Abstract: In a screw for extruder, a bearing segment having a function of supporting a screw main body at an intermediate part when kneading is performed is provided at a position corresponding to a kneading portion or on the downstream side of the kneading portion. The bearing segment is provided with at least two flights having a sectional shape of a complete meshing type with one streak in the axial direction, the flights are arranged in the rotational direction with uniformly displacing a phase thereof respectively, and length of the flights in the axial direction is set to 0.2D (D: rotational outer diameter of the bearing segment) or more. According to the above configuration, bending of the screw main body is prevented and abrasion of the flights and a barrel is suppressed.

Abstract: For determining mode spectra of an optical property of a device under test (DUT) in dependence on a spectral parameter, with the mode spectra corresponding to the device's principal states of polarization (PSPs), minimum and maximum envelope values are determined for the optical property, or other measured values from which the envelope values can be determined with respect to possible state of polarization of light that is incident upon the DUT, whereby the minimum envelope values and the maximum envelope values are determined for a spectral range of interest of the spectral parameter. The mode spectra are derived for the optical property for at least one of the PSPs as a function of the spectral parameter for the spectral range of interest, whereby a partial correspondence of the mode spectra with the minimum and maximum envelope values is used for deriving the mode spectra.

Abstract: A geometrical correcting method allowing geometrical correction to be performed simply, accurately and in short a time, even in a multi-projection system including a screen of complex shape and projectors complexly arranged, for significantly improving the maintenance efficiency. Test pattern images having feature points are projected by respective projectors, and captured and displayed on a monitor, approximate positions of the feature points are designated and input while referring to the displayed test pattern captured image, and the accurate positions of the feature points in the test pattern images are detected according to the approximate position information.

Abstract: A method of inspecting patterns to detect a defect of the patterns by using information of a scattered diagram of brightness of said first and second images.

Abstract: For determining mode spectra of an optical property of a device under test (DUT) in dependence on a spectral parameter, with the mode spectra corresponding to the device's principal states of polarization (PSPs), minimum and maximum envelope values are determined for the optical property, or other measured values from which the envelope values can be determined with respect to possible state of polarization of light that is incident upon the DUT, whereby the minimum envelope values and the maximum envelope values are determined for a spectral range of interest of the spectral parameter. The mode spectra are derived for the optical property for at least one of the PSPs as a function of the spectral parameter for the spectral range of interest, whereby a partial correspondence of the mode spectra with the minimum and maximum envelope values is used for deriving the mode spectra.

Abstract: A method of inspecting defects of a plurality of patterns that are formed on a substrate to have naturally the same shape. According to this method, in order to detect very small defects of the patterns with high sensitivity without being affected by irregular brightness due to the thickness difference between the patterns formed on a semiconductor wafer, a first pattern being inspected is detected to produce a first image of the first pattern, the first image is stored, a second pattern being inspected is detected to produce a second image of said second pattern, the stored first image and the second image are matched in brightness, and the brightness-matched first and second images are compared with each other so that the patterns can be inspected.

Abstract: A method of calculating correction data for correcting display characteristic includes generating test pattern data, displaying, based on the test pattern data, a test pattern on an image display device, obtaining capture data by capturing the test pattern, and calculating, based on the capture data, correction data for correcting display characteristic of the image display device. In this case, when the capture data does not normally constitute an entire image, correction data relating to an entire image relating to the test pattern data is calculated by setting the not-normally-constituting area as the area to be complemented and complementing the area to be complemented based on the area excluding the area to be complemented.

Abstract: A defect inspecting apparatus is disclosed that can detect finer defects with high resolution optical images of those defects, and which makes the difference in contrast greater between fine line patterns of a semiconductor device. The defect inspecting apparatus includes a sample mounting device for mounting a sample; lighting and detecting apparatus for illuminating a patterned sample mounted on a mount and detecting the optical image of the reflected light obtained therefrom.

Abstract: An agent for intra-airway administration comprising a compound having a PDE-IV inhibitory activity or the pharmaceutically acceptable salt thereof as an active ingredient which shows its concentration in lung tissues 350-times or more higher than its concentration in plasma when administered into the airway is provided. An agent for intra-airway administration, wherein the compound having a PDE-IV inhibitory activity is, for example, a benzofuran derivative or a 1,3-benzodioxole derivative is provided.

Abstract: A reviewing apparatus, for enabling to conduct detailed review (ADR) and/or defect classification (ADC), effectively, through making alignment of defects detected in an upstream inspecting apparatus into the reviewing apparatus, with certainty and at high accuracy, and further within a short time-period, comprises a defect selecting portion 240 for selecting or picking up a plural number of alignment candidates from a large numbers defects, upon defect inspection information, which is detected within the inspecting apparatus, an electron microscope 21 (30) for obtaining a SEM image of the plural number of alignment candidates, through picking up an image on each of the plural number of alignment candidates, which are selected or picked up, narrowly, and a determining portion 243 for calculating out characteristic quantities relating to the plural number of alignment candidates, upon basis of the obtained SEM images thereof, and for determining on suitableness/unsuitableness for use in alignment relating to th

Abstract: A defect inspecting apparatus can detect finer defects with high resolution optical images of those defects. The apparatus includes a sample mounting device for mounting a sample; lighting and detecting apparatus for illuminating a patterned sample mounted on a mount and detecting the optical image of the reflected light obtained therefrom. A display displays the optical image detected by this lighting and detecting apparatus. An optical parameter setting device sets and displays optical parameters for the lighting and detecting apparatus on the display. An optical parameter adjusting apparatus adjusts optical parameters set for the lighting and detecting apparatus according to the optical parameters set by the optical parameter setting apparatus. A storage device stores comparative image data. A defect detecting device detects defects from patterns formed on the sample by comparing the optical image detected by the optical image detecting apparatus with the comparative image data stored in the storage.

Abstract: A method of inspecting defects of a plurality of patterns that are formed on a substrate to have naturally the same shape. According to this method, in order to detect very small defects of the patterns with high sensitivity without being affected by irregular brightness due to the thickness difference between the patterns formed on a semiconductor wafer, a first pattern being inspected is detected to produce a first image of the first pattern, the first image is stored, a second pattern being inspected is detected to produce a second image of said second pattern, the stored first image and the second image are matched in brightness, and the brightness-matched first and second images are compared with each other so that the patterns can be inspected.

Abstract: A method for the injection foaming molding of a light alloy wherein a melt(2) of a light alloy containing a thickener and a blowing agent decomposing at a high temperature to generate a gaseous component in respectively specified percentages is held at a temperature lower than the decomposition temperature of the blowing agent and then is agitated to allow the thickener and the blowing agent to disperse, a predetermined amount of the melt is measured for the injection into a mold (24) and then is injected into the mold (24) to produce a foaming molded article of the light alloy, characterized in that the temperature of the melt (2) is adjusted to a temperature higher than the decomposition temperature of the blowing agent and also the foaming of the melt is inhibited by pressuring at least immediately before the injection; and an apparatus for practicing the method.

Abstract: A barrel polishing device for polishing a workpiece having a relatively complicated shape such as a vehicle wheel. The barrel polishing device comprises a polishing medium storage tank for storing polishing media, a base, a workpiece supporting shaft mounted on the base, and a workpiece detachably mounted on a tip part of the workpiece supporting shaft, the polishing media stored in the polishing medium storage tank being flowed by an appropriate means, and the workpiece supporting shaft being disposed so that a front side of the workpiece opposes the flow of the polishing media, the workpiece supporting shaft being rotated about an axis thereof, and a baffle member being placed in the vicinity of a back side of the workpiece.

Abstract: A barrel polishing device for polishing a workpiece having a relatively complicated shape such as a vehicle wheel. The barrel polishing device comprises a polishing medium storage tank for storing polishing media, a base, a workpiece supporting shaft mounted on the base, and a workpiece detachably mounted on a tip part of the workpiece supporting shaft, the polishing media stored in the polishing medium storage tank being flowed by an appropriate means, and the workpiece supporting shaft being disposed so that a front side of the workpiece opposes the flow of the polishing media, the workpiece supporting shaft being rotated about an axis thereof, and a baffle member being placed in the vicinity of a back side of the workpiece.

Abstract: A calibration camera device for geometrical correction or color correction, including an optical lens part, an optical filter part which is provided in front of the optical lens part and to which at least three optical filters are attached, a filter switching part to select any one from among the optical filters and dispose the selected one optical filter at a photometric point, a near-infrared light cutting part which is provided in the rear of the optical lens part and to which a near-infrared light cutting filter is attached, a monochrome capturing part which is provided in the rear of the near-infrared light cutting part and includes a monochrome imaging element, an image storing part for storing a monochrome image which is captured by the monochrome capturing part, and a gain correction part for conducting sensitivity correction on the monochrome image.

Abstract: A calibration camera device for geometrical correction or color correction, including an optical lens part, an optical filter part which is provided in front of the optical lens part and to which at least three optical filters are attached, a filter switching part to select any one from among the optical filters and dispose the selected one optical filter at a photometric point, a near-infrared light cutting part which is provided in the rear of the optical lens part and to which a near-infrared light cutting filter is attached, a monochrome capturing part which is provided in the rear of the near-infrared light cutting part and includes a monochrome imaging element, an image storing part for storing a monochrome image which is captured by the monochrome capturing part, and a gain correction part for conducting sensitivity correction on the monochrome image.

Abstract: A method of inspecting defects of a plurality of patterns that are formed on a substrate to have naturally the same shape. According to this method, in order to detect very small defects of the patterns with high sensitivity without being affected by irregular brightness due to the thickness difference between the patterns formed on a semiconductor wafer, a first pattern being inspected is detected to produce a first image of the first pattern, the first image is stored, a second pattern being inspected is detected to produce a second image of said second pattern, the stored first image and the second image are matched in brightness, and the brightness-matched first and second images are compared with each other so that the patterns can be inspected.

Abstract: A defect inspecting apparatus is disclosed that can detect finer defects with high resolution optical images of those defects, and which makes the difference in contrast greater between fine line patterns of a semiconductor device. The defect inspecting apparatus includes a sample mounting device for mounting a sample; lighting and detecting apparatus for illuminating a patterned sample mounted on a mount and detecting the optical image of the reflected light obtained therefrom.

Abstract: A paper-web holding apparatus is provided in a rotary printing press having rollers which form a path for a paper web fed from a paper web feeding unit to travel along to a folding unit via a press unit and around which the paper web is wrapped. The paper-web holding apparatus includes a rotation restraint mechanism provided for at least one selected roller, and a propeller roller mechanism provided for the selected roller. The rotation restraint mechanism restrain rotation of the roller when the rotary printing press is halted, and allows rotation of the roller when the rotary printing press is operated. The propeller roller mechanism has a pressing member which is advanced toward the roller in order to apply pressing force to the roller at least when the rotary printing press is in a halt state.