Patents by Inventor Kazutoshi Kaji
Kazutoshi Kaji has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 10373802Abstract: An object of the present invention relates to high-resolution observation on a light field STEM, a dark field image STEM, and an EELS, at a low acceleration voltage. The present invention relates to controlling on incorporation angles of a STEM detector and an electron energy loss spectroscopy by changing the disposition of a sample with respect to an optical axis direction of a primary electron beam in a scanning transmission microscopy including an electron energy loss spectroscopy. According to the present invention, it is possible to easily control an optimum scattering angle in each of a light field STEM, a dark field STEM, and an EELS while suppressing occurrence of chromatic aberration accompanying the controlling on the incorporation angle.Type: GrantFiled: September 29, 2015Date of Patent: August 6, 2019Assignee: HITACHI HIGH-TECHNOLOGIES CORPORATIONInventors: Yu Yamazawa, Kazutoshi Kaji
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Publication number: 20180308659Abstract: An object of the present invention relates to high-resolution observation on a light field STEM, a dark field image STEM, and an EELS, at a low acceleration voltage. The present invention relates to controlling on incorporation angles of a STEM detector and an electron energy loss spectroscopy by changing the disposition of a sample with respect to an optical axis direction of a primary electron beam in a scanning transmission microscopy including an electron energy loss spectroscopy. According to the present invention, it is possible to easily control an optimum scattering angle in each of a light field STEM, a dark field STEM, and an EELS while suppressing occurrence of chromatic aberration accompanying the controlling on the incorporation angle.Type: ApplicationFiled: September 29, 2015Publication date: October 25, 2018Inventors: Yu YAMAZAWA, Kazutoshi KAJI
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Patent number: 8901493Abstract: An object of the present invention relates to measurement of a quantitative element image with a high S/N ratio and measurement of an electron energy loss spectrum with high energy precision and energy resolution. The present invention relates to measurement of a characteristic X-ray spectrum obtained by correcting dead time due to excessive X rays and measurement of an electron energy loss spectrum obtained by correcting energy based on a zero loss peak in the case where the characteristic X-ray spectrum and the electron energy loss spectrum are measured by irradiating one irradiation position on a sample with an electron beam for a predetermined time while scanning the surface of the sample to observe a Z-contrast image. According to the present invention, it becomes possible to measure a quantitative element image with a high S/N ratio by a characteristic X ray, an element image with a high S/N ratio by an electron energy loss spectrum and a high energy resolution spectrum.Type: GrantFiled: October 25, 2010Date of Patent: December 2, 2014Assignee: Hitachi High-Technologies CorporationInventor: Kazutoshi Kaji
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Patent number: 8344320Abstract: A lens adjustment method and a lens adjustment system which adjust a plurality of multi-pole lenses of an electron spectrometer attached to a transmission electron microscope, optimum conditions of the multi-pole lenses are determined through simulation based on a parameter design method using exciting currents of the multi-pole lenses as parameters.Type: GrantFiled: January 6, 2011Date of Patent: January 1, 2013Assignee: Hitachi High-Technologies CorporationInventors: Shohei Terada, Yoshihumi Taniguchi, Kazutoshi Kaji
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Publication number: 20120241611Abstract: An object of the present invention relates to measurement of a quantitative element image with a high S/N ratio and measurement of an electron energy loss spectrum with high energy precision and energy resolution. The present invention relates to measurement of a characteristic X-ray spectrum obtained by correcting dead time due to excessive X rays and measurement of an electron energy loss spectrum obtained by correcting energy based on a zero loss peak in the case where the characteristic X-ray spectrum and the electron energy loss spectrum are measured by irradiating one irradiation position on a sample with an electron beam for a predetermined time while scanning the surface of the sample to observe a Z-contrast image. According to the present invention, it becomes possible to measure a quantitative element image with a high S/N ratio by a characteristic X ray, an element image with a high S/N ratio by an electron energy loss spectrum and a high energy resolution spectrum.Type: ApplicationFiled: October 25, 2010Publication date: September 27, 2012Applicant: Hitachi High-Technologies CorporationInventor: Kazutoshi Kaji
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Patent number: 8134131Abstract: An object of the invention is to provide a method and apparatus for observing inside structures and a specimen holder, wherein aging degradation of a good sample to a bad sample can be tracked in the same field of view, using the same specimen in order to determine the mechanism of failure. The present invention is a method for observing inside structures. The method comprises irradiating a specimen with a corpuscular beam generated from a corpuscular beam source, detecting transmitted particles transmitted by the specimen, applying a voltage to a portion of the specimen, and observing of a detection status of the transmitted particles in the voltage-applied portion as needed.Type: GrantFiled: December 8, 2008Date of Patent: March 13, 2012Assignee: Hitachi, Ltd.Inventors: Shohei Terada, Kazutoshi Kaji, Shigeto Isakozawa
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Publication number: 20110095182Abstract: A lens adjustment method and a lens adjustment system which adjust a plurality of multi-pole lenses of an electron spectrometer attached to a transmission electron microscope, optimum conditions of the multi-pole lenses are determined through simulation based on a parameter design method using exciting currents of the multi-pole lenses as parameters.Type: ApplicationFiled: January 6, 2011Publication date: April 28, 2011Applicant: HITACHI HIGH-TECHNOLOGIES CORPORATIONInventors: Shohei Terada, Yoshihumi Taniguchi, Kazutoshi Kaji
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Patent number: 7928376Abstract: There is provided an element mapping unit, scanning transmission electron microscope, and element mapping method that enable to acquire an element mapping image very easily. On the scanning transmission electron microscope, the electron beam transmitted through an object to be analyzed enters into the element mapping unit. The electron beam is analyzed of its energy into spectrum by an electron spectrometer and an electron energy loss spectrum is acquired. Because the acceleration voltage data for each element and window data for 2-window method, 3-window method or contrast tuning method are already stored in a database and accordingly the spectrum measurement is carried out immediately even when an element to be analyzed is changed to another, the operator can confirm a two-dimensional element distribution map immediately.Type: GrantFiled: September 23, 2005Date of Patent: April 19, 2011Assignee: Hitachi, Ltd.Inventors: Kazutoshi Kaji, Kazuhiro Ueda, Koji Kimoto, Takashi Aoyama, Shunroku Taya, Shigeto Isakozawa
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Patent number: 7888641Abstract: A lens adjustment method and a lens adjustment system which adjust a plurality of multi-pole lenses of an electron spectrometer attached to a transmission electron microscope, optimum conditions of the multi-pole lenses are determined through simulation based on a parameter design method using exciting currents of the multi-pole lenses as parameters.Type: GrantFiled: July 31, 2008Date of Patent: February 15, 2011Assignee: Hitachi High-Technologies CorporationInventors: Shohei Terada, Yoshihumi Taniguchi, Kazutoshi Kaji
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Patent number: 7872232Abstract: To enable measurement of an elastically scattered electron image, a characteristic-X-ray-based element image and an electron-beam-energy-spectroscopy-based element image with a high S/N and high spatial resolution in an electronic microscope having a function to produce an element image. Measurement of a characteristic X-ray signal and electron beam energy loss spectra or measurement of a plurality of energy filter signals including a core loss of an observed element is performed simultaneously and continuously with detection of elastically scattered electrons transmitted through a specimen to be analyzed, and element images based on characteristic X-rays and electron beam energy spectroscopy are added up while correcting a positional misalignment with respect to elastically scattered electron images continuously observed (see FIG. 1).Type: GrantFiled: January 15, 2009Date of Patent: January 18, 2011Assignee: Hitachi High-Technologies CorporationInventor: Kazutoshi Kaji
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Publication number: 20090302234Abstract: An object of the invention is to provide a method and apparatus for observing inside structures and a specimen holder, wherein aging degradation of a good sample to a bad sample can be tracked in the same field of view, using the same specimen in order to determine the mechanism of failure. The present invention is a method for observing inside structures. The method comprises irradiating a specimen with a corpuscular beam generated from a corpuscular beam source, detecting transmitted particles transmitted by the specimen, applying a voltage to a portion of the specimen, and observing of a detection status of the transmitted particles in the voltage-applied portion as needed.Type: ApplicationFiled: December 8, 2008Publication date: December 10, 2009Inventors: Shohei Terada, Kazutoshi Kaji, Shigeto Isakozawa
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Patent number: 7544935Abstract: A method for evaluating thin films comprises the steps of inputting measurement conditions, generating electron beams from an electron source to condense the electron beams to a specimen by a condenser lens, enlarging the electron beams transmitted by the specimen with imaging lenses to image an enlarged image of the specimen, acquiring elemental maps of the specimen with an element analyzer to display the acquired elemental maps, measuring a length of the elemental maps, and correcting the measurement conditions. Disclosed is an evaluating apparatus that implements the above evaluating method.Type: GrantFiled: December 8, 2005Date of Patent: June 9, 2009Assignees: Hitachi, Ltd., Hitachi High-Technologies Corporation, Samsung Electronics Co.Inventors: Shohei Terada, Kazutoshi Kaji, Tatsumi Hirano, Gyeong-su Park, Se-ahn Song, Jong-bong Park
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Publication number: 20090045340Abstract: A lens adjustment method and a lens adjustment system which adjust a plurality of multi-pole lenses of an electron spectrometer attached to a transmission electron microscope, optimum conditions of the multi-pole lenses are determined through simulation based on a parameter design method using exciting currents of the multi-pole lenses as parameters.Type: ApplicationFiled: July 31, 2008Publication date: February 19, 2009Inventors: Shohei TERADA, Yoshihumi Taniguchi, Kazutoshi Kaji
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Patent number: 7476872Abstract: An object of the invention is to provide a method and apparatus for observing inside structures and a specimen holder, wherein aging degradation of a good sample to a bad sample can be tracked in the same field of view, using the same specimen in order to determine the mechanism of failure. The present invention is a method for observing inside structures. The method comprises irradiating a specimen with a corpuscular beam generated from a corpuscular beam source, detecting transmitted particles transmitted by the specimen, applying a voltage to a portion of the specimen, and observing of a detection status of the transmitted particles in the voltage-applied portion as needed.Type: GrantFiled: July 11, 2007Date of Patent: January 13, 2009Assignee: Hitachi Ltd.Inventors: Shohei Terada, Kazutoshi Kaji, Shigeto Isakozawa
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Patent number: 7462830Abstract: An object of the invention is to provide a method and apparatus for observing inside structures and a specimen holder, wherein aging degradation of a good sample to a bad sample can be tracked in the same field of view, using the same specimen in order to determine the mechanism of failure. The present invention is a method for observing inside structures. The method comprises irradiating a specimen with a corpuscular beam generated from a corpuscular beam source, detecting transmitted particles transmitted by the specimen, applying a voltage to a portion of the specimen, and observing of a detection status of the transmitted particles in the voltage-applied portion as needed.Type: GrantFiled: August 6, 2004Date of Patent: December 9, 2008Assignee: Hitachi Ltd.Inventors: Shohei Terada, Kazutoshi Kaji, Shigeto Isakozawa
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Publication number: 20070252091Abstract: An object of the invention is to provide a method and apparatus for observing inside structures and a specimen holder, wherein aging degradation of a good sample to a bad sample can be tracked in the same field of view, using the same specimen in order to determine the mechanism of failure. The present invention is a method for observing inside structures. The method comprises irradiating a specimen with a corpuscular beam generated from a corpuscular beam source, detecting transmitted particles transmitted by the specimen, applying a voltage to a portion of the specimen, and observing of a detection status of the transmitted particles in the voltage-applied portion as needed.Type: ApplicationFiled: July 11, 2007Publication date: November 1, 2007Inventors: Shohei Terada, Kazutoshi Kaji, Shigeto Isakozawa
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Patent number: 7250601Abstract: An electron beam detector detects a peak of a spectrum, and when a peak position is deviated from a reference position on the electron beam detector, a controller for controlling an electron beam position on the electron beam detector is used to correct a deviation. An electron energy loss spectrum is measured while controlling correction a deviation between an electron beam position on a specimen, and a peak position of the spectrum, and a spectrum measuring with the electron beam detector.Type: GrantFiled: March 10, 2006Date of Patent: July 31, 2007Assignee: Hitachi High-Technologies CorporationInventors: Kazutoshi Kaji, Takashi Aoyama, Shunroku Taya, Shigeto Isakozawa
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Publication number: 20060163479Abstract: An electron beam detector detects a peak of a spectrum, and when a peak position is deviated from a reference position on the electron beam detector, a controller for controlling an electron beam position on the electron beam detector is used to correct a deviation. An electron energy loss spectrum is measured while controlling correction a deviation between an electron beam position on a specimen, and a peak position of the spectrum, and a spectrum measuring with the electron beam detector.Type: ApplicationFiled: March 10, 2006Publication date: July 27, 2006Inventors: Kazutoshi Kaji, Takashi Aoyama, Shunroku Taya, Shigeto Isakozawa
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Publication number: 20060145075Abstract: A method for evaluating thin films comprises the steps of inputting measurement conditions, generating electron beams from an electron source to condense the electron beams to a specimen by a condenser lens, enlarging the electron beams transmitted by the specimen with imaging lenses to image an enlarged image of the specimen, acquiring elemental maps of the specimen with an element analyzer to display the acquired elemental maps, measuring a length of the elemental maps, and correcting the measurement conditions. Disclosed is an evaluating apparatus that implements the above evaluating method.Type: ApplicationFiled: December 8, 2005Publication date: July 6, 2006Inventors: Shohei Terada, Kazutoshi Kaji, Tatsumi Hirano, Gyeong-su Park, Se-ahn Song, Jong-bong Park
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Patent number: 7053372Abstract: A standard sample for transmission electron microscopy (TEM) elemental mapping and a TEM elemental mapping method using the same are provided. The standard sample includes a substrate; a first crystalline thin film containing heavy atoms formed on the substrate; a first amorphous thin film having oxides or nitrides containing light atoms and having a thickness of 1–5 nm or 6–10 nm formed on the first crystalline thin film; a second crystalline thin film containing heavy atoms formed on the first amorphous thin film. The standard sample can be used to correct TEM, EDS and EELS mapping results of a multi-layered nanometer-sized thin film and to optimize mapping conditions.Type: GrantFiled: January 14, 2005Date of Patent: May 30, 2006Assignees: Samsung Electronics Co., Ltd., Hitachi, Ltd., Hitachi High-Technologies Co.Inventors: Gyeong-su Park, Kazutoshi Kaji, Jong-bong Park, Shohei Terada, Tatsumi Hirano, Se-ahn Song