based on an operation input performed in the information processing apparatus by connecting to the information processing apparatus by using wireless communication. The information processing apparatus performs a control for switching a display state of a display screen related to an imaging operation of the imaging apparatus, based on a connection number of imaging apparatuses and information processing apparatuses connected by using wireless communication.

Abstract: An operation management system manages operations carried out by people in charge of operation regarding a common operation target, including: an operation information database storing operation information related to implementation of the operations; a start notification unit that notifies each person of the start of each operation when the start notification unit detects occurrence of a predetermined trigger event in the operation target; an operation flow construction unit that constructs an operation flow indicating the operation to be carried out by each person in relation to the trigger event, on the basis of the operation information database; an information providing unit that provides, to each person, the operation information with content suitable for the person in charge of operation on the basis of the operation flow; and a progress notification unit that notifies each person of progress of the operation.

Abstract: [Problem] To provide a method for manufacturing a thickened resist pattern. [Means for Solution] A method for manufacturing a thickened resist pattern comprising the following steps: (1) applying a resist composition above a substrate to form a resist layer from the resist composition; (2a) exposing the resist layer; (2b) applying a thickening solution comprising a polymer (A) and a solvent (B) on the resist layer to form a thickening layer; and (3) developing the resist layer and the thickening layer.

Abstract: A motor includes a stator core having salient poles, an insulator held by the stator core, coils of a plurality of phases which are wound around the salient poles through the insulator, a board which is electrically connected with a plurality of wires for the number of the phases that are extended from the coils, and a conduction terminal which electrically connects the board with the stator core. The conduction terminal is provided with a main body part, a board connection part which is extended from the main body part and is electrically connected with the board, a core connection part which is extended from the main body part and is electrically connected with the stator core, and a held part which is held by the insulator. The core connection part is fixed to the stator core by welding.

Abstract: A coil bobbin for a stator of an electric motor includes a body part in a rectangular column shape around which a conductive wire is to be wound, and a first flange part provided at an end of the body part. The body part is structured so that the conductive wire starts to be wound around the body part from a root part which is an end part on the first flange part side and, in a case that a corner of the root part which is a starting point where the conductive wire starts to be wound is referred to as a first corner part, a face of the first flange part directed to the body part side is formed with a groove part which passes at a position adjacent to a position of the first corner part and guides the conductive wire to the first corner part.

Abstract: [Problem] To provide an electronic device manufacturing aqueous solution, which makes it possible to prevent pattern collapse or suppress non-uniformity of resist pattern width. [Means for Solution] An electronic device manufacturing aqueous solution comprising an alkylcarboxylic acid compound (A) and a solvent (B), wherein the alkylcarboxylic acid compound (A) is represented by the formula (a): A1-COOH (a), wherein A1 is C4-12 alkyl, and the solvent (B) comprises water.

Abstract: Problem: A replacement liquid of liquid filling between resist patterns and a method for producing resist patterns using the same. Means of solution: To provide a replacement liquid of liquid filling between resist patterns comprising a sulfonyl group-containing compound (A); a nitrogen-containing compound (B); and a solvent (C).

Abstract: A fluorinated imide salt compound of the present invention is a compound represented by General Formula (1). In General Formula (1), m represents 1 or 2, n represents an integer from 1 to 4, ? represents 1 or 2, and X?+ represents an ?-valent metal ion, a primary ammonium ion, a secondary ammonium ion, a tertiary ammonium ion, a quaternary ammonium ion, or NH4+.

Abstract: In a rotor of a motor or the like, in order to suppress scattering of a part of a magnet provided around a rotating shaft, the rotor has a cylindrical magnet through which the rotating shaft passes, a first holder which covers the magnet from one side in an axial direction of the rotating shaft and a second holder which covers the magnet from the other side in the axial direction. The magnet is press-fitted into a first body portion of the first holder and a second body portion of the second holder, and a first end of the first body portion and a second end of the second body portion are joined by welding or the like. An inner diameter of the first end and the inner diameter of the second end are larger than an outer diameter of the magnet.

Abstract: [Problem] To provide a semiconductor aqueous composition capable of preventing a pattern collapse and suppressing a bridge defect. [Means for Solution] A semiconductor aqueous composition comprising a single or plurality of surfactant(s) having a monovalent anion part represented by formula (I): Chain 1-X1—X2-Chain 2 (I) wherein, X1 and X2 are each independently —C(=0)- or —S(=0)2-, and Chain 1 and Chain 2 are each independently a linear or branched C1-20 alkyl, wherein one or more H in said C1-20 alkyl are replaced by F, and one or more methylenes in Chain 1 may be replaced by -0-, with the proviso that Chain 1 and Chain 2 may be bonded to form a ring structure) and a monovalent cation part other than hydrogen ion; and water.

Abstract: A fluorinated imide salt compound of the present invention is a compound represented by General Formula (1). In General Formula (1), m represents 1 or 2, n represents an integer from 1 to 4, ? represents 1 or 2, and X?+ represents an ?-valent metal ion, a primary ammonium ion, a secondary ammonium ion, a tertiary ammonium ion, a quaternary ammonium ion, or NH4+.

Abstract: The present invention relates to a new lithography composition, the forming of resist patterns using the lithography composition, and a semiconductor device manufacturing method using the lithography composition in a photolithography method.

Abstract: The present invention relates to a new lithography composition, the forming of resist patterns using the lithography composition, and a semiconductor device manufacturing method using the lithography composition in a photolithography method.

Abstract: The present invention relates to a new rinse composition, the forming of resist patterns using the rinse composition, and a semiconductor device manufacturing method using the rinse composition in a photolithography method.

Abstract: The present invention relates to a new rinse composition, the forming of resist patterns using the rinse composition, and a semiconductor device manufacturing method using the rinse composition in a photolithography method.

Abstract: [Problem] To provide a composition capable of improving surface roughness of resist patterns, and also to provide a pattern formation method employing the composition. [Solution] The present invention provides a composition containing a particular nitrogen-containing compound, an anionic surfactant having a sulfo group, and water; and also provides a pattern formation method containing a step of applying the composition to a resist pattern beforehand developed and dried.

Abstract: The present invention provides a composition enabling to form a fine negative photoresist pattern free from troubles such as surface roughness, bridge defects or unresolved defects, and the invention also provides a pattern formation method employing that composition. The composition is used for miniaturizing a resist pattern by applying to a negative resist pattern from a chemically amplified resist composition and fattening the resist pattern. This composition comprises a polymer comprising a repeating unit having an amino group or a polymer mixture, and a solvent, and further comprises a specific amount of an acid or indicates a specific pH value. The polymer mixture comprises polymers whose HSP distance, determined from Hansen solubility parameter, is 3 or more. In the pattern formation method, the composition is cast on a negative photoresist pattern beforehand obtained by development with an organic solvent developer and is then heated to form a fine pattern.

Abstract: [Problem] To provide a composition capable of improving surface roughness of resist patterns, and also to provide a pattern formation method employing the composition. [Solution] The present invention provides a composition containing a particular nitrogen-containing compound, an anionic surfactant having a sulfo group, and water; and also provides a pattern formation method containing a step of applying the composition to a resist pattern beforehand developed and dried.

Abstract: The present invention provides a composition enabling to form a fine negative photoresist pattern less suffering from surface roughness, and also provides a pattern formation method employing that composition. The composition is used for miniaturizing a resist pattern by fattening in a process of forming a positive resist pattern from a chemically amplified positive-working type resist composition, and it contains a polymer comprising a repeating unit having an amino group, a solvent, and an acid. In the pattern formation method, the composition is cast on a positive photoresist pattern beforehand obtained by development and is then heated to form a fine pattern.

Abstract: The present invention provides a fine pattern-forming composition enabling to form a resist pattern having high dry etching resistance, and also provides a pattern formation method using that composition. This formation method hardly causes pipe blockages in the production process. The composition is used for miniaturizing a resist pattern by fattening in a process of forming a negative resist pattern from a chemically amplified resist composition, and comprises a polymer containing a repeating unit having a hydroxyaryl group and an organic solvent not dissolving the negative resist pattern. In the formation method, the fine pattern-forming composition and the resist composition are individually cast with the same coating apparatus, so as to prevent pipe blockages.