Abstract: The present invention provides a composition enabling to form a fine negative photoresist pattern less suffering from surface roughness, and also provides a pattern formation method employing that composition. The composition is used for miniaturizing a resist pattern by fattening in a process of forming a positive resist pattern from a chemically amplified positive-working type resist composition, and it contains a polymer comprising a repeating unit having an amino group, a solvent, and an acid. In the pattern formation method, the composition is cast on a positive photoresist pattern beforehand obtained by development and is then heated to form a fine pattern.

Abstract: The present invention provides a composition enabling to form a fine negative photoresist pattern free from troubles such as surface roughness, bridge defects or unresolved defects, and the invention also provides a pattern formation method employing that composition. The composition is used for miniaturizing a resist pattern by applying to a negative resist pattern from a chemically amplified resist composition and fattening the resist pattern. This composition comprises a polymer comprising a repeating unit having an amino group or a polymer mixture, and a solvent, and further comprises a specific amount of an acid or indicates a specific pH value. The polymer mixture comprises polymers whose HSP distance, determined from Hansen solubility parameter, is 3 or more. In the pattern formation method, the composition is cast on a negative photoresist pattern beforehand obtained by development with an organic solvent developer and is then heated to form a fine pattern.

Abstract: The durability of a frictional power transmission belt is improved. A V-ribbed belt (10) comprises an adhesion rubber portion (12) and a compression rubber portion (14) provided below the adhesion rubber portion (12). A cord (11) that is a tension member of the belt is embedded in the adhesion rubber portion (12). The adhesion rubber portion (12) includes an upper layer (12A) constituting the upper side and a lower layer (12B) constituting the lower side, which are located across the cord (11). The upper layer (12A) and the lower layer (12B) are obtained by vulcanizing a rubber composition including a high-viscosity elastomer such as EPM or EPDM, and a low-viscosity elastomer which is lower in Mooney viscosity than the high-viscosity elastomer, and contain modified nylon microfibers as short fibers (21A), (21B), respectively. The short fibers (21A), (21B) are oriented, respectively, in the width direction and longitudinal direction of the belt.

Abstract: The present invention provides a fine pattern-forming composition enabling to form a resist pattern having high dry etching resistance, and also provides a pattern formation method using that composition. This formation method hardly causes pipe blockages in the production process. The composition is used for miniaturizing a resist pattern by fattening in a process of forming a negative resist pattern from a chemically amplified resist composition, and comprises a polymer containing a repeating unit having a hydroxyaryl group and an organic solvent not dissolving the negative resist pattern. In the formation method, the fine pattern-forming composition and the resist composition are individually cast with the same coating apparatus, so as to prevent pipe blockages.

Abstract: The present invention provides a composition for forming a bottom anti-reflective coating, and also provides a photoresist pattern formation method employing that composition. The composition gives a bottom anti-reflective coating used in a lithographic process for manufacturing semiconductor devices, and the coating can be developed with a developing solution for photoresist. The composition contains a solvent, a polymer having a condensed polycyclic aromatic group, and a compound having a maleimide derivative or a maleic anhydride derivative. The composition may further contain a photo acid generator or a crosslinking agent.

Abstract: The present invention provides a composition for forming a bottom anti-reflective coating, and also provides a photoresist pattern formation method employing that composition. The composition gives a bottom anti-reflective coating used in a lithographic process for manufacturing semiconductor devices, and the coating can be developed with a developing solution for photoresist. The composition contains a solvent, a polymer having a condensed polycyclic aromatic group, and a compound having a maleimide derivative or a maleic anhydride derivative. The composition may further contain a photo acid generator or a crosslinking agent.

Abstract: The durability of a frictional power transmission belt is improved. A V-ribbed belt (10) comprises an adhesion rubber portion (12) and a compression rubber portion (14) provided below the adhesion rubber portion (12). A cord (11) that is a tension member of the belt is embedded in the adhesion rubber portion (12). The adhesion rubber portion (12) includes an upper layer (12A) constituting the upper side and a lower layer (12B) constituting the lower side, which are located across the cord (11). The upper layer (12A) and the lower layer (12B) are obtained by vulcanizing a rubber composition including a high-viscosity elastomer such as EPM or EPDM, and a low-viscosity elastomer which is lower in Mooney viscosity than the high-viscosity elastomer, and contain modified nylon microfibers as short fibers (21A), (21B), respectively. The short fibers (21A), (21B) are oriented, respectively, in the width direction and longitudinal direction of the belt.

Abstract: The present invention provides a composition for forming a bottom anti-reflective coating, and also provides a photoresist pattern formation method employing that composition. The composition gives a bottom anti-reflective coating used in a lithographic process for manufacturing semiconductor devices, and the coating can be developed with a developing solution for photoresist. The composition contains a solvent, a polymer having a condensed polycyclic aromatic group, and a compound having a maleimide derivative or a maleic anhydride derivative. The composition may further contain a photo acid generator or a crosslinking agent.

Abstract: A V-ribbed belt 10 includes a bottom rubber layer 12, an adhesive rubber layer 16, and a fabric 22. The bottom rubber layer 12 includes short fibers 14, a part of which protrude from the friction surface 12S of the bottom rubber layer 12. In the bottom rubber layer 12, an FEF carbon black with an average nitrogen adsorption surface area (ASTM D1765-01) of below 49 (m2/g), is used as a reinforcement. Therefore, the friction surface 12S of the bottom rubber layer 12 is slightly uneven, thus preventing the generation of an abnormal noise under usage of the V-ribbed belt 10. Further, after the short fibers 14 protruding from the friction surface 12S of the bottom rubber layer 12 have worn down, the unevenness of the friction surface 12S can be properly maintained by using such a carbon black, so that abnormal noise can be prevented.

Abstract: A fumigating method for fumigating a large place such as a cultural facility with a compact installation and an apparatus used for the fumigating method. The fumigating method which comprises providing an argon gas tank (1) and a PO tank (8) filled with liquid propylene oxide, introducing an argon gas fed from the argon gas tank (1) and liquid propylene oxide fed from the PO tank (8) in advance to a gas-liquid mixer (5) for mixture, introducing the resultant gas-liquid mixture from the gas-liquid mixer (5) to a vaporizer (25) for vaporization, and then introducing the resultant gas mixture to a place (31) to be fumigated; and an apparatus for conducting such a method.

Abstract: An apparatus having a power supply section capable of outputting plural power supply voltages is provided with a sleep mode (energy-saving mode) for inhibiting at least one of the outputs from the power supply section in a wait state. Furthermore, an image forming apparatus such a printer is provided with a cut-off function for inhibiting at least one of the outputs from the power supply section supplied to a heater of a fixing device if an abnormality is detected, so that by relating the operation of this cut-off function and the operation of inhibiting at least one output at the power supply section to each other, these operations may be more easily controlled and also the number of components required can be reached.

Abstract: A method and an apparatus for cutting a wafer from a crystalline ingot, by directing a stream or streams of etching gas at the crystalline ingot in a vacuum. Waste in cutting can be greatly minimized and the work environment can also be kept clean. Further, excellent surface smoothness can be realized on the cut wafers.

Abstract: A method and an apparatus for producing a wafer from a crystalline ingot, wherein the method supplies an etching gas, having a high etching property for at least one constituent of the crystalline ingot, in a state of a molecular beam stream on a predetermined part of the crystalline ingot to be processed, volatilizing the predetermined part gradually from the ingot, and then removing the predetermined part entirely so as to cut the wafer from the ingot. According to the method, waste in cutting can be greatly minimized and the work environment can also be kept clean. Further, excellent surface smoothness can be realized on the cut wafers.

Abstract: A method for processing semiconductor materials such as a crystalline ingot or a wafer and an apparatus employed therein. An etching gas is supplied on the surface of a semiconductor material, while laser irradiation or light quantum irradiation is applied on a predetermined part of the semiconductor material surface, whereby a component of the etching gas is excited, reacted with a component of the semiconductor material and evaporated for elimination. Thereby, semiconductor materials can be processed hygienically, easily and with high precision.

Abstract: An image processing apparatus comprises a memory for storing image data to be formed into an image, a memory holding unit for holding the content of the memory, and a control unit for stopping the memory holding operation by memory holding unit during a stand-by period of the image forming operation.

Abstract: An image processing apparatus comprises a memory for storing image data to be formed into an image, a memory holding unit for holding the content of the memory, and a control unit for stopping the memory holding operation by memory holding unit during a stand-by period of the image forming operation.