Patents by Inventor Kazutaka Akiyama
Kazutaka Akiyama has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 8580652Abstract: According to one embodiment, a manufacturing method of a semiconductor device is disclosed. The semiconductor device includes a semiconductor substrate having first and second main surfaces, and a through hole passing through between the first and second main surfaces, a pad on the first main surface, a through electrode in the through hole, and a connection structure including a connection portion to directly connect the pad and the through electrode, and another connection portion to indirectly connect the pad and the through electrode. The method includes forming an isolation region in the first main surface, the isolation region being in a region where the through electrode is to be formed and being in a region other than the region where the through hole is to be formed, forming the pad, and forming the through hole by processing the substrate to expose a part of the pad.Type: GrantFiled: September 3, 2010Date of Patent: November 12, 2013Assignee: Kabushiki Kaisha ToshibaInventors: Atsuko Kawasaki, Kenichiro Hagiwara, Ikuko Inoue, Kazutaka Akiyama, Itsuko Sakai, Mie Matsuo, Masahiro Sekiguchi, Yoshiteru Koseki, Hiroki Neko, Koushi Tozuka, Kazuhiko Nakadate, Takuto Inoue
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Patent number: 8415750Abstract: A semiconductor device according to one embodiment includes: a semiconductor substrate; an element isolation insulating film embedded in the vicinity of a front surface of the semiconductor substrate; a through plug penetrating the semiconductor substrate from a back surface to the front surface so as to penetrate through the element isolation insulating film, and having a multi-stage structure comprising an upper stage portion and a lower stage portion, the upper stage portion having a region surrounded by the element isolation insulating film in the semiconductor substrate, the lower stage portion having a diameter larger than that of the upper stage portion; and a contact plug connected to an end portion of the through plug on the frond surface side of the semiconductor substrate for connecting a conductive member formed above the front surface side of the semiconductor substrate to the through plug.Type: GrantFiled: January 11, 2010Date of Patent: April 9, 2013Assignee: Kabushiki Kaisha ToshibaInventor: Kazutaka Akiyama
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Patent number: 8008779Abstract: Disclosed is a semiconductor device that includes: a semiconductor substrate; a first insulating film formed above the semiconductor substrate and having a relative dielectric constant of 3.8 or less; a conductor which covers a side face of the first insulating film at least near four corners of the semiconductor substrate, and at least an outer side face of which has a conductive barrier layer; and a second insulating film covering the outer side face of the conductor and having a relative dielectric constant of over 3.8. Also disclosed is a semiconductor device that includes: a conductor covering a side face of the first insulating film at least near four corners of the semiconductor substrate; and a corrosion resistant conductor formed at least near the four corners of the semiconductor substrate to extend from directly under the second insulating film to directly under the conductor.Type: GrantFiled: March 24, 2004Date of Patent: August 30, 2011Assignee: Kabushiki Kaisha ToshibaInventor: Kazutaka Akiyama
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Publication number: 20110163453Abstract: The present invention provides a semiconductor device having a low-k film including an interconnect layer and a highly-reliable through-substrate contact plug. The semiconductor device includes: a semiconductor substrate having a first surface and a second surface facing each other; a first insulating film formed on the first surface of the semiconductor substrate and having a specific permittivity of 4 or higher; a circuit constituent element formed on the first surface of the semiconductor substrate and covered with the first insulating film); a contact plug formed in the first insulating film and electrically connected to the circuit constituent element; a through-substrate contact plug penetrating through the semiconductor substrate and the first insulating film; a second insulating film formed on the first insulating film and having a specific permittivity of 3.Type: ApplicationFiled: March 11, 2011Publication date: July 7, 2011Applicant: Kabushiki Kaisha ToshibaInventor: Kazutaka Akiyama
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Patent number: 7943459Abstract: A semiconductor device is provided with a conductor wire and a fuse wire formed in an insulating film over a semiconductor substrate, a first under-pad-wire insulating film formed above the insulating film, a second under-pad-wire insulating film formed on the first under-pad-wire insulating film, a pad wire formed in an area above the conductive wire, in the first and second under-pad-wire insulating films and an opening formed by leaving a part of the first under-pad-wire insulating film in an area above the fuse wire, in the first and second under-pad-wire insulating films, wherein the second under-pad-wire insulating film comprises an element different from that of the first under-pad-wire insulating film.Type: GrantFiled: August 24, 2007Date of Patent: May 17, 2011Assignee: Kabushiki Kaisha ToshibaInventors: Kazutaka Akiyama, Takaya Matsushita
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Patent number: 7919835Abstract: The present invention provides a semiconductor device having a low-k film including an interconnect layer and a highly-reliable through-substrate contact plug. The semiconductor device includes: a semiconductor substrate having a first surface and a second surface facing each other; a first insulating film formed on the first surface of the semiconductor substrate and having a specific permittivity of 4 or higher; a circuit constituent element formed on the first surface of the semiconductor substrate and covered with the first insulating film); a contact plug formed in the first insulating film and electrically connected to the circuit constituent element; a through-substrate contact plug penetrating through the semiconductor substrate and the first insulating film; a second insulating film formed on the first insulating film and having a specific permittivity of 3.Type: GrantFiled: December 10, 2008Date of Patent: April 5, 2011Assignee: Kabushiki Kaisha ToshibaInventor: Kazutaka Akiyama
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Publication number: 20110068476Abstract: According to one embodiment, a manufacturing method of a semiconductor device is disclosed. The semiconductor device includes a semiconductor substrate having first and second main surfaces, and a through hole passing through between the first and second main surfaces, a pad on the first main surface, a through electrode in the through hole, and a connection structure including a connection portion to directly connect the pad and the through electrode, and another connection portion to indirectly connect the pad and the through electrode. The method includes forming an isolation region in the first main surface, the isolation region being in a region where the through electrode is to be formed and being in a region other than the region where the through hole is to be formed, forming the pad, and forming the through hole by processing the substrate to expose a part of the pad.Type: ApplicationFiled: September 3, 2010Publication date: March 24, 2011Inventors: Atsuko KAWASAKI, Kenichiro Hagiwara, Ikuko Inoue, Kazutaka Akiyama, Itsuko Sakai, Mie Matsuo, Masahiro Sekiguchi, Yoshiteru Koseki, Hiroki Neko, Koushi Tozuka, Kazuhiko Nakadate, Takuto Inoue
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Patent number: 7888760Abstract: A solid state imaging device includes: an imaging device substrate with an imaging device section formed on a first major surface side thereof; a backside interconnect electrode provided on a second major surface side of the imaging device substrate and electrically connected to the imaging device section, the second major surface being on the opposite side of the first major surface; a circuit substrate provided with a circuit substrate electrode opposed to the second major surface; a connecting portion electrically connecting the backside interconnect electrode to the circuit substrate electrode; and a light shielding layer provided coplanar with the backside interconnect electrode or on the circuit substrate side of the backside interconnect electrode.Type: GrantFiled: October 10, 2008Date of Patent: February 15, 2011Assignee: Kabushiki Kaisha ToshibaInventors: Hitoshi Sugiyama, Atsuko Yamashita, Kazutaka Akiyama, Susumu Harada, Masahiro Sekiguchi, Masayuki Dohi, Kazumasa Tanida, Chiaki Takubo, Hiroshi Yoshikawa, Akihiro Hori
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Publication number: 20110024849Abstract: A semiconductor device according to one embodiment includes: a semiconductor substrate; an element isolation insulating film embedded in the vicinity of a front surface of the semiconductor substrate; a through plug penetrating the semiconductor substrate from a back surface to the front surface so as to penetrate through the element isolation insulating film, and having a multi-stage structure comprising an upper stage portion and a lower stage portion, the upper stage portion having a region surrounded by the element isolation insulating film in the semiconductor substrate, the lower stage portion having a diameter larger than that of the upper stage portion; and a contact plug connected to an end portion of the through plug on the frond surface side of the semiconductor substrate for connecting a conductive member formed above the front surface side of the semiconductor substrate to the through plug.Type: ApplicationFiled: January 11, 2010Publication date: February 3, 2011Inventor: Kazutaka AKIYAMA
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Patent number: 7831330Abstract: A process control system includes a client computer which prepares a correlation between a reference monitored value of apparatus information and a feature quantity, a manufacturing execution system which prepares a processing recipe describing, as a first setting value in an actual manufacturing process, a value of the control parameter, an apparatus information collection section which collects an objective monitored value of the apparatus information in operation of the actual manufacturing process with the first setting value, a feature quantity calculation section which calculates a value of a feature quantity corresponding to the objective monitored value based on the correlation, a parameter calculation section which calculates a second setting value in the actual manufacturing process on the basis of the value of the feature quantity, and an apparatus control unit which changes the processing recipe with the second setting value being as a setting value of the second step.Type: GrantFiled: July 10, 2009Date of Patent: November 9, 2010Assignee: Kabushiki Kaisha ToshibaInventors: Junji Sugamoto, Yukihiro Ushiku, Kazutaka Akiyama, Shoichi Harakawa
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Publication number: 20100102454Abstract: When an etch stopper film is stacked on a pad electrode in which an opening is provided and a through electrode is embedded in a through hole formed in a semiconductor substrate, a distal end of the through electrode penetrates a part of the pad electrode via the opening and is stopped by the etch stopper film.Type: ApplicationFiled: July 6, 2009Publication date: April 29, 2010Applicant: KABUSHIKI KAISHA TOSHIBAInventor: Kazutaka AKIYAMA
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Patent number: 7701004Abstract: A first conductive layer and a second conductive layer are formed on an upper surface of a semiconductor substrate. The second conductive layer formed at a higher location than the first conductive layer. An insulating film is formed over the semiconductor substrate to cover the first conductive layer and the second conductive layer. An interlayer insulator has a structure of at least two layers including a first layered film composed of an organic insulating material and a second layered film composed of an inorganic insulating material and formed on the first layered film. The interlayer insulator is formed covering the first conductive layer and the second conductive layer.Type: GrantFiled: January 31, 2008Date of Patent: April 20, 2010Assignee: Kabushiki Kaisha ToshibaInventor: Kazutaka Akiyama
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Publication number: 20090276078Abstract: A process control system includes a client computer which prepares a correlation between a reference monitored value of apparatus information and a feature quantity, a manufacturing execution system which prepares a processing recipe describing, as a first setting value in an actual manufacturing process, a value of the control parameter, an apparatus information collection section which collects an objective monitored value of the apparatus information in operation of the actual manufacturing process with the first setting value, a feature quantity calculation section which calculates a value of a feature quantity corresponding to the objective monitored value based on the correlation, a parameter calculation section which calculates a second setting value in the actual manufacturing process on the basis of the value of the feature quantity, and an apparatus control unit which changes the processing recipe with the second setting value being as a setting value of the second step.Type: ApplicationFiled: July 10, 2009Publication date: November 5, 2009Inventors: Junji Sugamoto, Yukihiro Ushiku, Kazutaka Akiyama, Shoichi Harakawa
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Patent number: 7611994Abstract: An insulation film is formed on a semiconductor substrate. A stopper film, which has a large etching selectivity relative to the insulation film and has a first film thickness, is formed on the insulation film. A first mask material, which has a second film thickness that is less than the first film thickness, is formed on the stopper film. A first mask is formed by patterning the first mask material. An opening portion is formed by etching the stopper film using the first mask. The opening portion is filled with a second mask material. A second mask of the second mask material is formed by removing the stopper film. The insulation film is etched using the second mask.Type: GrantFiled: March 31, 2006Date of Patent: November 3, 2009Assignee: Kabushiki Kaisha ToshibaInventor: Kazutaka Akiyama
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Patent number: 7596421Abstract: A process control system includes a client computer which prepares a correlation between a reference monitored value of apparatus information and a feature quantity, a manufacturing execution system which prepares a processing recipe describing, as a first setting value in an actual manufacturing process, a value of the control parameter, an apparatus information collection section which collects an objective monitored value of the apparatus information in operation of the actual manufacturing process with the first setting value, a feature quantity calculation section which calculates a value of a feature quantity corresponding to the objective monitored value based on the correlation, a parameter calculation section which calculates a second setting value in the actual manufacturing process on the basis of the value of the feature quantity, and an apparatus control unit which changes the processing recipe with the second setting value being as a setting value of the second step.Type: GrantFiled: June 21, 2006Date of Patent: September 29, 2009Assignee: Kabushik Kaisha ToshibaInventors: Junji Sugamoto, Yukihiro Ushiku, Kazutaka Akiyama, Shoichi Harakawa
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Publication number: 20090152602Abstract: The present invention provides a semiconductor device having a low-k film including an interconnect layer and a highly-reliable through-substrate contact plug. The semiconductor device includes: a semiconductor substrate having a first surface and a second surface facing each other; a first insulating film formed on the first surface of the semiconductor substrate and having a specific permittivity of 4 or higher; a circuit constituent element formed on the first surface of the semiconductor substrate and covered with the first insulating film); a contact plug formed in the first insulating film and electrically connected to the circuit constituent element; a through-substrate contact plug penetrating through the semiconductor substrate and the first insulating film; a second insulating film formed on the first insulating film and having a specific permittivity of 3.Type: ApplicationFiled: December 10, 2008Publication date: June 18, 2009Inventor: Kazutaka AKIYAMA
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Publication number: 20090096051Abstract: A solid state imaging device includes: an imaging device substrate with an imaging device section formed on a first major surface side thereof; a backside interconnect electrode provided on a second major surface side of the imaging device substrate and electrically connected to the imaging device section, the second major surface being on the opposite side of the first major surface; a circuit substrate provided with a circuit substrate electrode opposed to the second major surface; a connecting portion electrically connecting the backside interconnect electrode to the circuit substrate electrode; and a light shielding layer provided coplanar with the backside interconnect electrode or on the circuit substrate side of the backside interconnect electrode.Type: ApplicationFiled: October 10, 2008Publication date: April 16, 2009Applicant: KABUSHIKI KAISHA TOSHIBAInventors: Hitoshi SUGIYAMA, Atsuko Yamashita, Kazutaka Akiyama, Susumu Harada, Masahiro Sekiguchi, Masayuki Dohi, Kazumasa Tanida, Chiaki Takubo, Hiroshi Yoshikawa, Akihiro Hori
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Publication number: 20080211030Abstract: A first conductive layer and a second conductive layer are formed on an upper surface of a semiconductor substrate. The second conductive layer formed at a higher location than the first conductive layer. An insulating film is formed over the semiconductor substrate to cover the first conductive layer and the second conductive layer. An interlayer insulator has a structure of at least two layers including a first layered film composed of an organic insulating material and a second layered film composed of an inorganic insulating material and formed on the first layered film. The interlayer insulator is formed covering the first conductive layer and the second conductive layer.Type: ApplicationFiled: January 31, 2008Publication date: September 4, 2008Applicant: Kabushiki Kaisha ToshibaInventor: Kazutaka Akiyama
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Patent number: 7348623Abstract: A semiconductor device includes: a semiconductor substrate; a first wiring formed above the semiconductor substrate with a first insulating film interposed therebetween; an MIM capacitor formed above the first insulating film; a second insulating film formed to cover the MIM capacitor; a second wiring formed on the second insulating film; and a guard ring buried in the second insulating film to surround the MIM capacitor.Type: GrantFiled: September 9, 2003Date of Patent: March 25, 2008Assignee: Kabushiki Kaisha ToshibaInventor: Kazutaka Akiyama
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Publication number: 20080054395Abstract: A semiconductor device is provided with a conductor wire and a fuse wire formed in an insulating film over a semiconductor substrate, a first under-pad-wire insulating film formed above the insulating film, a second under-pad-wire insulating film formed on the first under-pad-wire insulating film, a pad wire formed in an area above the conductive wire, in the first and second under-pad-wire insulating films and an opening formed by leaving a part of the first under-pad-wire insulating film in an area above the fuse wire, in the first and second under-pad-wire insulating films, wherein the second under-pad-wire insulating film comprises an element different from that of the first under-pad-wire insulating film.Type: ApplicationFiled: August 24, 2007Publication date: March 6, 2008Inventors: Kazutaka Akiyama, Takaya Matsushita