Patents by Inventor Kei Sakamoto

Kei Sakamoto has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20050122318
    Abstract: A data processing device includes plural input modes which is capable of, for instance, automatically determining whether the device is in a notebook mode or a tablet mode, thereby enabling a user to use the data processing device by use of an interface suitable for the mode without performing any particular operation for choosing the interface. The data processing device includes a display which is integrally configured with a tablet, a mode determination section which determines an input mode on basis of the tablet, and a mode controller which switches a user interface on basis of the result of determination of the mode determination section. When configured as described above, the convertible data processing device can automatically determine whether the device is in a notebook mode or a tablet mode, and provide a user with an interface suitable for the mode. Accordingly, comfortable operability can be realized.
    Type: Application
    Filed: November 12, 2004
    Publication date: June 9, 2005
    Applicant: KABUSHIKI KAISHA TOSHIBA
    Inventors: Yojiro Tonouchi, Kei Sakamoto, Tomohiro Hanyu
  • Publication number: 20050105781
    Abstract: An apparatus includes an input device which inputs coordinate data and pressure data corresponding to a signature which is handwritten by a stylus, a unit for sensing a completion of input of a handwritten signature, a unit for detecting an actual stroke end point, a unit for extracting a given number of items of coordinate data input after the actual stroke end point, as effective air stroke data, from the coordinate data and pressure data both input during a period of time from the actual stroke end point to sensing of the completion of input of the handwritten signature, and a unit for defining, as signature data corresponding to the handwritten signature, the coordinate data and the pressure data both input during a period of time from a signature input start point to the actual stroke end point and the coordinate data extracted as the effective air stroke data.
    Type: Application
    Filed: October 6, 2004
    Publication date: May 19, 2005
    Applicant: KABUSHIKI KAISHA TOSHIBA
    Inventors: Kei Sakamoto, Yojiro Tonouchi
  • Publication number: 20050069149
    Abstract: In an electronic apparatus, microphones are arranged parallel to one side of a display screen so as to be spaced apart from each other on the front surface of a display whose display screen is exposed. Together with the microphone, a microphone is arranged parallel to other side different from one side of the display screen. Of the microphones, the microphones are selected when one side of the display screen serves as a bottom, and the microphones are selected when other side of the display screen serves as the bottom. A voice input process is then executed.
    Type: Application
    Filed: September 21, 2004
    Publication date: March 31, 2005
    Inventors: Toshio Takahashi, Kazuyuki Saito, Makoto Yamaguchi, Kei Sakamoto
  • Publication number: 20040152843
    Abstract: A ring-opened metathesis copolymer and its hydrogenated product having a desired monomer unit ratio and a high molecular weight and having hydroxyl groups or hydroxycarbonyl groups can be obtained by conducting a ring-opening metathesis copolymerization of a norbornene-type monomer having hydroxyl groups or hydroxycarbonyl groups with an unsubstituted norbornene-type monomer having at least three rings in the presence of a catalyst predominantly comprised of an organic ruthenium compound having coordinated therewith a neutral electron-donating ligand, and, if desired, hydrogenating the resulting copolymer. The thus-obtained ring-opened metathesis copolymer and its hydrogenation product are characterized by having a low water absorption, good adhesion to metal and other materials, good compatibility with a curing agent and other compounds, and high heat resistance, and exhibiting reduced signal retardation and signal noise.
    Type: Application
    Filed: March 9, 2004
    Publication date: August 5, 2004
    Inventors: Kazunori Taguchi, Yasuo Tsunogae, Hitomi Takeuchi, Yasuhiro Wakisaka, Kei Sakamoto
  • Publication number: 20040107339
    Abstract: A peak shift/cut control program is a program for carrying out a system environment setting changeover control, and properly changes a profile in accordance with each time zone of profile B collectively managing system environment setting items. A user interface section sets time zone corresponding to each profile. A time acquire section periodically acquires system time from an internal clock section of an operating system, and transfers the system time to a profile changeover section. The profile changeover section carries out profile changeover control in accordance with time zone set by the user interface section while receiving the system time from the time acquire section.
    Type: Application
    Filed: November 19, 2003
    Publication date: June 3, 2004
    Applicant: KABUSHIKI KAISHA TOSHIBA
    Inventors: Toshikazu Morisawa, Satoru Arai, Koji Nakamura, Hideaki Andoh, Kei Sakamoto
  • Patent number: 6403289
    Abstract: The invention relates to a developer for photosensitive polyimide resin compositions, comprising an alkaline aqueous solution containing a basic compound (A) represented by a formula (1): wherein X+ is N+ or P+, R is an alkyl group having 1 to 20 carbon atoms or an aryl group having 6 to 10 ring forming carbon atoms, Y− is a monovalent anion, m is 0 or 1, n is 3 or 4, and m+n is 4, with the proviso that when m is 0, n is 4, and R is an alkyl group, the total number of carbon atoms of 4 alkyl groups is at least 13, or when m is 1, n is 3, and R is an alkyl group, the total number of carbon atoms of 3 alkyl groups is at least 6.
    Type: Grant
    Filed: October 30, 1998
    Date of Patent: June 11, 2002
    Assignees: Nippon Zeon Co., Ltd., Fujitsu Limited
    Inventors: Akira Tanaka, Kei Sakamoto, Yasuhiro Yoneda, Kishio Yokouchi
  • Patent number: 6270900
    Abstract: A composite film having a layer structure of at least two layers, wherein a film (A) formed from a ring structure-containing polymer comprising a repeating unit derived from ring-opening or addition polymerization of a monomer having a ring structure, and a film (B) formed from a polycondensation polymer adjoin each other directly or through an adhesive layer.
    Type: Grant
    Filed: April 24, 2000
    Date of Patent: August 7, 2001
    Assignee: Nippon Zeon Co., Ltd.
    Inventors: Yasuhiro Wakizaka, Kei Sakamoto
  • Patent number: 6160081
    Abstract: The invention relates to a photosensitive polyimide resin composition comprising (A) a polyamic acid having, in its main chain, repeating units formed from a polycondensation product of at least one tetracarboxylic acid or tetracarboxylic anhydride thereof with at least one diamine compound, and having actinic ray-sensitive functional groups at both terminals thereof; (B) a photosensitive auxiliary having a photopolymerizable functional group; (C) a photopolymerization initiator; and (D) a solvent, wherein 1 the polyamic acid is such that when the repeating unit represented by the formula (1) is defined as a unit molecular weight, a unit molecular weight per carboxyl group (unit molecular weight/COOH) falls within a range of from 200 to 300, and 2 the photosensitive resin composition permits the formation of a polyimide film having a residual stress of 40 MPa or lower and a coefficient of thermal expansion of 30 ppm/.degree. C.
    Type: Grant
    Filed: October 30, 1998
    Date of Patent: December 12, 2000
    Assignees: Nippon Zeon Co., Ltd., Fujitsu Limited
    Inventors: Akira Tanaka, Kei Sakamoto, Kenichi Ito, Yasuhiro Yoneda, Kishio Yokouchi, Yasuo Naganuma
  • Patent number: 5886136
    Abstract: Disclosed herein is a pattern forming process comprising the steps of coating a substrate with a photosensitive resin composition comprising a polyamic compound having, at each terminal thereof, an actinic ray-sensitive functional group which has substituent groups each having a photopolymerizable carbon-carbon double bond, a photosensitive auxiliary having a photopolymerizable functional group, a photopolymerization initiator, and a solvent to form a film; subjecting the film to pattering exposure; and then developing the thus-exposed film with an alkaline developer or alkaline aqueous solution.
    Type: Grant
    Filed: March 17, 1997
    Date of Patent: March 23, 1999
    Assignees: Nippon Zeon Co., Ltd., Fujitsu Limited
    Inventors: Akira Tanaka, Masami Koshiyama, Kei Sakamoto, Yasuhiro Yoneda, Kishio Yokouchi, Daisuke Mizutani, Yoshikatsu Ishizuki
  • Patent number: 5777068
    Abstract: Provided are photosensitive resin compositions comprising a polyamic compound having, at each terminal thereof, a specific actinic ray-sensitive functional group which has substituent groups each having a photopolymerizable carbon-carbon double bond, a photosensitive auxiliary having a photopolymerizable functional group and a solvent. The photosensitive resin compositions of the invention are excellent in resist properties such as sensitivity and good in storage stability and can provide a film small in residual stress.
    Type: Grant
    Filed: September 12, 1995
    Date of Patent: July 7, 1998
    Assignees: Nippon Zeon Co., Ltd., Fujitsu Limited
    Inventors: Akira Tanaka, Satoshi Tazaki, Kei Sakamoto, Yasuhiro Yoneda, Kishio Yokouchi, Daisuke Mizutani, Yoshikatsu Ishizuki