Abstract: An imprinting method includes placing a template onto non-solidified resin that is applied onto a surface of a substrate, such that the non-solidified resin extends into a pattern of the template in a surface direction of the substrate, starting first alignment operation to align the template with the substrate using a first alignment mark at a first timing, and starting a second alignment operation to align the template with the substrate using a second alignment mark at a second timing after the first timing. The first timing is when the non-solidified resin has extended into the first alignment mark and not yet into the second alignment mark. The second timing is when the non-solidified resin has extended into the first and second alignment marks.

Abstract: According to one embodiment, an imprint apparatus includes a first light source positioned to irradiate a substrate with light, a second light source positioned to irradiate the substrate with light, an illuminance changing portion selectively configured to change the illuminance distribution of light from the first light source on an irradiation surface on the substrate, and a controller configured to control the first light source, the second light source and the illuminance changing portion to irradiate the substrate with light from the first light source, and to subsequently irradiate the substrate with light from the second light source directly through the template.

Abstract: According to one embodiment, a template includes a base material with a first surface at a first level. A first pattern on the template includes first protruding portions in a first region that protrude to a second level beyond the first level, a first recess portion between an adjacent pair of first protruding portions in a central portion of the first region, and a second recess portion between another adjacent pair of first protruding portions in an outer peripheral portion of the first region. A second pattern on the template includes a protrusion portion in a second region outside the first region. The protrusion portion protrudes to a third level. An optical layer is in the first recess portion and at least a portion of a bottom surface of the second recess portion is not covered by the optical layer.

Abstract: According to one embodiment, an imprint lithography template comprises a substrate transparent to ultraviolet light. A first mesa region is on the substrate. A surface of the first mesa region includes a pattern region to be pressed into a photocurable resist film. The pattern region having four sides. A second mesa region is also on the substrate. The first mesa region protrudes from a surface of the second mesa region. A blocking film is adjacent to two sides of the four sides pattern region. The two sides to which the blocking film is adjacent are connected to each other at a corner of the pattern region. The blocking film blocks ultraviolet light.

Abstract: A template includes: a base material having a surface including a first pattern, a second pattern and a third pattern, the first pattern including a first recess, the second pattern including a second recess. The base material containing a first material having a first refractive index; a first layer disposed in the first recess and containing a second material, the second material having a second refractive index different from the first refractive index; and a second layer disposed in the second recess, containing the second material, and being thicker than the first layer.

Abstract: According to one embodiment, a mark is a mark arranged on a substrate and including a line-and-space pattern having a substantially constant pitch on the substrate, the mark including: a first mark in which the line-and-space pattern extends in a direction at an angle that is less than 90° or greater than 90° with respect to the first direction, the first mark including a pair of first patterns arranged at a distance in a first direction along the substrate or a first periodic pattern having a period in the first direction; and a second mark in which the line-and-space pattern extends in a direction at an angle that is less than 90° or greater than 90° with respect to the second direction, the second mark including a pair of second patterns provided in correspondence with the pair of first patterns and arranged at a distance in a second direction along the substrate and intersecting the first direction or a second periodic pattern provided in correspondence with the first periodic pattern and having a period

Abstract: An imprint apparatus includes a moveable substrate support configured to hold a substrate having a transfer target material thereon, a template holder configured to hold a template in which a pattern, which is to be transferred to the transfer target material, is formed, a light source configured to emit light at different selectable intensities toward the transfer target material, and a controller. The controller includes a processing unit and a storage unit, and is configured to retrieve exposure conditions for the transfer target material and control the intensity, and timing of initiation, of the light output by the light source, based on the retrieved exposure conditions, such that the transfer target material is subjected to main curing after undergoing temporary curing.

Abstract: An imprinting device includes an aligner configured to adjust a relative position between an original plate and a substrate when the original plate including a pattern is moved into contact with the substrate including a transfer target material; a first irradiator configured to irradiate the transfer target material with first light based on an irradiation condition before adjusting the relative position; a second irradiator configured to cure the transfer target material by irradiating the transfer target material with second light after adjusting the relative position; an index acquirer configured to acquire an accuracy index indicating an adjustment accuracy of the adjusted relative position; a memory configured to store data including a plurality of the accuracy indexes acquired for a plurality of the substrates; and a controller configured to adjust the irradiation condition when subsequently using the first irradiator based on the data.

Abstract: An imprint device, including a template which has a first surface and a second surface opposite to the first surface, and is provided with a pedestal portion on the first surface, the pedestal portion defining a pattern; a holding portion configured to hold the template; and a magnification adjustment unit disposed at a position corresponding to the pattern of the pedestal portion on a second surface side of the template without contacting the template.

Abstract: A template includes: a base material having a surface including a first pattern, a second pattern and a third pattern, the first pattern including a first recess, the second pattern including a second recess. The base material containing a first material having a first refractive index; a first layer disposed in the first recess and containing a second material, the second material having a second refractive index different from the first refractive index; and a second layer disposed in the second recess, containing the second material, and being thicker than the first layer.

Abstract: According to one embodiment, an imprint lithography template comprises a substrate transparent to ultraviolet light. A first mesa region is on the substrate. A surface of the first mesa region includes a pattern region to be pressed into a photocurable resist film. The pattern region having four sides. A second mesa region is also on the substrate. The first mesa region protrudes from a surface of the second mesa region. A blocking film is adjacent to two sides of the four sides pattern region. The two sides to which the blocking film is adjacent are connected to each other at a corner of the pattern region. The blocking film blocks ultraviolet light.

Abstract: According to one embodiment, an imprint apparatus includes a first light source positioned to irradiate a substrate with light, a second light source positioned to irradiate the substrate with light, an illuminance changing portion selectively configured to change the illuminance distribution of light from the first light source on an irradiation surface on the substrate, and a controller configured to control the first light source, the second light source and the illuminance changing portion to irradiate the substrate with light from the first light source, and to subsequently irradiate the substrate with light from the second light source directly through the template.

Abstract: According to one embodiment, an imprint apparatus includes a first light source positioned to irradiate a substrate with light, a second light source positioned to irradiate the substrate with light, an illuminance changing portion selectively configured to change the illuminance distribution of light from the first light source on an irradiation surface on the substrate, and a controller configured to control the first light source, the second light source and the illuminance changing portion to irradiate the substrate with light from the first light source, and to subsequently irradiate the substrate with light from the second light source directly through the template.

Abstract: An imprinting method includes placing a template onto non-solidified resin that is applied onto a surface of a substrate, such that the non-solidified resin extends into a pattern of the template in a surface direction of the substrate, starting first alignment operation to align the template with the substrate using a first alignment mark at a first timing, and starting a second alignment operation to align the template with the substrate using a second alignment mark at a second timing after the first timing. The first timing is when the non-solidified resin has extended into the first alignment mark and not yet into the second alignment mark. The second timing is when the non-solidified resin has extended into the first and second alignment marks.

Abstract: According to one embodiment, an original plate such as an imprint template or the like, comprises a substrate having a first surface. A pattern region is on the first surface. An impurity layer is within the substrate in a plane parallel to the first surface. The pattern region is within an outer perimeter of the impurity layer when viewed from a direction orthogonal to the first surface.

Abstract: An imprint device, including a template which has a first surface and a second surface opposite to the first surface, and is provided with a pedestal portion on the first surface, the pedestal portion defining a pattern; a holding portion configured to hold the template; and a magnification adjustment unit disposed at a position corresponding to the pattern of the pedestal portion on a second surface side of the template without contacting the template.

Abstract: A power semiconductor device includes: a plurality of power modules including control terminals; a heat sink, on which the plurality of power modules are mounted; and a control substrate, to which the control terminals are fixed. The plurality of power modules each include a first protruding portion close to the control terminals, and a second protruding portion far from the control terminals. The heat sink has, at a position corresponding to the first protruding portion, a first recessed portion formed to have an inner diameter larger than an outer diameter of the first protruding portion, and engaged with the first protruding portion. At a position corresponding to the second protruding portion, the heat sink has a second recessed portion formed to have the shape of an elongated hole whose minor diameter is larger than an outer diameter of the second protruding portion, and engaged with the second protruding portion.

Abstract: According to one embodiment, an imprint apparatus includes a first light source positioned to irradiate a substrate with light, a second light source positioned to irradiate the substrate with light, an illuminance changing portion selectively configured to change the illuminance distribution of light from the first light source on an irradiation surface on the substrate, and a controller configured to control the first light source, the second light source and the illuminance changing portion to irradiate the substrate with light from the first light source, and to subsequently irradiate the substrate with light from the second light source directly through the template.

Abstract: An imprint apparatus includes a moveable substrate support configured to hold a substrate having a transfer target material thereon, a template holder configured to hold a template in which a pattern, which is to be transferred to the transfer target material, is formed, a light source configured to emit light at different selectable intensities toward the transfer target material, and a controller. The controller includes a processing unit and a storage unit, and is configured to retrieve exposure conditions for the transfer target material and control the intensity, and timing of initiation, of the light output by the light source, based on the retrieved exposure conditions, such that the transfer target material is subjected to main curing after undergoing temporary curing.

Abstract: An imprint apparatus includes a substrate support, a template support, and a plurality of independent pressing members. The substrate support is configured to secure a substrate having a transfer target member thereon. The template support has a pressing member side and a template holding side for holding a template, in which a pattern to be transferred to the transfer target material is provided. The plurality of independent pressing members is contactable with the template support, and each pressing member is disposed at a different position on the pressing member side of the template support.