Patents by Inventor Kazuto Ikemoto
Kazuto Ikemoto has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
-
Publication number: 20130253001Abstract: An object of the present invention is to provide a salt of pyrroloquinoline quinone having a high solubility in water and in an organic solvent and a method for producing the same. According to the present invention, there are provided an ammonium salt of pyrroloquinoline quinone having a high solubility in water and in an organic solvent, consisting of a pyrroloquinoline quinone ion and an ammonium salt having a hydroxyl group.Type: ApplicationFiled: November 25, 2011Publication date: September 26, 2013Applicant: MITSUBISHI GAS CHEMICAL COMPANY INC.Inventor: Kazuto Ikemoto
-
Publication number: 20130225632Abstract: An object of the present invention is to provide an industrially useful method for producing a calcium salt of pyrroloquinoline quinone, without using large amounts of organic solvents, and highly pure crystals produced thereby. According to the present invention, a highly pure calcium salt of pyrroloquinoline quinone can be produced by reacting an alkali metal salt of pyrroloquinoline quinone with a source of calcium ions.Type: ApplicationFiled: September 22, 2011Publication date: August 29, 2013Applicant: MITSUBISHI GAS CHEMICAL COMPANY, INC.Inventors: Kazuto Ikemoto, Masahiko Nakano
-
Publication number: 20130203869Abstract: An object of the present invention is to provide a gel containing pyrroloquinoline quinone that is capable of easily forming a gel near room temperature and is useful even in the food sector, and a method for producing the gel. According to the present invention, there is provided a gel containing pyrroloquinoline quinone that uses pyrroloquinoline quinone itself as a gelling agent and a method for producing the gel by adding a salt of pyrroloquinoline quinone to water and subsequently adjusting the temperature or the pH to reduce solubility.Type: ApplicationFiled: August 9, 2011Publication date: August 8, 2013Applicant: MITSUBISHI GAS CHEMICAL COMPANY, INC.Inventors: Tsuyoshi Mikekado, Kazuto Ikemoto, Hajime Shimizu
-
Patent number: 8399256Abstract: The present invention provides a method for transferring a gene into cells, which is practically useful and can achieve high transfer efficiency, and also a composition for use in the method. By bringing a mixture of a composition comprising a diallylamine sulfur dioxide copolymer having a repeating unit represented by the formula (1) or a salt thereof and a gene into contact with a cell, a gene such as DNA and RNA can be transferred into a target cell safely and conveniently, and into a cell at a specific site with high gene transfer efficiency.Type: GrantFiled: October 13, 2009Date of Patent: March 19, 2013Assignee: Mitsubishi Gas Chemical Company, Inc.Inventor: Kazuto Ikemoto
-
Publication number: 20120323009Abstract: An object of the present invention is to provide a method for conveniently producing reduced pyrroloquinoline quinone from oxidized pyrroloquinoline quinone without needing expensive equipment, and a method for stabilizing reduced pyrroloquinoline quinone. According to the present invention, high-quality reduced pyrroloquinoline quinone can be obtained conveniently and efficiently in a manner suitable for industrial-scale production by mixing pyrroloquinoline quinone and ascorbic acid in a solvent.Type: ApplicationFiled: February 16, 2011Publication date: December 20, 2012Applicant: MITSUBISHI GAS CHEMICAL COMPANY, INC.Inventors: Kazuto Ikemoto, Masahiko Nakano, Junichi Edahiro
-
Publication number: 20120226045Abstract: An object of the present invention is to provide a method for conveniently producing pyrroloquinoline quinone in the free form without any organic solvent or ion-exchange resin and highly-pure crystals thereof. According to the present invention, there is provided a production method of pyrroloquinoline quinone in the free form and highly-pure crystals thereof, wherein the production method comprises preparing a solution having a pH of 1.5 or less by dissolving an alkali metal salt of pyrroloquinoline quinone to obtain a precipitate.Type: ApplicationFiled: November 5, 2010Publication date: September 6, 2012Applicant: MITSUBISHI GAS CHEMICAL COMPANY INC.Inventors: Kazuto Ikemoto, Junichi Edahiro
-
Publication number: 20120116087Abstract: A crystal of pyrroloquinoline quinone disodium salt having peaks at 2? of 9.1°, 10.3°, 13.8°, 17.7°, 18.3°, 24.0°, 27.4°, 31.2° and 39.5° (±0.2° for each) in powder X-ray diffractometry using Cu K? radiation, or a crystal of pyrroloquinoline quinone trisodium salt having peaks at 2? of 6.6°, 11.4°, 13.0°, 22.6°, 26.9°, 27.9°, 37.0°, 38.9° and 43.4° (±0.2° for each) in powder X-ray diffractometry using Cu K? radiation.Type: ApplicationFiled: June 9, 2010Publication date: May 10, 2012Applicant: Mitsubishi Gas Chemical Company, Inc.Inventors: Junichi Edahiro, Hitoshi Sakamoto, Kazuto Ikemoto, Hajime Shimizu, Tatsuya Hasegawa, Masahiko Nakano
-
Publication number: 20110275982Abstract: The present invention provides a method whereby a drug can be conveniently injected into the living body, without sticking a needle, from a device that is not in contact with the living body, and a device therefor. Specifically provided is a method for injecting a peptide drug such as insulin, and a device therefor. No special consumables are needed except the drug solution or suspension. The method and device comprise injecting a drug into the living body by electrospraying a solution or suspension of the drug from a nozzle to which high voltage is applied and which is not in contact with the living body.Type: ApplicationFiled: January 8, 2010Publication date: November 10, 2011Applicant: MITSUBISHI GAS CHEMICAL COMPANTInventors: Kazuto Ikemoto, Takafumi Sakai, Kanako Koike, Satoshi Sakahara
-
Publication number: 20110201120Abstract: The present invention provides a method for transferring a gene into cells, which is practically useful and can achieve high transfer efficiency, and also a composition for use in the method. By bringing a mixture of a composition comprising a diallylamine sulfur dioxide copolymer having a repeating unit represented by the formula (1) or a salt thereof and a gene into contact with a cell, a gene such as DNA and RNA can be transferred into a target cell safely and conveniently, and into a cell at a specific site with high gene transfer efficiency.Type: ApplicationFiled: October 13, 2009Publication date: August 18, 2011Applicant: MITSUBISHI GAS CHEMICAL COMPANY, INC.Inventor: Kazuto Ikemoto
-
Patent number: 7927874Abstract: There is provided a method by which multiple types of substances desired to be transferred into cells can be continuously transferred into multiple types of cells by a convenient procedure, a cell in which the substance desired to be transferred into cells has been taken up by this method, and an apparatus for transferring a substance into cells by this method. The foregoing objects can be achieved by electrospraying cells with a liquid free from the substance to be transferred into cells while the cells are kept in contact with the substance to be transferred into cells, or first electrospraying cells with a liquid free from the substance to be transferred into cells and then bringing the cells into contact with the substance to be transferred into cells.Type: GrantFiled: May 16, 2007Date of Patent: April 19, 2011Assignees: Mitsubishi Gas Chemical Company, Inc., Saitama UniversityInventors: Kazuto Ikemoto, Yusuke Okubo, Kanako Koike, Sayaka Aizawa, Ichiro Sakata, Takafumi Skai
-
Publication number: 20110020935Abstract: The present invention provides a method whereby, in transferring a gene into a cell by contacting the cell with a gene to be transferred into the cell in a container and then electrospraying a spray liquid free from the gene on the cell and gene in the container, the gene can be rapidly and conveniently transferred into the cell with high transfer efficiency while minimizing the degradation of the gene, and an apparatus therefor. A nozzle for electrospraying comprising a tube portion for applying a high voltage, which is made of an electrically conductive substance and located on the side of the spray liquid suction port, and another tube portion for spraying, which is made of an insulating substance and located on the side of the spray liquid ejection port. By using this nozzle, electrospraying can be performed while preventing a discharge phenomenon that causes degradation of the gene.Type: ApplicationFiled: March 24, 2009Publication date: January 27, 2011Applicant: Mitsubishi Gas Chemical Company, Inc.Inventor: Kazuto Ikemoto
-
Publication number: 20090233367Abstract: There is provided a method by which multiple types of substances desired to be transferred into cells can be continuously transferred into multiple types of cells by a convenient procedure, a cell in which the substance desired to be transferred into cells has been taken up by this method, and an apparatus for transferring a substance into cells by this method. The foregoing objects can be achieved by electrospraying cells with a liquid free from the substance to be transferred into cells while the cells are kept in contact with the substance to be transferred into cells, or first electrospraying cells with a liquid free from the substance to be transferred into cells and then bringing the cells into contact with the substance to be transferred into cells.Type: ApplicationFiled: May 16, 2007Publication date: September 17, 2009Applicants: MITSUBISHI GAS CHEMICAL CO., INC., SAITAMA UNIVERSITYInventors: Kazuto Ikemoto, Yusuke Okubo, Kanako Koike, Sayaka Aizawa, Ichiro Sakata, Takafumi Sakai
-
Patent number: 7186844Abstract: A method for producing a cyclic carbamate ester produces the cyclic carbamate ester by reacting an organic compound having at least two halogen atoms per molecule, an amine having at least two hydrogen atoms on a nitrogen atom, and carbon dioxide.Type: GrantFiled: January 3, 2005Date of Patent: March 6, 2007Assignee: Mitsubishi Gas Chemical Co., Inc.Inventor: Kazuto Ikemoto
-
Publication number: 20060270574Abstract: The photoresist stripping agent of the present invention contains a reaction product that is produced by the reaction of formaldehyde and an alkanol amine in a molar ratio of 0.8 or less. The photoresist stripping agent easily removes, at low temperatures in a short period of time, photoresist layers applied on substrates, photoresist layers remaining after etching and photoresist residues after ashing subsequent to etching. The photoresist stripping agent also removes the photoresist layers and photoresist residues without corroding substrates, wiring materials, insulating layers, etc. to enable the fine processing and provide high precision circuits.Type: ApplicationFiled: August 2, 2006Publication date: November 30, 2006Inventor: Kazuto Ikemoto
-
Patent number: 7078371Abstract: The cleaning composition of the present invention is characterized by containing N-hydroxyformamide. The cleaning composition is capable of easily removing patterned photoresist masks or resist residues remaining on substrates after the etching process or removing resist residues remaining after the etching process and the subsequent ashing process within a short period of time without causing the corrosion of wiring materials and insulating films, thereby ensuring the fine processing to provide high-precision wiring circuits.Type: GrantFiled: September 5, 2003Date of Patent: July 18, 2006Assignee: Mitsubishi Gas Chemical Company, Inc.Inventor: Kazuto Ikemoto
-
Patent number: 7049275Abstract: The photoresist stripping composition of the present invention contains at least one oxymethylamine compound represented by the following formula 1: wherein R1 to R3 are as defined in the specification. Of the oxymethylamine compound of the formula 1, the compound represented by the following formula 7: wherein R2 to R5 and n are as defined in the specification, is a novel compound.Type: GrantFiled: March 12, 2003Date of Patent: May 23, 2006Assignee: Mitsubishi Gas Chemical Company, Inc.Inventors: Kazuto Ikemoto, Yoshiaki Yamamoto, Hiroshi Yoshida, Taketo Maruyama
-
Publication number: 20050154200Abstract: A method for producing a cyclic carbamate ester produces the cyclic carbamate ester by reacting an organic compound having at least two halogen atoms per molecule, an amine having at least two hydrogen atoms on a nitrogen atom, and carbon dioxide.Type: ApplicationFiled: January 3, 2005Publication date: July 14, 2005Applicant: Mitsubishi Gas Chemical Company, Inc.Inventor: Kazuto Ikemoto
-
Publication number: 20040256358Abstract: In the resist stripping method of the present invention, a wiring substrate having a remaining resist layer is brought into contact with a resist stripping composition in an atmosphere containing oxygen in a proportion of 2% by volume or less. Preferably, the resist is removed after pretreating the remaining resist layer with hydrogen peroxide. A resist stripping composition comprising an amine compound, a solvent, a strong alkali, and water is preferably used in the resist stripping method of the present invention.Type: ApplicationFiled: April 27, 2004Publication date: December 23, 2004Inventors: Hidetaka Shimizu, Hiroshi Matsunaga, Masaru Ohto, Kazuto Ikemoto
-
Publication number: 20040137379Abstract: The photoresist stripping agent of the present invention contains a reaction product that is produced by the reaction of formaldehyde and an alkanol amine in a molar ratio of 0.8 or less. The photoresist stripping agent easily removes, at low temperatures in a short period of time, photoresist layers applied on substrates, photoresist layers remaining after etching and photoresist residues after ashing subsequent to etching. The photoresist stripping agent also removes the photoresist layers and photoresist residues without corroding substrates, wiring materials, insulating layers, etc. to enable the fine processing and provide high precision circuits.Type: ApplicationFiled: January 5, 2004Publication date: July 15, 2004Inventor: Kazuto Ikemoto
-
Publication number: 20040081922Abstract: The photoresist stripping composition of the present invention comprises an amine compound and at least one alkanol amide compound selected from the group consisting of compounds represented by Formula I or II: 1Type: ApplicationFiled: February 28, 2003Publication date: April 29, 2004Inventors: Kazuto Ikemoto, Hisake Abe, Taketo Maruyama, Tetsuo Aoyama