Abstract: A substrate processing apparatus comprises a reaction chamber which is to accommodate stacked substrates, a gas introducing portion, and a buffer chamber, wherein the gas introducing portion is provided along a stacking direction of the substrates, and introduces substrate processing gas into the buffer chamber, the buffer chamber includes a plurality of gas-supply openings provided along the stacking direction of the substrates, and the processing gas introduced from the gas introducing portion is supplied from the gas-supply openings to the reaction chamber.

Abstract: A substrate processing apparatus includes: a reaction tube; a gas introducing tube which is in communication with said reaction tube; a gas exhausting tube having a closing member, and a controller which controls an opening of the closing member to substantially stop exhaustion through the exhausting tube from a predetermined point of time before cleaning gas is supplied from said gas introducing tube into the reaction tube to a point of time when several seconds are elapsed after starting of supply of the cleaning gas into the reaction tube such that there exists a state in which exhaustion from the gas exhausting tube is stopped while the cleaning gas is supplied from the gas introducing tube into the reaction tube to fill the reaction tube with the cleaning gas under control of the controller.

Abstract: A vertical type semiconductor device producing apparatus comprises a vertical type reaction chamber which is to accommodate a plurality of stacked substrates; an exhaust path which exhausts the reaction chamber, a vacuum exhaust device which exhausts the reaction chamber through the exhaust path; an exhaust valve which opens and closes the exhaust path; a first supply path which supplies a first kind of gas, which contributes to film formation, to the reaction chamber; a second supply path which supplies a second kind of gas, which contributes to the film formation, to the reaction chamber; a first and a second gas supply valves which respectively open and close the first and second supply paths; and a controller which controls the exhaust valve and the first and second gas supply valves such that when the first kind of gas is supplied to the reaction chamber, the first kind of gas is supplied to the reaction chamber from the first supply path in a state in which exhaust of the reaction chamber is being stopp

Abstract: A substrate processing apparatus can efficiently use a gas supplied into a reaction tube by improving a shape of a gas nozzle. A cylinder reaction tube 12 is vertically disposed, and openings of a furnace opening flange 13 is airtightly sealed with a seal cap 14, and a boat 15 onto which wafers W as substrates are loaded in a multi-storied fashion is inserted into the reaction tube 12. A gas is supplied from a nozzle 21 to a plurality of wafers W in the cylindrical reaction tube 12 to deposit a thin film on the wafers W. The nozzle 21 is provided creepingly along an inner wall 22 of the tube in a tube axial direction of the cylinder reaction tube 12. In addition, the nozzle 21 has a nozzle space therein which has an extent of 45° or more and 180° or less in a circumferential direction within the tube. A plurality of gas nozzle openings 24 of the nozzle 21 are provided such that the nozzle openings 24 correspond to the respective wafers W so that a gas flows on the respective wafers W.

Abstract: A communication network for use in an automobile includes a main electronic control unit (ECU) that communicates with plural sub-ECUs connected to the main ECU through a communication line. Messages transmitted periodically with a certain interval from each sub-ECU to the main ECU and received by the main ECU in a monitoring interval are counted to obtain the number of message receipts. The number of message receipts is compared with a criterion number preset for each sub-ECU, and if the former is smaller than the later, it is determined that the sub-ECU is under failure. Further, if the number of message receipts is smaller than the criterion number as to all of the sub-ECUs, it is determined that there is a failure or failures in the communication line.

Abstract: A backup RAM for storing pieces of diagnosis data regardless of the cut-off of an electric power is provided in a portion of a RAM. In cases where the detection of an unusual condition by a throttle sensor or a water temperature sensor is judged by a CPU in a current processing routine, a first checking value indicating that the backup RAM is in a renewing period is stored in a checking region of the backup RAM, and pieces of previous diagnosis data stored in a data access region of the backup RAM in a previous processing routine are copied to a temporary refuge region of the backup RAM. Thereafter, pieces of updated diagnosis data obtained in the current processing routine are stored one by one in the data access region in place of the previous diagnosis data, and a second checking value indicating that the backup RAM is in a renewal finishing period is stored in the checking region.